BE891509A - Procede de formation d'une couche mince de phosphore sur des substrats de silicium par depot de vapeur de h3p04 - Google Patents

Procede de formation d'une couche mince de phosphore sur des substrats de silicium par depot de vapeur de h3p04

Info

Publication number
BE891509A
BE891509A BE0/206857A BE206857A BE891509A BE 891509 A BE891509 A BE 891509A BE 0/206857 A BE0/206857 A BE 0/206857A BE 206857 A BE206857 A BE 206857A BE 891509 A BE891509 A BE 891509A
Authority
BE
Belgium
Prior art keywords
phosphorus
forming
thin film
vapor deposition
silicon substrates
Prior art date
Application number
BE0/206857A
Other languages
English (en)
Inventor
T D Koval
Original Assignee
Solarex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solarex Corp filed Critical Solarex Corp
Publication of BE891509A publication Critical patent/BE891509A/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H01L21/02129—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/02—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/314—Inorganic layers
    • H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
    • H01L21/31604—Deposition from a gas or vapour

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Glass (AREA)
BE0/206857A 1980-12-18 1981-12-17 Procede de formation d'une couche mince de phosphore sur des substrats de silicium par depot de vapeur de h3p04 BE891509A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/217,742 US4360393A (en) 1980-12-18 1980-12-18 Vapor deposition of H3 PO4 and formation of thin phosphorus layer on silicon substrates

Publications (1)

Publication Number Publication Date
BE891509A true BE891509A (fr) 1982-06-17

Family

ID=22812324

Family Applications (1)

Application Number Title Priority Date Filing Date
BE0/206857A BE891509A (fr) 1980-12-18 1981-12-17 Procede de formation d'une couche mince de phosphore sur des substrats de silicium par depot de vapeur de h3p04

Country Status (7)

Country Link
US (1) US4360393A (fr)
BE (1) BE891509A (fr)
ES (1) ES8303819A1 (fr)
FR (1) FR2496704A1 (fr)
GB (1) GB2091709B (fr)
IT (1) IT1142150B (fr)
NL (1) NL8105737A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60153119A (ja) * 1984-01-20 1985-08-12 Fuji Electric Corp Res & Dev Ltd 不純物拡散方法
CA2070380A1 (fr) * 1990-10-24 1992-04-25 Mark D. Rosenblum Methode et appareil pour former des noeuds de diffusion dans des substrats de piles solaires
US5270248A (en) * 1992-08-07 1993-12-14 Mobil Solar Energy Corporation Method for forming diffusion junctions in solar cell substrates
JPH08153784A (ja) * 1994-11-28 1996-06-11 Nec Corp 半導体装置の製造方法
US6143633A (en) * 1995-10-05 2000-11-07 Ebara Solar, Inc. In-situ diffusion of dopant impurities during dendritic web growth of crystal ribbon
US7790574B2 (en) 2004-12-20 2010-09-07 Georgia Tech Research Corporation Boron diffusion in silicon devices
US8659668B2 (en) 2005-10-07 2014-02-25 Rearden, Llc Apparatus and method for performing motion capture using a random pattern on capture surfaces
WO2008027956A2 (fr) * 2006-08-31 2008-03-06 Despatch Industries Limited Partnership Ajout continu de dopant
US10699944B2 (en) 2018-09-28 2020-06-30 Taiwan Semiconductor Manufacturing Company, Ltd. Surface modification layer for conductive feature formation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3173802A (en) * 1961-12-14 1965-03-16 Bell Telephone Labor Inc Process for controlling gas phase composition
GB1037284A (en) * 1963-11-27 1966-07-27 Associated Semiconductor Mft Improvements in and relating to methods of heat treating semiconductor crystal bodies
DE1257989B (de) * 1964-07-09 1968-01-04 Telefunken Patent Verfahren zum Herstellen eines Silizium-Halbleiterkoerpers fuer eine Sonnenzelle
US3486951A (en) * 1967-06-16 1969-12-30 Corning Glass Works Method of manufacturing semiconductor devices
DE2754833A1 (de) * 1977-12-09 1979-06-13 Ibm Deutschland Phosphordiffusionsverfahren fuer halbleiteranwendungen

Also Published As

Publication number Publication date
GB2091709B (en) 1984-12-05
IT8125705A0 (it) 1981-12-18
GB2091709A (en) 1982-08-04
US4360393A (en) 1982-11-23
IT1142150B (it) 1986-10-08
ES508088A0 (es) 1983-02-01
FR2496704A1 (fr) 1982-06-25
FR2496704B1 (fr) 1984-11-30
NL8105737A (nl) 1982-07-16
ES8303819A1 (es) 1983-02-01

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: SOLAREX CORP.

Effective date: 19841217