BG26402A3 - - Google Patents

Info

Publication number
BG26402A3
BG26402A3 BG7530068A BG3006875A BG26402A3 BG 26402 A3 BG26402 A3 BG 26402A3 BG 7530068 A BG7530068 A BG 7530068A BG 3006875 A BG3006875 A BG 3006875A BG 26402 A3 BG26402 A3 BG 26402A3
Authority
BG
Bulgaria
Application number
BG7530068A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BG26402A3 publication Critical patent/BG26402A3/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10Epoxy resins modified by unsaturated compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/443Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from vinylhalogenides or other halogenoethylenic compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/447Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from acrylic compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/4981Utilizing transitory attached element or associated separate material
    • Y10T29/49812Temporary protective coating, impregnation, or cast layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Chemically Coating (AREA)
BG7530068A 1974-05-24 1975-05-23 BG26402A3 (US07122547-20061017-C00273.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/473,180 US4003877A (en) 1974-05-24 1974-05-24 Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions

Publications (1)

Publication Number Publication Date
BG26402A3 true BG26402A3 (US07122547-20061017-C00273.png) 1979-03-15

Family

ID=23878521

Family Applications (1)

Application Number Title Priority Date Filing Date
BG7530068A BG26402A3 (US07122547-20061017-C00273.png) 1974-05-24 1975-05-23

Country Status (24)

Country Link
US (2) US4003877A (US07122547-20061017-C00273.png)
JP (1) JPS515388A (US07122547-20061017-C00273.png)
AR (1) AR217039A1 (US07122547-20061017-C00273.png)
AT (1) AT339928B (US07122547-20061017-C00273.png)
BE (1) BE829437A (US07122547-20061017-C00273.png)
BG (1) BG26402A3 (US07122547-20061017-C00273.png)
BR (1) BR7503276A (US07122547-20061017-C00273.png)
CA (1) CA1049691A (US07122547-20061017-C00273.png)
CH (1) CH608825A5 (US07122547-20061017-C00273.png)
DD (2) DD120662A5 (US07122547-20061017-C00273.png)
DE (1) DE2522811C2 (US07122547-20061017-C00273.png)
DK (1) DK154919C (US07122547-20061017-C00273.png)
ES (1) ES437825A1 (US07122547-20061017-C00273.png)
FI (1) FI59112C (US07122547-20061017-C00273.png)
FR (1) FR2274652A1 (US07122547-20061017-C00273.png)
GB (1) GB1507842A (US07122547-20061017-C00273.png)
IL (1) IL47310A (US07122547-20061017-C00273.png)
IN (1) IN142791B (US07122547-20061017-C00273.png)
IT (1) IT1035820B (US07122547-20061017-C00273.png)
NL (1) NL173178B (US07122547-20061017-C00273.png)
NO (1) NO146676C (US07122547-20061017-C00273.png)
RO (1) RO67457A (US07122547-20061017-C00273.png)
SE (1) SE431879B (US07122547-20061017-C00273.png)
ZA (1) ZA753049B (US07122547-20061017-C00273.png)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5296690A (en) * 1976-02-10 1977-08-13 Dainippon Ink & Chem Inc Rapidly curable photo-setting resin composition
US4234676A (en) * 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
EP0002040B1 (de) * 1977-11-21 1981-12-30 Ciba-Geigy Ag Verfahren zur Herstellung von Lötstoppmasken auf gedruckten Schaltungen mit Druckkontaktierungsbohrungen
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
US4322457A (en) * 1978-01-25 1982-03-30 Western Electric Co., Inc. Method of selectively depositing a metal on a surface
US4381951A (en) * 1978-01-25 1983-05-03 Western Electric Co. Inc. Method of removing contaminants from a surface
JPS54105774A (en) * 1978-02-08 1979-08-20 Hitachi Ltd Method of forming pattern on thin film hybrid integrated circuit
JPS5953164B2 (ja) * 1978-04-13 1984-12-24 日本文化精工株式会社 印刷とメツキとによるプラスチツク製品の加飾方法
JPS54158661A (en) * 1978-06-01 1979-12-14 Tokyo Purinto Kougiyou Kk Printed circuit board
GB2030584B (en) * 1978-10-03 1983-03-23 Lankro Chem Ltd Photopolymerisable solder resist compositions
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
US4486466A (en) * 1979-01-12 1984-12-04 Kollmorgen Technologies Corporation High resolution screen printable resists
US4240945A (en) * 1979-01-31 1980-12-23 Albert Gabrick Solder mask composition
US4345371A (en) * 1979-03-14 1982-08-24 Sony Corporation Method and apparatus for manufacturing hybrid integrated circuits
JPS55127097A (en) * 1979-03-20 1980-10-01 Matsushita Electric Ind Co Ltd Photocurable resin composition and solder resist
GB2050946B (en) * 1979-05-30 1983-02-16 Tdk Electronics Co Ltd Hot melt screen printing machine and process for producing a screen printing plate
US4376815A (en) * 1979-10-22 1983-03-15 Oddi Michael J Method of applying photoresist by screening in the formation of printed circuits
US4390615A (en) * 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4416974A (en) * 1979-12-05 1983-11-22 Hercules Incorporated Radiation curable ceramic pigment composition
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
US4252888A (en) * 1980-02-26 1981-02-24 Minnesota Mining And Manufacturing Company Solder mask composition
JPS6045665B2 (ja) * 1980-04-21 1985-10-11 日立化成工業株式会社 実装回路板用防湿絶縁塗料組成物
JPS573875A (en) * 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition
US4490457A (en) * 1980-11-28 1984-12-25 Honeywell Inc. Cold/dry substrate treatment technique which improves photolithographic limits of resolution and exposure tolerance
JPS5888741A (ja) * 1981-11-20 1983-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
JPS58177492A (ja) * 1982-04-12 1983-10-18 Tadao Mutou プラスチツク成形品に部分的な金属メツキを施す方法
US4522914A (en) * 1982-10-22 1985-06-11 Wabash College Imaging method of making a raised line facsimile of a photographic image
JPS59204036A (ja) * 1983-05-06 1984-11-19 Dainippon Ink & Chem Inc レジストパタ−ンの形成法
US4533445A (en) * 1983-07-06 1985-08-06 Shipley Company Inc. U.V. Curable composition
US4775611A (en) * 1983-11-10 1988-10-04 Sullivan Donald F Additive printed circuit boards with flat surface and indented primary wiring conductors
US4640719A (en) * 1985-07-01 1987-02-03 Petroleum Fermentations N.V. Method for printed circuit board and/or printed wiring board cleaning
AT389793B (de) * 1986-03-25 1990-01-25 Philips Nv Leiterplatte fuer gedruckte schaltungen und verfahren zur herstellung solcher leiterplatten
US4690833A (en) * 1986-03-28 1987-09-01 International Business Machines Corporation Providing circuit lines on a substrate
US4826705A (en) * 1986-07-02 1989-05-02 Loctite Corporation Radiation curable temporary solder mask
JPH0688012B2 (ja) * 1986-07-02 1994-11-09 ロクタイト.コーポレーション 放射線硬化性マスキング組成物
JPS6462375A (en) * 1987-09-02 1989-03-08 Arakawa Chem Ind Liquid photosolder resist ink composition of alkali development type
GB2214191B (en) * 1988-01-12 1990-10-31 Sicpa Holding Sa Reversibly photochromic printing inks
EP0346522A3 (en) * 1988-06-16 1991-04-03 Nippon CMK Corp. Printed wiring board
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
US5206116A (en) * 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
DE4316087A1 (de) * 1993-05-13 1994-11-17 Morton Int Inc Verfahren zum bildmäßigen Metallisieren von strukturierten Leiterplatten
US5458921A (en) 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions
US5545440A (en) * 1994-12-05 1996-08-13 At&T Global Information Solutions Company (Aka Ncr Corporation) Method and apparatus for polymer coating of substrates
US5802713A (en) * 1995-01-20 1998-09-08 Fairchild Space And Defense Corportion Circuit board manufacturing method
US5939239A (en) * 1997-12-01 1999-08-17 Nichigo-Morton Co., Ltd. Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers
US5952153A (en) * 1997-12-01 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility, adhesion and stripping characteristics
US5939238A (en) * 1998-06-02 1999-08-17 Morton International, Inc. Photoimageable composition having improved photoinitiator system
US5952154A (en) * 1998-05-29 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility
DE19842276A1 (de) * 1998-09-16 2000-03-30 Bosch Gmbh Robert Paste zum Verschweißen von Keramiken mit Metallen und Verfahren zur Herstellung einer Schweißverbindung
JP2000118113A (ja) * 1998-10-15 2000-04-25 Riso Kagaku Corp 孔版印刷方法及び装置
JP4098631B2 (ja) * 2001-02-08 2008-06-11 コンストラクション リサーチ アンド テクノロジー ゲーエムベーハー 構造支持ポリマー膜材
US20030119955A1 (en) * 2001-02-08 2003-06-26 Mbt Holding Ag Polymeric structural support membrane
US6855480B2 (en) 2001-04-19 2005-02-15 Shipley Company, L.L.C. Photoresist composition
TW511423B (en) * 2001-09-25 2002-11-21 Benq Corp Soft circuit board for recognition and the manufacturing method thereof
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
EP1845119B1 (en) * 2005-02-04 2009-04-01 Denki Kagaku Kogyo Kabushiki Kaisha Resin compositions, cured article obtained therefrom, and sheet
US7579134B2 (en) * 2005-03-15 2009-08-25 E. I. Dupont De Nemours And Company Polyimide composite coverlays and methods and compositions relating thereto
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto
US7527915B2 (en) * 2006-07-19 2009-05-05 E. I. Du Pont De Nemours And Company Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
EP2256167B1 (en) 2008-03-03 2018-08-22 Asahi Kasei Kabushiki Kaisha Flame-retardant resin composition
TWI353808B (en) * 2008-04-28 2011-12-01 Ind Tech Res Inst Method for fabricating conductive pattern on flexi
EP2359395B1 (en) * 2008-11-25 2013-08-14 Lord Corporation Methods for protecting a die surface with photocurable materials
US9093448B2 (en) 2008-11-25 2015-07-28 Lord Corporation Methods for protecting a die surface with photocurable materials
US20130029046A1 (en) * 2010-04-09 2013-01-31 Basf Se Printing ink containing a divinyl ester
US8344172B2 (en) * 2011-03-25 2013-01-01 Stepan Company Preparation of antiplasticizers for thermoplastic polyesters
KR101560111B1 (ko) 2011-12-28 2015-10-13 아사히 가세이 이-매터리얼즈 가부시키가이샤 레독스 플로우 이차 전지 및 레독스 플로우 이차 전지용 전해질막
GB201223064D0 (en) * 2012-12-20 2013-02-06 Rainbow Technology Systems Ltd Curable coatings for photoimaging
EP3044274A1 (en) * 2013-09-13 2016-07-20 Basf Se Scratch-resistant radiation-cured coatings
DE102014106230A1 (de) * 2014-05-05 2015-11-05 Preh Gmbh Galvanisierverfahren für Inselstrukturen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3066112A (en) * 1959-01-30 1962-11-27 Rafael L Bowen Dental filling material comprising vinyl silane treated fused silica and a binder consisting of the reaction product of bis phenol and glycidyl acrylate
US3539533A (en) * 1968-06-14 1970-11-10 Johnson & Johnson Dental filling material
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US3772062A (en) * 1971-11-16 1973-11-13 Inmont Corp Ultra-violet curable coating compositions
JPS5414605B2 (US07122547-20061017-C00273.png) * 1972-07-05 1979-06-08
JPS5625441B2 (US07122547-20061017-C00273.png) * 1972-09-04 1981-06-12
JPS535712B2 (US07122547-20061017-C00273.png) * 1973-01-24 1978-03-01
DE2349979A1 (de) * 1973-10-04 1975-04-17 Bayer Ag Uv-licht-haertende massen hoher reaktivitaet

Also Published As

Publication number Publication date
DE2522811A1 (de) 1975-11-27
FR2274652A1 (fr) 1976-01-09
US4064287A (en) 1977-12-20
NL173178B (nl) 1983-07-18
SE431879B (sv) 1984-03-05
CA1049691A (en) 1979-02-27
RO67457A (ro) 1981-07-30
US4003877A (en) 1977-01-18
CH608825A5 (US07122547-20061017-C00273.png) 1979-01-31
SE7505838L (sv) 1975-12-11
NL7506080A (nl) 1975-11-26
DK154919B (da) 1989-01-02
JPS515388A (en) 1976-01-17
BR7503276A (pt) 1976-04-27
BE829437A (fr) 1975-09-15
FR2274652B1 (US07122547-20061017-C00273.png) 1979-01-19
DE2522811C2 (de) 1983-01-13
NO146676C (no) 1982-11-17
DD120662A5 (US07122547-20061017-C00273.png) 1976-06-20
FI59112C (fi) 1981-06-10
AU8112875A (en) 1976-11-18
FI59112B (fi) 1981-02-27
ATA400775A (de) 1977-03-15
AR217039A1 (es) 1980-02-29
NO751830L (US07122547-20061017-C00273.png) 1975-11-25
DD124390A5 (US07122547-20061017-C00273.png) 1977-02-16
AT339928B (de) 1977-11-10
IL47310A0 (en) 1975-07-28
DK227875A (da) 1975-11-25
IT1035820B (it) 1979-10-20
GB1507842A (en) 1978-04-19
DK154919C (da) 1989-05-29
ZA753049B (en) 1976-04-28
NO146676B (no) 1982-08-09
ES437825A1 (es) 1977-07-01
FI751475A (US07122547-20061017-C00273.png) 1975-11-25
IN142791B (US07122547-20061017-C00273.png) 1977-08-27
IL47310A (en) 1978-07-31

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