CA2469095A1 - Multiphoton photosensitization system - Google Patents
Multiphoton photosensitization system Download PDFInfo
- Publication number
- CA2469095A1 CA2469095A1 CA002469095A CA2469095A CA2469095A1 CA 2469095 A1 CA2469095 A1 CA 2469095A1 CA 002469095 A CA002469095 A CA 002469095A CA 2469095 A CA2469095 A CA 2469095A CA 2469095 A1 CA2469095 A1 CA 2469095A1
- Authority
- CA
- Canada
- Prior art keywords
- composition
- multiphoton
- salts
- photon
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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- 231100000434 photosensitization Toxicity 0.000 title description 2
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- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- TYIZUJNEZNBXRS-UHFFFAOYSA-K trifluorogadolinium Chemical compound F[Gd](F)F TYIZUJNEZNBXRS-UHFFFAOYSA-K 0.000 description 1
- NTUUXNCVRZQBFX-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-5-yl)ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1CCCC2OC12 NTUUXNCVRZQBFX-UHFFFAOYSA-N 0.000 description 1
- WLADIVUISABQHN-UHFFFAOYSA-N trimethyl(piperidin-1-yl)silane Chemical compound C[Si](C)(C)N1CCCCC1 WLADIVUISABQHN-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- BPLUKJNHPBNVQL-UHFFFAOYSA-N triphenylarsine Chemical class C1=CC=CC=C1[As](C=1C=CC=CC=1)C1=CC=CC=C1 BPLUKJNHPBNVQL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XKGLSKVNOSHTAD-UHFFFAOYSA-N valerophenone Chemical compound CCCCC(=O)C1=CC=CC=C1 XKGLSKVNOSHTAD-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- AWSFICBXMUKWSK-UHFFFAOYSA-N ytterbium(3+) Chemical compound [Yb+3] AWSFICBXMUKWSK-UHFFFAOYSA-N 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Polymerisation Methods In General (AREA)
- Luminescent Compositions (AREA)
- Glass Compositions (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Optical Communication System (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/033,507 US6750266B2 (en) | 2001-12-28 | 2001-12-28 | Multiphoton photosensitization system |
| US10/033,507 | 2001-12-28 | ||
| PCT/US2002/039473 WO2003058346A1 (en) | 2001-12-28 | 2002-12-09 | Multiphoton photosensitization system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2469095A1 true CA2469095A1 (en) | 2003-07-17 |
Family
ID=21870791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002469095A Abandoned CA2469095A1 (en) | 2001-12-28 | 2002-12-09 | Multiphoton photosensitization system |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6750266B2 (enExample) |
| EP (1) | EP1459132B1 (enExample) |
| JP (1) | JP4361799B2 (enExample) |
| KR (1) | KR100904926B1 (enExample) |
| CN (1) | CN1288498C (enExample) |
| AT (1) | ATE329292T1 (enExample) |
| AU (1) | AU2002363983A1 (enExample) |
| CA (1) | CA2469095A1 (enExample) |
| DE (1) | DE60212189T2 (enExample) |
| WO (1) | WO2003058346A1 (enExample) |
Families Citing this family (72)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| AU2001270320A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| EP1295180B1 (en) * | 2000-06-15 | 2013-05-22 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| KR100811017B1 (ko) * | 2000-06-15 | 2008-03-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 다중방향성 광반응성 흡수 방법 |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| EP1295179B1 (en) * | 2000-06-15 | 2013-05-22 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
| US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
| EP1292852B1 (en) * | 2000-06-15 | 2005-11-09 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
| US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| ATE440308T1 (de) * | 2000-06-15 | 2009-09-15 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| US8119041B2 (en) * | 2001-09-05 | 2012-02-21 | Fujifilm Corporation | Non-resonant two-photon absorption induction method and process for emitting light thereby |
| US20050164118A1 (en) * | 2002-01-31 | 2005-07-28 | Claus Barholm -Hansen | Method of joining a workpiece and a microstructure light exposure |
| US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
| US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
| US20040198857A1 (en) * | 2003-04-01 | 2004-10-07 | Dejneka Matthew J. | Photochemical reactions using multi-photon upconverting fluorescent inorganic materials |
| CN1795417B (zh) * | 2003-05-28 | 2010-12-29 | 松下电器产业株式会社 | 信息记录媒体及其制造方法、以及记录再现方法、光学信息记录再现装置 |
| US20040259030A1 (en) * | 2003-06-23 | 2004-12-23 | Hayden Joseph S. | Resonantly enhanced photosensitivity |
| JP2005092177A (ja) * | 2003-09-12 | 2005-04-07 | Rohm & Haas Electronic Materials Llc | 光学部品形成方法 |
| JP2005305735A (ja) * | 2004-04-20 | 2005-11-04 | Fuji Photo Film Co Ltd | 平版印刷版原版および平版印刷方法 |
| KR100651728B1 (ko) * | 2004-11-10 | 2006-12-06 | 한국전자통신연구원 | 정착기를 갖는 전자 소자용 화합물 및 이를 포함하는 전자소자와 이들의 제조 방법 |
| JP2008524401A (ja) | 2004-12-20 | 2008-07-10 | パフォーマンス インディケーター エルエルシー | 高輝度、持続性のフォトルミネセンス配合物およびフォトルミネセンス品、ならびにその製造方法 |
| US7910022B2 (en) | 2006-09-15 | 2011-03-22 | Performance Indicator, Llc | Phosphorescent compositions for identification |
| US7297374B1 (en) * | 2004-12-29 | 2007-11-20 | 3M Innovative Properties Company | Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| US20060154180A1 (en) * | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
| US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
| US7846639B2 (en) * | 2006-06-30 | 2010-12-07 | E. I. Du Pont De Nemours And Company | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element |
| US7551359B2 (en) * | 2006-09-14 | 2009-06-23 | 3M Innovative Properties Company | Beam splitter apparatus and system |
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| US20090041986A1 (en) * | 2007-06-21 | 2009-02-12 | 3M Innovative Properties Company | Method of making hierarchical articles |
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| JP2009216766A (ja) * | 2008-03-07 | 2009-09-24 | Toshiba Corp | ホログラム記録媒体 |
| CL2009000560A1 (es) | 2008-03-11 | 2010-02-19 | Univ Duke | Un metodo para endurecer un medio endurecible por radiacion que comprende colocar una composicion dentro de un objeto para ser endurecido, la aplicacion de al menos uno elegido entre rayos x, rayos gama o haz de electrones a traves del objeto y dentro de la composicion. |
| GB0823282D0 (en) * | 2008-12-20 | 2009-01-28 | Univ Strathclyde | Dose responsive UV indicator |
| CN102656205B (zh) * | 2009-12-17 | 2015-04-08 | 埃西勒国际通用光学公司 | 热固性环氧官能组合物以及由其制备的透明的热固性耐腐蚀硬质涂层 |
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| US9365658B2 (en) * | 2010-11-15 | 2016-06-14 | Eastman Kodak Company | Method of photocuring acrylate compositions |
| JP5995963B2 (ja) * | 2011-06-08 | 2016-09-21 | スリーエム イノベイティブ プロパティズ カンパニー | ポリマー連結ナノ粒子を含有するフォトレジスト |
| WO2013119134A1 (en) * | 2012-10-16 | 2013-08-15 | Eugen Pavel | Photoresist with rare-earth sensitizers |
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| JP6268152B2 (ja) * | 2015-12-18 | 2018-01-24 | 株式会社 エースネット | ラジカルの製造方法および酸化反応生成物の製造方法 |
| EP4599931A1 (en) | 2015-12-18 | 2025-08-13 | Acenet Inc. | A drug comprising a radical generating catalyst |
| JP6268151B2 (ja) * | 2015-12-18 | 2018-01-24 | 株式会社 エースネット | ラジカル発生触媒、ラジカルの製造方法および酸化反応生成物の製造方法 |
| US20220244650A1 (en) * | 2016-03-04 | 2022-08-04 | Nanotronix Inc. | Photoexcitation method |
| KR102337048B1 (ko) * | 2016-03-31 | 2021-12-07 | 스미또모 가가꾸 가부시끼가이샤 | 착색 경화성 수지 조성물, 컬러 필터 및 그것을 포함하는 표시 장치 |
| US10283476B2 (en) | 2017-03-15 | 2019-05-07 | Immunolight, Llc. | Adhesive bonding composition and electronic components prepared from the same |
| EP3501837A1 (en) * | 2017-12-21 | 2019-06-26 | Université de Haute Alsace | Thermal amplification of free radical polymerization induced by red to near-infrared irradiation |
| US11078302B2 (en) | 2018-05-10 | 2021-08-03 | North Carolina State University | Polymerization methods |
| JP7124511B2 (ja) * | 2018-07-20 | 2022-08-24 | 株式会社リコー | 活性エネルギー線硬化型インク |
| WO2020113018A1 (en) * | 2018-11-27 | 2020-06-04 | President And Fellows Of Harvard College | Photon upconversion nanocapsules for 3d printing and other applications |
| CN109991778A (zh) | 2019-04-11 | 2019-07-09 | 京东方科技集团股份有限公司 | 背光模组及显示设备 |
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| CN113246462B (zh) * | 2021-04-01 | 2022-05-17 | 厦门大学 | 一种在多孔薄膜中通过双光子聚合构建多层图案的方法 |
| CN114350357B (zh) * | 2022-01-11 | 2023-07-25 | 郑州大学 | 一种可循环快速检测孔雀石绿的荧光碳点的制备及应用 |
| DE102022116865A1 (de) * | 2022-07-06 | 2024-01-11 | PhoSuMa Photonic & Sustainable Materials | Heteroaromatische ketone und ihre verwendung in der radikalischen und kationischen polymerisation |
| TW202519566A (zh) * | 2023-07-21 | 2025-05-16 | 日商納美仕有限公司 | 光硬化性樹脂組成物、接著劑、密封材、塗佈劑、硬化物、半導體裝置、電子零件、以及使用光硬化性樹脂組成物之硬化、接著、密封及塗佈之方法 |
Family Cites Families (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3018262A (en) * | 1957-05-01 | 1962-01-23 | Shell Oil Co | Curing polyepoxides with certain metal salts of inorganic acids |
| US3954475A (en) * | 1971-09-03 | 1976-05-04 | Minnesota Mining And Manufacturing Company | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines |
| US3987037A (en) * | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
| US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
| US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
| US3741769A (en) * | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
| AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
| US4333165A (en) * | 1975-01-27 | 1982-06-01 | Formigraphic Engine Corporation | Three-dimensional pattern making methods |
| US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
| US4279717A (en) * | 1979-08-03 | 1981-07-21 | General Electric Company | Ultraviolet curable epoxy silicone coating compositions |
| US4394433A (en) * | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4642126A (en) * | 1985-02-11 | 1987-02-10 | Norton Company | Coated abrasives with rapidly curable adhesives and controllable curvature |
| US4652274A (en) * | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
| US4751138A (en) * | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| CA1323949C (en) * | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
| US4735632A (en) * | 1987-04-02 | 1988-04-05 | Minnesota Mining And Manufacturing Company | Coated abrasive binder containing ternary photoinitiator system |
| US4859572A (en) * | 1988-05-02 | 1989-08-22 | Eastman Kodak Company | Dye sensitized photographic imaging system |
| US5166236A (en) * | 1990-12-05 | 1992-11-24 | E. I. Du Pont De Nemours And Company | Crosslinkable fluoro elastomer composition |
| US5235015A (en) * | 1991-02-21 | 1993-08-10 | Minnesota Mining And Manufacturing Company | High speed aqueous solvent developable photopolymer compositions |
| JP3420765B2 (ja) | 1992-09-14 | 2003-06-30 | エス・アール・アイ・インターナシヨナル | レーザー励起技術を用いる生物学的および他の分析のためのアップコンバート性レポータ |
| US5674698A (en) * | 1992-09-14 | 1997-10-07 | Sri International | Up-converting reporters for biological and other assays using laser excitation techniques |
| TW268969B (enExample) * | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
| US5856373A (en) * | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
| AU7237896A (en) * | 1995-09-06 | 1997-03-27 | Research Foundation Of The State University Of New York, The | Two-photon upconverting dyes and applications |
| EP0968411A1 (en) | 1997-03-25 | 2000-01-05 | Photonic Research Systems Limited | Luminescence assays |
| US6054007A (en) * | 1997-04-09 | 2000-04-25 | 3M Innovative Properties Company | Method of forming shaped adhesives |
| US6025406A (en) * | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
| US5998495A (en) * | 1997-04-11 | 1999-12-07 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
| JP3774046B2 (ja) * | 1997-10-15 | 2006-05-10 | 大日本印刷株式会社 | 蛍光体組成物、蛍光体ペースト及び感光性ドライフイルム |
| ATE425993T1 (de) | 2000-06-15 | 2009-04-15 | 3M Innovative Properties Co | Multiphoton photosensibilisierungssystem |
| AU2001266920A1 (en) | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multiphoton absorption method using patterned light |
| ATE440308T1 (de) | 2000-06-15 | 2009-09-15 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
| AU2001270320A1 (en) | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| KR100811017B1 (ko) | 2000-06-15 | 2008-03-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 다중방향성 광반응성 흡수 방법 |
| EP1295179B1 (en) | 2000-06-15 | 2013-05-22 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
| KR100811018B1 (ko) | 2000-06-15 | 2008-03-14 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 물품에 구조를 형성 또는 추가하는 방법 |
| EP1295180B1 (en) | 2000-06-15 | 2013-05-22 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| EP1292852B1 (en) | 2000-06-15 | 2005-11-09 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
| JP2003029404A (ja) | 2001-07-12 | 2003-01-29 | Mitsubishi Chemicals Corp | 多光子励起感光性フォトポリマー組成物およびその露光方法 |
-
2001
- 2001-12-28 US US10/033,507 patent/US6750266B2/en not_active Expired - Lifetime
-
2002
- 2002-12-09 AU AU2002363983A patent/AU2002363983A1/en not_active Abandoned
- 2002-12-09 WO PCT/US2002/039473 patent/WO2003058346A1/en not_active Ceased
- 2002-12-09 EP EP02798501A patent/EP1459132B1/en not_active Expired - Lifetime
- 2002-12-09 CA CA002469095A patent/CA2469095A1/en not_active Abandoned
- 2002-12-09 CN CNB028262530A patent/CN1288498C/zh not_active Expired - Fee Related
- 2002-12-09 JP JP2003558597A patent/JP4361799B2/ja not_active Expired - Fee Related
- 2002-12-09 AT AT02798501T patent/ATE329292T1/de not_active IP Right Cessation
- 2002-12-09 DE DE60212189T patent/DE60212189T2/de not_active Expired - Lifetime
- 2002-12-09 KR KR1020047010070A patent/KR100904926B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1608230A (zh) | 2005-04-20 |
| KR100904926B1 (ko) | 2009-06-29 |
| US6750266B2 (en) | 2004-06-15 |
| AU2002363983A1 (en) | 2003-07-24 |
| EP1459132A1 (en) | 2004-09-22 |
| KR20040076267A (ko) | 2004-08-31 |
| DE60212189D1 (de) | 2006-07-20 |
| WO2003058346A1 (en) | 2003-07-17 |
| US20030139484A1 (en) | 2003-07-24 |
| CN1288498C (zh) | 2006-12-06 |
| EP1459132B1 (en) | 2006-06-07 |
| JP2005514658A (ja) | 2005-05-19 |
| DE60212189T2 (de) | 2007-04-12 |
| JP4361799B2 (ja) | 2009-11-11 |
| ATE329292T1 (de) | 2006-06-15 |
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