BR112014017464A2 - método para produzir o composto pentanário semicondutor cztsse dopado com sódio - Google Patents
método para produzir o composto pentanário semicondutor cztsse dopado com sódioInfo
- Publication number
- BR112014017464A2 BR112014017464A2 BR112014017464A BR112014017464A BR112014017464A2 BR 112014017464 A2 BR112014017464 A2 BR 112014017464A2 BR 112014017464 A BR112014017464 A BR 112014017464A BR 112014017464 A BR112014017464 A BR 112014017464A BR 112014017464 A2 BR112014017464 A2 BR 112014017464A2
- Authority
- BR
- Brazil
- Prior art keywords
- precursor
- sulfur
- depositing
- selenium
- layer
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 title abstract 4
- 229910052708 sodium Inorganic materials 0.000 title abstract 4
- 239000011734 sodium Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- -1 pentane compound Chemical class 0.000 title abstract 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 title 1
- 239000002243 precursor Substances 0.000 abstract 12
- 150000001875 compounds Chemical class 0.000 abstract 9
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 6
- 229910052717 sulfur Inorganic materials 0.000 abstract 6
- 239000011593 sulfur Substances 0.000 abstract 6
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 abstract 5
- 238000000137 annealing Methods 0.000 abstract 5
- 238000000151 deposition Methods 0.000 abstract 5
- 229910052711 selenium Inorganic materials 0.000 abstract 5
- 239000011669 selenium Substances 0.000 abstract 5
- 229910052798 chalcogen Inorganic materials 0.000 abstract 3
- 150000001787 chalcogens Chemical class 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 3
- 230000004888 barrier function Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910052783 alkali metal Inorganic materials 0.000 abstract 1
- 150000001340 alkali metals Chemical class 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 239000011135 tin Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
- H01L31/1832—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe comprising ternary compounds, e.g. Hg Cd Te
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02488—Insulating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02491—Conductive materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02496—Layer structure
- H01L21/02502—Layer structure consisting of two layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02557—Sulfides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/0256—Selenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02579—P-type
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02614—Transformation of metal, e.g. oxidation, nitridation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
1/1 resumo “método para produzir o composto pentanário semicondutor cztsse dopado com sódio” a presente invenção diz respeito a um método para produzir uma pilha em camadas para fabricar uma célula solar de película fina tendo um composto semicondutor do tipo cu2znsn(s,se)4, que compreende as seguintes etapas de: fornecer um substrato; depositar uma camada de barreira que consiste de um material adaptados para inibir a difusão de metais alcalinos no dito substrato; que deposita uma camada de eletrodo na dita camada de barreira; depositar uma primeira camada de precursor que compreende os metais cobre, zinco e estanho; depositar uma segunda camada de precursor que compreende pelo menos um chalcogênio selecionado de enxofre e selênio na dita primeira camada precursora; recozer as ditas camadas precursoras para cristalizar o dito composto semicondutor; fornecer pelo menos um gás de processo durante o recozimento da dita primeira e segunda camadas precursoras, em que (i) no caso enxofre ou selênio estarem contidos na dita segunda camada precursora, o outro chalcogênio e/ou um composto contendo o outro chalcogênio está contido no dito gás de processo ou (ii) no caso enxofre e selênio estão contidas na dita camada precursora, enxofre e/ou selênio e/ou um composto contendo enxofre e/ou um composto contendo selênio está contido no dito gás de processo; depositar um sódio elementar e/ou um composto contendo sódio (i) nas ditas camadas precursoras e/ou a dita camada de eletrodo no avanço do dito recozimento das ditas camadas precursoras, (ii) nas ditas camadas precursoras durante o dito recozimento das ditas camadas precursoras e/ou (iii) no dito composto semicondutor após o recozimento das ditas camadas precursoras; em que o dito composto semicondutor é produzido de uma tal maneira que perfis de profundidade de sódio e enxofre definidos entre uma primeira face de limite e uma segunda face de limite do dito composto semicondutor são obtidos
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12166090 | 2012-04-27 | ||
PCT/EP2013/058670 WO2013160421A1 (en) | 2012-04-27 | 2013-04-25 | Method for producing the pentanary compound semiconductor cztsse doped with sodium |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112014017464A2 true BR112014017464A2 (pt) | 2017-06-13 |
BR112014017464A8 BR112014017464A8 (pt) | 2017-07-04 |
Family
ID=48326272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112014017464A BR112014017464A8 (pt) | 2012-04-27 | 2013-04-25 | método para produzir o composto pentanário semicondutor cztsse dopado com sódio |
Country Status (8)
Country | Link |
---|---|
US (1) | US20150037927A1 (pt) |
EP (1) | EP2842169A1 (pt) |
JP (1) | JP2015509290A (pt) |
KR (1) | KR20140109457A (pt) |
CN (1) | CN104247036A (pt) |
BR (1) | BR112014017464A8 (pt) |
WO (1) | WO2013160421A1 (pt) |
ZA (1) | ZA201405062B (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014239122A (ja) * | 2013-06-06 | 2014-12-18 | 株式会社豊田中央研究所 | p型半導体膜及び光電素子 |
EP2947175A1 (en) * | 2014-05-21 | 2015-11-25 | Heraeus Deutschland GmbH & Co. KG | CuSn, CuZn and Cu2ZnSn sputter targets |
CN105803392B (zh) * | 2014-12-30 | 2019-01-15 | 北京有色金属研究总院 | 一种Na掺杂Cu2ZnSn(S1-xSex)4薄膜的制备方法 |
CN104947050B (zh) * | 2015-05-21 | 2018-01-09 | 内蒙古大学 | 一种CZTSSe薄膜的硫化物靶材共溅射制备方法及产品 |
EP3627564A1 (de) * | 2018-09-22 | 2020-03-25 | (CNBM) Bengbu Design & Research Institute for Glass Industry Co., Ltd. | Verfahren zur nachbehandlung einer absorberschicht |
KR102420408B1 (ko) * | 2020-07-31 | 2022-07-13 | 전남대학교산학협력단 | 무기박막태양전지용 p형 화합물 반도체층 제조방법 및 상기 방법으로 제조된 p형 화합물 반도체층을 포함하는 무기박막태양전지 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4442824C1 (de) | 1994-12-01 | 1996-01-25 | Siemens Ag | Solarzelle mit Chalkopyrit-Absorberschicht |
US7700464B2 (en) * | 2004-02-19 | 2010-04-20 | Nanosolar, Inc. | High-throughput printing of semiconductor precursor layer from nanoflake particles |
US7736940B2 (en) * | 2004-03-15 | 2010-06-15 | Solopower, Inc. | Technique and apparatus for depositing layers of semiconductors for solar cell and module fabrication |
US8389852B2 (en) | 2006-02-22 | 2013-03-05 | Guardian Industries Corp. | Electrode structure for use in electronic device and method of making same |
DE102008022784A1 (de) | 2008-05-08 | 2009-11-12 | Avancis Gmbh & Co. Kg | Vorrichtung und Verfahren zum Tempern von Gegenständen in einer Behandlungskammer |
US20110294254A1 (en) * | 2009-12-28 | 2011-12-01 | Jackrel David B | Low cost solar cells formed using a chalcogenization rate modifier |
US9087954B2 (en) * | 2011-03-10 | 2015-07-21 | Saint-Gobain Glass France | Method for producing the pentanary compound semiconductor CZTSSe, and thin-film solar cell |
-
2013
- 2013-04-25 US US14/380,169 patent/US20150037927A1/en not_active Abandoned
- 2013-04-25 EP EP13721302.1A patent/EP2842169A1/en not_active Withdrawn
- 2013-04-25 JP JP2014555268A patent/JP2015509290A/ja active Pending
- 2013-04-25 CN CN201380022112.0A patent/CN104247036A/zh active Pending
- 2013-04-25 WO PCT/EP2013/058670 patent/WO2013160421A1/en active Application Filing
- 2013-04-25 KR KR1020147020895A patent/KR20140109457A/ko not_active Application Discontinuation
- 2013-04-25 BR BR112014017464A patent/BR112014017464A8/pt not_active IP Right Cessation
-
2014
- 2014-07-10 ZA ZA2014/05062A patent/ZA201405062B/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN104247036A (zh) | 2014-12-24 |
JP2015509290A (ja) | 2015-03-26 |
BR112014017464A8 (pt) | 2017-07-04 |
WO2013160421A1 (en) | 2013-10-31 |
EP2842169A1 (en) | 2015-03-04 |
ZA201405062B (en) | 2015-10-28 |
US20150037927A1 (en) | 2015-02-05 |
KR20140109457A (ko) | 2014-09-15 |
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Legal Events
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B08F | Application fees: application dismissed [chapter 8.6 patent gazette] | ||
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] | ||
B350 | Update of information on the portal [chapter 15.35 patent gazette] |