BRPI0405220B1 - composiÇço fotopolimerizÁvel, placa de impressço flexogrÁfica, e, formas em relevo de impressço flexogrÁfica. - Google Patents
composiÇço fotopolimerizÁvel, placa de impressço flexogrÁfica, e, formas em relevo de impressço flexogrÁfica.Info
- Publication number
- BRPI0405220B1 BRPI0405220B1 BRPI0405220-0A BRPI0405220A BRPI0405220B1 BR PI0405220 B1 BRPI0405220 B1 BR PI0405220B1 BR PI0405220 A BRPI0405220 A BR PI0405220A BR PI0405220 B1 BRPI0405220 B1 BR PI0405220B1
- Authority
- BR
- Brazil
- Prior art keywords
- weight
- range
- flexographic printing
- photopolymerizable
- block
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 abstract 4
- 229920001400 block copolymer Polymers 0.000 abstract 4
- 229920001169 thermoplastic Polymers 0.000 abstract 3
- 239000004416 thermosoftening plastic Substances 0.000 abstract 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 238000012644 addition polymerization Methods 0.000 abstract 1
- 239000007822 coupling agent Substances 0.000 abstract 1
- 230000009477 glass transition Effects 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 229920005604 random copolymer Polymers 0.000 abstract 1
- 150000003384 small molecules Chemical class 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/02—Letterpress printing, e.g. book printing
- B41M1/04—Flexographic printing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Polymerisation Methods In General (AREA)
- Printing Methods (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03076253A EP1473595A1 (en) | 2003-04-29 | 2003-04-29 | Photopolymerizable compositions and flexographic printing plates derived therefrom |
| PCT/EP2004/050635 WO2004097523A1 (en) | 2003-04-29 | 2004-04-28 | Photopolymerizable compositions and flexographic printing plates derived therefrom |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BRPI0405220A BRPI0405220A (pt) | 2005-03-01 |
| BRPI0405220B1 true BRPI0405220B1 (pt) | 2012-07-24 |
Family
ID=32981873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0405220-0A BRPI0405220B1 (pt) | 2003-04-29 | 2004-04-28 | composiÇço fotopolimerizÁvel, placa de impressço flexogrÁfica, e, formas em relevo de impressço flexogrÁfica. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20050233249A1 (enExample) |
| EP (2) | EP1473595A1 (enExample) |
| JP (1) | JP4087411B2 (enExample) |
| KR (1) | KR100699610B1 (enExample) |
| CN (1) | CN100561342C (enExample) |
| AT (1) | ATE525675T1 (enExample) |
| BR (1) | BRPI0405220B1 (enExample) |
| TW (1) | TWI247194B (enExample) |
| WO (1) | WO2004097523A1 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1426411A1 (en) | 2002-12-06 | 2004-06-09 | KRATON Polymers Research B.V. | Styrenic block copolymer compositions to be used for the manufacture of transparent, gel free films |
| WO2005031459A1 (ja) * | 2003-09-25 | 2005-04-07 | Zeon Corporation | 感光性フレキソ版用ブロック共重合体組成物 |
| BRPI0417952A (pt) | 2003-12-22 | 2007-04-17 | Kraton Polymers Res Bv | composição de copolìmero em bloco, e, composição adesiva |
| US7307124B2 (en) | 2004-02-19 | 2007-12-11 | Kraton Polymers U.S. Llc | Hot-melt adhesive composition for non-wovens |
| CN101057181B (zh) | 2004-11-11 | 2011-01-12 | 旭化成电子材料株式会社 | 柔性版印刷用感光性树脂组合物 |
| US7872065B2 (en) | 2005-03-11 | 2011-01-18 | Kraton Polymers U.S. Llc | Adhesive compositions comprising mixtures of block copolymers |
| US20060205877A1 (en) | 2005-03-11 | 2006-09-14 | Kraton Polymers U.S. Llc | Adhesive compositions comprising mixtures of block copolymers |
| US7704676B2 (en) * | 2007-09-04 | 2010-04-27 | Kraton Polymers U.S. Llc | Block copolymers having distinct isoprene and butadiene midblocks, method for making same, and uses for such block copolymers |
| CN101981121B (zh) * | 2008-03-31 | 2013-02-06 | 日本瑞翁株式会社 | 嵌段共聚物组合物、其制备方法及薄膜 |
| US8598271B2 (en) | 2008-12-26 | 2013-12-03 | Zeon Corporation | Block copolymer composition, film, and method for producing block copolymer composition |
| WO2010074267A1 (ja) | 2008-12-26 | 2010-07-01 | 日本ゼオン株式会社 | ブロック共重合体組成物およびホットメルト粘接着剤組成物 |
| JP5403048B2 (ja) * | 2009-02-27 | 2014-01-29 | 日本ゼオン株式会社 | フレキソ版用ブロック共重合体組成物 |
| JP5772592B2 (ja) | 2009-03-31 | 2015-09-02 | 日本ゼオン株式会社 | ラベル用粘接着剤組成物 |
| US8470929B2 (en) | 2009-03-31 | 2013-06-25 | Zeon Corporation | Composition for stretchable film |
| KR101591131B1 (ko) | 2009-06-30 | 2016-02-02 | 제온 코포레이션 | 신축성 필름용 조성물 |
| CN102540715A (zh) * | 2010-12-30 | 2012-07-04 | 乐凯华光印刷科技有限公司 | 一种容易去粘的柔性感光树脂版 |
| US8604129B2 (en) * | 2010-12-30 | 2013-12-10 | Kimberly-Clark Worldwide, Inc. | Sheet materials containing S-B-S and S-I/B-S copolymers |
| US8980994B2 (en) * | 2010-12-30 | 2015-03-17 | Kraton Polymers U.S. Llc | Elastic film/fiber formulations |
| DE102012202377A1 (de) * | 2011-10-21 | 2013-04-25 | Tesa Se | Klebemasse insbesondere zur Kapselung einer elektronischen Anordnung |
| JP2014048517A (ja) * | 2012-08-31 | 2014-03-17 | Asahi Kasei E-Materials Corp | フレキソ印刷版用構成体及びフレキソ印刷版 |
| US11493844B2 (en) | 2017-04-04 | 2022-11-08 | Asahi Kasei Kabushiki Kaisha | Photosensitive resin composition for flexographic printing plate, flexographic printing original plate, flexographic printing plate, and copolymer |
| WO2019188604A1 (ja) | 2018-03-28 | 2019-10-03 | 日本ゼオン株式会社 | フレキソ版用ブロック共重合体組成物 |
| CN114854235A (zh) * | 2022-05-05 | 2022-08-05 | 昆山国显光电有限公司 | 一种组合物、功能层以及显示模组 |
| CN119505116A (zh) * | 2023-08-25 | 2025-02-25 | 中国石油化工股份有限公司 | 一种可光聚合受控分布嵌段聚合物的组合物及其制备方法和应用 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL288289A (enExample) * | 1962-01-29 | |||
| CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
| JPS53127004A (en) * | 1977-04-11 | 1978-11-06 | Asahi Chemical Ind | Photosensitive elastomer composition |
| JPS597948A (ja) * | 1982-07-06 | 1984-01-17 | Asahi Chem Ind Co Ltd | 画像形成方法 |
| DE3630474A1 (de) * | 1986-09-06 | 1988-03-10 | Basf Ag | Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen |
| DE3744243C2 (de) * | 1987-12-24 | 1995-12-07 | Du Pont Deutschland | Verbesserte photopolymerisierbare Aufzeichnungsmaterialien |
| DE69225277T2 (de) * | 1991-02-15 | 1998-12-24 | Asahi Kasei Kogyo K.K., Osaka | Lichtempfindliche Elastomerzusammensetzung |
| WO1996007702A1 (en) * | 1994-09-09 | 1996-03-14 | Shell Internationale Research Maatschappij B.V. | Block copolymer containing binder composition and electrophotographic toner composition derived therefrom |
| DE19654103A1 (de) * | 1996-12-23 | 1998-06-25 | Du Pont Deutschland | Verfahren zum Kantenverkleben von photopolymerisierbaren Druckplatten oder Photopolymerdruckformen für den Flexodruck |
| DE19709037A1 (de) * | 1997-03-06 | 1998-09-10 | Du Pont Deutschland | Material und Verfahren zum Kantenabdecken von photopolymerisierbaren Druckplatten für den Flexodruck |
| US6127094A (en) * | 1997-10-02 | 2000-10-03 | Napp Systems Inc. | Acrylate copolymer-containing water-developable photosensitive resins and printing plates prepared therefrom |
| EP1025149B1 (en) * | 1997-10-31 | 2002-02-06 | KRATON Polymers Research B.V. | Foam composition comprising oil, thermoplastic elastomer and expandable particles |
| EP1158364A3 (de) * | 2000-05-03 | 2003-04-23 | BASF Drucksysteme GmbH | Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen |
| EP1266935B1 (en) * | 2000-06-30 | 2008-08-13 | Asahi Kasei Kabushiki Kaisha | Styrene copolymer composition |
| EP1193039A1 (en) * | 2000-09-29 | 2002-04-03 | Fuji Photo Film Co., Ltd. | Method of recycling plastic parts for photosensitive material |
| AU2002246042A1 (en) * | 2001-01-18 | 2002-07-30 | Kraton Polymers Research B.V. | Adhesive composition |
| EP1442079B1 (en) * | 2001-10-18 | 2006-03-29 | KRATON Polymers Research B.V. | Solid curable polymeric composition |
| KR100428514B1 (ko) * | 2001-11-16 | 2004-04-29 | 금호석유화학 주식회사 | 선형과 비선형성 구조가 혼합된 중합체 및 그 제조방법 |
-
2003
- 2003-04-29 EP EP03076253A patent/EP1473595A1/en not_active Withdrawn
-
2004
- 2004-04-28 US US10/518,985 patent/US20050233249A1/en not_active Abandoned
- 2004-04-28 EP EP04729904A patent/EP1499923B1/en not_active Expired - Lifetime
- 2004-04-28 KR KR1020047021326A patent/KR100699610B1/ko not_active Expired - Fee Related
- 2004-04-28 BR BRPI0405220-0A patent/BRPI0405220B1/pt not_active IP Right Cessation
- 2004-04-28 AT AT04729904T patent/ATE525675T1/de not_active IP Right Cessation
- 2004-04-28 WO PCT/EP2004/050635 patent/WO2004097523A1/en not_active Ceased
- 2004-04-28 JP JP2005518218A patent/JP4087411B2/ja not_active Expired - Lifetime
- 2004-04-28 CN CNB2004800004100A patent/CN100561342C/zh not_active Expired - Fee Related
- 2004-04-29 TW TW093112076A patent/TWI247194B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004097523A1 (en) | 2004-11-11 |
| JP4087411B2 (ja) | 2008-05-21 |
| KR20050027996A (ko) | 2005-03-21 |
| JP2006514338A (ja) | 2006-04-27 |
| TWI247194B (en) | 2006-01-11 |
| BRPI0405220A (pt) | 2005-03-01 |
| CN100561342C (zh) | 2009-11-18 |
| KR100699610B1 (ko) | 2007-03-23 |
| US20050233249A1 (en) | 2005-10-20 |
| EP1473595A1 (en) | 2004-11-03 |
| EP1499923B1 (en) | 2011-09-21 |
| CN1698015A (zh) | 2005-11-16 |
| TW200510935A (en) | 2005-03-16 |
| ATE525675T1 (de) | 2011-10-15 |
| EP1499923A1 (en) | 2005-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 28/04/2004, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 16A ANUIDADE. |
|
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: REFERENTE AO DESPACHO 21.6 PUBLICADO NA RPI 2564 DE 2020-02-27 |