BR7607672A - Elemento fotopolimerizavel,mascara atacavel por pontos,processo de reproducao de imagem e sistema de prova de cor - Google Patents

Elemento fotopolimerizavel,mascara atacavel por pontos,processo de reproducao de imagem e sistema de prova de cor

Info

Publication number
BR7607672A
BR7607672A BR7607672A BR7607672A BR7607672A BR 7607672 A BR7607672 A BR 7607672A BR 7607672 A BR7607672 A BR 7607672A BR 7607672 A BR7607672 A BR 7607672A BR 7607672 A BR7607672 A BR 7607672A
Authority
BR
Brazil
Prior art keywords
photopolimerizable
attacked
mask
points
image reproduction
Prior art date
Application number
BR7607672A
Other languages
English (en)
Portuguese (pt)
Inventor
M Bratt
A Cohen
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of BR7607672A publication Critical patent/BR7607672A/pt
Priority to US06/037,947 priority Critical patent/US4229517A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Materials For Photolithography (AREA)
BR7607672A 1975-11-17 1976-11-17 Elemento fotopolimerizavel,mascara atacavel por pontos,processo de reproducao de imagem e sistema de prova de cor BR7607672A (pt)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/037,947 US4229517A (en) 1976-11-13 1979-05-10 Dot-etchable photopolymerizable elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63272675A 1975-11-17 1975-11-17

Publications (1)

Publication Number Publication Date
BR7607672A true BR7607672A (pt) 1977-09-27

Family

ID=24536688

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7607672A BR7607672A (pt) 1975-11-17 1976-11-17 Elemento fotopolimerizavel,mascara atacavel por pontos,processo de reproducao de imagem e sistema de prova de cor

Country Status (8)

Country Link
JP (4) JPS5262427A (ko)
AU (1) AU506292B2 (ko)
BE (1) BE848409A (ko)
BR (1) BR7607672A (ko)
CA (1) CA1079565A (ko)
DE (3) DE2651864C3 (ko)
FR (1) FR2331813A1 (ko)
GB (1) GB1548439A (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2651864C3 (de) * 1975-11-17 1987-09-10 E.I. Du Pont De Nemours And Co., Wilmington, Del. Photopolymerisierbares Aufzeichnungsmaterial
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS55114370A (en) * 1979-02-28 1980-09-03 Fuji Photo Film Co Ltd Treatment of plate
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask
DE3150637C2 (de) * 1981-12-21 1983-11-10 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Ätzlösung zum Ätzen von Photopolymerfilmen und Verfahren zum Punktätzen
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
JPS59154442A (ja) * 1983-02-22 1984-09-03 Oji Paper Co Ltd 画像形成用感光性フイルム
JPS62231245A (ja) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd 感光性フレキソ版
JPH01282543A (ja) * 1988-05-09 1989-11-14 Fuji Photo Film Co Ltd 画像形成材料
US5372437A (en) * 1992-04-24 1994-12-13 Citizen Watch Co., Ltd. Print head of wire-dot printer and production method thereof
JP2003107697A (ja) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd 感光性転写材料、フォトマスク材料、フォトマスクおよびフォトマスクの製造方法
JP5203575B2 (ja) * 2005-05-04 2013-06-05 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． コーティング組成物
JP4820640B2 (ja) * 2005-12-20 2011-11-24 富士フイルム株式会社 平版印刷版の作製方法
JP4979368B2 (ja) * 2005-12-27 2012-07-18 関西ペイント株式会社 活性エネルギー線硬化型樹脂組成物及びレジストパターン形成方法
TWI790145B (zh) * 2015-03-30 2023-01-11 日商富士軟片股份有限公司 著色感光性組成物、硬化膜、圖案形成方法、帶遮光膜的紅外線截止濾光片、固體攝像元件、圖像顯示裝置及紅外感測器

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (ko) * 1951-08-20
US3149975A (en) * 1962-07-06 1964-09-22 Du Pont Photopolymerizable compositions and elements
US3380831A (en) * 1964-05-26 1968-04-30 Du Pont Photopolymerizable compositions and elements
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3698904A (en) * 1969-07-23 1972-10-17 Asahi Chemical Ind Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer
BE759041A (fr) * 1969-11-18 1971-05-17 Du Pont Compositions photopolymerisables contenant des aminophenylcetones et des adjuvants
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
BE787932A (fr) * 1971-09-13 1973-02-26 Bristol Myers Co Produits tels que des tampons, pour nettoyage ou d'autres usages et compositions liquides pour preparer ces produits
JPS4877438A (ko) * 1972-01-19 1973-10-18
JPS4893337A (ko) * 1972-03-11 1973-12-03
BE788560A (fr) * 1972-06-09 1973-03-08 Du Pont Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples
JPS51139041A (en) * 1975-05-23 1976-12-01 Kayaba Industry Co Ltd Disk brake for eccentric retention suspension mechanism
DE2651864C3 (de) * 1975-11-17 1987-09-10 E.I. Du Pont De Nemours And Co., Wilmington, Del. Photopolymerisierbares Aufzeichnungsmaterial

Also Published As

Publication number Publication date
FR2331813A1 (fr) 1977-06-10
AU506292B2 (en) 1979-12-20
GB1548439A (en) 1979-07-18
DE2660921A1 (ko) 1984-07-19
DE2660103C3 (de) 1987-10-22
BE848409A (fr) 1977-05-17
JPS5722372B2 (ko) 1982-05-12
AU1966676A (en) 1978-05-25
CA1079565A (en) 1980-06-17
DE2660921C3 (de) 1987-07-30
JPS5262427A (en) 1977-05-23
JPS5762048A (en) 1982-04-14
DE2651864C3 (de) 1987-09-10
DE2651864A1 (de) 1977-05-18
JPS6132661B2 (ko) 1986-07-28
DE2651864B2 (de) 1980-02-07
FR2331813B1 (ko) 1981-10-02
DE2660103B1 (de) 1981-02-12
JPS5638046A (en) 1981-04-13
JPS5638047A (en) 1981-04-13

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