BR0308846A - Sistema e métodos para preparação de reagentes vaporizados - Google Patents

Sistema e métodos para preparação de reagentes vaporizados

Info

Publication number
BR0308846A
BR0308846A BR0308846-4A BR0308846A BR0308846A BR 0308846 A BR0308846 A BR 0308846A BR 0308846 A BR0308846 A BR 0308846A BR 0308846 A BR0308846 A BR 0308846A
Authority
BR
Brazil
Prior art keywords
chamber
vapor
vaporization chamber
vaporization
magnetically driven
Prior art date
Application number
BR0308846-4A
Other languages
English (en)
Inventor
Douglas M Nelson
Original Assignee
Pilkington North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington North America Inc filed Critical Pilkington North America Inc
Publication of BR0308846A publication Critical patent/BR0308846A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/228—In rotating vessels; vessels with movable parts horizontally placed cylindrical container or drum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

"SISTEMA E MéTODO PARA PREPARAçãO DE REAGENTES VAPORIZADOS". é realizada uma seleção de um ou mais precursores de revestimento (30). Uma câmara de vaporização (100) possui uma estrutura para injeção contínua do precursor de revestimento em estado líquido para o interior da câmara, para produção de um vapor (42). Uma parte desprovida de vedações, acionada magneticamente (24) realiza a rotação de uma estrutura para distribuição do precursor de revestimento em estado líquido no interior da câmara de vaporização. Em uma configuração, um gás de barreira (102) é injetado na adjacência da câmara a uma velocidade maior que a velocidade de difusão do vapor para impedir a ocorrência de uma comunicação do vapor com a parte acionada magneticamente. Em uma outra configuração, uma primeira parte da parte acionada magneticamente é acoplada a uma estrutura para distribuição do precursor de revestimento em estado líquido no interior da câmara de vaporização. A segunda parte, localizada em uma posição adjacente à primeira parte, porém fora da câmara de vaporização, acopla-se magneticamente à primeira parte e imprime uma rotação à mesma.
BR0308846-4A 2002-03-29 2003-03-19 Sistema e métodos para preparação de reagentes vaporizados BR0308846A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US36911002P 2002-03-29 2002-03-29
PCT/US2003/008414 WO2003085164A1 (en) 2002-03-29 2003-03-19 Method and apparatus for preparing vaporized reactants for chemical vapor deposition

Publications (1)

Publication Number Publication Date
BR0308846A true BR0308846A (pt) 2005-02-01

Family

ID=28791925

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0308846-4A BR0308846A (pt) 2002-03-29 2003-03-19 Sistema e métodos para preparação de reagentes vaporizados

Country Status (12)

Country Link
US (2) US6827974B2 (pt)
EP (1) EP1501964B1 (pt)
JP (1) JP4317459B2 (pt)
KR (1) KR20040101358A (pt)
CN (1) CN100443630C (pt)
AT (1) ATE356894T1 (pt)
AU (1) AU2003218262A1 (pt)
BR (1) BR0308846A (pt)
DE (1) DE60312504T2 (pt)
MX (1) MXPA04009247A (pt)
RU (1) RU2303078C2 (pt)
WO (1) WO2003085164A1 (pt)

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US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
JP2007531236A (ja) * 2004-05-18 2007-11-01 メカロニクス カンパニー リミテッド 有機発光層形成方法
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US20080260539A1 (en) * 2005-10-07 2008-10-23 Aker Kvaerner Subsea As Apparatus and Method For Controlling Supply of Barrier Gas in a Compressor Module
WO2007130447A2 (en) * 2006-05-05 2007-11-15 Pilkington Group Limited Method for depositing zinc oxide coatings on flat glass
US7736698B2 (en) * 2006-05-05 2010-06-15 Pilkington Group Limited Method of depositing zinc oxide coatings on a substrate
WO2008027086A1 (en) * 2006-08-29 2008-03-06 Pilkington Group Limited Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby
FR2927146B1 (fr) * 2008-02-06 2010-03-26 Air Liquide Systeme de chauffage de stockages des gaz liquefies sous pression
DE102010016926A1 (de) 2009-05-16 2010-12-30 Eichler Gmbh & Co.Kg Verfahren und Beschichtungsanlage zur elektrostatischen Lackierung (Pulverbeschichtung) von elektrisch nicht leitenden Teilen
EP2533905B1 (en) 2010-02-10 2018-07-04 Dresser-Rand Company Separator fluid collector and method
WO2012009159A2 (en) 2010-07-15 2012-01-19 Dresser-Rand Company Radial vane pack for rotary separators
US8673159B2 (en) 2010-07-15 2014-03-18 Dresser-Rand Company Enhanced in-line rotary separator
WO2012012018A2 (en) 2010-07-20 2012-01-26 Dresser-Rand Company Combination of expansion and cooling to enhance separation
US8821362B2 (en) 2010-07-21 2014-09-02 Dresser-Rand Company Multiple modular in-line rotary separator bundle
EP2614216B1 (en) 2010-09-09 2017-11-15 Dresser-Rand Company Flush-enabled controlled flow drain
US20120276291A1 (en) * 2011-04-28 2012-11-01 Bird Chester D Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization
JP6559423B2 (ja) 2011-08-05 2019-08-14 スリーエム イノベイティブ プロパティズ カンパニー 蒸気を処理するためのシステム及び方法
US9156041B1 (en) * 2012-05-07 2015-10-13 The United States Of America As Represented By The Secretary Of The Army Dimethylmethylphosphonate vapor generator
US11517831B2 (en) 2019-06-25 2022-12-06 George Andrew Rabroker Abatement system for pyrophoric chemicals and method of use
CN110965046B (zh) * 2019-12-31 2024-05-28 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
CN117959738B (zh) * 2024-04-02 2024-06-04 山西兴源盛科技有限公司 一种氯化钙生产用蒸发装置

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US3932068A (en) * 1966-10-04 1976-01-13 March Manufacturing Company Magnetically-coupled pump
FR1570922A (pt) * 1967-06-22 1969-06-13
US3795386A (en) * 1971-08-16 1974-03-05 Monsanto Co Shaft seal for low and high pressures
JPS5659112A (en) 1979-10-18 1981-05-22 Matsushita Electric Ind Co Ltd Liquid fuel combustor
US4790911A (en) 1987-03-10 1988-12-13 Martin Parkinson Solvent evaporator
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US5090985A (en) 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5324540A (en) * 1992-08-17 1994-06-28 Tokyo Electron Limited System and method for supporting and rotating substrates in a process chamber
KR100190310B1 (ko) * 1992-09-03 1999-06-01 모리시따 요오이찌 진공배기장치
JPH06196419A (ja) 1992-12-24 1994-07-15 Canon Inc 化学気相堆積装置及びそれによる半導体装置の製造方法
TW322602B (pt) * 1996-04-05 1997-12-11 Ehara Seisakusho Kk
JPH1018041A (ja) * 1996-07-02 1998-01-20 Ebara Corp 液体原料気化装置
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JP3645682B2 (ja) * 1997-03-18 2005-05-11 三菱電機株式会社 Ｃｕ成膜用ＣＶＤ装置
JPH10339275A (ja) * 1997-06-05 1998-12-22 Toru Imai 軸受装置
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Also Published As

Publication number Publication date
KR20040101358A (ko) 2004-12-02
CN100443630C (zh) 2008-12-17
EP1501964A1 (en) 2005-02-02
AU2003218262A1 (en) 2003-10-20
US20030185979A1 (en) 2003-10-02
MXPA04009247A (es) 2005-01-25
US7596305B2 (en) 2009-09-29
DE60312504D1 (de) 2007-04-26
JP4317459B2 (ja) 2009-08-19
RU2004131823A (ru) 2005-10-10
EP1501964B1 (en) 2007-03-14
ATE356894T1 (de) 2007-04-15
JP2005521796A (ja) 2005-07-21
US6827974B2 (en) 2004-12-07
WO2003085164A1 (en) 2003-10-16
CN1656248A (zh) 2005-08-17
DE60312504T2 (de) 2007-11-22
RU2303078C2 (ru) 2007-07-20
US20050066894A1 (en) 2005-03-31

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 8A E 9A ANUIDADE(S).

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: NAO APRESENTADA A GUIA DE CUMPRIMENTO DE EXIGENCIA. REFERENTE AS 8A E 9A ANUIDADES.