BE896083A - Traitement electrochimique du cuivre pour ameliorer sa resistance de liaison - Google Patents
Traitement electrochimique du cuivre pour ameliorer sa resistance de liaisonInfo
- Publication number
- BE896083A BE896083A BE0/210260A BE210260A BE896083A BE 896083 A BE896083 A BE 896083A BE 0/210260 A BE0/210260 A BE 0/210260A BE 210260 A BE210260 A BE 210260A BE 896083 A BE896083 A BE 896083A
- Authority
- BE
- Belgium
- Prior art keywords
- copper
- electrochemical treatment
- improve binding
- binding resistance
- resistance
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/09—Wave forms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12472—Microscopic interfacial wave or roughness
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12993—Surface feature [e.g., rough, mirror]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Thermal Sciences (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35505382A | 1982-03-05 | 1982-03-05 | |
US06/460,630 US4468293A (en) | 1982-03-05 | 1983-01-24 | Electrochemical treatment of copper for improving its bond strength |
Publications (1)
Publication Number | Publication Date |
---|---|
BE896083A true BE896083A (fr) | 1983-09-05 |
Family
ID=26998684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE0/210260A BE896083A (fr) | 1982-03-05 | 1983-03-04 | Traitement electrochimique du cuivre pour ameliorer sa resistance de liaison |
Country Status (10)
Country | Link |
---|---|
US (1) | US4468293A (fr) |
BE (1) | BE896083A (fr) |
CA (1) | CA1212071A (fr) |
DE (1) | DE3307748A1 (fr) |
FR (1) | FR2522693B1 (fr) |
GB (1) | GB2116213B (fr) |
HK (1) | HK71687A (fr) |
MY (1) | MY8700715A (fr) |
NL (1) | NL187643C (fr) |
SG (1) | SG44487G (fr) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8333753D0 (en) * | 1983-12-19 | 1984-01-25 | Thorpe J E | Dielectric boards |
US4549940A (en) * | 1984-04-23 | 1985-10-29 | Karwan Steven J | Method for surface treating copper foil |
JPS6113688A (ja) * | 1984-06-28 | 1986-01-21 | 福田金属箔粉工業株式会社 | 印刷回路用銅箔およびその製造方法 |
US4549941A (en) * | 1984-11-13 | 1985-10-29 | Olin Corporation | Electrochemical surface preparation for improving the adhesive properties of metallic surfaces |
US4552627A (en) * | 1984-11-13 | 1985-11-12 | Olin Corporation | Preparation for improving the adhesion properties of metal foils |
US4532014A (en) * | 1984-11-13 | 1985-07-30 | Olin Corporation | Laser alignment system |
US4549950A (en) * | 1984-11-13 | 1985-10-29 | Olin Corporation | Systems for producing electroplated and/or treated metal foil |
US4551210A (en) * | 1984-11-13 | 1985-11-05 | Olin Corporation | Dendritic treatment of metallic surfaces for improving adhesive bonding |
US4568431A (en) * | 1984-11-13 | 1986-02-04 | Olin Corporation | Process for producing electroplated and/or treated metal foil |
US4652346A (en) * | 1984-12-31 | 1987-03-24 | Olin Corporation | Apparatus and process for the continuous plating of wide delicate metal foil |
US4647315A (en) * | 1985-07-01 | 1987-03-03 | Olin Corporation | Copper stainproofing technique |
DE3626341A1 (de) * | 1986-08-02 | 1988-02-04 | Varta Batterie | Verfahren zur herstellung von elektrisch leitfaehigen organischen polymerverbindungen als elektrodenmaterialien fuer wiederaufladbare galvanische elemente in form dicker filme |
US4692221A (en) * | 1986-12-22 | 1987-09-08 | Olin Corporation | In-situ dendritic treatment of electrodeposited foil |
US5326454A (en) * | 1987-08-26 | 1994-07-05 | Martin Marietta Corporation | Method of forming electrodeposited anti-reflective surface coatings |
US4888449A (en) * | 1988-01-04 | 1989-12-19 | Olin Corporation | Semiconductor package |
US5185073A (en) * | 1988-06-21 | 1993-02-09 | International Business Machines Corporation | Method of fabricating nendritic materials |
US5057193A (en) * | 1989-04-05 | 1991-10-15 | Olin Corporation | Anti-tarnish treatment of metal foil |
US4961828A (en) * | 1989-04-05 | 1990-10-09 | Olin Corporation | Treatment of metal foil |
US4952285A (en) * | 1989-04-14 | 1990-08-28 | Olin Corporation | Anti-tarnish treatment of metal foil |
US5181770A (en) * | 1989-04-19 | 1993-01-26 | Olin Corporation | Surface topography optimization through control of chloride concentration in electroformed copper foil |
US5230932A (en) * | 1989-10-13 | 1993-07-27 | Olin Corporation | Chromium-zinc anti-tarnish coating for copper foil |
US5098796A (en) * | 1989-10-13 | 1992-03-24 | Olin Corporation | Chromium-zinc anti-tarnish coating on copper foil |
US5250363A (en) * | 1989-10-13 | 1993-10-05 | Olin Corporation | Chromium-zinc anti-tarnish coating for copper foil having a dark color |
US5022968A (en) * | 1990-09-20 | 1991-06-11 | Olin Corporation | Method and composition for depositing a chromium-zinc anti-tarnish coating on copper foil |
US5071520A (en) * | 1989-10-30 | 1991-12-10 | Olin Corporation | Method of treating metal foil to improve peel strength |
US5164235A (en) * | 1990-03-06 | 1992-11-17 | Olin Corporation | Anti-tarnish treatment of metal foil |
US5066366A (en) * | 1990-05-04 | 1991-11-19 | Olin Corporation | Method for making foil |
TW208110B (fr) * | 1990-06-08 | 1993-06-21 | Furukawa Circuit Foil Kk | |
KR100297179B1 (ko) * | 1990-07-02 | 2002-12-26 | 올린 코포레이션 | 구리또는구리계합금호일을크롬-아년이온으로전착처리하여당해호일에내변색성을부여하는방법및구리또는구리계합금호일에변색방지막을전착시키기위한염기성전해질수용액 |
DE4334122C2 (de) * | 1992-04-09 | 1995-11-23 | Wmv Ag | Verfahren zum elektrochemischen Aufbringen einer Oberflächenbeschichtung und Anwendung des Verfahrens |
DE4211881C2 (de) * | 1992-04-09 | 1994-07-28 | Wmv Ag | Verfahren zum elektrochemischen Aufbringen einer strukturierten Oberflächenbeschichtung |
US5779870A (en) * | 1993-03-05 | 1998-07-14 | Polyclad Laminates, Inc. | Method of manufacturing laminates and printed circuit boards |
US5958207A (en) * | 1994-10-01 | 1999-09-28 | Heidelberger Druckmaschinen Ag | Process for applying a surface coating |
AU7784794A (en) * | 1993-10-07 | 1995-05-01 | Heidelberger Druckmaschinen Aktiengesellschaft | Process for the galvanic application of a surface coating |
TW317575B (fr) * | 1994-01-21 | 1997-10-11 | Olin Corp | |
JP3709221B2 (ja) * | 1994-10-06 | 2005-10-26 | 古河サーキットフォイル株式会社 | 銅箔の表面粗化処理方法 |
US5573845A (en) * | 1994-12-09 | 1996-11-12 | Olin Corporation | Superficial coating layer having acicular structures for electrical conductors |
DE19502470A1 (de) * | 1995-01-27 | 1996-08-01 | Basf Lacke & Farben | Pulsmoduliertes Gleichspannungsapplikationsverfahren |
US5681662A (en) * | 1995-09-15 | 1997-10-28 | Olin Corporation | Copper alloy foils for flexible circuits |
DE19545231A1 (de) * | 1995-11-21 | 1997-05-22 | Atotech Deutschland Gmbh | Verfahren zur elektrolytischen Abscheidung von Metallschichten |
WO1998010628A1 (fr) * | 1996-09-05 | 1998-03-12 | Siemens Aktiengesellschaft | Element support pour puce de semi-conducteur |
US6136460A (en) * | 1998-04-03 | 2000-10-24 | Olin Corporation | Tin coatings incorporating selected elemental additions to reduce discoloration |
US6183886B1 (en) | 1998-04-03 | 2001-02-06 | Olin Corporation | Tin coatings incorporating selected elemental additions to reduce discoloration |
US6309969B1 (en) * | 1998-11-03 | 2001-10-30 | The John Hopkins University | Copper metallization structure and method of construction |
US6221176B1 (en) * | 1999-03-17 | 2001-04-24 | Gould Electronics, Inc. | Surface treatment of copper to prevent microcracking in flexible circuits |
US6224991B1 (en) * | 1999-09-13 | 2001-05-01 | Yates Foil Usa, Inc. | Process for electrodeposition of barrier layer over copper foil bonding treatment, products thereof and electrolyte useful in such process |
FR2808291B1 (fr) * | 2000-04-26 | 2003-05-23 | Mofratech | Procede electrolytique d'oxydation pour l'obtention d'un revetement ceramique a la surface d'un metal |
US6478943B1 (en) | 2000-06-01 | 2002-11-12 | Roll Surface Technologies, Inc. | Method of manufacture of electrochemically textured surface having controlled peak characteristics |
JP2002033581A (ja) * | 2000-07-13 | 2002-01-31 | Mitsui Mining & Smelting Co Ltd | 銅張積層板の製造方法 |
US6620303B2 (en) * | 2001-05-21 | 2003-09-16 | Hong Kong Polytechnic University | Process for making nickel electroforms |
WO2003004732A1 (fr) * | 2001-07-05 | 2003-01-16 | Roll Surface Technologies, Inc. | Surface electrochimiquement texturee a caracteristiques de rugosite commandees et procede de fabrication |
US6689686B2 (en) * | 2001-09-27 | 2004-02-10 | Texas Instruments Incorporated | System and method for electroplating fine geometries |
DE10255853A1 (de) * | 2002-11-29 | 2004-06-17 | Federal-Mogul Burscheid Gmbh | Herstellung strukturierter Hartchromschichten |
US20040175582A1 (en) * | 2002-12-05 | 2004-09-09 | Olin Corporation, A Corporation Of The Commonwealth Of Virginia | Laser ablation resistant copper foil |
US7749611B2 (en) * | 2002-12-05 | 2010-07-06 | Gbc Metals, L.L.C. | Peel strength enhancement of copper laminates |
DE102004019370B3 (de) * | 2004-04-21 | 2005-09-01 | Federal-Mogul Burscheid Gmbh | Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung |
CN1972557A (zh) * | 2005-10-14 | 2007-05-30 | 三井金属矿业株式会社 | 挠性覆铜层压板和薄膜载带及其制造方法、以及挠性印刷电路板、半导体装置 |
DE102008017270B3 (de) * | 2008-04-04 | 2009-06-04 | Federal-Mogul Burscheid Gmbh | Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement |
PT106470A (pt) * | 2012-07-27 | 2014-01-27 | Inst Superior Tecnico | Processo de eletrodeposição de revestimentos de níquel-cobalto com estrutura dendrítica |
NL2011267C2 (en) * | 2013-08-05 | 2015-02-09 | Onderzoekscentrum Voor Aanwending Van Staal N V | Method for manufacturing a product. |
DE102014211298A1 (de) * | 2014-06-13 | 2015-12-17 | Robert Bosch Gmbh | Substrat mit einer Oberflächenbeschichtung und Verfahren zum Beschichten einer Oberfläche eines Substrates |
CN115928157A (zh) * | 2022-12-12 | 2023-04-07 | 广东腐蚀科学与技术创新研究院 | 一种高延电解铜箔的制备方法及其应用 |
Family Cites Families (39)
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US30180A (en) * | 1860-09-25 | Apparatus fob molding candles | ||
GB591783A (en) * | 1943-10-16 | 1947-08-28 | Westinghouse Electric Int Co | Improvements in or relating to the electro deposition of metals |
GB757892A (en) * | 1952-11-08 | 1956-09-26 | Ferranti Ltd | Improvements relating to the electrolytic production of copper foils |
DE1060075B (de) * | 1957-07-29 | 1959-06-25 | Licentia Gmbh | Verfahren zum Verkleben von Kupfer, insbesondere fuer die Befestigung von Kurzschlussringen im bzw. am Magneteisen von Wechselstrommagneten, mittels AEthoxylinharz |
US3232854A (en) * | 1959-06-05 | 1966-02-01 | Diamond Alkali Co | Chromium plating |
NL267988A (fr) * | 1960-08-15 | 1900-01-01 | ||
US3220897A (en) * | 1961-02-13 | 1965-11-30 | Esther S Conley | Conducting element and method |
US3293109A (en) * | 1961-09-18 | 1966-12-20 | Clevite Corp | Conducting element having improved bonding characteristics and method |
NL128730C (fr) * | 1962-03-06 | |||
US3328275A (en) * | 1963-12-18 | 1967-06-27 | Revere Copper & Brass Inc | Treatment of copper to form a dendritic surface |
DE1496748C3 (de) * | 1964-02-28 | 1974-03-28 | Clevite Corp., Cleveland, Ohio (V.St.A.) | Kupferkörper, insbesondere Kupferfolie, mit einer auf elektrolytischem Wege erzeugten, aus zwei Schichten aufgebauten rauhen Oberfläche und Verfahren zu dessen Herstellung |
US3227637A (en) * | 1965-06-03 | 1966-01-04 | Hart Harold George De | Method of bonding coatings |
US3454376A (en) * | 1966-06-06 | 1969-07-08 | Clevite Corp | Metal composite and method of making same |
US3518168A (en) * | 1966-11-18 | 1970-06-30 | Revere Copper & Brass Inc | Electrolytic process of preparing a copper foil for a plastic coat |
NL144810C (fr) * | 1968-02-06 | |||
US3585010A (en) * | 1968-10-03 | 1971-06-15 | Clevite Corp | Printed circuit board and method of making same |
US3674656A (en) * | 1969-06-19 | 1972-07-04 | Circuit Foil Corp | Bonding treatment and products produced thereby |
US3716464A (en) * | 1969-12-30 | 1973-02-13 | Ibm | Method for electrodepositing of alloy film of a given composition from a given solution |
US3699018A (en) * | 1971-07-12 | 1972-10-17 | Northern Engraving Co | Method of electrodepositing coral copper on copper foil |
US3857681A (en) * | 1971-08-03 | 1974-12-31 | Yates Industries | Copper foil treatment and products produced therefrom |
BE789715A (fr) * | 1971-10-08 | 1973-02-01 | Yates Industries | Traitement de feuilles de cuivre en plusieurs couches |
US3799847A (en) * | 1972-05-09 | 1974-03-26 | A Buzhinskaya | Method for electrolytically producing a metal band |
US3857766A (en) * | 1972-08-03 | 1974-12-31 | Permaloy Corp | Process for anodizing aluminum and its alloys |
GB1396436A (en) * | 1973-01-08 | 1975-06-04 | Akad Wissenschaften Ddr | Process for the electrolytic production of hard-magnetic layers |
JPS534498B2 (fr) * | 1973-06-23 | 1978-02-17 | ||
CA1044636A (fr) * | 1974-01-07 | 1978-12-19 | Betty L. Berdan | Formation de nodules sur une surface metallique |
DD112145B1 (de) * | 1974-03-22 | 1986-10-29 | Cordt Schmidt | Verfahren und vorrichtung zur erzeugung von wischfesten haftbelaegen auf metallfolien, insbesondere auf kupferfolien |
US3959088A (en) * | 1975-03-19 | 1976-05-25 | The United States Of America As Represented By The Secretary Of The Army | Method and apparatus for generating high amperage pulses from an A-C power source |
US4140599A (en) * | 1975-06-04 | 1979-02-20 | Fujitsu Limited | Process for producing porous aluminum anode element |
GB1515361A (en) * | 1975-07-09 | 1978-06-21 | Electrofoils Ltd | Metal finishing of metallic foils by electrodeposition |
JPS5856758B2 (ja) * | 1975-12-17 | 1983-12-16 | ミツイアナコンダドウハク カブシキガイシヤ | ドウハクヒヨウメンシヨリホウホウ |
JPS5853079B2 (ja) * | 1976-03-15 | 1983-11-26 | 三井アナコンダ銅箔株式会社 | 銅箔の防錆方法 |
US4061837A (en) * | 1976-06-17 | 1977-12-06 | Hutkin Irving J | Plastic-metal composite and method of making the same |
CH629542A5 (de) * | 1976-09-01 | 1982-04-30 | Inoue Japax Res | Verfahren und vorrichtung zur galvanischen materialablagerung. |
GB1543301A (en) * | 1976-12-27 | 1979-04-04 | Mitsui Mining & Smelting Co | Producing copper-clad laminates by electrodeposition |
US4169018A (en) * | 1978-01-16 | 1979-09-25 | Gould Inc. | Process for electroforming copper foil |
DD134785A1 (de) * | 1978-01-25 | 1979-03-21 | Hans Skilandat | Verfahren zur elektrolytischen erzeugung eines kupfernen haftbelages auf kupferfolie |
JPS56155592A (en) * | 1980-04-03 | 1981-12-01 | Furukawa Circuit Foil | Copper foil for printed circuit and method of manufacturing same |
JPS56155593A (en) * | 1980-04-08 | 1981-12-01 | Furukawa Circuit Foil | Steel foil for printed circuit and method of manufacturing same |
-
1983
- 1983-01-24 US US06/460,630 patent/US4468293A/en not_active Expired - Lifetime
- 1983-03-04 CA CA000422894A patent/CA1212071A/fr not_active Expired
- 1983-03-04 FR FR838303615A patent/FR2522693B1/fr not_active Expired - Fee Related
- 1983-03-04 GB GB08305975A patent/GB2116213B/en not_active Expired
- 1983-03-04 NL NLAANVRAGE8300807,A patent/NL187643C/xx not_active IP Right Cessation
- 1983-03-04 DE DE19833307748 patent/DE3307748A1/de active Granted
- 1983-03-04 BE BE0/210260A patent/BE896083A/fr not_active IP Right Cessation
-
1987
- 1987-05-11 SG SG44487A patent/SG44487G/en unknown
- 1987-10-01 HK HK716/87A patent/HK71687A/xx not_active IP Right Cessation
- 1987-12-30 MY MY715/87A patent/MY8700715A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
FR2522693A1 (fr) | 1983-09-09 |
CA1212071A (fr) | 1986-09-30 |
DE3307748A1 (de) | 1983-09-15 |
US4468293A (en) | 1984-08-28 |
GB8305975D0 (en) | 1983-04-07 |
GB2116213B (en) | 1986-06-18 |
NL187643C (nl) | 1991-12-02 |
MY8700715A (en) | 1987-12-31 |
GB2116213A (en) | 1983-09-21 |
NL8300807A (nl) | 1983-10-03 |
HK71687A (en) | 1987-10-09 |
FR2522693B1 (fr) | 1990-02-02 |
DE3307748C2 (fr) | 1990-08-23 |
SG44487G (en) | 1987-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: *OLIN CORP. Effective date: 20020331 |