AU517415B2 - Curable polymer composition - Google Patents

Curable polymer composition

Info

Publication number
AU517415B2
AU517415B2 AU25531/77A AU2553177A AU517415B2 AU 517415 B2 AU517415 B2 AU 517415B2 AU 25531/77 A AU25531/77 A AU 25531/77A AU 2553177 A AU2553177 A AU 2553177A AU 517415 B2 AU517415 B2 AU 517415B2
Authority
AU
Australia
Prior art keywords
polymer composition
curable polymer
curable
composition
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU25531/77A
Other languages
English (en)
Other versions
AU2553177A (en
Inventor
J. V Crivello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of AU2553177A publication Critical patent/AU2553177A/en
Application granted granted Critical
Publication of AU517415B2 publication Critical patent/AU517415B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
AU25531/77A 1976-07-09 1977-05-26 Curable polymer composition Expired AU517415B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
USUS703860 1976-07-09
US73242176A 1976-10-14 1976-10-14
USUS732421 1976-10-14

Publications (2)

Publication Number Publication Date
AU2553177A AU2553177A (en) 1978-11-30
AU517415B2 true AU517415B2 (en) 1981-07-30

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
AU25531/77A Expired AU517415B2 (en) 1976-07-09 1977-05-26 Curable polymer composition

Country Status (8)

Country Link
JP (1) JPS6035930B2 (OSRAM)
AU (1) AU517415B2 (OSRAM)
BR (1) BR7704527A (OSRAM)
DE (1) DE2730725A1 (OSRAM)
FR (1) FR2357931A1 (OSRAM)
GB (1) GB1554389A (OSRAM)
MX (2) MX159499A (OSRAM)
NL (1) NL183948C (OSRAM)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
US7255926B2 (en) * 2002-02-01 2007-08-14 Shell Oil Company Barrier layer made of a curable resin containing polymeric polyol
KR101592960B1 (ko) 2009-10-01 2016-02-12 히타치가세이가부시끼가이샤 유기 일렉트로닉스용 재료, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 및 그것을 사용한 표시 소자, 조명 장치, 표시 장치
KR101485470B1 (ko) 2010-04-22 2015-01-22 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치
CN106939074B (zh) 2013-03-08 2020-06-16 日立化成株式会社 含有离子性化合物的处理液

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
BE522162A (OSRAM) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516351A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1516512A (en) * 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Also Published As

Publication number Publication date
FR2357931B1 (OSRAM) 1983-11-25
FR2357931A1 (fr) 1978-02-03
GB1554389A (en) 1979-10-17
DE2730725A1 (de) 1978-01-12
JPS5322597A (en) 1978-03-02
NL7707609A (nl) 1978-01-11
MX159499A (es) 1989-06-20
JPS6035930B2 (ja) 1985-08-17
NL183948B (nl) 1988-10-03
NL183948C (nl) 1989-03-01
AU2553177A (en) 1978-11-30
BR7704527A (pt) 1978-04-25
DE2730725C2 (OSRAM) 1990-08-16
MX145409A (es) 1982-02-04

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