AU470155B2 - Photosensitive organophilic compositions and lithographic plastes therewith - Google Patents

Photosensitive organophilic compositions and lithographic plastes therewith

Info

Publication number
AU470155B2
AU470155B2 AU70239/74A AU7023974A AU470155B2 AU 470155 B2 AU470155 B2 AU 470155B2 AU 70239/74 A AU70239/74 A AU 70239/74A AU 7023974 A AU7023974 A AU 7023974A AU 470155 B2 AU470155 B2 AU 470155B2
Authority
AU
Australia
Prior art keywords
plastes
lithographic
photosensitive
therewith
organophilic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU70239/74A
Other languages
English (en)
Other versions
AU7023974A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of AU7023974A publication Critical patent/AU7023974A/en
Application granted granted Critical
Publication of AU470155B2 publication Critical patent/AU470155B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
AU70239/74A 1973-06-20 1974-06-19 Photosensitive organophilic compositions and lithographic plastes therewith Expired AU470155B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37157873A 1973-06-20 1973-06-20

Publications (2)

Publication Number Publication Date
AU7023974A AU7023974A (en) 1976-01-08
AU470155B2 true AU470155B2 (en) 1976-03-04

Family

ID=23464533

Family Applications (1)

Application Number Title Priority Date Filing Date
AU70239/74A Expired AU470155B2 (en) 1973-06-20 1974-06-19 Photosensitive organophilic compositions and lithographic plastes therewith

Country Status (12)

Country Link
JP (1) JPS5036210A (ja)
AR (1) AR205345A1 (ja)
AU (1) AU470155B2 (ja)
BR (1) BR7405009D0 (ja)
CA (1) CA1024803A (ja)
CH (1) CH607095A5 (ja)
DE (1) DE2429251A1 (ja)
FR (1) FR2234583A1 (ja)
GB (1) GB1474073A (ja)
IT (1) IT1015190B (ja)
SE (1) SE7407618L (ja)
ZA (1) ZA743952B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
JPS601931B2 (ja) * 1980-11-08 1985-01-18 住友金属工業株式会社 高張力線の製造方法
JPS6043892B2 (ja) * 1980-11-08 1985-10-01 住友金属工業株式会社 高張力線の製造方法
JPS5811932A (ja) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd 感光性組成物
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
DE3617499A1 (de) * 1986-05-24 1987-11-26 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644161A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644163A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3811242A1 (de) * 1988-04-02 1989-10-19 Hoechst Ag Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Also Published As

Publication number Publication date
IT1015190B (it) 1977-05-10
DE2429251A1 (de) 1975-01-02
CH607095A5 (ja) 1978-11-30
AR205345A1 (es) 1976-04-30
CA1024803A (en) 1978-01-24
FR2234583A1 (ja) 1975-01-17
JPS5036210A (ja) 1975-04-05
GB1474073A (en) 1977-05-18
ZA743952B (en) 1975-06-25
AU7023974A (en) 1976-01-08
BR7405009D0 (pt) 1975-09-30
SE7407618L (ja) 1974-12-23

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