CA1024803A - Photosensitive organophilic compositions and lithographic plates prepared therewith - Google Patents

Photosensitive organophilic compositions and lithographic plates prepared therewith

Info

Publication number
CA1024803A
CA1024803A CA196,099A CA196099A CA1024803A CA 1024803 A CA1024803 A CA 1024803A CA 196099 A CA196099 A CA 196099A CA 1024803 A CA1024803 A CA 1024803A
Authority
CA
Canada
Prior art keywords
photosensitive
plates prepared
lithographic plates
prepared therewith
organophilic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA196,099A
Other languages
English (en)
French (fr)
Inventor
Christopher J. Podsiadly
Paul M. Fuchs
Wallace R. Lundquist
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of CA1024803A publication Critical patent/CA1024803A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CA196,099A 1973-06-20 1974-03-27 Photosensitive organophilic compositions and lithographic plates prepared therewith Expired CA1024803A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37157873A 1973-06-20 1973-06-20

Publications (1)

Publication Number Publication Date
CA1024803A true CA1024803A (en) 1978-01-24

Family

ID=23464533

Family Applications (1)

Application Number Title Priority Date Filing Date
CA196,099A Expired CA1024803A (en) 1973-06-20 1974-03-27 Photosensitive organophilic compositions and lithographic plates prepared therewith

Country Status (12)

Country Link
JP (1) JPS5036210A (ja)
AR (1) AR205345A1 (ja)
AU (1) AU470155B2 (ja)
BR (1) BR7405009D0 (ja)
CA (1) CA1024803A (ja)
CH (1) CH607095A5 (ja)
DE (1) DE2429251A1 (ja)
FR (1) FR2234583A1 (ja)
GB (1) GB1474073A (ja)
IT (1) IT1015190B (ja)
SE (1) SE7407618L (ja)
ZA (1) ZA743952B (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631245A (en) * 1984-02-08 1986-12-23 Hoechst Aktiengesellschaft Photosensitive composition admixture of a diazonium salt polycondensation product and polymeric binder with carboxyl side chain groups
US4828959A (en) * 1986-05-24 1989-05-09 Hoechst Aktiengesellschaft Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound
US4840868A (en) * 1986-12-23 1989-06-20 Hoechst Aktiengesellschaft Photosensitive composition based on a diazonium salt polycondensation product with an ester polymer binder having urethane group
US4983491A (en) * 1985-11-22 1991-01-08 Fuji Photo Film Co., Ltd. Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain
US5008362A (en) * 1988-04-02 1991-04-16 Hoechst Aktiengesellschaft Binders soluble in aqueous alkali and containing silanyl groups in the side chain, process for preparing same and also photosensitive mixture containing these compounds
US5045429A (en) * 1985-08-07 1991-09-03 Hoechst Aktiengesellschaft Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
JPS6043892B2 (ja) * 1980-11-08 1985-10-01 住友金属工業株式会社 高張力線の製造方法
JPS601931B2 (ja) * 1980-11-08 1985-01-18 住友金属工業株式会社 高張力線の製造方法
JPS5811932A (ja) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd 感光性組成物
DE3644161A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631245A (en) * 1984-02-08 1986-12-23 Hoechst Aktiengesellschaft Photosensitive composition admixture of a diazonium salt polycondensation product and polymeric binder with carboxyl side chain groups
US5045429A (en) * 1985-08-07 1991-09-03 Hoechst Aktiengesellschaft Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol
US4983491A (en) * 1985-11-22 1991-01-08 Fuji Photo Film Co., Ltd. Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain
US4828959A (en) * 1986-05-24 1989-05-09 Hoechst Aktiengesellschaft Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound
US4840868A (en) * 1986-12-23 1989-06-20 Hoechst Aktiengesellschaft Photosensitive composition based on a diazonium salt polycondensation product with an ester polymer binder having urethane group
US5008362A (en) * 1988-04-02 1991-04-16 Hoechst Aktiengesellschaft Binders soluble in aqueous alkali and containing silanyl groups in the side chain, process for preparing same and also photosensitive mixture containing these compounds

Also Published As

Publication number Publication date
AU7023974A (en) 1976-01-08
SE7407618L (ja) 1974-12-23
FR2234583A1 (ja) 1975-01-17
DE2429251A1 (de) 1975-01-02
JPS5036210A (ja) 1975-04-05
GB1474073A (en) 1977-05-18
AR205345A1 (es) 1976-04-30
BR7405009D0 (pt) 1975-09-30
ZA743952B (en) 1975-06-25
CH607095A5 (ja) 1978-11-30
AU470155B2 (en) 1976-03-04
IT1015190B (it) 1977-05-10

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