BR112015014923A2 - composição para formação de uma tinta de estampagem, tinta de estampagem, método para formar uma camada conformada em um substrato, uso da tinta de estampagem e substrato - Google Patents

composição para formação de uma tinta de estampagem, tinta de estampagem, método para formar uma camada conformada em um substrato, uso da tinta de estampagem e substrato

Info

Publication number
BR112015014923A2
BR112015014923A2 BR112015014923A BR112015014923A BR112015014923A2 BR 112015014923 A2 BR112015014923 A2 BR 112015014923A2 BR 112015014923 A BR112015014923 A BR 112015014923A BR 112015014923 A BR112015014923 A BR 112015014923A BR 112015014923 A2 BR112015014923 A2 BR 112015014923A2
Authority
BR
Brazil
Prior art keywords
ink
substrate
forming
embossing ink
composition
Prior art date
Application number
BR112015014923A
Other languages
English (en)
Other versions
BR112015014923B1 (pt
Inventor
Antonius Verschuuren Marcus
Van Brakel Remco
Original Assignee
Koninklijke Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Nv filed Critical Koninklijke Philips Nv
Publication of BR112015014923A2 publication Critical patent/BR112015014923A2/pt
Publication of BR112015014923B1 publication Critical patent/BR112015014923B1/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/283—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysiloxanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/263—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer having non-uniform thickness
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/102—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Silicon Polymers (AREA)

Abstract

resumo composição para formação de uma tinta de estampagem, tinta de estampagem, método para formar uma camada conformada em um substrato, uso da tinta de estampagem e substrato a presente invenção refere-se a uma composição à base de silano para formar uma tinta de estampagem para estampar aplicações de litografia em que a reticulação dos silanos na composição é suprimida pela inclusão de um composto da fórmula 3 em que r9 é selecionado do grupo consistindo em grupos alquila c1-c6 linear ou ramificada e um grupo fenila, e em que n é um número inteiro positivo tendo um valor de ao menos 2. uma tinta pode ser formada pela adição de um pag, um fotoiniciador ou tag à composição de tal modo que após sua ativação, a reação de reticulação é feita. um método de estampagem usando tal tinta é apresentado também. 1/1
BR112015014923-5A 2012-12-21 2013-12-13 Composição para formação de uma tinta de estampagem, tinta de estampagem, método para formar uma camada conformada em um substrato, uso da tinta de estampagem e substrato BR112015014923B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12198958 2012-12-21
EP12198958.6 2012-12-21
PCT/IB2013/060930 WO2014097096A1 (en) 2012-12-21 2013-12-13 Composition, imprinting ink and imprinting method

Publications (2)

Publication Number Publication Date
BR112015014923A2 true BR112015014923A2 (pt) 2017-07-11
BR112015014923B1 BR112015014923B1 (pt) 2021-11-16

Family

ID=47471589

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015014923-5A BR112015014923B1 (pt) 2012-12-21 2013-12-13 Composição para formação de uma tinta de estampagem, tinta de estampagem, método para formar uma camada conformada em um substrato, uso da tinta de estampagem e substrato

Country Status (8)

Country Link
US (1) US10946625B2 (pt)
EP (1) EP2904058B1 (pt)
JP (1) JP5897234B1 (pt)
CN (1) CN104870576B (pt)
BR (1) BR112015014923B1 (pt)
DK (1) DK2904058T3 (pt)
RU (1) RU2632456C2 (pt)
WO (1) WO2014097096A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029529A1 (fr) * 2014-12-03 2016-06-10 Commissariat Energie Atomique Encre sol-gel luminescente pour marquer un substrat, procede de realisation d'une encre sol-gel luminescente et procede de marquage d'un substrat par une encre sol-gel luminescente.
US12006441B2 (en) 2015-10-20 2024-06-11 Koninklijke Philips N.V. Imprinting ink composition, imprinting method, optical element lighting device, optical sensor and photovoltaic device
US11609499B2 (en) * 2016-02-24 2023-03-21 Nissan Chemical Corporation Silicon-containing coating agent for pattern reversal
US11163230B2 (en) 2016-04-06 2021-11-02 Koninklijke Philips N.V. Imprint lithography stamp method of making and using the same
US12092953B2 (en) * 2016-07-08 2024-09-17 University Of Massachusetts Patterning of nanostructures using imprint lithography
CN106226847B (zh) * 2016-09-07 2017-12-19 山东科技大学 一种力响应性纳米量级光子晶体材料的制备方法
CN106226846B (zh) * 2016-09-07 2017-11-07 山东科技大学 一种基于反转压印纳米成型技术的力响应性光子晶体材料的制备方法
CN106291776B (zh) * 2016-09-07 2018-01-30 山东科技大学 一种基于纳米成型技术的力响应性光子晶体材料的制备方法
US10877192B2 (en) * 2017-04-18 2020-12-29 Saudi Arabian Oil Company Method of fabricating smart photonic structures for material monitoring
US10879431B2 (en) * 2017-12-22 2020-12-29 Lumileds Llc Wavelength converting layer patterning for LED arrays
WO2019188522A1 (ja) 2018-03-27 2019-10-03 富士フイルム株式会社 インクジェットインク組成物及びその製造方法、並びに画像形成方法
EP3582004A1 (en) 2018-06-13 2019-12-18 Koninklijke Philips N.V. Imprinting composition and method of forming a patterned layer using the same
US12044963B2 (en) 2020-01-22 2024-07-23 Applied Materials, Inc. High refractive index imprint compositions and materials and processes for making the same
US11892771B2 (en) 2020-04-20 2024-02-06 Applied Materials, Inc. Methods for increasing the density of high-index nanoimprint lithography films
EP3929658A1 (en) * 2020-06-23 2021-12-29 Koninklijke Philips N.V. Imprinting method and patterned layer

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1845795A (zh) 2003-08-19 2006-10-11 纳诺普托公司 亚微米级构图方法和体系
RU2339668C2 (ru) * 2004-06-28 2008-11-27 Кэнон Кабусики Кайся Водные чернила, струйный способ записи, чернильный картридж, блок записи, струйное устройство записи и способ формирования изображения
JP3793222B2 (ja) * 2004-07-02 2006-07-05 キヤノン株式会社 インクジェット用インク、インクセット、インクジェット記録方法、インクカートリッジ、記録ユニット、及びインクジェット記録装置
JP2008007623A (ja) 2006-06-29 2008-01-17 Chisso Corp ナノインプリント用組成物
CN101535892A (zh) * 2006-11-01 2009-09-16 皇家飞利浦电子股份有限公司 凹凸层和制作凹凸层的压印方法
US20100093969A1 (en) 2007-02-26 2010-04-15 Ruzhi Zhang Process for making siloxane polymers
US8460770B2 (en) 2007-11-01 2013-06-11 Dow Global Technologies Llc In situ moisture generation and use of polyfunctional alcohols for crosslinking of silane-functionalized resins
JP5433152B2 (ja) * 2008-01-18 2014-03-05 東京応化工業株式会社 室温インプリント用膜形成組成物、並びに構造体の製造方法及び構造体
US9429837B2 (en) * 2008-05-20 2016-08-30 Asml Netherlands B.V. Aqueous curable imprintable medium and patterned layer forming method
KR101749349B1 (ko) * 2008-05-21 2017-07-03 닛산 가가쿠 고교 가부시키 가이샤 아미노산 발생제 및 이를 포함하는 폴리실록산 조성물
CN102056990B (zh) 2008-06-06 2014-02-19 皇家飞利浦电子股份有限公司 用于软光刻的硅酮橡胶材料
JP2011082347A (ja) 2009-10-07 2011-04-21 Fujifilm Corp インプリント用硬化性組成物、硬化物の製造方法および硬化物
JP5882583B2 (ja) * 2010-02-04 2016-03-09 東京応化工業株式会社 エアギャップ形成用シリカ系被膜形成材料及びエアギャップ形成方法
WO2012133432A1 (ja) 2011-03-30 2012-10-04 旭化成ケミカルズ株式会社 オルガノポリシロキサン、その製造方法、及びオルガノポリシロキサンを含有する硬化性樹脂組成物
JP5729865B2 (ja) * 2011-03-31 2015-06-03 旭化成ケミカルズ株式会社 オルガノポリシロキサンを含有する光硬化性樹脂組成物およびその用途

Also Published As

Publication number Publication date
US20150291815A1 (en) 2015-10-15
DK2904058T3 (en) 2016-08-22
CN104870576B (zh) 2017-09-12
JP5897234B1 (ja) 2016-03-30
CN104870576A (zh) 2015-08-26
WO2014097096A1 (en) 2014-06-26
JP2016511701A (ja) 2016-04-21
EP2904058B1 (en) 2016-05-25
RU2632456C2 (ru) 2017-10-04
US10946625B2 (en) 2021-03-16
RU2015120063A (ru) 2016-12-20
EP2904058A1 (en) 2015-08-12
BR112015014923B1 (pt) 2021-11-16

Similar Documents

Publication Publication Date Title
BR112015014923A2 (pt) composição para formação de uma tinta de estampagem, tinta de estampagem, método para formar uma camada conformada em um substrato, uso da tinta de estampagem e substrato
BR112013006118A2 (pt) composição aquosa de revestimento e método para prevenção de oxidação usando a composição de revestimento aquoso
MX2015010754A (es) Composiciones anti-suciedad con un polimero u oligomero que contiene un oxialquileno fluorado.
BRPI0519408A2 (pt) composiÇÕes de revestimento para a fabricaÇço de substratos
ES2527817T3 (es) Adhesivo de revestimiento de 2 componentes
BR112018002181A2 (pt) composição de resina epóxi de baixa emissão
BR112012007085B8 (pt) processos para a preparação de derivados de benzil-benzeno substituídos com glicopiranosila
BRPI0719411A8 (pt) Aditivo para uma composição de revestimento, método para melhorar o desempenho de uma composição de revestimento, método para revestir um substrato, artigo, composição de revestimento e kit para preparar uma composição de revestimento
BR112012028630A2 (pt) dispositivo para comprimir e secar gás
BR112013024280A2 (pt) composição de revestimento para o uso como um revestimento para impedir a incrustação em um ambiente marinho, processo para impedir fisicamente a incrustação a partir de um substrato em um ambiente de incrustação aquático, e estrutura feita pelo homem
BR112012028637A2 (pt) composição de gasolina, pacote de aditivo, uso de aditivo e método
ES2530991T3 (es) Procedimiento para la obtención de betamiméticos
PH12015502750A1 (en) Impurity-diffusing composition and method for producing semiconductor element
BR112013032592A2 (pt) fluido formável em jato curável para fabricação de uma impressão flexográfica mestre
BR112014019903A8 (pt) Uso de um copolímero e processo para inibição e/ou dispersão de escamas de sulfeto
BR112013023983A2 (pt) composição de revestimento, método de produção de uma composição de revestimento e uso de uma composição de revestimento
BR112013016067A2 (pt) "composição reticulável e/ou endurecível, composição e elastómero de silicone, uso da composição de silicone, suporte sólido revestido e processo de revestimento sobre um suporte flexível"
BR112012031314A2 (pt) "processo de preparo de compostos esteramidas"
NZ588506A (en) Fluorocarbon polymer compositions and methods of coating coils therewith
BR112014008934A2 (pt) composição, método de obtenção da composição e formulação fitossanitária que a compreende
CY1115094T1 (el) Νεα μεθοδος για την συνθεση (7-μεθοξυ-1-ναφθυλ) ακετονιτριλιου και εφαρμογη στην συνθεση αγομελατινης
BR112017018431A2 (pt) película auto-sustentável a base de um éster de ácido hialurônico e método de preparação da película
BR112018001486A2 (pt) ?composição de limpeza em barra, processo para preparar a composição, método para reduzir atividade antimicrobiana em uma superfície e uso da composição?
BR112013006159A2 (pt) gerador eletroquímico e processo de realização desse gerador
BR112015030307A2 (pt) composto magnético dendrímero, método para preparação do composto magnético dendrímero, uso do composto magnético dendrímero e lubrificante

Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06I Publication of requirement cancelled [chapter 6.9 patent gazette]

Free format text: ANULADA A PUBLICACAO CODIGO 6.6.1 NA RPI NO 2462 DE 13/03/2018 POR TER SIDO INDEVIDA.

B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 13/12/2013, OBSERVADAS AS CONDICOES LEGAIS.