FR2521315B1 - Procede de formation d'une configuration dans une couche photoresist de seleniure de germanium, notamment pour realiser des microcircuits electroniques - Google Patents

Procede de formation d'une configuration dans une couche photoresist de seleniure de germanium, notamment pour realiser des microcircuits electroniques

Info

Publication number
FR2521315B1
FR2521315B1 FR8220462A FR8220462A FR2521315B1 FR 2521315 B1 FR2521315 B1 FR 2521315B1 FR 8220462 A FR8220462 A FR 8220462A FR 8220462 A FR8220462 A FR 8220462A FR 2521315 B1 FR2521315 B1 FR 2521315B1
Authority
FR
France
Prior art keywords
seleniure
photanesist
germanium
configuration
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8220462A
Other languages
English (en)
Other versions
FR2521315A1 (fr
Inventor
Paul Giddeon Huggett
Klaus Frick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of FR2521315A1 publication Critical patent/FR2521315A1/fr
Application granted granted Critical
Publication of FR2521315B1 publication Critical patent/FR2521315B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Physical Vapour Deposition (AREA)
FR8220462A 1982-02-05 1982-12-07 Procede de formation d'une configuration dans une couche photoresist de seleniure de germanium, notamment pour realiser des microcircuits electroniques Expired FR2521315B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/346,180 US4368099A (en) 1982-02-05 1982-02-05 Development of germanium selenide photoresist

Publications (2)

Publication Number Publication Date
FR2521315A1 FR2521315A1 (fr) 1983-08-12
FR2521315B1 true FR2521315B1 (fr) 1989-11-24

Family

ID=23358299

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8220462A Expired FR2521315B1 (fr) 1982-02-05 1982-12-07 Procede de formation d'une configuration dans une couche photoresist de seleniure de germanium, notamment pour realiser des microcircuits electroniques

Country Status (5)

Country Link
US (1) US4368099A (fr)
JP (1) JPS58137835A (fr)
DE (1) DE3246947A1 (fr)
FR (1) FR2521315B1 (fr)
GB (1) GB2114308B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506005A (en) * 1983-05-10 1985-03-19 Gca Corporation Method of catalytic etching
JPH02283018A (ja) * 1989-01-31 1990-11-20 Matsushita Electric Ind Co Ltd 半導体基体の処理方法及び半導体の製造方法
JPH0469536A (ja) * 1990-07-10 1992-03-04 Yokogawa Electric Corp 差圧測定装置
JP3006048B2 (ja) * 1990-07-27 2000-02-07 ソニー株式会社 ドライエッチング方法
DE19641981C2 (de) * 1996-10-11 2000-12-07 A Benninghoven Verfahren zur Bestimmung von Tiefenprofilen im Dünnschichtbereich
US6458647B1 (en) * 2001-08-27 2002-10-01 Infineon Technologies Ag Process flow for sacrificial collar with poly mask
US6784018B2 (en) * 2001-08-29 2004-08-31 Micron Technology, Inc. Method of forming chalcogenide comprising devices and method of forming a programmable memory cell of memory circuitry
US7064080B2 (en) * 2002-02-08 2006-06-20 Micron Technology, Inc. Semiconductor processing method using photoresist and an antireflective coating
US6825135B2 (en) * 2002-06-06 2004-11-30 Micron Technology, Inc. Elimination of dendrite formation during metal/chalcogenide glass deposition
US6856002B2 (en) * 2002-08-29 2005-02-15 Micron Technology, Inc. Graded GexSe100-x concentration in PCRAM
US7211296B2 (en) * 2003-08-22 2007-05-01 Battelle Memorial Institute Chalcogenide glass nanostructures
DE102004047630A1 (de) * 2004-09-30 2006-04-13 Infineon Technologies Ag Verfahren zur Herstellung eines CBRAM-Halbleiterspeichers
KR102455674B1 (ko) * 2017-11-17 2022-10-17 미쓰이 가가쿠 가부시키가이샤 반도체 소자 중간체, 금속 함유막 형성용 조성물, 반도체 소자 중간체의 제조 방법, 및 반도체 소자의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3707372A (en) * 1968-02-19 1972-12-26 Teeg Research Inc Electromagnetic radiation sensitive elements
GB1529037A (en) * 1976-06-08 1978-10-18 Nippon Telegraph & Telephone Image-forming materials having a radiation sensitive chalcogenide coating and a method of forming images with such materials
FR2376904A1 (fr) * 1977-01-11 1978-08-04 Alsthom Atlantique Procede d'attaque d'une couche mince par decomposition d'un gaz dans un plasma
US4330384A (en) * 1978-10-27 1982-05-18 Hitachi, Ltd. Process for plasma etching
JPS5559723A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma etching method
JPS5565365A (en) * 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
US4276368A (en) * 1979-05-04 1981-06-30 Bell Telephone Laboratories, Incorporated Photoinduced migration of silver into chalcogenide layer

Also Published As

Publication number Publication date
DE3246947A1 (de) 1983-08-11
GB2114308B (en) 1985-06-19
JPH0259451B2 (fr) 1990-12-12
FR2521315A1 (fr) 1983-08-12
JPS58137835A (ja) 1983-08-16
GB2114308A (en) 1983-08-17
US4368099A (en) 1983-01-11

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Legal Events

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ST Notification of lapse