BR112012026552A2 - alvo para vaporização de centelha com limitação espacial da propagação de centelha - Google Patents
alvo para vaporização de centelha com limitação espacial da propagação de centelhaInfo
- Publication number
- BR112012026552A2 BR112012026552A2 BR112012026552A BR112012026552A BR112012026552A2 BR 112012026552 A2 BR112012026552 A2 BR 112012026552A2 BR 112012026552 A BR112012026552 A BR 112012026552A BR 112012026552 A BR112012026552 A BR 112012026552A BR 112012026552 A2 BR112012026552 A2 BR 112012026552A2
- Authority
- BR
- Brazil
- Prior art keywords
- spark
- target
- vaporization
- propagation
- spatial limitation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3444—Associated circuits
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
alvo para vaporização de centelha com limitação espacial da propagação de centelha. a presente invenção refere-se a um alvo para uma fonte arc com um primeiro corpo (3) de um material a ser vaporizado, que compreende essencialmente em um plano uma superfície prevista para vaporização, sendo que a superfície nesse plano envolve uma região central, caracaterizado pelo fato de que na região central é provido um segundo corpo (7), executado de preferência em forma de disco, eletricamente isolado do primeiro corpo (3) de tal maneira, que pelo segundo corpo (7) essencialmente não podem ser disponibilizados elétrons para manutenção de uma centelha.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32492910P | 2010-04-16 | 2010-04-16 | |
US61/324,929 | 2010-04-16 | ||
DE102010020737.3 | 2010-05-17 | ||
DE102010020737A DE102010020737A1 (de) | 2010-05-17 | 2010-05-17 | Target für Funkenverdampfung mit räumlicher Begrenzung der Ausbreitung des Funkens |
PCT/EP2011/000057 WO2011128004A1 (de) | 2010-04-16 | 2011-01-10 | Target für funkenverdampfung mit räumlicher begrenzung der ausbreitung des funkens |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112012026552A2 true BR112012026552A2 (pt) | 2016-07-12 |
BR112012026552B1 BR112012026552B1 (pt) | 2022-01-11 |
Family
ID=43735926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012026552-0A BR112012026552B1 (pt) | 2010-04-16 | 2011-01-10 | Alvo para uma fonte arc com um primeiro corpo de um material a ser vaporizado |
Country Status (12)
Country | Link |
---|---|
US (1) | US9657389B2 (pt) |
EP (1) | EP2559050B1 (pt) |
JP (1) | JP5757991B2 (pt) |
KR (1) | KR101784540B1 (pt) |
CN (1) | CN102822938B (pt) |
BR (1) | BR112012026552B1 (pt) |
CA (1) | CA2796394C (pt) |
DE (1) | DE102010020737A1 (pt) |
MX (1) | MX338452B (pt) |
RU (1) | RU2562909C2 (pt) |
TW (1) | TWI544101B (pt) |
WO (1) | WO2011128004A1 (pt) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62218562A (ja) | 1986-03-19 | 1987-09-25 | Fujitsu Ltd | スパツタリング装置 |
US5298136A (en) | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
DE4401986A1 (de) | 1994-01-25 | 1995-07-27 | Dresden Vakuumtech Gmbh | Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür |
CH689558A5 (de) * | 1995-07-11 | 1999-06-15 | Erich Bergmann | Bedampfungsanlage und Verdampfereinheit. |
WO1998028779A1 (de) * | 1996-12-21 | 1998-07-02 | Singulus Technologies Ag | Vorrichtung zur kathodenzerstäubung |
WO2000016373A1 (de) | 1998-09-14 | 2000-03-23 | Unaxis Trading Ag | Targetanordnung für eine arc-verdampfungs-kammer |
CA2268659C (en) * | 1999-04-12 | 2008-12-30 | Vladimir I. Gorokhovsky | Rectangular cathodic arc source and method of steering an arc spot |
US6783638B2 (en) * | 2001-09-07 | 2004-08-31 | Sputtered Films, Inc. | Flat magnetron |
DE60315007D1 (de) * | 2002-03-23 | 2007-08-30 | Metal Nanopowders Ltd | Verfahren zur erzeugung von pulver |
JP2005126737A (ja) * | 2003-10-21 | 2005-05-19 | Riken Corp | アーク式蒸発源 |
US20060049041A1 (en) * | 2004-08-20 | 2006-03-09 | Jds Uniphase Corporation | Anode for sputter coating |
WO2007131944A2 (de) * | 2006-05-16 | 2007-11-22 | Oerlikon Trading Ag, Trübbach | Arcquelle und magnetanordnung |
US20100018857A1 (en) * | 2008-07-23 | 2010-01-28 | Seagate Technology Llc | Sputter cathode apparatus allowing thick magnetic targets |
-
2010
- 2010-05-17 DE DE102010020737A patent/DE102010020737A1/de not_active Withdrawn
-
2011
- 2011-01-10 RU RU2012148715/07A patent/RU2562909C2/ru active
- 2011-01-10 US US13/641,499 patent/US9657389B2/en active Active
- 2011-01-10 MX MX2012012055A patent/MX338452B/es active IP Right Grant
- 2011-01-10 WO PCT/EP2011/000057 patent/WO2011128004A1/de active Application Filing
- 2011-01-10 KR KR1020127026973A patent/KR101784540B1/ko active IP Right Grant
- 2011-01-10 EP EP11701194.0A patent/EP2559050B1/de active Active
- 2011-01-10 JP JP2013504138A patent/JP5757991B2/ja active Active
- 2011-01-10 CA CA2796394A patent/CA2796394C/en active Active
- 2011-01-10 CN CN201180019323.XA patent/CN102822938B/zh active Active
- 2011-01-10 BR BR112012026552-0A patent/BR112012026552B1/pt active IP Right Grant
- 2011-04-14 TW TW100112896A patent/TWI544101B/zh active
Also Published As
Publication number | Publication date |
---|---|
CA2796394C (en) | 2019-07-09 |
TW201207141A (en) | 2012-02-16 |
WO2011128004A1 (de) | 2011-10-20 |
MX2012012055A (es) | 2012-12-17 |
EP2559050A1 (de) | 2013-02-20 |
US9657389B2 (en) | 2017-05-23 |
RU2012148715A (ru) | 2014-05-27 |
KR101784540B1 (ko) | 2017-10-11 |
CN102822938A (zh) | 2012-12-12 |
JP2013525600A (ja) | 2013-06-20 |
RU2562909C2 (ru) | 2015-09-10 |
JP5757991B2 (ja) | 2015-08-05 |
EP2559050B1 (de) | 2017-06-07 |
BR112012026552B1 (pt) | 2022-01-11 |
DE102010020737A1 (de) | 2011-11-17 |
CN102822938B (zh) | 2016-05-04 |
KR20130064045A (ko) | 2013-06-17 |
CA2796394A1 (en) | 2011-10-20 |
TWI544101B (zh) | 2016-08-01 |
US20130126348A1 (en) | 2013-05-23 |
MX338452B (es) | 2016-04-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BR112015023506A2 (pt) | substratos não tecidos | |
BR112013032423A2 (pt) | luva isolante para um copo | |
UY35537A (es) | Compuestos de amida sustituida | |
UY33625A (es) | Uso de ingredientes activos para controlar nematodos en cultivos resistentes a nematodos | |
SV2009003160A (es) | Peptidomimeticos de smac utiles como inhibidores de proteinas de apoptosis (iap) | |
BR112014012050A2 (pt) | método para produção de uma escova de dentes que tem uma cavidade interna | |
BR112012029620A2 (pt) | sistema de distribuição e envoltório para um recepiente portátil | |
BR112017010188A2 (pt) | análogos de éter fosfolipídeos como veículos de fármacos alvejando câncer | |
AU342675S (en) | Reticle for an optical aiming device | |
AU342673S (en) | Reticle for an optical aiming device | |
BR112015023924A2 (pt) | inoculante e processo de fabricação de um inoculante | |
UY33246A (es) | Tienopirimidinas que contienen cicloalquilo para composiciones farmacéuticas | |
CR20140036A (es) | Compuesto inhibidor de la señalización de la trayectoria notch | |
BR112014006923B8 (pt) | Aparelho de pulverizar líquido | |
BR112014017304A8 (pt) | pistola de pulverização térmica com ponta de bocal re-movível e método de fabricação e utilização da mesma | |
BR112015016425A2 (pt) | coldre para uma pistola | |
WO2014197093A3 (en) | All water-based nanopatterning | |
BR112014004794A2 (pt) | composição, composição reticulada e artigo | |
ECSP14027694A (es) | Composiciones y métodos de polipéptidos-complejo de quelato de oligonucleótido | |
BR112017025639A2 (pt) | brinquedo de transformação | |
TWM490189U (en) | Plasma enhanced chemical vapor deposition (PECVD) source | |
BR112020006148A8 (pt) | Mistura antidegradante, seu uso e composição polimérica | |
TWD191653S (zh) | 電漿饋通凸緣 | |
CO6831981A2 (es) | Productos médicos para uso en enfermedades relacionadas con infecciones microbianas en el tracto aerodigestivo superior | |
MX2021001790A (es) | Composiciones solidas de trigliceridos y usos de estas. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
B25G | Requested change of headquarter approved |
Owner name: OERLIKON TRADING AG, TRUEBBACH (CH) |
|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 10/01/2011, OBSERVADAS AS CONDICOES LEGAIS. PATENTE CONCEDIDA CONFORME ADI 5.529/DF, QUE DETERMINA A ALTERACAO DO PRAZO DE CONCESSAO. |
|
B25D | Requested change of name of applicant approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH) |
|
B25G | Requested change of headquarter approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH) |