BRPI0416131A - método e aparelho de processamento ultra-sÈnico com transdutores de múltiplas freqüências - Google Patents
método e aparelho de processamento ultra-sÈnico com transdutores de múltiplas freqüênciasInfo
- Publication number
- BRPI0416131A BRPI0416131A BRPI0416131-9A BRPI0416131A BRPI0416131A BR PI0416131 A BRPI0416131 A BR PI0416131A BR PI0416131 A BRPI0416131 A BR PI0416131A BR PI0416131 A BRPI0416131 A BR PI0416131A
- Authority
- BR
- Brazil
- Prior art keywords
- transducers
- resonant frequencies
- ultrasonic processing
- processing method
- multiple frequency
- Prior art date
Links
- 238000003672 processing method Methods 0.000 title abstract 2
- 230000005284 excitation Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/0207—Driving circuits
- B06B1/0223—Driving circuits for generating signals continuous in time
- B06B1/0269—Driving circuits for generating signals continuous in time for generating multiple frequencies
- B06B1/0284—Driving circuits for generating signals continuous in time for generating multiple frequencies with consecutive, i.e. sequential generation, e.g. with frequency sweep
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B2201/00—Indexing scheme associated with B06B1/0207 for details covered by B06B1/0207 but not provided for in any of its subgroups
- B06B2201/70—Specific application
- B06B2201/71—Cleaning in a tank
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Apparatuses For Generation Of Mechanical Vibrations (AREA)
Abstract
"MéTODO E APARELHO DE PROCESSAMENTO ULTRA-SÈNICO COM TRANSDUTORES DE MúLTIPLAS FREQüêNCIAS". São revelados um aparelho e método de processamento ultra-sênico, que incluem múltiplos transdutores de pelo menos duas freqüências ressonantes diferentes que fornecem energia ultra-sónica a um tanque cheio de líquido contendo componentes a ser limpos ou processados ultra-sonicamente. Os transdutores são arranjados em padrões triangulares eqüilaterais ao longo de linhas diagonais em uma parede do tanque, de maneira que cada transdutor tenha um transdutor adjacente de uma freqüência diferente. Alternativamente, o aparelho inclui um ou mais transdutores tipo haste tendo freqüências ressonantes diferentes, de maneira que o aparelho forneça uma mistura de várias freqüências de energia ultrasónica ao tanque. Um outro aspecto da invenção envolve selecionar transdutores com freqüências ressonantes diferentes, que estão fora de uma subfaixa excluída, e energizar os transdutores por meio de um sinal de excitação que varre as freqüências ressonantes dos transdutores e a subfaixa excluída.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51750103P | 2003-11-05 | 2003-11-05 | |
PCT/US2004/037177 WO2005044440A2 (en) | 2003-11-05 | 2004-11-05 | Ultrasonic apparatus with multiple frequency transducers |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0416131A true BRPI0416131A (pt) | 2007-01-02 |
Family
ID=34572948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0416131-9A BRPI0416131A (pt) | 2003-11-05 | 2004-11-05 | método e aparelho de processamento ultra-sÈnico com transdutores de múltiplas freqüências |
Country Status (9)
Country | Link |
---|---|
US (3) | US7247977B2 (pt) |
EP (1) | EP1701781A4 (pt) |
JP (1) | JP2007523738A (pt) |
KR (1) | KR101004073B1 (pt) |
CN (1) | CN101084586B (pt) |
AU (1) | AU2004287498C1 (pt) |
BR (1) | BRPI0416131A (pt) |
CA (1) | CA2544633A1 (pt) |
WO (1) | WO2005044440A2 (pt) |
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DE102004053337A1 (de) * | 2004-11-04 | 2006-05-11 | Steag Hama Tech Ag | Verfahren und Vorrichtung zum Behandeln von Substraten und Düseneinheit hierfür |
TWI393595B (zh) * | 2006-03-17 | 2013-04-21 | Michale Goodson J | 具有頻率掃描的厚度模式轉換器之超高頻音波處理設備 |
JP4763585B2 (ja) * | 2006-12-04 | 2011-08-31 | 富士通株式会社 | 超音波洗浄装置及び基板洗浄方法 |
GB0703295D0 (en) * | 2007-02-21 | 2007-03-28 | Guyson Internat Ltd | Ultrasonic cleaning apparatus |
US20080312460A1 (en) * | 2007-06-13 | 2008-12-18 | Goodson J Michael | Multi-Frequency Ultrasonic Apparatus and Process for Producing Biofuels |
US20100126942A1 (en) * | 2008-11-20 | 2010-05-27 | Thottathil Sebastian K | Multi-frequency ultrasonic apparatus and process with exposed transmitting head |
SG177745A1 (en) * | 2009-08-12 | 2012-02-28 | Kulicke & Soffa Ind Inc | Ultrasonic transducers for wire bonding and methods of forming wire bonds using ultrasonic transducers |
US9108232B2 (en) * | 2009-10-28 | 2015-08-18 | Megasonic Sweeping, Incorporated | Megasonic multifrequency apparatus with matched transducers and mounting plate |
US20110132575A1 (en) * | 2009-12-07 | 2011-06-09 | Goodson J Michael | Cleaning Industrial Heat Exchangers Through Utilization of Thicknenss Mode Ultrasonics |
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US9159311B2 (en) * | 2010-04-01 | 2015-10-13 | J. Michael Goodson | Unrestricted mounting of ultrasonic transducers |
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US8540798B2 (en) * | 2011-01-04 | 2013-09-24 | Guilherme Santana Lopes Gomes | Systems and methods for recycling steelmaking converter sludge |
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US9454954B2 (en) | 2012-05-01 | 2016-09-27 | Fujifilm Dimatix, Inc. | Ultra wide bandwidth transducer with dual electrode |
US9061320B2 (en) * | 2012-05-01 | 2015-06-23 | Fujifilm Dimatix, Inc. | Ultra wide bandwidth piezoelectric transducer arrays |
EP2703094B1 (en) * | 2012-08-27 | 2019-10-02 | IMEC vzw | A system for delivering ultrasonic energy to a liquid and its use for cleaning of solid parts |
GB2506939B (en) * | 2012-10-15 | 2017-04-05 | Alphasonics (Ultrasonic Cleaning Systems) Ltd | Improvements in and relating to ultrasonic cleaning |
US9660170B2 (en) | 2012-10-26 | 2017-05-23 | Fujifilm Dimatix, Inc. | Micromachined ultrasonic transducer arrays with multiple harmonic modes |
CN103143529A (zh) * | 2013-03-18 | 2013-06-12 | 无锡南方声学工程有限公司 | 一种应用于纺丝行业喷丝板的聚能式超声波清洗装置 |
WO2014193315A1 (en) * | 2013-05-30 | 2014-12-04 | Agricultural Research Development Agency (Public Organization) | Ultrasonic cleaning and disinfecting device and method |
CN103341466B (zh) * | 2013-07-29 | 2014-12-17 | 河海大学常州校区 | 多频可切换的水下构建物清洗维护装置 |
US9226076B2 (en) | 2014-04-30 | 2015-12-29 | Apple Inc. | Evacuation of liquid from acoustic space |
US11141762B2 (en) | 2015-05-15 | 2021-10-12 | Acm Research (Shanghai), Inc. | System for cleaning semiconductor wafers |
JP6605044B2 (ja) | 2015-05-20 | 2019-11-13 | エーシーエム リサーチ (シャンハイ) インコーポレーテッド | 半導体ウエハの洗浄方法および洗浄装置 |
CN105562397B (zh) * | 2016-02-18 | 2018-11-20 | 深圳市智水小荷技术有限公司 | 复合频率超声波清洗装置 |
JP6770757B2 (ja) | 2016-04-06 | 2020-10-21 | エーシーエム リサーチ (シャンハイ) インコーポレーテッド | 半導体ウエハの洗浄方法及び洗浄装置 |
CN106238302B (zh) * | 2016-08-26 | 2018-10-16 | 北京七星华创电子股份有限公司 | 一种频率动态变化的超声波/兆声波清洗装置 |
CN106269452B (zh) * | 2016-08-26 | 2018-12-18 | 北京七星华创电子股份有限公司 | 一种组合式多频率超声波/兆声波清洗装置 |
US11103898B2 (en) | 2016-09-19 | 2021-08-31 | Acm Research, Inc. | Methods and apparatus for cleaning substrates |
CN109791899B (zh) | 2016-09-20 | 2023-06-16 | 盛美半导体设备(上海)股份有限公司 | 衬底清洗方法及清洗装置 |
CN106140724A (zh) * | 2016-09-30 | 2016-11-23 | 四川行来科技有限公司 | 一种超声波薄膜清洗机 |
US11772134B2 (en) * | 2017-09-29 | 2023-10-03 | Taiwan Semiconductor Manufacturing Company, Ltd | Sonic cleaning of brush |
CN107649063B (zh) * | 2017-11-02 | 2023-08-29 | 黑龙江省科学院自动化研究所 | 一种纳米材料超声共振乳化混配装置 |
US11581205B2 (en) | 2017-11-20 | 2023-02-14 | Acm Research, Inc. | Methods and system for cleaning semiconductor wafers |
WO2019186306A1 (en) * | 2018-03-24 | 2019-10-03 | RAMCHANDRAN, Shankar Trichur | Method and system for generating a combined waveform signal |
KR102046278B1 (ko) * | 2019-02-28 | 2019-12-03 | 박효정 | 복수의 주파수 발진기를 이용한 초음파 세척기 및 이에 적합한 초음파 진동자 제어 방법. |
CN110508566A (zh) * | 2019-08-27 | 2019-11-29 | 天津科技大学 | 基于多频漏超声导波的表面除垢方法 |
US11945014B2 (en) | 2020-01-24 | 2024-04-02 | New Jersey Institute Of Technology | Coupled high and low-frequency ultrasound systems and methods for remediation of contaminated solids |
CN112371645B (zh) * | 2020-10-26 | 2022-02-22 | 北京北方华创微电子装备有限公司 | 声波清洗装置及晶圆清洗设备 |
KR102369303B1 (ko) * | 2020-11-23 | 2022-03-03 | (주)고도기연 | 주파수 동기화 장치 및 그를 이용한 초음파 발진 장치 |
CN113909209B (zh) * | 2021-09-29 | 2022-09-13 | 深圳市美雅洁技术股份有限公司 | 一种混合频率超声波组件 |
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-
2004
- 2004-11-05 JP JP2006539710A patent/JP2007523738A/ja active Pending
- 2004-11-05 US US10/983,183 patent/US7247977B2/en active Active
- 2004-11-05 WO PCT/US2004/037177 patent/WO2005044440A2/en active Application Filing
- 2004-11-05 EP EP04818352A patent/EP1701781A4/en not_active Withdrawn
- 2004-11-05 CA CA002544633A patent/CA2544633A1/en not_active Abandoned
- 2004-11-05 CN CN2004800327357A patent/CN101084586B/zh not_active Expired - Fee Related
- 2004-11-05 BR BRPI0416131-9A patent/BRPI0416131A/pt not_active IP Right Cessation
- 2004-11-05 AU AU2004287498A patent/AU2004287498C1/en not_active Ceased
- 2004-11-05 KR KR1020067008641A patent/KR101004073B1/ko active IP Right Grant
-
2007
- 2007-07-23 US US11/781,760 patent/US20070283985A1/en not_active Abandoned
- 2007-07-23 US US11/781,823 patent/US20070283979A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1701781A2 (en) | 2006-09-20 |
CN101084586A (zh) | 2007-12-05 |
KR20070001058A (ko) | 2007-01-03 |
US20050122003A1 (en) | 2005-06-09 |
WO2005044440A3 (en) | 2007-05-10 |
JP2007523738A (ja) | 2007-08-23 |
EP1701781A4 (en) | 2010-02-03 |
AU2004287498B2 (en) | 2009-12-03 |
US20070283979A1 (en) | 2007-12-13 |
CN101084586B (zh) | 2010-04-28 |
AU2004287498C1 (en) | 2010-06-17 |
WO2005044440A2 (en) | 2005-05-19 |
AU2004287498A1 (en) | 2005-05-19 |
US7247977B2 (en) | 2007-07-24 |
US20070283985A1 (en) | 2007-12-13 |
CA2544633A1 (en) | 2005-05-19 |
KR101004073B1 (ko) | 2010-12-27 |
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