BR112014010115A8 - método para prover pulsos de potencial sequenciados - Google Patents
método para prover pulsos de potencial sequenciadosInfo
- Publication number
- BR112014010115A8 BR112014010115A8 BR112014010115A BR112014010115A BR112014010115A8 BR 112014010115 A8 BR112014010115 A8 BR 112014010115A8 BR 112014010115 A BR112014010115 A BR 112014010115A BR 112014010115 A BR112014010115 A BR 112014010115A BR 112014010115 A8 BR112014010115 A8 BR 112014010115A8
- Authority
- BR
- Brazil
- Prior art keywords
- die
- leistungsaufnahmebauteil
- wird
- leistung
- wobei
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/01—Details
- H03K3/012—Modifications of generator to improve response time or to decrease power consumption
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Measuring Volume Flow (AREA)
- Fluidized-Bed Combustion And Resonant Combustion (AREA)
- Plasma Technology (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Electrostatic Separation (AREA)
Abstract
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011117177A DE102011117177A1 (de) | 2011-10-28 | 2011-10-28 | Verfahren zur Bereitstellung sequenzieller Leistungspulse |
DE102011117177.4 | 2011-10-28 | ||
PCT/EP2012/004203 WO2013060415A1 (de) | 2011-10-28 | 2012-10-08 | Verfahren zur bereitstellung sequenzieller leistungspulse |
Publications (3)
Publication Number | Publication Date |
---|---|
BR112014010115A2 BR112014010115A2 (pt) | 2017-06-13 |
BR112014010115A8 true BR112014010115A8 (pt) | 2017-06-20 |
BR112014010115B1 BR112014010115B1 (pt) | 2021-11-16 |
Family
ID=47177865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112014010115-9A BR112014010115B1 (pt) | 2011-10-28 | 2012-10-08 | Método para prover pulsos de potência com intervalos de pulsos graduáveis para operar um catodo de atomização pvd |
Country Status (23)
Country | Link |
---|---|
US (1) | US9906210B2 (pt) |
EP (1) | EP2771901B1 (pt) |
JP (1) | JP6236651B2 (pt) |
KR (1) | KR101930579B1 (pt) |
CN (1) | CN104246967B (pt) |
AR (1) | AR088318A1 (pt) |
BR (1) | BR112014010115B1 (pt) |
CA (1) | CA2853699C (pt) |
DE (1) | DE102011117177A1 (pt) |
DK (1) | DK2771901T3 (pt) |
ES (1) | ES2705974T3 (pt) |
HU (1) | HUE043149T2 (pt) |
IN (1) | IN2014DN03385A (pt) |
MX (1) | MX360116B (pt) |
MY (1) | MY175563A (pt) |
PL (1) | PL2771901T3 (pt) |
PT (1) | PT2771901T (pt) |
RU (1) | RU2631670C2 (pt) |
SG (1) | SG11201401877QA (pt) |
SI (1) | SI2771901T1 (pt) |
TR (1) | TR201900589T4 (pt) |
TW (1) | TWI564415B (pt) |
WO (1) | WO2013060415A1 (pt) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011121770A1 (de) | 2011-12-21 | 2013-06-27 | Oerlikon Trading Ag, Trübbach | Homogenes HIPIMS-Beschichtungsverfahren |
DE102013011075A1 (de) * | 2013-07-03 | 2015-01-08 | Oerlikon Trading Ag | TiB2 Schichten und ihre Herstellung |
DE102013011073A1 (de) | 2013-07-03 | 2015-01-08 | Oerlikon Trading Ag, Trübbach | TlxSi1-xN Schichten und ihre Herstellung |
US9840768B2 (en) | 2013-07-03 | 2017-12-12 | Oerlikon Surface Solutions Ag, Pfäffikon | TixSi1-xN layers and their production |
DE102013011072A1 (de) | 2013-07-03 | 2015-01-08 | Oerlikon Trading Ag, Trübbach | Targetpräparation |
DE102013011071A1 (de) | 2013-07-03 | 2015-01-08 | Oerlikon Trading Ag, Trübbach | TixSi1-xN Schichten mit CryAl1-yN Haftschicht und ihre Herstellung |
KR102117739B1 (ko) | 2016-09-30 | 2020-06-09 | 주식회사 엘지화학 | 음극지지체형 고체산화물 연료전지 제조방법 |
EP3406751A1 (en) | 2017-05-24 | 2018-11-28 | Walter Ag | A coated cutting tool and a method for its production |
EP3406761A1 (en) | 2017-05-24 | 2018-11-28 | Walter Ag | A method for producing a coated cutting tool and a coated cutting tool |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6141766A (ja) * | 1984-08-06 | 1986-02-28 | Hitachi Ltd | スパツタリング方法およびスパツタ−装置 |
JPH07116596B2 (ja) * | 1989-02-15 | 1995-12-13 | 株式会社日立製作所 | 薄膜形成方法、及びその装置 |
CA2218279A1 (en) * | 1995-04-25 | 1996-10-31 | The Boc Group, Inc. | Sputtering system using cylindrical rotating magnetron electrically powered using alternating current |
DE19651615C1 (de) * | 1996-12-12 | 1997-07-10 | Fraunhofer Ges Forschung | Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern |
US6063254A (en) * | 1997-04-30 | 2000-05-16 | The Alta Group, Inc. | Method for producing titanium crystal and titanium |
US6878242B2 (en) * | 2003-04-08 | 2005-04-12 | Guardian Industries Corp. | Segmented sputtering target and method/apparatus for using same |
US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
CN101273431A (zh) * | 2005-10-13 | 2008-09-24 | 贝卡尔特股份有限公司 | 通过溅射沉积涂层的方法 |
DE102006017382A1 (de) | 2005-11-14 | 2007-05-16 | Itg Induktionsanlagen Gmbh | Verfahren und Vorrichtung zum Beschichten und/oder zur Behandlung von Oberflächen |
US9355824B2 (en) * | 2006-12-12 | 2016-05-31 | Evatec Ag | Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) |
US20080197015A1 (en) * | 2007-02-16 | 2008-08-21 | Terry Bluck | Multiple-magnetron sputtering source with plasma confinement |
CN102027564B (zh) * | 2008-04-28 | 2013-05-22 | 塞梅孔公司 | 对物体进行预处理和涂覆的装置和方法 |
JP5037475B2 (ja) * | 2008-11-11 | 2012-09-26 | 株式会社神戸製鋼所 | スパッタ装置 |
DE202010001497U1 (de) * | 2010-01-29 | 2010-04-22 | Hauzer Techno-Coating B.V. | Beschichtungsvorrichtung mit einer HIPIMS-Leistungsquelle |
DE102011018363A1 (de) | 2011-04-20 | 2012-10-25 | Oerlikon Trading Ag, Trübbach | Hochleistungszerstäubungsquelle |
DE102011121770A1 (de) * | 2011-12-21 | 2013-06-27 | Oerlikon Trading Ag, Trübbach | Homogenes HIPIMS-Beschichtungsverfahren |
JP7116596B2 (ja) * | 2018-05-31 | 2022-08-10 | 川崎重工業株式会社 | リード線挿入装置およびリード線挿入方法 |
-
2011
- 2011-10-28 DE DE102011117177A patent/DE102011117177A1/de not_active Withdrawn
-
2012
- 2012-10-08 PT PT12784435T patent/PT2771901T/pt unknown
- 2012-10-08 TR TR2019/00589T patent/TR201900589T4/tr unknown
- 2012-10-08 SI SI201231499T patent/SI2771901T1/sl unknown
- 2012-10-08 WO PCT/EP2012/004203 patent/WO2013060415A1/de active Application Filing
- 2012-10-08 CN CN201280065357.7A patent/CN104246967B/zh active Active
- 2012-10-08 EP EP12784435.5A patent/EP2771901B1/de active Active
- 2012-10-08 SG SG11201401877QA patent/SG11201401877QA/en unknown
- 2012-10-08 IN IN3385DEN2014 patent/IN2014DN03385A/en unknown
- 2012-10-08 CA CA2853699A patent/CA2853699C/en active Active
- 2012-10-08 RU RU2014121388A patent/RU2631670C2/ru active
- 2012-10-08 MX MX2014005134A patent/MX360116B/es active IP Right Grant
- 2012-10-08 MY MYPI2014001218A patent/MY175563A/en unknown
- 2012-10-08 PL PL12784435T patent/PL2771901T3/pl unknown
- 2012-10-08 ES ES12784435T patent/ES2705974T3/es active Active
- 2012-10-08 US US14/354,698 patent/US9906210B2/en active Active
- 2012-10-08 JP JP2014537511A patent/JP6236651B2/ja active Active
- 2012-10-08 BR BR112014010115-9A patent/BR112014010115B1/pt active IP Right Grant
- 2012-10-08 DK DK12784435.5T patent/DK2771901T3/en active
- 2012-10-08 KR KR1020147014022A patent/KR101930579B1/ko active IP Right Grant
- 2012-10-08 HU HUE12784435A patent/HUE043149T2/hu unknown
- 2012-10-12 AR ARP120103800A patent/AR088318A1/es active IP Right Grant
- 2012-10-26 TW TW101139611A patent/TWI564415B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW201337016A (zh) | 2013-09-16 |
TR201900589T4 (tr) | 2019-02-21 |
CA2853699C (en) | 2019-08-06 |
RU2014121388A (ru) | 2015-12-10 |
MY175563A (en) | 2020-07-01 |
BR112014010115B1 (pt) | 2021-11-16 |
SI2771901T1 (sl) | 2019-05-31 |
AR088318A1 (es) | 2014-05-28 |
DE102011117177A1 (de) | 2013-05-02 |
PL2771901T3 (pl) | 2019-04-30 |
EP2771901B1 (de) | 2018-12-12 |
US9906210B2 (en) | 2018-02-27 |
KR20140097214A (ko) | 2014-08-06 |
HUE043149T2 (hu) | 2019-08-28 |
BR112014010115A2 (pt) | 2017-06-13 |
JP2015501383A (ja) | 2015-01-15 |
WO2013060415A1 (de) | 2013-05-02 |
EP2771901A1 (de) | 2014-09-03 |
DK2771901T3 (en) | 2019-02-18 |
MX2014005134A (es) | 2014-10-06 |
CN104246967A (zh) | 2014-12-24 |
MX360116B (es) | 2018-10-23 |
RU2631670C2 (ru) | 2017-09-26 |
PT2771901T (pt) | 2019-02-08 |
CA2853699A1 (en) | 2013-05-02 |
SG11201401877QA (en) | 2014-09-26 |
CN104246967B (zh) | 2017-04-19 |
TWI564415B (zh) | 2017-01-01 |
US20140339917A1 (en) | 2014-11-20 |
IN2014DN03385A (pt) | 2015-06-05 |
ES2705974T3 (es) | 2019-03-27 |
KR101930579B1 (ko) | 2018-12-18 |
JP6236651B2 (ja) | 2017-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B25D | Requested change of name of applicant approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG, TRUEBBACH (CH) |
|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B350 | Update of information on the portal [chapter 15.35 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B09W | Correction of the decision to grant [chapter 9.1.4 patent gazette] |
Free format text: O PRESENTE PEDIDO TEVE UM PARECER DE DEFERIMENTO NOTIFICADO NA RPI NO 2644 DE08/09/2021. ATRAVES DA MENSAGEM FALE CONOSCO 966743, A REQUERENTE SOLICITA CORRIGIR O QUADRO1 DO PARECER DE DEFERIMENTO QUE APRESENTA EQUIVOCADAMENTE 15 PAGINAS QUANDO O CORRETO SAO18. DIANTE DISTO, CONCLUO PELA RETIFICACAO DO PARECER DE DEFERIMENTO, DEVENDO INTEGRAR ACARTA PATENTE O NUMERO DE REIVINDICACOES QUE CONSTAM NO QUADRO 1 DESTE PARECER. |
|
B25D | Requested change of name of applicant approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH) |
|
B25G | Requested change of headquarter approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH) |
|
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 08/10/2012, OBSERVADAS AS CONDICOES LEGAIS. |