BR0309663A - Sistemas polimerizáveis sensìveis ao infravermelho estabilizados - Google Patents
Sistemas polimerizáveis sensìveis ao infravermelho estabilizadosInfo
- Publication number
- BR0309663A BR0309663A BR0309663-7A BR0309663A BR0309663A BR 0309663 A BR0309663 A BR 0309663A BR 0309663 A BR0309663 A BR 0309663A BR 0309663 A BR0309663 A BR 0309663A
- Authority
- BR
- Brazil
- Prior art keywords
- infrared sensitive
- polymerizable systems
- sensitive polymerizable
- nitrogen atom
- stabilized infrared
- Prior art date
Links
- 125000005842 heteroatom Chemical group 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000001072 heteroaryl group Chemical group 0.000 abstract 1
- -1 mercapto compounds Chemical class 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
- 125000003396 thiol group Chemical group [H]S* 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
"SISTEMAS POLIMERIZáVEIS SENSìVEIS AO INFRAVERMELHO ESTABILIZADOS". A presente invenção refere-se ao uso de certos compostos mercapto como agentes para melhora da vida de prateleira para precursores de placa de impressão litográfico sensíveis ao infravermelho. Os compostos são anéis heteroaromáticos com cinco elementos contendo um átomo de nitrogênio e pelo menos um outro heterátomo, que pode ser oxigênio, enxofre ou um outro átomo de nitrogênio, tal que dois heteroátomos de anel são ligados em um carbono do anel transportando um grupo tiol.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/131,866 US6884568B2 (en) | 2000-10-17 | 2002-04-25 | Stabilized infrared-sensitive polymerizable systems |
PCT/EP2003/004271 WO2003091022A1 (en) | 2002-04-25 | 2003-04-24 | Stabilized infrared-sensitive polymerizable systems |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0309663A true BR0309663A (pt) | 2005-02-22 |
Family
ID=29268746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0309663-7A BR0309663A (pt) | 2002-04-25 | 2003-04-24 | Sistemas polimerizáveis sensìveis ao infravermelho estabilizados |
Country Status (9)
Country | Link |
---|---|
US (1) | US6884568B2 (pt) |
EP (1) | EP1497122B1 (pt) |
JP (1) | JP2005523484A (pt) |
CN (1) | CN1329190C (pt) |
AT (1) | ATE327888T1 (pt) |
AU (1) | AU2003233055A1 (pt) |
BR (1) | BR0309663A (pt) |
DE (1) | DE60305683T2 (pt) |
WO (1) | WO2003091022A1 (pt) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
KR100804873B1 (ko) | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 sog 반사방지 코팅 |
JP4156784B2 (ja) * | 2000-07-25 | 2008-09-24 | 富士フイルム株式会社 | ネガ型画像記録材料及び画像形成方法 |
JP2002082429A (ja) * | 2000-09-08 | 2002-03-22 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
US20040091811A1 (en) * | 2002-10-30 | 2004-05-13 | Munnelly Heidi M. | Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions |
US6846614B2 (en) * | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
US7056639B2 (en) * | 2001-08-21 | 2006-06-06 | Eastman Kodak Company | Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
EP1472574A4 (en) | 2001-11-15 | 2005-06-08 | Honeywell Int Inc | ANTI-REFLECTIVE COATINGS DESIGNED TO BE INSTALLED BY ROTATION FOR PHOTOLITHOGRAPHY |
US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
US7172850B2 (en) * | 2002-04-10 | 2007-02-06 | Eastman Kodak Company | Preparation of solvent-resistant binder for an imageable element |
JP2004126050A (ja) * | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US7338748B2 (en) * | 2002-09-30 | 2008-03-04 | Fujifilm Corporation | Polymerizable composition and planographic printing plate precursor |
JP4137577B2 (ja) * | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
CN100590525C (zh) * | 2002-12-18 | 2010-02-17 | 富士胶片株式会社 | 可聚合组合物和平版印刷版前体 |
JP4150261B2 (ja) * | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
JP4458778B2 (ja) * | 2003-02-20 | 2010-04-28 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版 |
JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
JP2004252285A (ja) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US6902866B1 (en) * | 2003-11-24 | 2005-06-07 | Gary Ganghui Teng | Thermosensitive lithographic printing plate comprising specific acrylate monomers |
DE102004003143A1 (de) * | 2004-01-21 | 2005-08-18 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
JP4411226B2 (ja) * | 2005-02-22 | 2010-02-10 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP4524235B2 (ja) * | 2005-03-29 | 2010-08-11 | 富士フイルム株式会社 | 平版印刷版原版 |
EP1862301B1 (en) * | 2006-06-02 | 2011-09-28 | FUJIFILM Corporation | Image recording material, planographic printing plate precursor, and planographic printing method using the same |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
JP5166016B2 (ja) * | 2007-12-28 | 2013-03-21 | 株式会社シンク・ラボラトリー | ネガ型感光性組成物 |
JP5155677B2 (ja) * | 2008-01-22 | 2013-03-06 | 富士フイルム株式会社 | 平版印刷版原版、およびその製版方法 |
US8084182B2 (en) | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
CN102510869B (zh) | 2009-09-15 | 2014-12-24 | 米兰集团 | 用于负性工作辐射敏感性平版印刷板的辐射敏感性涂料组合物的共聚物、包含所述共聚物的聚合颗粒和共聚粘合剂 |
US8329383B2 (en) * | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
KR101471310B1 (ko) | 2010-09-14 | 2014-12-09 | 밀란 그룹 | 포지티브형 서멀 리소그래픽 인쇄판을 위한 근적외선-감응 코팅 조성물용 코폴리머 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
EP2916171B1 (en) * | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
CN104788987B (zh) * | 2015-02-02 | 2017-06-09 | 北京印刷学院 | 链转移近红外染料及其高分子聚合乳液制备方法及应用 |
EP3067216B1 (en) * | 2015-03-10 | 2019-01-16 | Basf Se | Chromophoric compositions |
EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
CN105218806B (zh) * | 2015-11-02 | 2018-01-16 | 国网吉林省电力有限公司电力科学研究院 | 一种侧链含三唑基团的聚芳醚类聚合物及其制备方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4410621A (en) * | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
US4937159A (en) * | 1985-11-20 | 1990-06-26 | The Mead Corporation | Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers |
ES2096811T3 (es) | 1988-12-07 | 1997-03-16 | Kao Corp | Produccion de aminas alifaticas primarias. |
EP0672954B1 (en) | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates |
US5491046A (en) | 1995-02-10 | 1996-02-13 | Eastman Kodak Company | Method of imaging a lithographic printing plate |
EP0819985B1 (en) | 1996-07-19 | 2002-06-05 | Agfa-Gevaert | A radiation sensitive imaging element and a method for producing lithographic plates therewith |
US6060222A (en) * | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
EP0889363B1 (en) | 1997-07-03 | 2005-10-05 | E.I. Du Pont De Nemours And Company | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes |
JP3844853B2 (ja) | 1997-07-22 | 2006-11-15 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
JP2000086670A (ja) | 1997-08-26 | 2000-03-28 | Showa Denko Kk | 有機ホウ素酸塩の安定化剤および感光性組成物 |
US6352811B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
DE19906823C2 (de) * | 1999-02-18 | 2002-03-14 | Kodak Polychrome Graphics Gmbh | IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten |
US6391524B2 (en) * | 1999-11-19 | 2002-05-21 | Kodak Polychrome Graphics Llc | Article having imagable coatings |
US6309792B1 (en) * | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
US6660446B2 (en) * | 2000-05-30 | 2003-12-09 | Fuji Photo Film Co., Ltd. | Heat-sensitive composition and planographic printing plate |
US6864040B2 (en) * | 2001-04-11 | 2005-03-08 | Kodak Polychrome Graphics Llc | Thermal initiator system using leuco dyes and polyhalogene compounds |
US6846614B2 (en) * | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
JP2003114520A (ja) * | 2001-10-05 | 2003-04-18 | Fuji Photo Film Co Ltd | 光重合性組成物及びそれを用いた記録材料 |
-
2002
- 2002-04-25 US US10/131,866 patent/US6884568B2/en not_active Expired - Fee Related
-
2003
- 2003-04-24 WO PCT/EP2003/004271 patent/WO2003091022A1/en active IP Right Grant
- 2003-04-24 CN CNB038117975A patent/CN1329190C/zh not_active Expired - Fee Related
- 2003-04-24 AU AU2003233055A patent/AU2003233055A1/en not_active Abandoned
- 2003-04-24 DE DE60305683T patent/DE60305683T2/de not_active Expired - Lifetime
- 2003-04-24 EP EP03727351A patent/EP1497122B1/en not_active Expired - Lifetime
- 2003-04-24 AT AT03727351T patent/ATE327888T1/de not_active IP Right Cessation
- 2003-04-24 BR BR0309663-7A patent/BR0309663A/pt not_active Application Discontinuation
- 2003-04-24 JP JP2003587621A patent/JP2005523484A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
ATE327888T1 (de) | 2006-06-15 |
AU2003233055A1 (en) | 2003-11-10 |
US6884568B2 (en) | 2005-04-26 |
US20020197564A1 (en) | 2002-12-26 |
WO2003091022A1 (en) | 2003-11-06 |
EP1497122B1 (en) | 2006-05-31 |
CN1329190C (zh) | 2007-08-01 |
DE60305683D1 (de) | 2006-07-06 |
EP1497122A1 (en) | 2005-01-19 |
DE60305683T2 (de) | 2006-12-28 |
CN1655932A (zh) | 2005-08-17 |
JP2005523484A (ja) | 2005-08-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BR0309663A (pt) | Sistemas polimerizáveis sensìveis ao infravermelho estabilizados | |
PT699192E (pt) | Compostos oxazolilo substituidos para o tratamento de inflamacao | |
WO2003018022A8 (en) | 2-amino-4-heteroarylaminopyrimidine derivatives for use in the treatment of cancer | |
HUP0000657A2 (hu) | N-Arilszulfonil-piperidin-, -morfolin-hidroxámsav-származékok és ezeket tartalmazó gyógyszerkészítmények | |
RS93604A (en) | Substituted phenylacetamides and their use as glucokinase activators | |
IS7391A (is) | ACC hindrar | |
BR0110704A (pt) | Fenil - acetamidas substituìdas e seu uso como ativadores de glicocinase | |
MXPA06013125A (es) | Enzima recombinante con sensibilidad alterada a la retroalimentacion. | |
MY136764A (en) | Indole-3-carboxamides as glucokinase (gk) activators | |
ATE365551T1 (de) | Fusionierte heteroaryl-derivative zur verwendung als p38 kinase inhibitoren zur behandlung von u.a rheumatischer arthritis | |
MXPA04000646A (es) | Agente antiviral. | |
PE4896A1 (es) | Derivado de quinazolina | |
CY1114472T1 (el) | Ρυθμιστης του υποδοχεα κανναβινοειδων | |
AR003106A1 (es) | Compuestos anti-sida de piperadinil y piperazinil alquil substituidos. | |
DE60327750D1 (de) | Pde4-inhibitoren mit heterobrückensubstituiertem 8-arylchinolin | |
ES2133622T3 (es) | Herbicidas de tetrazolinona. | |
ECSP066658A (es) | Alfahidroxiamidas como antagonistas o agonistas inversos de bradiquinina | |
BRPI0500454A (pt) | Cilindro basculante | |
ATE330963T1 (de) | Amorphe feste modifikation von bis(2,4- dicumylphenyl) pentaerythritdiphosphit | |
WO2004047772A3 (en) | Catalytic antioxidants and methods of use | |
FI871693A (fi) | Foerfarande foer framstaellning av kefalosporinmellanprodukter. | |
FR2823131B1 (fr) | Procede d'elimination des molecules oxygenees organiques presentes dans un effluent organique, utilisant des agglomeres d'alumine | |
PE20060353A1 (es) | Combinacion farmaceutica antituberculosa que comprende n-(3-[[4-(3-trifluorometilfenil)piperazinil]metil]-2-metil-5-fenil-pirrolil)-4-piridilcarboxamida | |
BRPI0400012A (pt) | Métodos e sistemas para medir e controlar o oxidante estequiométrico percentual em um incinerador | |
SE0203700D0 (sv) | On-Growth Inhibiting Compounds |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |