BR9911084A - Processos de polimerização e para reticulação de um revestimento polimérico, e, substrato revestido - Google Patents
Processos de polimerização e para reticulação de um revestimento polimérico, e, substrato revestidoInfo
- Publication number
- BR9911084A BR9911084A BR9911084-9A BR9911084A BR9911084A BR 9911084 A BR9911084 A BR 9911084A BR 9911084 A BR9911084 A BR 9911084A BR 9911084 A BR9911084 A BR 9911084A
- Authority
- BR
- Brazil
- Prior art keywords
- polymerization
- photoinitiator
- processes
- source
- coated substrate
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 4
- 238000006116 polymerization reaction Methods 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 title abstract 3
- 238000004132 cross linking Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- 239000000203 mixture Substances 0.000 abstract 4
- 230000005855 radiation Effects 0.000 abstract 4
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 230000008033 biological extinction Effects 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J143/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Adhesives based on derivatives of such polymers
- C09J143/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/061—Polyesters; Polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/068—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/141—Polyesters; Polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/148—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/20—Presence of organic materials
- C09J2400/22—Presence of unspecified polymer
- C09J2400/228—Presence of unspecified polymer in the pretreated surface to be joined
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2839—Web or sheet containing structurally defined element or component and having an adhesive outermost layer with release or antistick coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
"PROCESSOS DE POLIMERIZAçãO E PARA RETICULAçãO DE UM REVESTIMENTO POLIMéRICO, E, SUBSTRATO REVESTIDO" Em um aspecto a invenção proporciona um processo de polimerização energeticamente eficiente compreendendo irradiação de uma composição polimerizável e um fotoiniciador com uma fonte de radiação essencialmente monocromática no qual o fotoiniciador e o comprimento de onda da fonte de radiação são selecionados de tal modo que o coeficiente de extinção do fotoiniciador no comprimento de onda de pico da fonte é maior do que cerca de 1.000 M^ -1^.cm^ 1^ e de tal maneira que o fotoiniciador absorve pelo menos dois por cento da radiação actínica incidente sobre o revestimento. Em outro aspecto a invenção proporciona processos energeticamente eficientes de polimerização de composições polimerizáveis e de reticulação de composições reticuláveis por irradiação das respectivas composições com uma fonte de baixa potência de radiação essencialmente monocromática. As fontes de energia de baixa potência possuem uma potência de entrada menor do que cerca de 10 W/cm. Também são proporcionados artigos preparados pelos processos acima, incluindo filmes poliméricos que possuem revestimentos removíveis, revestimentos adesivos, e revestimentos duros e similares sobre os mesmos.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/096,004 US6224949B1 (en) | 1998-06-11 | 1998-06-11 | Free radical polymerization method |
PCT/US1999/001783 WO1999064472A1 (en) | 1998-06-11 | 1999-01-28 | Free radical polymerization method |
Publications (2)
Publication Number | Publication Date |
---|---|
BR9911084A true BR9911084A (pt) | 2001-03-06 |
BR9911084B1 BR9911084B1 (pt) | 2009-05-05 |
Family
ID=22254617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI9911084-9A BR9911084B1 (pt) | 1998-06-11 | 1999-01-28 | processo de polimerização. |
Country Status (10)
Country | Link |
---|---|
US (2) | US6224949B1 (pt) |
EP (2) | EP1093471B1 (pt) |
JP (1) | JP4288003B2 (pt) |
KR (1) | KR100523305B1 (pt) |
AR (1) | AR018638A1 (pt) |
AU (1) | AU2564699A (pt) |
BR (1) | BR9911084B1 (pt) |
DE (1) | DE69937681T2 (pt) |
NZ (1) | NZ508550A (pt) |
WO (1) | WO1999064472A1 (pt) |
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US6824820B1 (en) * | 1999-06-07 | 2004-11-30 | 3M Innovative Properties Company | Polyurea-based adhesives, articles therefrom and methods of their preparation and use |
JP2001240842A (ja) * | 2000-02-28 | 2001-09-04 | Nitto Denko Corp | 紫外線硬化型粘着剤組成物とその粘着シ―ト類 |
DE10049669A1 (de) * | 2000-10-06 | 2002-04-11 | Tesa Ag | Verfahren zur Herstellung von vernetzten Acrylatschmelzhaftklebemassen |
US7351471B2 (en) * | 2000-12-06 | 2008-04-01 | 3M Innovative Properties Company | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
US6908586B2 (en) * | 2001-06-27 | 2005-06-21 | Fusion Uv Systems, Inc. | Free radical polymerization method having reduced premature termination, apparatus for performing the method and product formed thereby |
US6866899B2 (en) * | 2001-12-21 | 2005-03-15 | 3M Innovative Properties Company | Polymerization method comprising sequential irradiation |
US6916510B1 (en) * | 2002-05-17 | 2005-07-12 | Seagate Technology Llc | Method for improving efficiency of UV curing of lubricant thin films and improved data/information storage media obtained thereby |
US20040028931A1 (en) * | 2002-06-26 | 2004-02-12 | Bletsos Ioannis V. | Coated sheet materials and packages made therewith |
DE10232828A1 (de) * | 2002-07-19 | 2004-02-05 | Goldschmidt Ag | Verwendung von Antioxidantien in strahlenhärtbaren Beschichtungsmassen für die Herstellung von abhäsiven Beschichtungen |
US20040071978A1 (en) * | 2002-10-15 | 2004-04-15 | Omnova Solutions Inc. | Laminate and method of production |
DE602004029842D1 (de) * | 2003-06-21 | 2010-12-16 | Cpfilms Inc | Folie, enthaltend eine Beschichtung mit Trenneigenschaften |
US7101618B2 (en) * | 2004-05-07 | 2006-09-05 | 3M Innovative Properties Company | Article comprising fluorochemical surface layer |
US7342080B2 (en) * | 2004-05-07 | 2008-03-11 | 3M Innovative Properties Company | Polymerizable compositions, methods of making the same, and composite articles therefrom |
US20050249940A1 (en) * | 2004-05-07 | 2005-11-10 | 3M Innovative Properties Company | Fluoropolyether poly(meth)acryl compounds |
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WO2005111157A1 (en) * | 2004-05-07 | 2005-11-24 | 3M Innovative Properties Company | Stain repellent optical hard coating |
JP4851446B2 (ja) * | 2004-07-01 | 2012-01-11 | スリーエム イノベイティブ プロパティズ カンパニー | ハードコート組成物 |
US20060148996A1 (en) * | 2004-12-30 | 2006-07-06 | Coggio William D | Low refractive index fluoropolymer compositions having improved coating and durability properties |
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JP2008527090A (ja) * | 2004-12-30 | 2008-07-24 | スリーエム イノベイティブ プロパティズ カンパニー | 耐汚染性フルオロケミカル組成物 |
US7323514B2 (en) * | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
US7297810B2 (en) * | 2004-12-30 | 2007-11-20 | 3M Innovative Properties Company | High refractive index monomers for optical applications |
US20070014018A1 (en) * | 2004-12-30 | 2007-01-18 | Wheatley John A | Internal components of optical device comprising hardcoat |
US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
US20060216524A1 (en) | 2005-03-23 | 2006-09-28 | 3M Innovative Properties Company | Perfluoropolyether urethane additives having (meth)acryl groups and hard coats |
FR2890970B1 (fr) * | 2005-09-16 | 2008-03-14 | Rhodia Recherches & Tech | Procede de preparation d'un revetement silicone anti- adherent |
US7407710B2 (en) * | 2006-04-14 | 2008-08-05 | 3M Innovative Properties Company | Composition containing fluoroalkyl silicone and hydrosilicone |
US7410704B2 (en) * | 2006-04-14 | 2008-08-12 | 3M Innovative Properties Company | Composition containing fluoroalkyl hydrosilicone |
US7413807B2 (en) * | 2006-04-14 | 2008-08-19 | 3M Innovative Properties Company | Fluoroalkyl silicone composition |
US20070285779A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Optical films comprising high refractive index and antireflective coatings |
US20070285778A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Optical films comprising high refractive index and antireflective coatings |
US20080124555A1 (en) | 2006-11-29 | 2008-05-29 | 3M Innovative Properties Company | Polymerizable composition comprising perfluoropolyether urethane having ethylene oxide repeat units |
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US20090275720A1 (en) * | 2008-04-30 | 2009-11-05 | 3M Innovative Properties Company | Ortho-benzylphenol mono(meth)acrylate monomers suitable for microstructured optical films |
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CN113874437A (zh) | 2019-05-31 | 2021-12-31 | 3M创新有限公司 | 经热处理的取向(共)聚合物膜及其使用交联载体层的制备方法 |
JP7353845B2 (ja) | 2019-07-23 | 2023-10-02 | エステー株式会社 | ダニ用忌避剤及びダニの忌避方法 |
Family Cites Families (26)
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US4181752A (en) | 1974-09-03 | 1980-01-01 | Minnesota Mining And Manufacturing Company | Acrylic-type pressure sensitive adhesives by means of ultraviolet radiation curing |
US4262072A (en) | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
US4330590A (en) | 1980-02-14 | 1982-05-18 | Minnesota Mining And Manufacturing Company | Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine |
US4329384A (en) | 1980-02-14 | 1982-05-11 | Minnesota Mining And Manufacturing Company | Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine |
US4379201A (en) | 1981-03-30 | 1983-04-05 | Minnesota Mining And Manufacturing Company | Multiacrylate cross-linking agents in pressure-sensitive photoadhesives |
US4737559A (en) | 1986-05-19 | 1988-04-12 | Minnesota Mining And Manufacturing Co. | Pressure-sensitive adhesive crosslinked by copolymerizable aromatic ketone monomers |
US4748043A (en) | 1986-08-29 | 1988-05-31 | Minnesota Mining And Manufacturing Company | Electrospray coating process |
US4885332A (en) | 1988-04-11 | 1989-12-05 | Minnesota Mining And Manufacturing Company | Photocurable abrasion resistant coatings comprising silicon dioxide dispersions |
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DE3844445A1 (de) | 1988-12-31 | 1990-07-19 | Basf Ag | Uv-vernetzbare massen auf basis von (meth)-acrylesterpolymerisaten |
US5248805A (en) | 1988-12-31 | 1993-09-28 | Basf Aktiengesellschaft | Radiation-senstive, ethylenically unsaturated, copolymerizable compounds and their preparation |
DE3914374A1 (de) | 1989-04-29 | 1990-10-31 | Basf Ag | Durch ultraviolette strahlung unter luftsauerstoffatmosphaere vernetzbare copolymerisate |
DE3930097A1 (de) | 1989-09-09 | 1991-03-14 | Basf Ag | Uv-vernetzbare copolymerisate |
US5091483A (en) | 1989-09-22 | 1992-02-25 | Minnesota Mining And Manufacturing Company | Radiation-curable silicone elastomers and pressure sensitive adhesives |
DE4007318A1 (de) | 1990-03-08 | 1991-09-12 | Basf Ag | Ethylenisch ungesaettigte verbindungen |
JPH04202865A (ja) * | 1990-11-29 | 1992-07-23 | Toray Ind Inc | 着色繊維構造物の製造法 |
US5504391A (en) | 1992-01-29 | 1996-04-02 | Fusion Systems Corporation | Excimer lamp with high pressure fill |
US5326598A (en) | 1992-10-02 | 1994-07-05 | Minnesota Mining And Manufacturing Company | Electrospray coating apparatus and process utilizing precise control of filament and mist generation |
DE4243270A1 (de) | 1992-12-21 | 1994-06-23 | Lohmann Gmbh & Co Kg | Verfahren zur Vernetzung von Haftklebern durch Einsatz von Lasern |
EP0688351B1 (en) | 1993-03-11 | 1997-08-06 | Minnesota Mining And Manufacturing Company | Radiation curable acrylate/silicone permanently removable pressure sensitive adhesive |
US5543231A (en) * | 1993-05-26 | 1996-08-06 | Avery Dennison Corporation | Radiation-curable silicone release compositions |
US5685754A (en) | 1994-06-30 | 1997-11-11 | Kimberly-Clark Corporation | Method of generating a reactive species and polymer coating applications therefor |
US5562992A (en) * | 1994-08-02 | 1996-10-08 | Avery Dennison Corporation | Radiation-curable silicone release compositions and coated articles |
US5891530A (en) * | 1996-04-19 | 1999-04-06 | Minnesota Mining And Manufacturing Company | Method for producing a coating |
JP2000509089A (ja) | 1996-04-19 | 2000-07-18 | ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー | ポリマを放射線架橋する方法及び放射線架橋性組成物 |
EP0961787B1 (en) | 1997-02-19 | 2002-05-22 | Ciba SC Holding AG | (co)polymers by photopolymerization |
-
1998
- 1998-06-11 US US09/096,004 patent/US6224949B1/en not_active Expired - Lifetime
-
1999
- 1999-01-28 AU AU25646/99A patent/AU2564699A/en not_active Abandoned
- 1999-01-28 DE DE69937681T patent/DE69937681T2/de not_active Expired - Lifetime
- 1999-01-28 KR KR10-2000-7013944A patent/KR100523305B1/ko not_active IP Right Cessation
- 1999-01-28 JP JP2000553477A patent/JP4288003B2/ja not_active Expired - Fee Related
- 1999-01-28 EP EP99905500A patent/EP1093471B1/en not_active Revoked
- 1999-01-28 BR BRPI9911084-9A patent/BR9911084B1/pt not_active IP Right Cessation
- 1999-01-28 EP EP04016305A patent/EP1471078B1/en not_active Expired - Lifetime
- 1999-01-28 NZ NZ508550A patent/NZ508550A/en unknown
- 1999-01-28 WO PCT/US1999/001783 patent/WO1999064472A1/en active IP Right Grant
- 1999-06-09 AR ARP990102728A patent/AR018638A1/es active IP Right Grant
-
2001
- 2001-02-06 US US09/777,995 patent/US6517910B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1093471B1 (en) | 2007-12-05 |
US6517910B2 (en) | 2003-02-11 |
BR9911084B1 (pt) | 2009-05-05 |
KR100523305B1 (ko) | 2005-10-24 |
DE69937681D1 (de) | 2008-01-17 |
WO1999064472A1 (en) | 1999-12-16 |
EP1093471A1 (en) | 2001-04-25 |
AU2564699A (en) | 1999-12-30 |
AR018638A1 (es) | 2001-11-28 |
US20010031798A1 (en) | 2001-10-18 |
DE69937681T2 (de) | 2008-11-20 |
JP2002517569A (ja) | 2002-06-18 |
KR20010052689A (ko) | 2001-06-25 |
US6224949B1 (en) | 2001-05-01 |
JP4288003B2 (ja) | 2009-07-01 |
NZ508550A (en) | 2003-10-31 |
EP1471078B1 (en) | 2012-04-25 |
EP1471078A1 (en) | 2004-10-27 |
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