BE831361A - Procede et installation pour l'utilisation d'une machine a attaquer les metaux et analogues, par un acide - Google Patents

Procede et installation pour l'utilisation d'une machine a attaquer les metaux et analogues, par un acide

Info

Publication number
BE831361A
BE831361A BE2054459A BE2054459A BE831361A BE 831361 A BE831361 A BE 831361A BE 2054459 A BE2054459 A BE 2054459A BE 2054459 A BE2054459 A BE 2054459A BE 831361 A BE831361 A BE 831361A
Authority
BE
Belgium
Prior art keywords
procedure
installation
acid
machine
attacking
Prior art date
Application number
BE2054459A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE831361A publication Critical patent/BE831361A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions
BE2054459A 1974-07-17 1975-07-15 Procede et installation pour l'utilisation d'une machine a attaquer les metaux et analogues, par un acide BE831361A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2434305A DE2434305C2 (de) 1974-07-17 1974-07-17 Ätzanlage

Publications (1)

Publication Number Publication Date
BE831361A true BE831361A (fr) 1975-11-03

Family

ID=5920781

Family Applications (1)

Application Number Title Priority Date Filing Date
BE2054459A BE831361A (fr) 1974-07-17 1975-07-15 Procede et installation pour l'utilisation d'une machine a attaquer les metaux et analogues, par un acide

Country Status (13)

Country Link
US (1) US4017343A (fr)
AT (1) AT335246B (fr)
BE (1) BE831361A (fr)
BR (1) BR7504517A (fr)
CH (1) CH615699A5 (fr)
DE (1) DE2434305C2 (fr)
DK (1) DK325875A (fr)
FR (1) FR2278796A1 (fr)
GB (1) GB1514286A (fr)
IE (1) IE41425B1 (fr)
IT (1) IT1050588B (fr)
NL (1) NL7508297A (fr)
SE (1) SE426713B (fr)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1050864A (fr) * 1973-08-29 1979-03-20 James K. Anderson Appareil de traitement automatique de photogravures sur surfaces curvilignes
FR2354796A1 (fr) * 1976-06-16 1978-01-13 Poudres & Explosifs Ste Nale Procede et dispositif de lavage d'un produit impregne par une substance liquide
JPS5767133A (en) * 1980-10-09 1982-04-23 Nippon Steel Corp Continuous annealing installation having adjusting device for strip surface
US4350597A (en) * 1980-10-31 1982-09-21 Wilson & Company Apparatus and process for treatment of sludge
DE3317040A1 (de) * 1983-05-10 1984-11-15 Hans Höllmüller Maschinenbau GmbH & Co, 7033 Herrenberg Verfahren und vorrichtung zur elektrolytischen regeneration eines aetzmittels
US4911761A (en) * 1984-05-21 1990-03-27 Cfm Technologies Research Associates Process and apparatus for drying surfaces
US4778532A (en) * 1985-06-24 1988-10-18 Cfm Technologies Limited Partnership Process and apparatus for treating wafers with process fluids
US4984597B1 (en) * 1984-05-21 1999-10-26 Cfmt Inc Apparatus for rinsing and drying surfaces
US4654089A (en) * 1985-05-31 1987-03-31 Singelyn Daniel D Counterflow spray rinse process
DE3539886A1 (de) * 1985-11-11 1987-05-14 Hoellmueller Maschbau H Verfahren und vorrichtung zum aetzen eines zumindest teilweise aus metall, vorzugsweise kupfer, bestehenden aetzguts
JP2598305B2 (ja) * 1988-06-06 1997-04-09 日東電工株式会社 半導体ウエハの処理システム
DE3833242A1 (de) * 1988-09-30 1990-04-05 Hoellmueller Maschbau H Verfahren zum aetzen von kupferhaltigen werkstuecken sowie aetzanlage zur durchfuehrung des verfahrens
JPH0296334A (ja) * 1988-10-01 1990-04-09 Nisso Eng Kk 高温エッチング液の循環方法
US4895099A (en) * 1988-11-03 1990-01-23 D.E.M. Controls Of Canada Device for sequential spray application of chemical solutions used in the preparation of circuit board inner layers
US4904339A (en) * 1989-05-26 1990-02-27 Psi Star Vertical spray etch reactor and method
DE3935222A1 (de) * 1989-10-23 1991-04-25 Hoellmueller Maschbau H Aetzanlage sowie verfahren zum aetzen von gegenstaenden
MY118065A (en) * 1989-10-26 2004-08-30 Toshiba Silicone Cleaning compositions
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
DE4110423A1 (de) * 1991-03-29 1992-10-01 Scient Impex Establishment Vorrichtung zur chemischen metallbearbeitung
DE69117927T2 (de) * 1991-04-02 1996-08-01 Unitika Ltd Verfahren zum Behandeln eines geschmolzenen Salzbades
KR100254653B1 (ko) 1991-10-04 2000-05-01 월터 알란 이. 대상물을 처리하는 방법
US6864570B2 (en) * 1993-12-17 2005-03-08 The Regents Of The University Of California Method and apparatus for fabricating self-assembling microstructures
DE4345077C2 (de) * 1993-12-31 1999-09-23 Zibulla & Sohn Gmbh Vorrichtung zum Reinigen und Entfetten der Oberflächen von Blechen
US5720813A (en) 1995-06-07 1998-02-24 Eamon P. McDonald Thin sheet handling system
US5733378A (en) * 1996-02-26 1998-03-31 Austin American Technology Method for cleaning printed circuit boards
US6039059A (en) 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
US6328809B1 (en) 1998-10-09 2001-12-11 Scp Global Technologies, Inc. Vapor drying system and method
WO2010030505A1 (fr) * 2008-09-10 2010-03-18 Austin American Technology Corporation Nettoyage et test de la propreté ionique d’ensembles électroniques
US9406500B2 (en) * 2012-02-08 2016-08-02 Taiwan Semiconductor Manufacturing Company, Ltd. Flux residue cleaning system and method
EP3875642A1 (fr) * 2020-03-04 2021-09-08 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Procédé de traitement des eaux de rinçage provenant de la fabrication de cartes de circuit imprimé et/ou de substrats

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3082774A (en) * 1961-02-08 1963-03-26 Ct Circuits Inc Etching machine
US3310435A (en) * 1963-11-18 1967-03-21 Dravo Corp Process for continuous pickling of steel strip and regeneration of the contact acid
US3871914A (en) * 1971-10-18 1975-03-18 Chemcut Corp Etchant rinse apparatus

Also Published As

Publication number Publication date
SE7508065L (sv) 1976-01-19
IT1050588B (it) 1981-03-20
IE41425L (en) 1976-01-17
NL7508297A (nl) 1976-01-20
GB1514286A (en) 1978-06-14
ATA539075A (de) 1976-06-15
FR2278796A1 (fr) 1976-02-13
SE426713B (sv) 1983-02-07
DE2434305C2 (de) 1983-09-29
BR7504517A (pt) 1976-07-06
IE41425B1 (en) 1980-01-02
DK325875A (da) 1976-02-13
FR2278796B3 (fr) 1979-04-27
CH615699A5 (fr) 1980-02-15
AT335246B (de) 1977-02-25
US4017343A (en) 1977-04-12
DE2434305A1 (de) 1976-01-29

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: FIRMA HABS HOLLMULLER MASCHINENBAU

Effective date: 19920731