BR8101905A - Solucao reveladora e processo para revelacao de camadas de reproducao que trabalham negativamente - Google Patents

Solucao reveladora e processo para revelacao de camadas de reproducao que trabalham negativamente

Info

Publication number
BR8101905A
BR8101905A BR8101905A BR8101905A BR8101905A BR 8101905 A BR8101905 A BR 8101905A BR 8101905 A BR8101905 A BR 8101905A BR 8101905 A BR8101905 A BR 8101905A BR 8101905 A BR8101905 A BR 8101905A
Authority
BR
Brazil
Prior art keywords
water
insoluble
revealing
developer solution
reproduction layers
Prior art date
Application number
BR8101905A
Other languages
English (en)
Inventor
L Schell
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8101905A publication Critical patent/BR8101905A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Materials For Medical Uses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Undergarments, Swaddling Clothes, Handkerchiefs Or Underwear Materials (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Medicinal Preparation (AREA)
  • Media Introduction/Drainage Providing Device (AREA)
  • Sampling And Sample Adjustment (AREA)
BR8101905A 1980-03-31 1981-03-30 Solucao reveladora e processo para revelacao de camadas de reproducao que trabalham negativamente BR8101905A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803012522 DE3012522A1 (de) 1980-03-31 1980-03-31 Verfahren und entwicklerloesung zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten

Publications (1)

Publication Number Publication Date
BR8101905A true BR8101905A (pt) 1981-10-06

Family

ID=6098913

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8101905A BR8101905A (pt) 1980-03-31 1981-03-30 Solucao reveladora e processo para revelacao de camadas de reproducao que trabalham negativamente

Country Status (11)

Country Link
US (1) US4416976A (pt)
EP (1) EP0037060B1 (pt)
JP (1) JPS56153341A (pt)
AT (1) ATE6703T1 (pt)
AU (1) AU539890B2 (pt)
BR (1) BR8101905A (pt)
CA (1) CA1168500A (pt)
DE (2) DE3012522A1 (pt)
FI (1) FI66697C (pt)
MX (1) MX159691A (pt)
ZA (1) ZA812100B (pt)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4786580A (en) * 1983-12-27 1988-11-22 Hoechst Celanese Corporation Method of developing imaged diazo material with propanol containing developer composition
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
US5066561A (en) * 1984-06-11 1991-11-19 Hoechst Celanese Corporation Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US4983490A (en) * 1985-10-28 1991-01-08 Hoechst Celanese Corporation Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4948697A (en) * 1985-10-28 1990-08-14 Hoechst Celanese Corporation Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4806458A (en) * 1985-10-28 1989-02-21 Hoechst Celanese Corporation Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
US4692398A (en) * 1985-10-28 1987-09-08 American Hoechst Corporation Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US5039594A (en) * 1985-10-28 1991-08-13 Hoechst Celanese Corporation Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
ZA87922B (en) * 1986-02-28 1987-09-30 Macdermid Inc Photoresist stripper composition
US4714670A (en) * 1986-06-09 1987-12-22 Imperial Metal & Chemical Company Developer including an aliphatic cyclic carbonate in the oil phase emulsion
US4755451A (en) * 1986-08-28 1988-07-05 Sage Technology Developer for color proofing film with an alkyl glycol derivative of cyclohexane
DE3715792A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Entwickler fuer wasserlos druckende offsetplatten
US4822723A (en) * 1987-11-30 1989-04-18 Hoechst Celanese Corporation Developer compositions for heavy-duty lithographic printing plates
JPH02253265A (ja) * 1989-03-28 1990-10-12 Nippon Zeon Co Ltd レジスト剥離剤
US5290665A (en) * 1989-06-01 1994-03-01 Fuji Photo Film Co., Ltd. Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative
JPH035756A (ja) * 1989-06-01 1991-01-11 Fuji Photo Film Co Ltd 水なしｐｓ版用現像液
JPH0785947B2 (ja) * 1989-08-05 1995-09-20 東洋インキ製造株式会社 平版印刷用湿し水
JPH0418564A (ja) * 1990-01-22 1992-01-22 Asahi Chem Ind Co Ltd 感光性エラストマー組成物用現像剤
EP0539881B1 (en) * 1991-10-29 1995-08-02 E.I. Du Pont De Nemours And Company Single-phase developers for lithographic printing elements
JPH10186680A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd リンス液

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
GB1220808A (en) * 1967-05-18 1971-01-27 Howson Algraphy Ltd Processing of presensitized photolithographic printing plate
NL6918761A (pt) 1968-12-30 1970-07-02
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3682641A (en) * 1970-03-23 1972-08-08 Du Pont Photoresist developer extender baths containing polyoxyalkylene ethers and esters and process of use
US3996054A (en) * 1971-09-24 1976-12-07 Minnesota Mining And Manufacturing Company Color photographic developing solution
JPS5027728B2 (pt) * 1971-11-04 1975-09-10
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
GB1418433A (en) * 1973-02-10 1975-12-17 Ricoh Kk Developers for two-component diazotype materials
CA1057105A (en) * 1974-10-08 1979-06-26 Ferdinand J. Gajewski Developing and stripping of binder-containing presensitized coatings
JPS5217901A (en) * 1975-07-31 1977-02-10 Mitsubishi Chem Ind Developer for lithographic press plate
US4055515A (en) * 1975-12-31 1977-10-25 Borden, Inc. Developer for printing plates
JPS5587151A (en) * 1978-12-25 1980-07-01 Mitsubishi Chem Ind Ltd Developing solution composition for lithographic printing plate
US4308340A (en) * 1980-08-08 1981-12-29 American Hoechst Corporation Aqueous 2-propoxyethanol containing processing composition for lithographic printing plates

Also Published As

Publication number Publication date
EP0037060B1 (de) 1984-03-14
JPS6367178B2 (pt) 1988-12-23
EP0037060A1 (de) 1981-10-07
FI810955L (fi) 1981-10-01
ATE6703T1 (de) 1984-03-15
DE3012522A1 (de) 1981-10-08
JPS56153341A (en) 1981-11-27
FI66697C (fi) 1984-11-12
AU539890B2 (en) 1984-10-18
MX159691A (es) 1989-08-07
CA1168500A (en) 1984-06-05
AU6883181A (en) 1981-10-08
ZA812100B (en) 1982-04-28
FI66697B (fi) 1984-07-31
US4416976A (en) 1983-11-22
DE3162577D1 (en) 1984-04-19

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)