BR9900610A - Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação. - Google Patents
Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação.Info
- Publication number
- BR9900610A BR9900610A BR9900610-3A BR9900610A BR9900610A BR 9900610 A BR9900610 A BR 9900610A BR 9900610 A BR9900610 A BR 9900610A BR 9900610 A BR9900610 A BR 9900610A
- Authority
- BR
- Brazil
- Prior art keywords
- radiation
- polymers
- sensitive
- substituted maleimide
- application
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F126/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/36—Amides or imides
- C08F22/40—Imides, e.g. cyclic imides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Patente de Invenção: <B>"POLìMEROS COM UNIDADES DE MALEIMIDA N-SUBSTITUìDA E SUA APLICAçãO EM MISTURAS SENSìVEIS à RADIAçãO"<D>. A invenção refere-se a polímeros com unidades a partir de maleimida N-substituída, uma mistura sensível à radiação que trabalha de maneira positiva ou negativa, que contém a) um aglutinante de polímero insolúvel em água, solúvel em solução aquosa e alcalina e b) pelo menos um composto sensível à radiação, sendo que o aglutinante engloba um polímero com unidade a partir de maleimida N-substituída da fórmula (I) Além disso, a invenção refere-se a um material de desenho com um suporte e uma camada sensível à radiação, sendo que a camada consiste na mistura mencionada. O material de desenho é especialmente adequado para a preparação de desenhos em relevo resistentes a produtos químicos. As placas de impressão planas preparadas a partir do material de desenho permitem uma elevada tiragem de impressão e são resistentes face e produtos químicos de processamento.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803564A DE19803564A1 (de) | 1998-01-30 | 1998-01-30 | Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9900610A true BR9900610A (pt) | 2000-04-11 |
Family
ID=7856113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9900610-3A BR9900610A (pt) | 1998-01-30 | 1999-01-29 | Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação. |
Country Status (6)
Country | Link |
---|---|
US (1) | US6190825B1 (pt) |
EP (1) | EP0933682B1 (pt) |
JP (1) | JPH11269229A (pt) |
KR (1) | KR19990068178A (pt) |
BR (1) | BR9900610A (pt) |
DE (2) | DE19803564A1 (pt) |
Families Citing this family (66)
Publication number | Priority date | Publication date | Assignee | Title |
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US6537736B1 (en) * | 1999-03-12 | 2003-03-25 | Matsushita Electric Industrial Co., Ltd. | Patten formation method |
US6528240B1 (en) * | 1999-03-12 | 2003-03-04 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method |
DE19936333A1 (de) * | 1999-08-02 | 2001-03-15 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen für Druckplatten zur Steigerung der Chemikalien- und Entwicklerresistenz |
DE60014536T2 (de) | 1999-08-02 | 2005-03-24 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen für Druckplatten mit verbesserter chemischer Beständigkeit und Entwickler-Beständigkeit und mit diesen Zusammensetzungen hergestellte Druckplatten |
DE19936332A1 (de) * | 1999-08-02 | 2001-03-15 | Kodak Polychrome Graphics Gmbh | Druckplatten mit hoher Chemikalien-Entwicklerresistenz |
DE19936331B4 (de) * | 1999-08-02 | 2006-12-07 | Kodak Polychrome Graphics Gmbh | Copolymer zur Erhöhung der Chemikalien- und Entwicklerresistenz von positiv arbeitenden Druckplatten |
US6783914B1 (en) * | 2000-02-25 | 2004-08-31 | Massachusetts Institute Of Technology | Encapsulated inorganic resists |
JP2001264979A (ja) * | 2000-03-22 | 2001-09-28 | Fuji Photo Film Co Ltd | ポジ型感光性平版印刷版 |
JP4119597B2 (ja) * | 2000-05-17 | 2008-07-16 | 富士フイルム株式会社 | 平版印刷版原版 |
DE60126736T2 (de) * | 2000-08-31 | 2007-11-15 | Az Electronic Materials Usa Corp. | Strahlungsempfindliche polysilazan-zusammensetzung, daraus erzeugte muster sowie ein verfahren zur veraschung eines entsprechenden beschichtungsfilms |
US6645689B2 (en) | 2002-03-13 | 2003-11-11 | Kodak Polychrome Graphics Llc | Solvent resistant polymers with improved bakeability features |
US20060000377A1 (en) * | 2002-10-04 | 2006-01-05 | Agfa-Gevaert | Method of marking a lithographic printing plate precursor |
US20060234161A1 (en) * | 2002-10-04 | 2006-10-19 | Eric Verschueren | Method of making a lithographic printing plate precursor |
US7458320B2 (en) * | 2002-10-15 | 2008-12-02 | Agfa Graphics, N.V. | Polymer for heat-sensitive lithographic printing plate precursor |
US20060060096A1 (en) * | 2002-10-15 | 2006-03-23 | Agfa-Gevaert | Polymer for heat-sensitive lithographic printing plate precursor |
DE60321371D1 (de) * | 2002-10-15 | 2008-07-10 | Agfa Graphics Nv | Polymer für wärmeempfindlichen vorläufer einer lithographischen druckplatte |
US7198877B2 (en) * | 2002-10-15 | 2007-04-03 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
JP2006517306A (ja) * | 2003-02-11 | 2006-07-20 | アグフア−ゲヴエルト | 感熱性平版印刷版前駆体 |
EP1577330B1 (en) * | 2003-08-22 | 2012-02-15 | Okamoto Chemical Industry Co., Ltd | Copolymer, image-forming composition and plate for lithography |
US20070077513A1 (en) * | 2003-12-18 | 2007-04-05 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
US7467587B2 (en) | 2004-04-21 | 2008-12-23 | Agfa Graphics, N.V. | Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material |
EP1604818B1 (en) * | 2004-06-11 | 2007-04-25 | Agfa Graphics N.V. | Negative working, heat-sensitive lithographic printing plate precursor |
JP4674110B2 (ja) * | 2004-04-27 | 2011-04-20 | アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ | ネガ作用性感熱性平版印刷版前駆体 |
US7348126B2 (en) | 2004-04-27 | 2008-03-25 | Agfa Graphics N.V. | Negative working, heat-sensitive lithographic printing plate precursor |
JP4404734B2 (ja) * | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
US7856985B2 (en) | 2005-04-22 | 2010-12-28 | Cynosure, Inc. | Method of treatment body tissue using a non-uniform laser beam |
US20070003875A1 (en) * | 2005-06-30 | 2007-01-04 | Agfa-Gevaert | Method for preparing a lithographic printing plate precursor |
DE602005006118T2 (de) * | 2005-06-30 | 2009-07-02 | Agfa Graphics N.V. | Wärmeempfindlicher Flachdruckplattenvorläufer |
US7678533B2 (en) | 2005-06-30 | 2010-03-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
US20070003869A1 (en) * | 2005-06-30 | 2007-01-04 | Agfa-Gevaert | Heat-sensitive lithographic printing plate-precursor |
JP2007071902A (ja) * | 2005-09-02 | 2007-03-22 | Fujifilm Corp | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
US7586957B2 (en) | 2006-08-02 | 2009-09-08 | Cynosure, Inc | Picosecond laser apparatus and methods for its operation and use |
DE602006009919D1 (de) | 2006-08-03 | 2009-12-03 | Agfa Graphics Nv | Flachdruckplattenträger |
JP5238176B2 (ja) * | 2007-03-23 | 2013-07-17 | 富士フイルム株式会社 | ネガ型平版印刷版原版及びそれを用いる平版印刷方法 |
ATE516953T1 (de) | 2007-04-27 | 2011-08-15 | Agfa Graphics Nv | Lithographiedruckplattenvorläufer |
ATE509764T1 (de) | 2007-08-14 | 2011-06-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithographiedruckform |
EP2047988B1 (en) | 2007-10-09 | 2014-03-12 | Agfa Graphics N.V. | A lithographic printing plate precursor |
EP2065211B1 (en) | 2007-11-30 | 2010-05-26 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
ES2430562T3 (es) | 2008-03-04 | 2013-11-21 | Agfa Graphics N.V. | Método para la fabricación de un soporte de una plancha de impresión litográfica |
JP5205661B2 (ja) * | 2008-03-28 | 2013-06-05 | 富士フイルム株式会社 | ネガ型平版印刷版原版及びそれを用いる平版印刷方法 |
JP5158506B2 (ja) * | 2008-03-28 | 2013-03-06 | 富士フイルム株式会社 | 平版印刷版の製版方法及び平版印刷方法 |
JP5212622B2 (ja) * | 2008-03-28 | 2013-06-19 | 富士フイルム株式会社 | ネガ型平版印刷版原版及びそれを用いる平版印刷方法 |
ATE514561T1 (de) | 2008-03-31 | 2011-07-15 | Agfa Graphics Nv | Verfahren zur behandlung einer lithografischen druckplatte |
EP2159049B1 (en) | 2008-09-02 | 2012-04-04 | Agfa Graphics N.V. | A heat-sensitive positive-working lithographic printing plate precursor |
EP2213690B1 (en) | 2009-01-30 | 2015-11-11 | Agfa Graphics N.V. | A new alkali soluble resin |
ATE553920T1 (de) | 2009-06-18 | 2012-05-15 | Agfa Graphics Nv | Lithographiedruckplattenvorläufer |
EP2329951B1 (en) | 2009-12-04 | 2012-06-20 | AGFA Graphics NV | A lithographic printing plate precursor |
EP2366545B1 (en) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | A lithographic printing plate precursor |
US20130298792A1 (en) | 2011-01-25 | 2013-11-14 | Agfa Graphics Nv | Lithographic printing plate precursor |
ES2427137T3 (es) | 2011-02-18 | 2013-10-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
EP2753981B1 (en) | 2011-09-08 | 2015-10-14 | AGFA Graphics NV | Method of making a lithographic printing plate |
KR102342629B1 (ko) | 2012-04-18 | 2021-12-22 | 싸이노슈어, 엘엘씨 | 피코초 레이저 장치 및 그를 사용한 표적 조직의 치료 방법 |
EP2941349B1 (en) | 2013-01-01 | 2017-07-19 | AGFA Graphics NV | (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
EP3751684A1 (en) | 2013-03-15 | 2020-12-16 | Cynosure, Inc. | Picosecond optical radiation systems and methods of use |
EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
EP2944657B1 (en) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors |
EP2955198B8 (en) | 2014-06-13 | 2018-01-03 | Agfa Nv | Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors |
EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
EP3032334B1 (en) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
EP3170662B1 (en) | 2015-11-20 | 2019-08-14 | Agfa Nv | A lithographic printing plate precursor |
WO2017157575A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method and apparatus for processing a lithographic printing plate |
AU2019225242B2 (en) | 2018-02-26 | 2023-08-10 | Cynosure, Llc | Q-switched cavity dumped sub-nanosecond laser |
EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
Family Cites Families (34)
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---|---|---|---|---|
US3779778A (en) | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
GB1375461A (pt) | 1972-05-05 | 1974-11-27 | ||
JPS5039702B2 (pt) * | 1973-08-28 | 1975-12-18 | ||
JPS5228401B2 (pt) | 1973-09-21 | 1977-07-26 | ||
JPS5136129A (en) | 1974-09-20 | 1976-03-26 | Konishiroku Photo Ind | Kankoseisoseibutsu |
CH598214A5 (pt) * | 1976-04-09 | 1978-05-12 | Ciba Geigy Ag | |
DE2718259C2 (de) | 1977-04-25 | 1982-11-25 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliches Gemisch |
US4189323A (en) | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
DE2960207D1 (en) * | 1978-03-07 | 1981-04-16 | Bayer Ag | Disulfimide derivatives containing polymerisable maleimide groups, process for their preparation and their use |
DE2829511A1 (de) | 1978-07-05 | 1980-01-24 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE2829512A1 (de) | 1978-07-05 | 1980-01-17 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE2928636A1 (de) | 1979-07-16 | 1981-02-12 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
US4540762A (en) * | 1982-09-13 | 1985-09-10 | Exxon Research And Engineering Co. | Copolymers of sodium styrene sulfonate and sodium-N-(4-sulfophenyl)-maleimide |
DE3404366A1 (de) | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
DE3406927A1 (de) | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
DE3409888A1 (de) | 1984-03-17 | 1985-09-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung |
DE3442756A1 (de) | 1984-11-23 | 1986-05-28 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen |
CA1254432A (en) | 1984-12-28 | 1989-05-23 | Conrad G. Houle | High-temperature resistant, selectively developable positive-working resist |
US4663268A (en) * | 1984-12-28 | 1987-05-05 | Eastman Kodak Company | High-temperature resistant photoresists featuring maleimide binders |
JPH06105355B2 (ja) | 1986-12-15 | 1994-12-21 | 富士写真フイルム株式会社 | 感光性組成物 |
US5462840A (en) * | 1987-09-16 | 1995-10-31 | Hoechst Celanese Corporation | Use of poly(35-disubstituted 4-hydroxystyrene/N-substituted maleimide for forming a negative image |
DE3800617A1 (de) | 1988-01-12 | 1989-07-20 | Hoechst Ag | Elektrophotographisches aufzeichnungsmaterial |
JPH0769605B2 (ja) * | 1988-02-25 | 1995-07-31 | 富士写真フイルム株式会社 | 感光性組成物 |
DE3820699A1 (de) | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3832032A1 (de) | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
JP2648969B2 (ja) | 1989-07-28 | 1997-09-03 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH05150453A (ja) | 1991-11-27 | 1993-06-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
US5372915A (en) | 1993-05-19 | 1994-12-13 | Eastman Kodak Company | Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer |
DE4335425A1 (de) | 1993-10-18 | 1995-04-20 | Hoechst Ag | Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial |
NO952270D0 (no) | 1995-06-08 | 1995-06-08 | Jotun As | Polymerer for grohemmende maling og fremgangsmåte for fremstilling derav |
US6132935A (en) | 1995-12-19 | 2000-10-17 | Fuji Photo Film Co., Ltd. | Negative-working image recording material |
JP3725624B2 (ja) * | 1996-08-09 | 2005-12-14 | 富士写真フイルム株式会社 | ネガ型平版印刷用版材及び製版方法 |
DE19712323A1 (de) | 1997-03-24 | 1998-10-01 | Agfa Gevaert Ag | Strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial für Offsetdruckplatten |
DE19739302A1 (de) | 1997-09-08 | 1999-03-11 | Agfa Gevaert Ag | Positiv arbeitendes IR-sensitives Gemisch, damit hergestelltes thermisch bebilderbares Aufzeichnungsmaterial sowie Verfahren zur Herstellung einer Druckform für den Offsetdruck |
-
1998
- 1998-01-30 DE DE19803564A patent/DE19803564A1/de not_active Withdrawn
-
1999
- 1999-01-20 EP EP99100913A patent/EP0933682B1/de not_active Expired - Lifetime
- 1999-01-20 DE DE59913745T patent/DE59913745D1/de not_active Expired - Lifetime
- 1999-01-28 KR KR1019990002673A patent/KR19990068178A/ko not_active Application Discontinuation
- 1999-01-29 US US09/239,999 patent/US6190825B1/en not_active Expired - Fee Related
- 1999-01-29 BR BR9900610-3A patent/BR9900610A/pt not_active Application Discontinuation
- 1999-02-01 JP JP11024216A patent/JPH11269229A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US6190825B1 (en) | 2001-02-20 |
DE19803564A1 (de) | 1999-08-05 |
EP0933682B1 (de) | 2006-08-09 |
EP0933682A3 (de) | 2000-06-07 |
DE59913745D1 (de) | 2006-09-21 |
EP0933682A2 (de) | 1999-08-04 |
JPH11269229A (ja) | 1999-10-05 |
KR19990068178A (ko) | 1999-08-25 |
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