AU2002363983A1 - Multiphoton photosensitization system - Google Patents

Multiphoton photosensitization system

Info

Publication number
AU2002363983A1
AU2002363983A1 AU2002363983A AU2002363983A AU2002363983A1 AU 2002363983 A1 AU2002363983 A1 AU 2002363983A1 AU 2002363983 A AU2002363983 A AU 2002363983A AU 2002363983 A AU2002363983 A AU 2002363983A AU 2002363983 A1 AU2002363983 A1 AU 2002363983A1
Authority
AU
Australia
Prior art keywords
multiphoton
photochemically
effective amount
photosensitizer
photosensitization system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002363983A
Other languages
English (en)
Inventor
James G. Bentsen
Robert J. Devoe
Michael C. Palazzotto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2002363983A1 publication Critical patent/AU2002363983A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Polymerisation Methods In General (AREA)
  • Luminescent Compositions (AREA)
  • Glass Compositions (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Optical Communication System (AREA)
AU2002363983A 2001-12-28 2002-12-09 Multiphoton photosensitization system Abandoned AU2002363983A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/033,507 US6750266B2 (en) 2001-12-28 2001-12-28 Multiphoton photosensitization system
US10/033,507 2001-12-28
PCT/US2002/039473 WO2003058346A1 (en) 2001-12-28 2002-12-09 Multiphoton photosensitization system

Publications (1)

Publication Number Publication Date
AU2002363983A1 true AU2002363983A1 (en) 2003-07-24

Family

ID=21870791

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002363983A Abandoned AU2002363983A1 (en) 2001-12-28 2002-12-09 Multiphoton photosensitization system

Country Status (10)

Country Link
US (1) US6750266B2 (enExample)
EP (1) EP1459132B1 (enExample)
JP (1) JP4361799B2 (enExample)
KR (1) KR100904926B1 (enExample)
CN (1) CN1288498C (enExample)
AT (1) ATE329292T1 (enExample)
AU (1) AU2002363983A1 (enExample)
CA (1) CA2469095A1 (enExample)
DE (1) DE60212189T2 (enExample)
WO (1) WO2003058346A1 (enExample)

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AU2001270320A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
KR100811017B1 (ko) 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
EP1295179B1 (en) 2000-06-15 2013-05-22 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
KR100811018B1 (ko) 2000-06-15 2008-03-14 쓰리엠 이노베이티브 프로퍼티즈 캄파니 물품에 구조를 형성 또는 추가하는 방법
EP1295180B1 (en) 2000-06-15 2013-05-22 3M Innovative Properties Company Process for producing microfluidic articles
EP1292852B1 (en) 2000-06-15 2005-11-09 3M Innovative Properties Company Microfabrication of organic optical elements
JP2003029404A (ja) 2001-07-12 2003-01-29 Mitsubishi Chemicals Corp 多光子励起感光性フォトポリマー組成物およびその露光方法

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KR100904926B1 (ko) 2009-06-29
US6750266B2 (en) 2004-06-15
EP1459132A1 (en) 2004-09-22
KR20040076267A (ko) 2004-08-31
DE60212189D1 (de) 2006-07-20
WO2003058346A1 (en) 2003-07-17
US20030139484A1 (en) 2003-07-24
CN1288498C (zh) 2006-12-06
EP1459132B1 (en) 2006-06-07
JP2005514658A (ja) 2005-05-19
CA2469095A1 (en) 2003-07-17
DE60212189T2 (de) 2007-04-12
JP4361799B2 (ja) 2009-11-11
ATE329292T1 (de) 2006-06-15

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