BR112018010447B1 - PROCESS AND PLAN FOR OBTAINING COLORED GLASS - Google Patents

Abstract

a process for depositing a coating on a glass substrate is presented, said process being characterized by a step in which the following components are co-pulverized simultaneously by a plasma, in the same chamber of the vacuum deposition device: - a first component made of a material consisting of an oxide, a nitride or an oxynitride of a first element and - a second component consisting of the metallic form of a second element, and a step in which a hydride, a halide or an organic compound of a third element, different from the first element, introduced into said plasma in order to recover said substrate covered with said coating comprising said first, second and third elements at the output of the device, wherein said coating consisting of metallic nanoparticles of the second element is dispersed in an inorganic matrix of said first and third elements, said coating and exhibiting a plasma absorption peak in the visible region, said peak optionally being obtained by means of an additional heat treatment step, if necessary. an equipment for carrying out this process is presented.

Description

[0001] The present invention relates to a method and a piece of equipment in the field of surface treatment on a glass substrate to deposit, on it, a coating that allows proper coloring, without the need to add oxides of additional metals to the initial composition of the glass. In general, this treatment aims to modify the appearance of the surface of the glass, in particular of flat colorless glass resulting from an industrial process of the “float glass” type; bringing to it a coloration after it is formed by simply depositing a thin layer coating, wherein said coating consists of a material that has a plasmonic absorption peak in the visible region.

[0002] In the field of glass for construction, a lot of research has been dedicated to the development of innovative glass with various properties: glass to control sunlight, self-cleaning glass or colored glass. Increasingly, there has also been research into glasses that combine various properties and, in particular, colored glasses having one or more functional properties, such as sunlight control, thermal insulation (low emission glasses), electromagnetic shielding, heating , hydrophilic or hydrophobic functions, photocatalytic (self-cleaning glass), modification of the level of reflection in the visible (anti-reflective glass or mirrored glass).

[0003] When we want to obtain colored glass, the existing industrial process consists of a pigment supplement - usually metal oxides - to the melting bath of floating glass (type "float glass"). Thus, during the manufacture of glass, various metal oxides can be used, depending on the final color desired for the glass: CuO for a red color, MnO for violet or CoO for blue. Thus glass that is colored in its full form is obtained.

[0004] Although this method is relatively simple to implement, it has a major disadvantage. The use of pigment during glass making contaminates the melting bath and means that a particular color must be made in a specific bath.

[0005] In particular, a color change will always require the production of a transition glass: a large amount of glass is lost until the desired color is obtained. This involves a substantial loss in the level of production as well as the productivity of the equipment, which results in a considerable increase in the cost of the glazing, if we want to change its color. This method, therefore, does not bring flexibility to adapt to requirements in terms of constant change by customers.

[0006] An advantageous solution that allows greater flexibility in the production of colored glass is to deposit a coating on it, in layers, and, in this case, the colorimetric characteristics of said coating can be easily adjusted and modified.

[0007] The objective of the present invention is, therefore, according to a first aspect, to present a simple method and an equipment to implement it, in which said method makes it possible to deposit a coating whose colorimetry is easily adjustable.

[0008] As is known, a substrate can be coated in the vapor phase with one or more thin layers of a specified material by several different techniques:

[0009] According to a first method, called pyrolysis, the precursor of the product to be deposited, supplied in the form of gas, liquid or solid form, is decomposed in the substrate (hot T > 500 °C). In the case of gaseous precursors, the method is generally called thermal CVD. The present invention does not relate to such processes.

[0010] According to a second method of deposition, processes called sputtering or "magnetron sputtering" are used, and consist of conducting the ultra-vacuum deposition under a magnetic field, by spraying the material or the material precursor to be deposited. An exemplary embodiment of such a device is described, for example, in patent US6,214,183.

[0011] A third method has been described, and this was originally developed in the field of microelectronics, and is called PE-CVD (Plasma Enhanced Chemical Vapor Deposition). According to this method, instead of using a target made from the material to be deposited, the precursor of the latter is injected in the form of a gas and is decomposed by an electrical discharge from the plasma. This process is generally carried out at pressures ranging from 10 mtorr to 500 mbar (1 torr = 133 Pa, 1 bar = 0.1 MPa). The substrate is generally used at room temperature or relatively low temperatures (eg below 350 °C) to provide mechanical properties and adhesion properties of the deposited layer. Because of the moderate temperature to which the substrate is subjected, this technique can be used for a substrate coating that is temperature sensitive, for example consisting of plastics. Such a process is described for example in EP0149408.

[0012] Sputtering processes and, to a lesser extent PE-CVD, need to be carried out in a vacuum equipment and, therefore, done individually, having a very limited flexibility.

[0013] As mentioned above, one of the objectives of the present invention is to correct the problems described above, by proposing a manufacturing process that can be modulated and that allows a fast adaptation, flexible colorimetry and that is applicable to glass for construction in that, furthermore, said method is economical and does not lead to a significant loss of floating glass production.

[0014] According to the present invention, a process is described that combines the principles of sputtering and PE-CVD, for depositing a coating on a substrate that is, in principle, less colored (often called glass of course, in trade), to assign it with an adaptable color.

[0015] The application of the present invention offers several advantages. Firstly, the coloring is produced completely independently of the manufacturer and the glass, which is in principle less intensely colored according to the invention (less colored glass). Thus, glass can be made without having to define its color in advance. The use of thin layers also makes it possible to obtain colored glass in small quantities; the present process is thus much more flexible and adaptable to demand. Due to the present invention, it becomes possible to produce layers of different colors in different proportions, without loss of intermediates and large quantities of glass.

[0016] Deposition processes that are known make it possible to produce stacks of layers consisting mainly of metallic nanoparticles and dielectric layers, by the technique called "magnetron sputtering" of a target under vacuum. For example, the publication "Preparation and optical characterization of Au/SiO2 composite films with multilayer structure, HB Liao, Weijia Wen, GKL Wong, Journal of Applied Physics, 2003, Vol. No. 93, 4485" describes the fabrication of a stack of SiO2 / Au which s absorbs at a wavelength of about 530 nm and has a red coloration in transmission.

[0017] WO 2010/106370 describes a method for depositing a coating on a substrate, in which a solution of a precursor is deposited by CVD, AP-CVD or other pyrolysis on a substrate heated to 330-370 °C, to obtain a matrix film of tin oxide, titanium oxide or zinc oxide doped with aluminum, in which gold nanoparticles are incorporated. This process does not appear to be very flexible, nor is it suitable for application on an industrial scale, in particular for coloring large glasses on flat glass substrates obtained by a "floating" process, which often has a width of the order of several meters .

[0018] The present process provides the simple and economical production of coating in colored layers, which absorbs incident visible radiation according to a wavelength that is easily able to be adjusted, consisting of metallic nanoparticles embedded in a dielectric matrix, namely a oxide matrix.

[0019] More particularly, the present invention relates to a process for depositing a coating on a glass substrate in order to modify its colorimetry, wherein said process is characterized in that it comprises at least the following steps: a ) passing said substrate through a device for vacuum deposition by sputtering, b) introducing a gas into said vacuum deposition device and generating a plasma from said gas, c) co-spraying simultaneously, in the same chamber of the vacuum deposition device, - a first component made of a material consisting of an oxide, a nitride or an oxynitride of a first element, preferably an oxide of the first component, and - a second component consisting of the metallic form of a second element , wherein said co-spray is obtained by means of said plasma, d) introducing a hydride, a halide or an organic compound of a third element, different of the first element, in said plasma, e) recovering said substrate, covered with said coating comprising said first, second and third elements, at the output of the device, wherein said coating consists of metal nanoparticles of the dispersed second element in an inorganic matrix of said first and third elements, in particular in the form of an oxide, a nitride or an oxynitride of said first and third elements, said coating exhibiting a plasma absorption peak in the visible region,

[0020] or e') recovering said substrate covered with said coating comprising said first, second and third elements at the outlet of the heating device and the assembly at a suitable temperature (preferably above 400 °C and below the point of softening the glass) and for a time sufficient to obtain a coating comprising metallic nanoparticles of the second element dispersed in an inorganic matrix of said first and third elements, in particular in the form of an oxide, a nitride or an oxynitride of said first and third elements, said coating exhibiting a plasma absorption peak in the visible region.

[0021] The present invention thus relates to a process for depositing a coating on a glass substrate, said process comprising a step in which a first component made of a material consisting of an oxide, a nitride or an oxynitride ( preferably an oxide) of a first element and a second component consisting of the metallic form of a second element are co-precipitated simultaneously by a plasma, in one and the same chamber of the vacuum deposition device. According to the invention, a hydride, a halide or an organic compound of a third element, different than the first element, is introduced into said plasma, so as to recover said substrate covered with a coating comprising said first, second element. and third elements in the output of the device. According to the invention, said coating thus obtained consists of metallic nanoparticles of the second element dispersed in an inorganic matrix of said first and third element and exhibits a plasma absorption peak in the visible region, which gives a final color to the vitrification , whereby said final coloring is possible, which is obtained by means of an additional heat treatment step, if necessary.

[0022] Said coloring is easily adjustable, in particular, by modifying the conditions of said sputtering and, in particular, by varying the amount of the third element precursor introduced into the plasma.

[0023] According to preferred embodiments of the present invention, which can obviously be combined with each other: - The first element is selected from titanium, zirconium, tin, indium, aluminum, tin or silicon, zinc . - The third element, different from the first element, is selected from titanium, zirconium, tin, indium, aluminum, tin or silicon, zinc. - The first, second and third elements are different from each other. - The first component comprises, essentially comprises or consists of an oxide of the first element. - The inorganic matrix is an oxide of the aforementioned first and third elements. - The second element is selected from the group consisting of: Ag, Au, Ni, Cr, Cu, Pt, Pd, and is preferably selected from Ag, Ni, Cu, more preferably from Ag or Au. - Plasma gas is a neutral gas selected from argon, krypton or helium. - A reactive gas, comprising oxygen and/or nitrogen, in particular dioxygen and/or dinitrogen, is mixed with the neutral gas and introduced into the device. - According to a first possible embodiment, step c) comprises sputtering, wherein said device for vacuum depositing by sputtering a target comprises parts consisting of a mixture of an oxide, a nitride or an oxynitride of the first component, preferably an oxide of the first component, and the metal parts of the second element. - The metallic shape of the second component, according to this embodiment, represents between 10% and 40% of the total target weight. - According to an alternative possible but less preferred embodiment, step c) comprises sputtering, in said device for deposition by cathode, a first target constituted by an oxide, a nitride or an oxynitride of the first component, preferably a oxide of the first component, and of a second target consisting of the metal of the second element. - The first component is a titanium oxide, and said second component is selected from the group consisting of Au, Cu, Ag, Ni or in which the neutral gas is argon, mixed with oxygen and in which the second element is the silicon. According to this embodiment, the second element can be advantageously introduced into said device in the form of an organometallic silicon compound, preferably TEOS or HMDSO. - The process comprises, in step e), heating the substrate to a temperature above 400 °C and below the softening point. Such heating is used, in particular, if it is useful or necessary to improve the absorption of the coating in the visible region by the plasma effect. - The thickness of the coating is between 10 and 70 nm, in particular between 15 and 50 nm.

[0024] The invention also relates to the vitrification that can be obtained by the process described above and which comprises a glass substrate on which a coating is deposited, said coating being constituted by a material consisting of nanoparticles dispersed in an inorganic matrix of an oxide, a nitride or an oxynitride of at least two different elements, said material exhibiting a plasma absorption peak in the visible region.

[0025] In particular, in said vitrification, which is preferred according to the invention: - the two elements are selected from the group consisting of titanium, zirconium, tin, zinc or silicon and the metallic nanoparticles consist of at least one element selected from the group consisting of: Ag, Au, Ni, Cr, Cu, Pt, Pd, more preferably from Ag, Ni or Au, most preferably from Ag or Au. - the metal nanoparticles represent between 1 and 15% of the total weight of the material making up the coating, preferably between 2 and 10% of the total weight of the material making up the coating and more preferably between 2 and 5% of the total weight of the material making up the coating. constitutes the coating. - the thickness of the coating is between 10 and 70 nm, in particular between 15 and 50 nm. - the first element is silicon and the second element is selected from the group consisting of silicon, zirconium, tin, indium, zinc, titanium and the metal nanoparticles consist of at least one element selected from the group consisting of: Ag , Au, Ni, Cr, Cu, Pt, Pd, more preferably from Ag, Cu, Ni or Au, most preferably from Ag or Au. Preferably, according to this embodiment, the third element is silicon. - the first element is titanium and a second element is selected from the group consisting of silicon, zirconium, tin, indium, zinc, and the metallic nanoparticles consist of at least one element selected from the group consisting of: Ag , Au, Ni, Cr, Cu, Pt, Pd, more preferably from Ag, Cu, Ni or Au, most preferably from Ag or Au. Preferably, according to this embodiment, the second element is titanium.

[0026] In addition, the invention relates to an equipment to perform the process described above.

[0027] According to a first modality, said equipment comprises, in combination: - a sputtering device comprising at least one chamber under vacuum, - a target consisting of a mixture of a first component made of a dielectric material constituted by an oxide, a nitride or an oxynitride of a first element and a second component consisting of the metallic form of a second element, said target being mounted in the vacuum chamber, - a means for enclosing said target comprising means for introducing a plasma gas and means for generating a plasma from said gas, said plasma serving to spray the target, - means for introducing into said plasma a third element different from the first element, in the form of a hydride, a halide or an organic compound of said third element, - means for passing the substrate through said device, at a rate suitable for deposition, s on one of its surfaces, a layer of a coating comprising metallic nanoparticles of the second element dispersed in an inorganic matrix of an oxide, a nitride or an oxynitride of said first and third elements, - means for recovering said substrate covered with said coating at the output of the device.

[0028] According to a second embodiment, said equipment comprises, in combination: - a sputtering device comprising at least one chamber under vacuum, - a first target consisting of a mixture of a first component made of a material dielectric consisting of an oxide, a nitride or an oxynitride of a first element, said first target being mounted in the chamber under vacuum, - a second target made of a second component consisting of the metallic shape of a second element, said second target to be mounted in the vacuum chamber, - means for simultaneous co-spraying of two target components and means for introducing a plasma gas and means for generating a plasma from said gas, said plasma serving for spraying said targets , - means for introducing into said plasma a third element different from the first element, in the form of a hydride, a halide or an organic compound of ref. the element, - means for passing the substrate through said device, at a suitable speed for the deposition, on one of its surfaces, of a layer of a coating comprising metallic nanoparticles of the second element dispersed in an inorganic matrix of an oxide, a nitride or an oxynitride of said first and third elements, - means for recovering said substrate covered with said coating at the outlet of the device.

[0029] Finally, the invention relates to the use of a piece of equipment as described above for the production of colored glass substrates comprising a coating that includes metallic nanoparticles of the second element dispersed in an inorganic matrix of an oxide, a nitride or an oxynitride of said first and third elements.

[0030] According to the invention, to create the plasma, the cathode can be provided with a supply of an RF (radio frequency) or with a DC (direct current), optionally pulsed, or with a supply of an AC (alternating current ). As is known, an RF normally provides an alternating current of 130.56 MHz. This type of supply may require a tuner to tune the generated signal to the target.

[0031] In practice, for a spray target that has little or no conductivity, an RF supply will preferably be used.

[0032] In a second deposition process according to the invention, it is also possible, or even preferred, to use a DC source, which makes it possible to obtain an increase in the sputter rate, or to avoid failure in the cathode by the compounds injected into the chamber.

[0033] The invention, in its various aspects and with its advantages, will be better understood from the reading of the non-limiting examples presented below, provided purely for the purpose of illustration.

[0034] In these examples, the objective is to deposit, by the process of the invention, a color layer consisting of a matrix of oxides of the elements Ti and Si, in which gold metal particles are dispersed.

[0035] The deposition of the color layers according to the invention is conducted in a magnetic-type sputtering cathode box limiting a chamber in which a high vacuum can be created. In this housing (which constitutes the anode), the target (which constitutes the cathode) is installed in the chamber, in such a way that during deposition, an RF or DC supply allows a plasma to be generated from a plasma gas, most often argon, krypton or helium, in front of the target, with the substrate traveling parallel to this target. From this setting, it is possible to select the displacement speed of the substrate and, therefore, the deposition time and the thickness of the layer.

[0036] For the target according to the invention, a commercial target of titanium oxide (TiOx) is used initially. Metallic gold pellets are fixed (eg by bonding with a silver adhesive) and regularly spaced over the titanium oxide target to constitute the two-component target according to the invention, in such a way that the plasma sprays the two. components of said target simultaneously.

[0037] The power required to generate a plasma from the gas in the device is applied to the cathode. To jointly deposit the element Si on the glass substrate, an organometallic silicon precursor, HMDSO (hexamethyl disiloxane), is injected into the generated plasma. Ion deposition occurs under an atmosphere essentially of argon (neutral plasma gas) and a small proportion of dioxygen in the housing chamber. More precisely, for all the examples presented below, the flow rate of injected argon into the chamber is 25 sccm (standard cubic centimeters per minute) and the flow rate of injected oxygen into the chamber is 10 sccm. Deposition time is about 6 minutes for all examples. The thickness of the layer thus obtained varies between 10 and 30 nm.

Tabela 1[0038] Considering that several layers are deposited according to the same principle, the flow rate of the silicone precursor was varied in order to obtain different dielectric matrices consisting of a mixed oxide of titanium and silicon, in which the ratio of the two elements Si and Ti is adjusted as shown in Table 1, below. By varying this ratio, there is a variation in the active refractive index of the dielectric matrix, as well as in the thickness of the deposited layer. Finally, by measuring the active refractive index of the coating obtained, it is possible to estimate the amount of silicon present in the material comprising said coating (the deposited layer), with a measured index of 20.4 corresponding to a material whose composition is close to TiO2, and a measured index of about 1.5 corresponding to a material whose composition is close to SiO2. Table 1 below presents the main parameters of the layer coating deposition step according to the present process. Example Argon (sccm) O2 (sccm) HMDSO (sccm) Power (W) Total pressure (μbar) Deposition time (min)

Table 1

[0039] After deposition, the substrate added with the various coatings is annealed at 650 °C in air under normal pressure.

[0040] For each example, the properties of the deposited coating are then measured according to the following protocols:

[0041] The optical spectra of the samples were recorded in a Lambda 900 spectrophotometer over the wavelength range from 250 nm to 2500 nm. The measurements were carried out in terms of transmission on the layer side and reflection on the glass side and on the layer side. From the absorption absorption spectrum it is possible to perceive a plasma absorption peak that is deduced from the measurements using the following relationship: A = 100 - T - R (layer side).

[0042] The colorimetric properties of the layer were also measured using the device above on the obtained glazing (layer side). The L*, a* and b* values (international system), which characterize the color rendering, are measured from the obtained spectrum.

[0043] The refractive indices and thicknesses of the material constituting the coating deposited in the form of a thin layer were measured by classical ellipsometry techniques using a variable angle ellipsometer (VASE).

[0044] For each of the examples, the results obtained are shown in Table 2, below.

Tabela 2[0045] In addition, the attached figure shows the absorption spectrum in visible of the glass pane obtained according to the preceding examples (wavelength given in nanometers on the abscissa axis). Example HMDSO refractive index (sccm) Colorimetry Plasma peak position Perceived color

Table 2

[0046] The results presented in Table 2, above, show the advantage attached to the present invention. In particular, surprisingly, and in a way not described above, according to a process according to the invention, a simple control of the flow rate of HMDSO (silicon element precursor) injected during deposition provides for the final colorimetry control of the glazing .

[0047] According to the process according to the invention, it is thus possible to control perfectly and to vary the color of the glass over a wide range, very easily and economically, without loss of production.

[0048] In particular, simply by depositing a coating layer it is possible, according to the invention, by simply adapting the flow rate of the precursor gas in the device according to the invention, to change the color of the last glazing (substrate covered with the coating) quickly and without any difficulty, with a color ranging from cyan to various shades and intensities of blue, as well as hues of violet or magenta.

[0049] Similar results were observed when metallic silver pellets were used in the TiOx target instead of gold pellets, and several other stains were obtained by such replacement.

[0050] As an example, one can also cite the following possible combination: a silicon oxide target comprising a small amount of aluminum (for example between 4 and 12% aluminum, based on the amount of silicone present) and a titanium precursor such as TiPT ( titanium tetraisopropoxide), the second target component being selected from the group of metals consisting of Ag, Au, Ni, Cr, Cu, preferably being selected from Ag, Au.

[0051] Undoubtedly, according to the invention, it is possible to deposit other layers or other piles of colored coating on top (with reference to the glass substrate), or even on the bottom, according to the invention, and thus provide a glazing with additional functionality, eg sunlight control, low emission, electromagnetic shielding, heating, hydrophilicity, hydrophobicity, photocatalysis, anti-reflective or mirroring properties, electrochromic, electroluminescent or photovoltaic glass.

[0052] According to a preferred embodiment of the invention, a protective layer of dielectric material is deposited to increase the mechanical and/or chemical durability of said coatings, for example, of silicon nitride or silicon oxide, or titanium oxide is deposited on top of the colored coating according to the invention, or even on the underside of the colored coating. The thickness of this protective layer can be, for example, in the order of 1 to 15 nm, or even from 1 to 10 nm, or even from 1 to 5 nm.

Claims (19)

1. Process for depositing a coating on a glass substrate, said process characterized by the fact that it comprises the following successive steps: a) passing said substrate through a device for vacuum deposition by sputtering, b) introducing a gas into the said vacuum deposition device and generating a plasma from said gas, c) co-pulverizing simultaneously, in the same chamber of the vacuum deposition device, - a first component made of a material consisting of an oxide, a nitride or an oxynitride of a first element, and - a second component constituted by the metallic form of a second element, wherein said co-spray is obtained by means of said plasma, d) introducing a hydride, a halide or an organic compound of a third element, different from the first element, in said plasma, e) recovering said substrate, covered with said coating comprising said first, second and third elements, at the output of the device, wherein said coating consists of metal nanoparticles of the second element dispersed in an inorganic matrix of said first and third elements, said coating exhibiting a plasma absorption peak in the visible region, or recovering the said substrate covered with said coating comprising said first, second and third elements at the outlet of the device and heating the assembly to a suitable temperature and for a sufficient time to obtain a coating consisting of metallic nanoparticles of the second element dispersed in an inorganic matrix of said first and third elements, said coating exhibiting a plasma absorption peak in the visible region. 2. Process according to claim 1, characterized in that, during step e) the temperature is above 400 °C and below the softening point of the glass. 3. Process according to any one of claims 1 to 2, characterized in that, in particular, the inorganic matrix is an oxide, a nitride or an oxynitride of said first and third elements. 4. Process according to any one of claims 1 to 3, characterized in that the first element is selected from titanium, zirconium, tin, indium, aluminum, tin or silicon, zinc. 5. Process according to any one of claims 1 to 4, characterized in that the third element is selected from titanium, zirconium, tin, indium, aluminum, tin or silicon, zinc. 6. Process according to any one of claims 1 to 5, characterized in that the first component is an oxide of the first element. 7. Process according to any one of claims 1 to 6, characterized in that the second component is selected from the group of metals consisting of: Ag, Au, Ni, Cr, Cu, Pt, Pd, and preferably is selected from Ag, Ni, Cu, Au. 8. Process according to any one of claims 1 to 7, characterized in that the plasma gas is a neutral gas selected from argon, krypton or helium. 9. Process according to any one of claims 1 to 8, characterized in that a reactive gas, comprising oxygen and/or nitrogen, in particular, dioxygen and/or dinitrogen, is mixed with the neutral gas and introduced into the device. 10. Process according to any one of claims 1 to 9, characterized in that step c) comprises sputtering, in said device for sputtering under vacuum, a target comprising parts consisting of a mixture of an oxide, a nitride or an oxynitride of the first component and parts consisting of the metallic form of the second component. 11. Process according to any one of claims 1 to 10, characterized in that step c) comprises the sputtering, in said device for deposit by cathode under vacuum, of a first target consisting of an oxide, a nitride or an oxynitride of the first component and a second target consisting of the metallic form of the second component. 12. Process according to any one of claims 1 to 11, characterized in that the first component is a titanium oxide, wherein said second component is selected from the group consisting of Au, Ni, Cu, Ag , wherein the neutral gas is argon, mixed with oxygen and wherein the third element is silicon, said silicon preferably being introduced into said device in the form of an organometallic silicon compound, preferably TEOS or HMDSO. 13. Process according to any one of claims 1 to 12, characterized in that it comprises an additional step consisting of heating the substrate at a temperature above 400 °C and below the softening point of the glass during step e) . 14. Glazing characterized in that it is obtainable by the process as defined in any one of claims 1 to 13 and comprising a glass substrate on which a coating is deposited, said coating consisting of a material comprising metallic nanoparticles dispersed in an inorganic matrix of a oxide, a nitride or an oxynitride, preferably an oxide, of at least two different elements, said material exhibiting a plasma absorption peak in the visible region, wherein said two elements belong to the group consisting of titanium, zirconium, tin, zinc or silicon, where the metallic nanoparticles consist of at least one element selected from the group consisting of: Ag, Au, Ni, Cr, Cu, Pt, Pd and where the metallic nanoparticles represent between 1 and 10% of the total weight of the coating material, preferably between 2 and 10% of the total weight of the coating material and most preferably essentially between 2 and 5% of the total weight of the material constituting the coating, the thickness of said coating comprised between 10 and 50 nm. 15. Glazing according to claim 14, characterized in that a first element is silicon and a second element is selected from the group consisting of titanium, zirconium, tin, zinc, and the metallic nanoparticles consist of, at least at least one element selected from the group consisting of: Ag, Au, Ni, Cr, Cu, Pt, Pd, more preferably from Ag, Cu, Ni or Au, most preferably from Ag or Au. 16. Glazing according to claim 15, characterized in that a first element is titanium and a second element is selected from the group consisting of silicon, zirconium, tin, indium, zinc, and the metallic particles consist of at least one element selected from the group consisting of: Ag, Au, Ni, Cr, Cu, Pt, Pd, more preferably from Ag, Cu, Ni or Au, most preferably from Ag or Au. 17. Part of equipment for carrying out the process as defined in one of claims 1 to 13, characterized in that said part of equipment comprises, in combination: - a sputtering device comprising at least one vacuum chamber, - a target consisting of a mixture of a first component made of a dielectric material consisting of an oxide, a nitride or an oxynitride of a first element and a second component consisting of the metallic shape of a second element, said target being created in the vacuum chamber, - means for spraying said target comprising means for introducing a plasma gas and means for generating a plasma from said gas, - means for introducing into said plasma a third element other than the first element, in the form of a hydride, a halide or an organic compound of said third element, - means for passing the substrate through said di. positive, at an adequate rate for deposition, on one of its surfaces, a layer of a coating consisting of metallic nanoparticles of the second element dispersed in an inorganic matrix of an oxide, a nitride or an oxynitride of said first and third elements, - means for recovering said substrate covered with said coating at the outlet of the device. 18. Part of equipment for carrying out the process as defined in one of claims 1 to 13, characterized in that said part of equipment comprises, in combination: - a sputtering device comprising at least one chamber under vacuum, - a first target consisting of a mixture of a first component made of a dielectric material consisting of an oxide, a nitride or an oxynitride of a first element, said first target being created in the chamber under vacuum, - a second target made of a second component that consists of the metallic form of a second element, said second target being created in the vacuum chamber, - means for simultaneous co-spraying of the two targets comprising means for introducing a plasma gas and means for generating a plasma from said gas, - means for introducing into said plasma a third element different from the first element, in the form of a hydride, a halide or a co organic compound of said element, - means for passing the substrate through said device, at a suitable speed for the deposition, on a surface thereof, of a layer of a coating consisting of metallic nanoparticles of the second element dispersed in an inorganic matrix of an oxide, a nitride or an oxynitride of said first and third elements, - means for recovering said substrate covered with said coating at the outlet of the device. 19. Use of the equipment as defined in any one of claims 16 or 17, characterized in that it is for the production of colored glass substrates comprising a coating consisting of an inorganic matrix of an oxide, a nitride or an oxynitride of a first and of a third element, in which metallic nanoparticles of a second element are dispersed.

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