BR0308846A - Sistema e métodos para preparação de reagentes vaporizados - Google Patents
Sistema e métodos para preparação de reagentes vaporizadosInfo
- Publication number
- BR0308846A BR0308846A BR0308846-4A BR0308846A BR0308846A BR 0308846 A BR0308846 A BR 0308846A BR 0308846 A BR0308846 A BR 0308846A BR 0308846 A BR0308846 A BR 0308846A
- Authority
- BR
- Brazil
- Prior art keywords
- chamber
- vapor
- vaporization chamber
- vaporization
- magnetically driven
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
- B01D1/222—In rotating vessels; vessels with movable parts
- B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
- B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
- B01D1/222—In rotating vessels; vessels with movable parts
- B01D1/228—In rotating vessels; vessels with movable parts horizontally placed cylindrical container or drum
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Sampling And Sample Adjustment (AREA)
- Physical Vapour Deposition (AREA)
Abstract
"SISTEMA E MéTODO PARA PREPARAçãO DE REAGENTES VAPORIZADOS". é realizada uma seleção de um ou mais precursores de revestimento (30). Uma câmara de vaporização (100) possui uma estrutura para injeção contínua do precursor de revestimento em estado líquido para o interior da câmara, para produção de um vapor (42). Uma parte desprovida de vedações, acionada magneticamente (24) realiza a rotação de uma estrutura para distribuição do precursor de revestimento em estado líquido no interior da câmara de vaporização. Em uma configuração, um gás de barreira (102) é injetado na adjacência da câmara a uma velocidade maior que a velocidade de difusão do vapor para impedir a ocorrência de uma comunicação do vapor com a parte acionada magneticamente. Em uma outra configuração, uma primeira parte da parte acionada magneticamente é acoplada a uma estrutura para distribuição do precursor de revestimento em estado líquido no interior da câmara de vaporização. A segunda parte, localizada em uma posição adjacente à primeira parte, porém fora da câmara de vaporização, acopla-se magneticamente à primeira parte e imprime uma rotação à mesma.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36911002P | 2002-03-29 | 2002-03-29 | |
PCT/US2003/008414 WO2003085164A1 (en) | 2002-03-29 | 2003-03-19 | Method and apparatus for preparing vaporized reactants for chemical vapor deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0308846A true BR0308846A (pt) | 2005-02-01 |
Family
ID=28791925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0308846-4A BR0308846A (pt) | 2002-03-29 | 2003-03-19 | Sistema e métodos para preparação de reagentes vaporizados |
Country Status (12)
Country | Link |
---|---|
US (2) | US6827974B2 (pt) |
EP (1) | EP1501964B1 (pt) |
JP (1) | JP4317459B2 (pt) |
KR (1) | KR20040101358A (pt) |
CN (1) | CN100443630C (pt) |
AT (1) | ATE356894T1 (pt) |
AU (1) | AU2003218262A1 (pt) |
BR (1) | BR0308846A (pt) |
DE (1) | DE60312504T2 (pt) |
MX (1) | MXPA04009247A (pt) |
RU (1) | RU2303078C2 (pt) |
WO (1) | WO2003085164A1 (pt) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7118783B2 (en) * | 2002-06-26 | 2006-10-10 | Micron Technology, Inc. | Methods and apparatus for vapor processing of micro-device workpieces |
US8133554B2 (en) | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
JP2007531236A (ja) * | 2004-05-18 | 2007-11-01 | メカロニクス カンパニー リミテッド | 有機発光層形成方法 |
US7699932B2 (en) | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
US20080260539A1 (en) * | 2005-10-07 | 2008-10-23 | Aker Kvaerner Subsea As | Apparatus and Method For Controlling Supply of Barrier Gas in a Compressor Module |
WO2007130447A2 (en) * | 2006-05-05 | 2007-11-15 | Pilkington Group Limited | Method for depositing zinc oxide coatings on flat glass |
US7736698B2 (en) * | 2006-05-05 | 2010-06-15 | Pilkington Group Limited | Method of depositing zinc oxide coatings on a substrate |
WO2008027086A1 (en) * | 2006-08-29 | 2008-03-06 | Pilkington Group Limited | Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby |
FR2927146B1 (fr) * | 2008-02-06 | 2010-03-26 | Air Liquide | Systeme de chauffage de stockages des gaz liquefies sous pression |
DE102010016926A1 (de) | 2009-05-16 | 2010-12-30 | Eichler Gmbh & Co.Kg | Verfahren und Beschichtungsanlage zur elektrostatischen Lackierung (Pulverbeschichtung) von elektrisch nicht leitenden Teilen |
EP2533905B1 (en) | 2010-02-10 | 2018-07-04 | Dresser-Rand Company | Separator fluid collector and method |
WO2012009159A2 (en) | 2010-07-15 | 2012-01-19 | Dresser-Rand Company | Radial vane pack for rotary separators |
US8673159B2 (en) | 2010-07-15 | 2014-03-18 | Dresser-Rand Company | Enhanced in-line rotary separator |
WO2012012018A2 (en) | 2010-07-20 | 2012-01-26 | Dresser-Rand Company | Combination of expansion and cooling to enhance separation |
US8821362B2 (en) | 2010-07-21 | 2014-09-02 | Dresser-Rand Company | Multiple modular in-line rotary separator bundle |
EP2614216B1 (en) | 2010-09-09 | 2017-11-15 | Dresser-Rand Company | Flush-enabled controlled flow drain |
US20120276291A1 (en) * | 2011-04-28 | 2012-11-01 | Bird Chester D | Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization |
JP6559423B2 (ja) | 2011-08-05 | 2019-08-14 | スリーエム イノベイティブ プロパティズ カンパニー | 蒸気を処理するためのシステム及び方法 |
US9156041B1 (en) * | 2012-05-07 | 2015-10-13 | The United States Of America As Represented By The Secretary Of The Army | Dimethylmethylphosphonate vapor generator |
US11517831B2 (en) | 2019-06-25 | 2022-12-06 | George Andrew Rabroker | Abatement system for pyrophoric chemicals and method of use |
CN110965046B (zh) * | 2019-12-31 | 2024-05-28 | 威海中玻新材料技术研发有限公司 | 超薄液膜旋离式汽化装置 |
CN117959738B (zh) * | 2024-04-02 | 2024-06-04 | 山西兴源盛科技有限公司 | 一种氯化钙生产用蒸发装置 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL123626C (pt) | 1961-02-08 | |||
US3932068A (en) * | 1966-10-04 | 1976-01-13 | March Manufacturing Company | Magnetically-coupled pump |
FR1570922A (pt) * | 1967-06-22 | 1969-06-13 | ||
US3795386A (en) * | 1971-08-16 | 1974-03-05 | Monsanto Co | Shaft seal for low and high pressures |
JPS5659112A (en) | 1979-10-18 | 1981-05-22 | Matsushita Electric Ind Co Ltd | Liquid fuel combustor |
US4790911A (en) | 1987-03-10 | 1988-12-13 | Martin Parkinson | Solvent evaporator |
US4913777A (en) | 1987-12-11 | 1990-04-03 | Martin Parkinson | Solvent evaporator |
US5090985A (en) | 1989-10-17 | 1992-02-25 | Libbey-Owens-Ford Co. | Method for preparing vaporized reactants for chemical vapor deposition |
US5324540A (en) * | 1992-08-17 | 1994-06-28 | Tokyo Electron Limited | System and method for supporting and rotating substrates in a process chamber |
KR100190310B1 (ko) * | 1992-09-03 | 1999-06-01 | 모리시따 요오이찌 | 진공배기장치 |
JPH06196419A (ja) | 1992-12-24 | 1994-07-15 | Canon Inc | 化学気相堆積装置及びそれによる半導体装置の製造方法 |
TW322602B (pt) * | 1996-04-05 | 1997-12-11 | Ehara Seisakusho Kk | |
JPH1018041A (ja) * | 1996-07-02 | 1998-01-20 | Ebara Corp | 液体原料気化装置 |
JP3717014B2 (ja) | 1996-08-06 | 2005-11-16 | 富士写真フイルム株式会社 | 撹拌装置 |
JP3645682B2 (ja) * | 1997-03-18 | 2005-05-11 | 三菱電機株式会社 | Cu成膜用CVD装置 |
JPH10339275A (ja) * | 1997-06-05 | 1998-12-22 | Toru Imai | 軸受装置 |
FR2779361B1 (fr) | 1998-06-05 | 2000-07-28 | Mixel | Agitateur a entrainement magnetique |
JP3579278B2 (ja) | 1999-01-26 | 2004-10-20 | 東京エレクトロン株式会社 | 縦型熱処理装置及びシール装置 |
US6280157B1 (en) | 1999-06-29 | 2001-08-28 | Flowserve Management Company | Sealless integral-motor pump with regenerative impeller disk |
-
2003
- 2003-02-28 US US10/376,894 patent/US6827974B2/en not_active Expired - Lifetime
- 2003-03-19 JP JP2003582333A patent/JP4317459B2/ja not_active Expired - Lifetime
- 2003-03-19 EP EP03714256A patent/EP1501964B1/en not_active Expired - Lifetime
- 2003-03-19 AT AT03714256T patent/ATE356894T1/de not_active IP Right Cessation
- 2003-03-19 BR BR0308846-4A patent/BR0308846A/pt not_active IP Right Cessation
- 2003-03-19 MX MXPA04009247A patent/MXPA04009247A/es active IP Right Grant
- 2003-03-19 WO PCT/US2003/008414 patent/WO2003085164A1/en active IP Right Grant
- 2003-03-19 KR KR10-2004-7015103A patent/KR20040101358A/ko not_active Application Discontinuation
- 2003-03-19 CN CNB038119498A patent/CN100443630C/zh not_active Expired - Lifetime
- 2003-03-19 AU AU2003218262A patent/AU2003218262A1/en not_active Abandoned
- 2003-03-19 DE DE60312504T patent/DE60312504T2/de not_active Expired - Lifetime
- 2003-03-19 RU RU2004131823/02A patent/RU2303078C2/ru active
-
2004
- 2004-09-24 US US10/948,902 patent/US7596305B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20040101358A (ko) | 2004-12-02 |
CN100443630C (zh) | 2008-12-17 |
EP1501964A1 (en) | 2005-02-02 |
AU2003218262A1 (en) | 2003-10-20 |
US20030185979A1 (en) | 2003-10-02 |
MXPA04009247A (es) | 2005-01-25 |
US7596305B2 (en) | 2009-09-29 |
DE60312504D1 (de) | 2007-04-26 |
JP4317459B2 (ja) | 2009-08-19 |
RU2004131823A (ru) | 2005-10-10 |
EP1501964B1 (en) | 2007-03-14 |
ATE356894T1 (de) | 2007-04-15 |
JP2005521796A (ja) | 2005-07-21 |
US6827974B2 (en) | 2004-12-07 |
WO2003085164A1 (en) | 2003-10-16 |
CN1656248A (zh) | 2005-08-17 |
DE60312504T2 (de) | 2007-11-22 |
RU2303078C2 (ru) | 2007-07-20 |
US20050066894A1 (en) | 2005-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 8A E 9A ANUIDADE(S). |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: NAO APRESENTADA A GUIA DE CUMPRIMENTO DE EXIGENCIA. REFERENTE AS 8A E 9A ANUIDADES. |