BE728728A - - Google Patents

Info

Publication number
BE728728A
BE728728A BE728728DA BE728728A BE 728728 A BE728728 A BE 728728A BE 728728D A BE728728D A BE 728728DA BE 728728 A BE728728 A BE 728728A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE728728A publication Critical patent/BE728728A/xx

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D257/00Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
    • C07D257/02Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D257/04Five-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D233/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/66Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/84Sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D235/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/20Two benzimidazolyl-2 radicals linked together directly or via a hydrocarbon or substituted hydrocarbon radical
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D235/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/24Benzimidazoles; Hydrogenated benzimidazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D235/28Sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/02Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D249/081,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
    • C07D249/101,2,4-Triazoles; Hydrogenated 1,2,4-triazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D249/12Oxygen or sulfur atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/005Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/34Fog-inhibitors; Stabilisers; Agents inhibiting latent image regression

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Plural Heterocyclic Compounds (AREA)
BE728728D 1968-02-22 1969-02-21 BE728728A (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB865368A GB1239017A (sv) 1968-02-22 1968-02-22

Publications (1)

Publication Number Publication Date
BE728728A true BE728728A (sv) 1969-08-21

Family

ID=9856631

Family Applications (1)

Application Number Title Priority Date Filing Date
BE728728D BE728728A (sv) 1968-02-22 1969-02-21

Country Status (5)

Country Link
JP (1) JPS4751896B1 (sv)
BE (1) BE728728A (sv)
DE (1) DE1906952C2 (sv)
FR (1) FR2002373A1 (sv)
GB (1) GB1239017A (sv)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3216843C2 (de) * 1982-05-05 1986-10-23 Ludwig Heumann & Co GmbH, 8500 Nürnberg 3-Thiomethyl-pyridin-Derivate, Verfahren zu ihrer Herstellung und diese Verbindungen enthaltende Arzneimittel
DE3572230D1 (en) * 1985-10-10 1989-09-14 Agfa Gevaert Nv Image-recieving element for the silver salt diffusion transfer reversal process
JPH0833642B2 (ja) * 1986-10-24 1996-03-29 富士写真フイルム株式会社 ハロゲン化銀写真感光材料の現像処理方法
DE69327217T2 (de) * 1992-10-01 2000-05-18 Sterling Diagnostic Imaging, Inc. Silberhalogenidemulsionen stabilisiert mit verbesserten Antischleiermitteln
KR101540145B1 (ko) * 2012-02-15 2015-07-28 삼성전기주식회사 알킬 설폰화된 테트라졸 화합물, 이의 제조방법, 이를 함유하는 에폭시 수지, 및 이로부터 제조된 기판
KR101747259B1 (ko) * 2012-12-28 2017-06-14 삼성전기주식회사 알킬 설폰화된 테트라졸 화합물로 표면 개질된 실리카, 이의 제조방법 및 이를 함유하는 수지조성물
KR101956273B1 (ko) * 2013-08-13 2019-03-08 삼성전기주식회사 수지 조성물, 이를 이용한 인쇄회로기판 및 그 제조방법
KR101956281B1 (ko) * 2013-08-13 2019-03-08 삼성전기주식회사 수지 조성물, 이를 이용한 인쇄회로기판 및 그 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE498287A (sv) * 1949-09-24
BE498286A (sv) * 1949-09-24
DE1177481B (de) * 1963-05-18 1964-09-03 Agfa Ag Lichtempfindliches photographisches Material mit mindestens einer sensibilisierten Halogensilberemulsionsschicht
DE1213240B (de) * 1964-02-13 1966-03-24 Agfa Gevaert Ag Lichtempfindliches photographisches Material mit mindestens einer Azofarbstoff enthaltenden optisch sensibilisierten Halogensilber-Emulsions-schicht fuer das Silberfarbbleichverfahren

Also Published As

Publication number Publication date
FR2002373A1 (sv) 1969-10-17
DE1906952A1 (de) 1969-09-25
GB1239017A (sv) 1971-07-14
JPS4751896B1 (sv) 1972-12-27
DE1906952C2 (de) 1983-04-07

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