BR112012013350A2 - método de deposição eletrostática de partículas, grãos abrasivos e artigos - Google Patents

método de deposição eletrostática de partículas, grãos abrasivos e artigos

Info

Publication number
BR112012013350A2
BR112012013350A2 BR112012013350A BR112012013350A BR112012013350A2 BR 112012013350 A2 BR112012013350 A2 BR 112012013350A2 BR 112012013350 A BR112012013350 A BR 112012013350A BR 112012013350 A BR112012013350 A BR 112012013350A BR 112012013350 A2 BR112012013350 A2 BR 112012013350A2
Authority
BR
Brazil
Prior art keywords
particles
articles
abrasive grains
electrostatic deposition
deposition method
Prior art date
Application number
BR112012013350A
Other languages
English (en)
Portuguese (pt)
Inventor
R Baran Jimmie Jr
Jungbauer Katrin
A Boehmer Roxanne
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of BR112012013350A2 publication Critical patent/BR112012013350A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
BR112012013350A 2009-12-03 2010-11-17 método de deposição eletrostática de partículas, grãos abrasivos e artigos BR112012013350A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26628609P 2009-12-03 2009-12-03
PCT/US2010/056973 WO2011068678A1 (en) 2009-12-03 2010-11-17 Method of electrostatic deposition of particles, abrasive grain and articles

Publications (1)

Publication Number Publication Date
BR112012013350A2 true BR112012013350A2 (pt) 2017-12-12

Family

ID=43535863

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112012013350A BR112012013350A2 (pt) 2009-12-03 2010-11-17 método de deposição eletrostática de partículas, grãos abrasivos e artigos

Country Status (7)

Country Link
US (1) US8894466B2 (https=)
EP (1) EP2507336B1 (https=)
JP (1) JP5658761B2 (https=)
CN (1) CN102639665B (https=)
BR (1) BR112012013350A2 (https=)
SG (1) SG181046A1 (https=)
WO (1) WO2011068678A1 (https=)

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CN104785349B (zh) * 2015-04-29 2017-05-03 浙江冠旗纳米科技有限公司 纳米级固体粉末高效制备方法
CN104947169B (zh) * 2015-06-19 2017-05-17 浙江大学 一种超疏水二氧化硅薄膜的制备方法
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KR20220130544A (ko) * 2021-03-18 2022-09-27 삼성에스디아이 주식회사 텅스텐 패턴 웨이퍼 연마용 cmp 슬러리 조성물 및 이를 이용한 텅스텐 패턴 웨이퍼의 연마 방법

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Also Published As

Publication number Publication date
SG181046A1 (en) 2012-07-30
WO2011068678A1 (en) 2011-06-09
JP5658761B2 (ja) 2015-01-28
US8894466B2 (en) 2014-11-25
CN102639665B (zh) 2015-04-01
EP2507336A1 (en) 2012-10-10
JP2013512786A (ja) 2013-04-18
CN102639665A (zh) 2012-08-15
EP2507336B1 (en) 2017-08-09
US20120252321A1 (en) 2012-10-04

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B11E Dismissal acc. art. 34 of ipl - requirements for examination incomplete
B11T Dismissal: dismissal of application maintained
B350 Update of information on the portal [chapter 15.35 patent gazette]
B350 Update of information on the portal [chapter 15.35 patent gazette]