TWD191653S - 電漿饋通凸緣 - Google Patents

電漿饋通凸緣

Info

Publication number
TWD191653S
TWD191653S TW106306299F TW106306299F TWD191653S TW D191653 S TWD191653 S TW D191653S TW 106306299 F TW106306299 F TW 106306299F TW 106306299 F TW106306299 F TW 106306299F TW D191653 S TWD191653 S TW D191653S
Authority
TW
Taiwan
Prior art keywords
plasma
feedthrough flange
feedthrough
flange
design
Prior art date
Application number
TW106306299F
Other languages
English (en)
Inventor
艾瑞克木原 生野
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD191653S publication Critical patent/TWD191653S/zh

Links

Abstract

【物品用途】;本設計所請求為電漿饋通凸緣。;【設計說明】;無。

Description

電漿饋通凸緣
本設計所請求為電漿饋通凸緣。
無。
TW106306299F 2017-04-28 2017-10-27 電漿饋通凸緣 TWD191653S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/602,206 USD818447S1 (en) 2017-04-28 2017-04-28 Plasma feedthrough flange
US29/602,206 2017-04-28

Publications (1)

Publication Number Publication Date
TWD191653S true TWD191653S (zh) 2018-07-11

Family

ID=62118263

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106306299F TWD191653S (zh) 2017-04-28 2017-10-27 電漿饋通凸緣

Country Status (3)

Country Link
US (1) USD818447S1 (zh)
JP (1) JP1612649S (zh)
TW (1) TWD191653S (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1462698A (en) * 1922-09-25 1923-07-24 Rodger F Haughey Pipe coupling
US2282552A (en) * 1940-11-15 1942-05-12 B & H Mfg Co Inc Nongasket flange
US2513178A (en) * 1945-02-22 1950-06-27 Pittsburgh Des Moines Company Bolted flange connection
US2532891A (en) * 1948-09-23 1950-12-05 Warren W Chupp Flanged joint sealing gasket
US3302953A (en) * 1963-02-25 1967-02-07 Clarence O Glasgow Gasket ring and conduit coupling
US3368818A (en) * 1964-02-02 1968-02-13 Nippon Electric Co Vacuum flange
US3747963A (en) * 1972-05-17 1973-07-24 Cajon Co High vacuum flange assembly with o-ring gasket
US3988698A (en) 1975-02-07 1976-10-26 Spectra-Physics, Inc. Plasma tube and method of manufacture
JPH0781657B2 (ja) * 1988-07-19 1995-09-06 日本原子力研究所 真空フランジ
US5119395A (en) * 1990-11-09 1992-06-02 Gas Research Institute Interlock feed-through and insulator arrangement for plasma arc industrial heat treat furnaces
US5228587A (en) * 1992-11-23 1993-07-20 Worthington James N Flange cap for high vacuum system
US5593123A (en) * 1995-03-07 1997-01-14 Kimball Physics, Inc. Vacuum system components
US5814818A (en) * 1996-06-11 1998-09-29 Ngk Insulators, Ltd. Gas tube for passing plasma generating gases
JP3746586B2 (ja) 1997-03-27 2006-02-15 日本碍子株式会社 プラズマ生成用ガス通過管の製造方法
US6325390B1 (en) * 1997-08-08 2001-12-04 Itt Manufacturing Enterprises, Inc. Vacuum flange O-ring center ring
US6326574B1 (en) 1999-09-21 2001-12-04 Mosel Vitelic Inc. Sleeve for an adapter flange of the gasonics L3510 etcher
US20020050689A1 (en) * 2000-10-26 2002-05-02 Kimball Physics, Inc. Minimal thickness, double-sided flanges for ultra-high vacuum components
US8191901B2 (en) * 2000-10-26 2012-06-05 Kimball Physics, Inc. Minimal thickness, double-sided flanges for ultra-high vacuum components
JP5269335B2 (ja) * 2007-03-30 2013-08-21 東京エレクトロン株式会社 プラズマ処理装置
USD606952S1 (en) * 2009-01-16 2009-12-29 Asm Genitech Korea Ltd. Plasma inducing plate for semiconductor deposition apparatus
USD702654S1 (en) * 2012-05-29 2014-04-15 Asm Ip Holding B.V. Plasma power transfer rod for a semiconductor deposition apparatus
JP1564934S (zh) * 2016-02-26 2016-12-05

Also Published As

Publication number Publication date
USD818447S1 (en) 2018-05-22
JP1612649S (zh) 2018-09-03

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