CA1017655A - Cleaning process using an azeotrope forming mixture - Google Patents

Cleaning process using an azeotrope forming mixture

Info

Publication number
CA1017655A
CA1017655A CA152,600A CA152600A CA1017655A CA 1017655 A CA1017655 A CA 1017655A CA 152600 A CA152600 A CA 152600A CA 1017655 A CA1017655 A CA 1017655A
Authority
CA
Canada
Prior art keywords
cleaning process
forming mixture
azeotrope forming
azeotrope
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA152,600A
Other languages
English (en)
Other versions
CA152600S (en
Inventor
James W. Tipping
Bernard P. Whim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Application granted granted Critical
Publication of CA1017655A publication Critical patent/CA1017655A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5036—Azeotropic mixtures containing halogenated solvents
    • C11D7/5068—Mixtures of halogenated and non-halogenated solvents
    • C11D7/5077—Mixtures of only oxygen-containing solvents
    • C11D7/5081—Mixtures of only oxygen-containing solvents the oxygen-containing solvents being alcohols only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • B01D3/36—Azeotropic distillation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02809—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine
    • C23G5/02812—Perhalogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02809—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine
    • C23G5/02812—Perhalogenated hydrocarbons
    • C23G5/02816—Ethanes
    • C23G5/02819—C2Cl3F3
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08—Treatments involving gases
    • H05K2203/088—Using a vapour or mist, e.g. cleaning using water vapor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1518—Vertically held PCB

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
CA152,600A 1971-09-27 1972-09-26 Cleaning process using an azeotrope forming mixture Expired CA1017655A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB4487671A GB1399867A (en) 1971-09-27 1971-09-27 Cleaning process
US28911372A 1972-09-14 1972-09-14
US05/558,380 US3957531A (en) 1971-09-27 1975-03-14 Two tank cleaning process using a contaminated cleaning mixture capable of forming an azeotrope

Publications (1)

Publication Number Publication Date
CA1017655A true CA1017655A (en) 1977-09-20

Family

ID=27259865

Family Applications (1)

Application Number Title Priority Date Filing Date
CA152,600A Expired CA1017655A (en) 1971-09-27 1972-09-26 Cleaning process using an azeotrope forming mixture

Country Status (7)

Country Link
US (1) US3957531A (de)
CA (1) CA1017655A (de)
CH (1) CH568103A5 (de)
DE (1) DE2247398C2 (de)
FR (1) FR2155354A5 (de)
GB (1) GB1399867A (de)
NL (1) NL174964C (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2660992C2 (de) * 1975-12-08 1988-09-01 Allied Corp., Morristown, N.J., Us
FR2345413A1 (fr) 1975-12-08 1977-10-21 Allied Chem Compositions du genre azeotropes, a base de trichlorotrifluoroethane
US4056403A (en) * 1976-05-27 1977-11-01 Olin Corporation Solvent composition used to clean polyurethane foam generating equipment
US4233120A (en) * 1978-04-14 1980-11-11 John Gladstone & Company (Engineering) Limited Distillation method for solvent recovery
US4260510A (en) * 1978-10-23 1981-04-07 Imperial Chemical Industries Limited Cleaning composition
US4269630A (en) * 1979-10-01 1981-05-26 George M. Stephenson Two-step process and composition for cleaning polished surfaces
US4483717A (en) * 1981-10-08 1984-11-20 Olmsted John H Method of removing adsorbent contaminants from electrical apparatus
EP0085560A1 (de) * 1982-01-28 1983-08-10 Diamond Shamrock Europe Limited Verfahren und Vorrichtung zum Reinigen Beschmutzter Gegenstände
US4530601A (en) * 1983-10-24 1985-07-23 The Dow Chemical Company Quantitative test for residual rosin on cleaned circuit boards
US4984597B1 (en) * 1984-05-21 1999-10-26 Cfmt Inc Apparatus for rinsing and drying surfaces
US4911761A (en) * 1984-05-21 1990-03-27 Cfm Technologies Research Associates Process and apparatus for drying surfaces
US4778532A (en) * 1985-06-24 1988-10-18 Cfm Technologies Limited Partnership Process and apparatus for treating wafers with process fluids
US4648417A (en) * 1985-02-11 1987-03-10 Entek Manufacturing Inc. Apparatus for degreasing a continuous sheet of thin material
US4711256A (en) * 1985-04-19 1987-12-08 Robert Kaiser Method and apparatus for removal of small particles from a surface
US4983222A (en) * 1988-04-14 1991-01-08 Union Carbide Chemicals And Plastics Company Inc. Vapor solvent decontamination of PCB transformer components
IT1226507B (it) * 1988-09-07 1991-01-23 Ausimont Spa Composizione solvente per il deflussaggio di circuiti stampati
DE4002120A1 (de) * 1990-01-25 1991-08-01 Hoechst Ag Neues azeotropartiges loesemittelgemisch und verfahren zur reinigung von elektronischen bauteilen mit hilfe desselben
US5271774A (en) * 1990-03-01 1993-12-21 U.S. Philips Corporation Method for removing in a centrifuge a liquid from a surface of a substrate
DE4013369A1 (de) * 1990-04-26 1991-10-31 Hoechst Ag Neues azeotropes oder azeotropartiges gemisch aus 2,2,2-trifluorethyl-1,1,2,2-tetrafluorethylether und ethanol sowie dessen verwendung
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
US5106425A (en) * 1990-10-22 1992-04-21 Baxter International, Inc. Method for maintaining a flammable solvent in a non-flammable environment
US5113883A (en) * 1990-10-22 1992-05-19 Baxter International Inc. Apparatus for cleaning objects with volatile solvents
US5082503A (en) * 1990-10-22 1992-01-21 Baxter International Inc. Method for removing contaminants from the surfaces of articles
US5201960A (en) * 1991-02-04 1993-04-13 Applied Photonics Research, Inc. Method for removing photoresist and other adherent materials from substrates
MX9202882A (es) * 1991-06-14 1993-07-01 Petroferm Inc Procedimiento de limpieza.
DE59208347D1 (de) * 1991-06-21 1997-05-22 Solvay Azeotropartiges Gemisch aus Methanol und 1H-Perfluorhexan
EP0519432A3 (en) * 1991-06-21 1993-05-05 Hoechst Aktiengesellschaft Azeotrope-like mixture of 2-propanol and 1h-perfluorohexane
ATE258084T1 (de) * 1991-10-04 2004-02-15 Cfmt Inc Superreinigung von komplizierten mikroteilchen
US6355113B1 (en) 1991-12-02 2002-03-12 3M Innovative Properties Company Multiple solvent cleaning system
DE69320725T2 (de) * 1992-06-29 1999-04-01 Canon Kk Harzzusammensetzung zum Dichten und eine mit Dichtharzzusammensetzung bedeckte Halbleitervorrichtung
US5401429A (en) * 1993-04-01 1995-03-28 Minnesota Mining And Manufacturing Company Azeotropic compositions containing perfluorinated cycloaminoether
US5494601A (en) * 1993-04-01 1996-02-27 Minnesota Mining And Manufacturing Company Azeotropic compositions
US6187729B1 (en) * 1993-12-14 2001-02-13 Petroferm Inc. Cleaning composition comprising solvating agent and rinsing agent
US6039059A (en) 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
US6328809B1 (en) 1998-10-09 2001-12-11 Scp Global Technologies, Inc. Vapor drying system and method
JP2004140196A (ja) * 2002-10-17 2004-05-13 Nec Electronics Corp 半導体装置の製造方法および基板洗浄装置
US7052556B1 (en) 2003-03-10 2006-05-30 Montie-Targosz Enterprises, Llc Process for removal of paint from plastic substrates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2153577A (en) * 1935-03-07 1939-04-11 Du Pont Process of degreasing
US2220124A (en) * 1938-07-20 1940-11-05 Westvaco Chlorine Products Cor Degreasing
GB550703A (en) * 1941-07-18 1943-01-20 William Edward Booth Improvements in the degreasing of metal articles
NL121693C (de) * 1959-05-22
US2999816A (en) * 1960-08-15 1961-09-12 Du Pont Azeotropic composition
NL129954C (de) * 1964-04-02
US3575867A (en) * 1969-02-06 1971-04-20 Allied Chem Novel solvent mixtures
US3723332A (en) * 1970-11-27 1973-03-27 Allied Chem Stabilized perchlorofluorocarbon compositions
US3881949A (en) * 1973-02-27 1975-05-06 Du Pont Vapor degreaser process employing trichlorotrifluoroethane and ethanol

Also Published As

Publication number Publication date
NL174964B (nl) 1984-04-02
AU4659372A (en) 1974-03-21
DE2247398A1 (de) 1973-04-12
US3957531A (en) 1976-05-18
FR2155354A5 (de) 1973-05-18
NL7213041A (de) 1973-03-29
NL174964C (nl) 1984-09-03
GB1399867A (en) 1975-07-02
DE2247398C2 (de) 1985-06-27
CH568103A5 (de) 1975-10-31

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