AU2003218262A1 - Method and apparatus for preparing vaporized reactants for chemical vapor deposition - Google Patents

Method and apparatus for preparing vaporized reactants for chemical vapor deposition

Info

Publication number
AU2003218262A1
AU2003218262A1 AU2003218262A AU2003218262A AU2003218262A1 AU 2003218262 A1 AU2003218262 A1 AU 2003218262A1 AU 2003218262 A AU2003218262 A AU 2003218262A AU 2003218262 A AU2003218262 A AU 2003218262A AU 2003218262 A1 AU2003218262 A1 AU 2003218262A1
Authority
AU
Australia
Prior art keywords
chamber
vapor
vaporization chamber
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003218262A
Other languages
English (en)
Inventor
Douglas M. Nelson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pilkington North America Inc
Original Assignee
Pilkington North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington North America Inc filed Critical Pilkington North America Inc
Publication of AU2003218262A1 publication Critical patent/AU2003218262A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/228—In rotating vessels; vessels with movable parts horizontally placed cylindrical container or drum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AU2003218262A 2002-03-29 2003-03-19 Method and apparatus for preparing vaporized reactants for chemical vapor deposition Abandoned AU2003218262A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36911002P 2002-03-29 2002-03-29
US60/369,110 2002-03-29
PCT/US2003/008414 WO2003085164A1 (fr) 2002-03-29 2003-03-19 Procede et appareil pour la preparation de reactants vaporises pour le depot chimique en phase vapeur

Publications (1)

Publication Number Publication Date
AU2003218262A1 true AU2003218262A1 (en) 2003-10-20

Family

ID=28791925

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003218262A Abandoned AU2003218262A1 (en) 2002-03-29 2003-03-19 Method and apparatus for preparing vaporized reactants for chemical vapor deposition

Country Status (12)

Country Link
US (2) US6827974B2 (fr)
EP (1) EP1501964B1 (fr)
JP (1) JP4317459B2 (fr)
KR (1) KR20040101358A (fr)
CN (1) CN100443630C (fr)
AT (1) ATE356894T1 (fr)
AU (1) AU2003218262A1 (fr)
BR (1) BR0308846A (fr)
DE (1) DE60312504T2 (fr)
MX (1) MXPA04009247A (fr)
RU (1) RU2303078C2 (fr)
WO (1) WO2003085164A1 (fr)

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US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US20070190247A1 (en) * 2004-05-18 2007-08-16 Mecharonics Co., Ltd. Method for forming organic light-emitting layer
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
NO325900B1 (no) * 2005-10-07 2008-08-11 Aker Subsea As Anordning og fremgangsmåte for regulering av tilførsel av barrieregass til en kompressormodul
US7670647B2 (en) * 2006-05-05 2010-03-02 Pilkington Group Limited Method for depositing zinc oxide coatings on flat glass
BRPI0711292A2 (pt) * 2006-05-05 2011-08-23 Arkema Inc processo de deposição quìmica em fase de vapor para deposição de um revestimento de óxido de zinco sobre um substrato contìnuo de vidro aquecido durante um processo de fabricação de vidro float
MY148287A (en) * 2006-08-29 2013-03-29 Pilkington Group Ltd Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby
FR2927146B1 (fr) * 2008-02-06 2010-03-26 Air Liquide Systeme de chauffage de stockages des gaz liquefies sous pression
DE102010016926A1 (de) 2009-05-16 2010-12-30 Eichler Gmbh & Co.Kg Verfahren und Beschichtungsanlage zur elektrostatischen Lackierung (Pulverbeschichtung) von elektrisch nicht leitenden Teilen
EP2533905B1 (fr) 2010-02-10 2018-07-04 Dresser-Rand Company Collecteur de fluide séparateur et procédé
WO2012009158A2 (fr) 2010-07-15 2012-01-19 Dresser-Rand Company Séparateur rotatif en ligne amélioré
US8663483B2 (en) 2010-07-15 2014-03-04 Dresser-Rand Company Radial vane pack for rotary separators
US8657935B2 (en) 2010-07-20 2014-02-25 Dresser-Rand Company Combination of expansion and cooling to enhance separation
US8821362B2 (en) 2010-07-21 2014-09-02 Dresser-Rand Company Multiple modular in-line rotary separator bundle
US8596292B2 (en) 2010-09-09 2013-12-03 Dresser-Rand Company Flush-enabled controlled flow drain
US20120276291A1 (en) * 2011-04-28 2012-11-01 Bird Chester D Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization
US9302291B2 (en) 2011-08-05 2016-04-05 3M Innovative Properties Company Systems and methods for processing vapor
US9156041B1 (en) * 2012-05-07 2015-10-13 The United States Of America As Represented By The Secretary Of The Army Dimethylmethylphosphonate vapor generator
US11517831B2 (en) * 2019-06-25 2022-12-06 George Andrew Rabroker Abatement system for pyrophoric chemicals and method of use
CN110965046B (zh) * 2019-12-31 2024-05-28 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
TW202242184A (zh) * 2020-12-22 2022-11-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 前驅物膠囊、前驅物容器、氣相沉積總成、及將固態前驅物裝載至前驅物容器中之方法
CN117959738B (zh) * 2024-04-02 2024-06-04 山西兴源盛科技有限公司 一种氯化钙生产用蒸发装置

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NL123626C (fr) 1961-02-08
US3932068A (en) * 1966-10-04 1976-01-13 March Manufacturing Company Magnetically-coupled pump
FR1570922A (fr) * 1967-06-22 1969-06-13
US3795386A (en) * 1971-08-16 1974-03-05 Monsanto Co Shaft seal for low and high pressures
JPS5659112A (en) 1979-10-18 1981-05-22 Matsushita Electric Ind Co Ltd Liquid fuel combustor
US4790911A (en) 1987-03-10 1988-12-13 Martin Parkinson Solvent evaporator
US4913777A (en) 1987-12-11 1990-04-03 Martin Parkinson Solvent evaporator
US5090985A (en) 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5324540A (en) * 1992-08-17 1994-06-28 Tokyo Electron Limited System and method for supporting and rotating substrates in a process chamber
KR100190310B1 (ko) * 1992-09-03 1999-06-01 모리시따 요오이찌 진공배기장치
JPH06196419A (ja) 1992-12-24 1994-07-15 Canon Inc 化学気相堆積装置及びそれによる半導体装置の製造方法
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JP3717014B2 (ja) 1996-08-06 2005-11-16 富士写真フイルム株式会社 撹拌装置
JP3645682B2 (ja) * 1997-03-18 2005-05-11 三菱電機株式会社 Ｃｕ成膜用ＣＶＤ装置
JPH10339275A (ja) * 1997-06-05 1998-12-22 Toru Imai 軸受装置
FR2779361B1 (fr) 1998-06-05 2000-07-28 Mixel Agitateur a entrainement magnetique
JP3579278B2 (ja) 1999-01-26 2004-10-20 東京エレクトロン株式会社 縦型熱処理装置及びシール装置
US6280157B1 (en) 1999-06-29 2001-08-28 Flowserve Management Company Sealless integral-motor pump with regenerative impeller disk

Also Published As

Publication number Publication date
WO2003085164A1 (fr) 2003-10-16
JP2005521796A (ja) 2005-07-21
JP4317459B2 (ja) 2009-08-19
EP1501964B1 (fr) 2007-03-14
RU2004131823A (ru) 2005-10-10
KR20040101358A (ko) 2004-12-02
ATE356894T1 (de) 2007-04-15
CN1656248A (zh) 2005-08-17
US7596305B2 (en) 2009-09-29
BR0308846A (pt) 2005-02-01
EP1501964A1 (fr) 2005-02-02
US20050066894A1 (en) 2005-03-31
DE60312504D1 (de) 2007-04-26
MXPA04009247A (es) 2005-01-25
CN100443630C (zh) 2008-12-17
US6827974B2 (en) 2004-12-07
DE60312504T2 (de) 2007-11-22
US20030185979A1 (en) 2003-10-02
RU2303078C2 (ru) 2007-07-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase