BR112015025189A2 - aparelho de processamento e método de medir temperatura de peça de trabalho no aparelho de processamento - Google Patents
aparelho de processamento e método de medir temperatura de peça de trabalho no aparelho de processamentoInfo
- Publication number
- BR112015025189A2 BR112015025189A2 BR112015025189A BR112015025189A BR112015025189A2 BR 112015025189 A2 BR112015025189 A2 BR 112015025189A2 BR 112015025189 A BR112015025189 A BR 112015025189A BR 112015025189 A BR112015025189 A BR 112015025189A BR 112015025189 A2 BR112015025189 A2 BR 112015025189A2
- Authority
- BR
- Brazil
- Prior art keywords
- processing apparatus
- measuring
- workpiece
- chamber
- temperature
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K5/00—Measuring temperature based on the expansion or contraction of a material
- G01K5/48—Measuring temperature based on the expansion or contraction of a material the material being a solid
- G01K5/50—Measuring temperature based on the expansion or contraction of a material the material being a solid arranged for free expansion or contraction
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N25/00—Investigating or analyzing materials by the use of thermal means
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Pathology (AREA)
- Immunology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
Abstract
resumo aparelho de processamento e método de medir temperatura de peça de trabalho no aparelho de processamento são proporcionados um aparelho de processamento (1) e um método capazes de medir com precisão uma temperatura real de uma peça de trabalho contida e aquecida em uma câmara. o aparelho de processamento (1) compreende uma câmara (2) contendo uma peça de trabalho (w), uma peça de medição (6) instalada na câmara (2), e uma unidade de medição (8). a peça de medição (6) é capaz de expansão e contração térmica em resposta a uma temperatura interior da câmara (2). a unidade de medição (8) mede uma quantidade de expansão e contração térmica da peça de medição (6) para assim medir a temperatura real da peça de trabalho (w).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013076947A JP6057812B2 (ja) | 2013-04-02 | 2013-04-02 | 処理装置及びワークの温度計測方法 |
PCT/JP2014/001383 WO2014162665A1 (ja) | 2013-04-02 | 2014-03-11 | 処理装置及び処理装置におけるワークの温度計測方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112015025189A2 true BR112015025189A2 (pt) | 2017-07-18 |
Family
ID=51657980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015025189A BR112015025189A2 (pt) | 2013-04-02 | 2014-03-11 | aparelho de processamento e método de medir temperatura de peça de trabalho no aparelho de processamento |
Country Status (9)
Country | Link |
---|---|
US (1) | US9897489B2 (pt) |
EP (1) | EP2982776A4 (pt) |
JP (1) | JP6057812B2 (pt) |
KR (1) | KR20150135516A (pt) |
CN (1) | CN105102672B (pt) |
BR (1) | BR112015025189A2 (pt) |
MX (1) | MX370694B (pt) |
TW (1) | TWI526563B (pt) |
WO (1) | WO2014162665A1 (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014144533A1 (en) | 2013-03-15 | 2014-09-18 | Applied Materials, Inc. | Position and temperature monitoring of ald platen susceptor |
CN104674169A (zh) * | 2015-02-12 | 2015-06-03 | 烟台首钢磁性材料股份有限公司 | 一种永磁钕铁硼磁钢表面电镀复合镀层的方法 |
CN105675161A (zh) * | 2016-01-19 | 2016-06-15 | 河南理工大学 | 一种用热电偶测量激光加工工件温度的方法 |
TWI620914B (zh) * | 2016-10-27 | 2018-04-11 | Toshiba Kk | Measuring device |
CN106906450B (zh) * | 2017-02-27 | 2019-03-01 | 成都京东方光电科技有限公司 | 一种监测蒸发源内部温度的方法 |
JP7310738B2 (ja) * | 2020-07-10 | 2023-07-19 | トヨタ自動車株式会社 | 電源システムおよびそれを備えた車両 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH468001A (de) * | 1967-12-21 | 1969-01-31 | Balzers Patent Beteilig Ag | Verfahren zur Überwachung von Temperaturänderungen strahlendurchlässiger Unterlagen für bei Unterdruck aufzubringende dünne Schichten |
JPS57197432A (en) * | 1981-05-29 | 1982-12-03 | Toshiba Corp | Light applying temperature sensor |
US5350899A (en) | 1992-04-15 | 1994-09-27 | Hiroichi Ishikawa | Semiconductor wafer temperature determination by optical measurement of wafer expansion in processing apparatus chamber |
DE3607368A1 (de) | 1986-03-06 | 1987-09-10 | Bosch Gmbh Robert | Vorrichtung zur beruehrungsfreien temperaturmessung |
JPH0334640Y2 (pt) * | 1986-11-05 | 1991-07-23 | ||
JP2836876B2 (ja) | 1988-08-25 | 1998-12-14 | ハウザー インダストリーズ ビーブイ | 物理的な蒸着の二重被覆を行う装置および方法 |
JP3042786B2 (ja) | 1990-07-03 | 2000-05-22 | 株式会社日立製作所 | 真空内被処理物の温度測定方法並びに温度制御方法及び装置 |
US5221142A (en) | 1991-05-20 | 1993-06-22 | Peak Systems, Inc. | Method and apparatus for temperature measurement using thermal expansion |
JPH0658814A (ja) * | 1992-08-04 | 1994-03-04 | Kobe Steel Ltd | ワーク温度測定装置 |
JPH0727634A (ja) * | 1993-07-15 | 1995-01-31 | Hitachi Ltd | 基板温度測定方法及び基板処理装置 |
JP3600873B2 (ja) | 1996-07-08 | 2004-12-15 | 独立行政法人理化学研究所 | 基板温度測定ユニット |
JPH11202700A (ja) * | 1998-01-16 | 1999-07-30 | Fuji Xerox Co Ltd | 画像形成装置 |
JP3883724B2 (ja) * | 1999-01-18 | 2007-02-21 | エスアイアイ・ナノテクノロジー株式会社 | 熱機械測定装置および方法 |
JP4607287B2 (ja) | 2000-06-05 | 2011-01-05 | 株式会社アルバック | 真空加熱装置 |
JP3905330B2 (ja) | 2001-05-30 | 2007-04-18 | 株式会社神戸製鋼所 | 温度計測装置及びそれを使用する温度計測方法 |
JP4515509B2 (ja) * | 2008-03-03 | 2010-08-04 | キヤノンアネルバ株式会社 | 基板表面温度計測方法、及び、これを用いた基板処理装置 |
JP2010151743A (ja) * | 2008-12-26 | 2010-07-08 | Olympus Corp | 接着剤の膜厚測定装置 |
JP2011021209A (ja) * | 2009-07-13 | 2011-02-03 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
JP2011053077A (ja) * | 2009-09-01 | 2011-03-17 | Sii Nanotechnology Inc | 熱分析装置 |
-
2013
- 2013-04-02 JP JP2013076947A patent/JP6057812B2/ja not_active Expired - Fee Related
-
2014
- 2014-03-11 WO PCT/JP2014/001383 patent/WO2014162665A1/ja active Application Filing
- 2014-03-11 KR KR1020157031016A patent/KR20150135516A/ko active Search and Examination
- 2014-03-11 MX MX2015011736A patent/MX370694B/es active IP Right Grant
- 2014-03-11 EP EP14778446.6A patent/EP2982776A4/en not_active Withdrawn
- 2014-03-11 US US14/769,306 patent/US9897489B2/en not_active Expired - Fee Related
- 2014-03-11 CN CN201480019564.8A patent/CN105102672B/zh not_active Expired - Fee Related
- 2014-03-11 BR BR112015025189A patent/BR112015025189A2/pt not_active Application Discontinuation
- 2014-03-26 TW TW103111248A patent/TWI526563B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN105102672A (zh) | 2015-11-25 |
TW201447006A (zh) | 2014-12-16 |
CN105102672B (zh) | 2018-01-09 |
EP2982776A1 (en) | 2016-02-10 |
JP2014201769A (ja) | 2014-10-27 |
US20150377714A1 (en) | 2015-12-31 |
US9897489B2 (en) | 2018-02-20 |
JP6057812B2 (ja) | 2017-01-11 |
MX2015011736A (es) | 2015-12-01 |
WO2014162665A1 (ja) | 2014-10-09 |
MX370694B (es) | 2019-12-19 |
EP2982776A4 (en) | 2016-11-09 |
KR20150135516A (ko) | 2015-12-02 |
TWI526563B (zh) | 2016-03-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |