AU517415B2 - Curable polymer composition - Google Patents

Curable polymer composition

Info

Publication number
AU517415B2
AU517415B2 AU25531/77A AU2553177A AU517415B2 AU 517415 B2 AU517415 B2 AU 517415B2 AU 25531/77 A AU25531/77 A AU 25531/77A AU 2553177 A AU2553177 A AU 2553177A AU 517415 B2 AU517415 B2 AU 517415B2
Authority
AU
Australia
Prior art keywords
polymer composition
curable polymer
curable
composition
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU25531/77A
Other languages
English (en)
Other versions
AU2553177A (en
Inventor
J. V Crivello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of AU2553177A publication Critical patent/AU2553177A/en
Application granted granted Critical
Publication of AU517415B2 publication Critical patent/AU517415B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
AU25531/77A 1976-07-09 1977-05-26 Curable polymer composition Expired AU517415B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
USUS703860 1976-07-09
US73242176A 1976-10-14 1976-10-14
USUS732421 1976-10-14

Publications (2)

Publication Number Publication Date
AU2553177A AU2553177A (en) 1978-11-30
AU517415B2 true AU517415B2 (en) 1981-07-30

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
AU25531/77A Expired AU517415B2 (en) 1976-07-09 1977-05-26 Curable polymer composition

Country Status (8)

Country Link
JP (1) JPS6035930B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU517415B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR7704527A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2730725A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2357931A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1554389A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
MX (2) MX145409A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL183948C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
EP0153904B1 (de) * 1984-02-10 1988-09-14 Ciba-Geigy Ag Verfahren zur Herstellung einer Schutzschicht oder einer Reliefabbildung
JP4927317B2 (ja) * 2002-02-01 2012-05-09 シェル・エルノイエルバーレ・エネルギエン・ゲーエムベーハー 高分子量ポリオール含有硬化性樹脂製のバリヤー層
WO2011040531A1 (ja) 2009-10-01 2011-04-07 日立化成工業株式会社 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置
US10566105B2 (en) 2010-04-22 2020-02-18 Hitachi Chemical Company, Ltd. Method for producing charge transport film
CN105027677B (zh) 2013-03-08 2018-05-25 日立化成株式会社 含有离子性化合物的处理液、有机电子元件和有机电子元件的制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
NL83160C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516352A (en) * 1974-05-02 1978-07-05 Gen Electric Halonium salts
GB1516512A (en) * 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Also Published As

Publication number Publication date
DE2730725A1 (de) 1978-01-12
GB1554389A (en) 1979-10-17
AU2553177A (en) 1978-11-30
MX145409A (es) 1982-02-04
FR2357931A1 (fr) 1978-02-03
DE2730725C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-08-16
MX159499A (es) 1989-06-20
JPS6035930B2 (ja) 1985-08-17
FR2357931B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1983-11-25
NL183948C (nl) 1989-03-01
NL7707609A (nl) 1978-01-11
JPS5322597A (en) 1978-03-02
BR7704527A (pt) 1978-04-25
NL183948B (nl) 1988-10-03

Similar Documents

Publication Publication Date Title
AU507094B2 (en) Photo curable composition
AU503868B2 (en) Curable organopolysiloxane composition
AU515086B2 (en) Polycarbonate composition
AU523457B2 (en) Monomer compositions
GB2029842B (en) Curable polymer composition
AU509306B2 (en) Plasticized polycarbonate compositions
AU511824B2 (en) polycarbonate based molding composition
AU523115B2 (en) Polymer composition
JPS5350252A (en) Polymer composition
AU508270B2 (en) Polymer manufacture
AU509255B2 (en) Self-extinguishing polymeric composition
AU510963B2 (en) Curable organopolysiloxane compositions
JPS5488952A (en) Polymer composition
AU3138577A (en) Plasticized polycarbonate composition
AU3138677A (en) Plasticized polycarbonate composition
AU498208B2 (en) Polymer dispensions
AU3161877A (en) Plasticized polycarbonate composition
AU515053B2 (en) Polycarbonate composition
AU517415B2 (en) Curable polymer composition
AU523301B2 (en) Curable composition
AU3132677A (en) Plasticized polycarbonate composition
AU509307B2 (en) Plasticized polycarbonate compositions
AU517377B2 (en) Anti-acne composition
AU504736B2 (en) Olefin polymer composition
AU504197B2 (en) Polycarbonate composition