AU2002230007C1 - Forming a mark on a gemstone or industrial diamond - Google Patents
Forming a mark on a gemstone or industrial diamond Download PDFInfo
- Publication number
- AU2002230007C1 AU2002230007C1 AU2002230007A AU2002230007A AU2002230007C1 AU 2002230007 C1 AU2002230007 C1 AU 2002230007C1 AU 2002230007 A AU2002230007 A AU 2002230007A AU 2002230007 A AU2002230007 A AU 2002230007A AU 2002230007 C1 AU2002230007 C1 AU 2002230007C1
- Authority
- AU
- Australia
- Prior art keywords
- setting
- exposure
- radiation
- image
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 97
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 89
- 239000010437 gem Substances 0.000 title claims description 60
- 229910001751 gemstone Inorganic materials 0.000 title claims description 60
- 230000005855 radiation Effects 0.000 claims abstract description 106
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 35
- 230000003287 optical effect Effects 0.000 claims description 16
- 230000000873 masking effect Effects 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 4
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 238000005286 illumination Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000001393 microlithography Methods 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000000806 elastomer Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- URQUNWYOBNUYJQ-UHFFFAOYSA-N diazonaphthoquinone Chemical compound C1=CC=C2C(=O)C(=[N]=[N])C=CC2=C1 URQUNWYOBNUYJQ-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- -1 tungsten halogen Chemical class 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/22—Removing surface-material, e.g. by engraving, by etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/034—Observing the temperature of the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B3/00—Artist's machines or apparatus equipped with tools or work holders moving or able to be controlled substantially two- dimensionally for carving, engraving, or guilloching shallow ornamenting or markings
- B44B3/06—Accessories, e.g. tool or work holders
- B44B3/065—Work holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
- B44B5/02—Dies; Accessories
- B44B5/022—Devices for holding or supporting work
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
- C04B41/5338—Etching
- C04B41/5346—Dry etching
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Adornments (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Laser Beam Processing (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0103881.9A GB0103881D0 (en) | 2001-02-16 | 2001-02-16 | E-beam marking |
| GB0103881.9 | 2001-02-16 | ||
| PCT/GB2002/000709 WO2002066262A2 (en) | 2001-02-16 | 2002-02-18 | Forming a mark on a gemstone or industrial diamond |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| AU2002230007A1 AU2002230007A1 (en) | 2003-02-27 |
| AU2002230007B2 AU2002230007B2 (en) | 2005-12-15 |
| AU2002230007C1 true AU2002230007C1 (en) | 2006-07-06 |
Family
ID=9908917
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002230007A Ceased AU2002230007C1 (en) | 2001-02-16 | 2002-02-18 | Forming a mark on a gemstone or industrial diamond |
| AU2002231996A Ceased AU2002231996B2 (en) | 2001-02-16 | 2002-02-18 | Mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002231996A Ceased AU2002231996B2 (en) | 2001-02-16 | 2002-02-18 | Mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof |
Country Status (13)
| Country | Link |
|---|---|
| EP (2) | EP1361961B1 (enExample) |
| JP (2) | JP4331941B2 (enExample) |
| KR (2) | KR100896783B1 (enExample) |
| CN (2) | CN1247387C (enExample) |
| AT (2) | ATE552123T1 (enExample) |
| AU (2) | AU2002230007C1 (enExample) |
| CA (2) | CA2442584C (enExample) |
| GB (3) | GB0103881D0 (enExample) |
| IL (3) | IL157407A0 (enExample) |
| RU (2) | RU2279840C2 (enExample) |
| TW (2) | TW590863B (enExample) |
| WO (2) | WO2002066262A2 (enExample) |
| ZA (2) | ZA200306378B (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005039430A1 (de) * | 2005-08-18 | 2007-02-22 | Oc Oerlikon Balzers Ag | Lasermarkierung nahe der Oberfläche bei innenbearbeiteten transparenten Körpern |
| WO2007067696A1 (en) * | 2005-12-06 | 2007-06-14 | California Institute Of Technology | Enhancing the optical characteristics of a gemstone |
| KR100816681B1 (ko) * | 2006-07-18 | 2008-03-27 | 참앤씨(주) | 평판 트리밍을 위한 인스펙션 장치 |
| US8069688B2 (en) | 2006-12-06 | 2011-12-06 | California Institute Of Technology | Gemstones and methods for controlling the appearance thereof |
| JP5435901B2 (ja) * | 2008-06-28 | 2014-03-05 | 日本写真印刷株式会社 | 宝石をインサートした樹脂成形品の製造方法 |
| AT11232U1 (de) * | 2009-03-27 | 2010-07-15 | Swarovski & Co | Schmuckstein mit verspiegelter vorderseite |
| US9993895B2 (en) | 2009-03-30 | 2018-06-12 | Boegli-Gravures Sa | Method and device for structuring the surface of a hard material coated solid body by means of a laser |
| AT507883B1 (de) | 2009-05-19 | 2010-09-15 | Swarovski & Co | Spritzgegossener dekorationsartikel |
| CN102152231B (zh) * | 2011-01-28 | 2013-08-14 | 金华冠华水晶有限公司 | 将双端锥形的钻石坯固定朝向的设备 |
| RU2505386C2 (ru) * | 2011-09-28 | 2014-01-27 | ООО Научно-производственный центр "Лазеры и аппаратура ТМ" | Способ лазерной обработки материалов и устройство для его осуществления |
| US8928973B2 (en) * | 2011-12-16 | 2015-01-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Microscope apparatus for phase image acquisition |
| US11969819B2 (en) | 2013-04-26 | 2024-04-30 | Vactronix Scientific, Llc | Adaptive guide bushing for laser tube cutting systems |
| US10259080B1 (en) * | 2013-04-26 | 2019-04-16 | Vactronix Scientific, Llc | Adaptive guide bushing for laser tube cutting systems |
| HK1198858A2 (en) * | 2014-04-16 | 2015-06-12 | Master Dynamic Limited | Method of marking a solid state material, and solid state materials marked according to such a method |
| KR101559935B1 (ko) * | 2015-07-31 | 2015-10-14 | 윤선용 | 사전 왜곡한 이미지를 이용하여 보석 표면에 이미지를 출력하는 장치 및 방법 |
| RU2736998C2 (ru) * | 2016-02-24 | 2020-11-23 | Дэвид Юрман Айпи Ллк | Встроенный метеорит |
| CN107351591A (zh) * | 2016-05-09 | 2017-11-17 | 重庆长寿古镇文化旅游开发有限公司 | 古建筑或仿古建筑梁枋彩绘纹样线条快速放样装置和方法 |
| CN106226994A (zh) * | 2016-08-31 | 2016-12-14 | 北京埃德万斯离子束技术研究所股份有限公司 | 一种基于离子束刻蚀的打标方法及应用 |
| GB2555463A (en) * | 2016-10-31 | 2018-05-02 | De Beers Uk Ltd | Apparatus and method for applying a coating to gemstones |
| CN111757813A (zh) * | 2018-02-23 | 2020-10-09 | 动力专家有限公司 | 对固态材料打标的方法、从该方法形成的标记和根据该方法打标的固态材料 |
| RU2720100C1 (ru) * | 2019-03-26 | 2020-04-24 | Акционерная Компания "АЛРОСА" (публичное акционерное общество) (АК "АЛРОСА" (ПАО)) | Способ создания и детектирования оптически проницаемого изображения внутри алмаза и системы для детектирования (варианты) |
| CN110877494B (zh) * | 2019-12-28 | 2020-09-04 | 南京溧水高新创业投资管理有限公司 | 一种用于小型石板作画的雕刻机 |
| CN111319385A (zh) * | 2020-03-25 | 2020-06-23 | 赵国柱 | 首饰反射式投影图案的加工方法 |
| TWI814173B (zh) * | 2020-12-14 | 2023-09-01 | 香港商金展科技有限公司 | 在多個寶石的外表面形成可識別標記的方法和系統，以及根據這種方法標記的寶石 |
| WO2025074213A1 (en) * | 2023-10-03 | 2025-04-10 | Opsydia Limited | Gemstone inscription viewing system and applications thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997003846A1 (en) * | 1995-07-17 | 1997-02-06 | Gersan Establishment | Marking diamond |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3527198A (en) * | 1966-03-26 | 1970-09-08 | Tokyo Shibaura Electric Co | Method and apparatus for working diamonds by means of laser light beam |
| SU442046A1 (ru) * | 1972-02-21 | 1974-09-05 | Предприятие П/Я Р-6495 | Устройство дл разметки драгоценных камней |
| SU491986A1 (ru) * | 1974-08-13 | 1975-11-15 | Предприятие П/Я В-2438 | Способ изготовлени магнитной головки |
| JPS5290372A (en) * | 1976-01-23 | 1977-07-29 | Okuda Kazumi | Patter embossed diamond |
| SU695760A1 (ru) * | 1976-10-26 | 1979-11-05 | Предприятие П/Я Р-6564 | Способ изготовлени штампов |
| SU837782A1 (ru) * | 1978-08-22 | 1981-06-15 | Предприятие П/Я А-1536 | Приспособление дл изготовлени устрой-CTBA КРЕплЕНи зАгОТОВОК ОпТичЕСКиХлиНз |
| US4478677A (en) * | 1983-12-22 | 1984-10-23 | International Business Machines Corporation | Laser induced dry etching of vias in glass with non-contact masking |
| US5410125A (en) * | 1990-10-11 | 1995-04-25 | Harry Winston, S.A. | Methods for producing indicia on diamonds |
| JP3104433B2 (ja) | 1992-10-16 | 2000-10-30 | 住友電気工業株式会社 | ダイヤモンドのエッチング方法 |
| DE4439714C2 (de) * | 1994-11-09 | 1997-11-06 | Fraunhofer Ges Forschung | Verfahren zum Markieren, wie Kennzeichnen und/oder Beschriften, von Produkten in einem Fertigungsablauf unter Verwendung von Laserstrahlung |
| US5760367A (en) * | 1995-05-16 | 1998-06-02 | Engraving Technologies, Inc. | Apparatus and method of engraving indicia on gemstones, and gemstones, produced thereby |
| US5932119A (en) * | 1996-01-05 | 1999-08-03 | Lazare Kaplan International, Inc. | Laser marking system |
| IL124592A (en) * | 1997-05-23 | 2002-07-25 | Gersan Ets | Method of marking a gemstone or diamond |
| GB2325439A (en) | 1997-05-23 | 1998-11-25 | Gersan Ets | Marking diamond gemstone by plasma or ion beam etching through a laser ablated resist |
| US6291110B1 (en) * | 1997-06-27 | 2001-09-18 | Pixelligent Technologies Llc | Methods for transferring a two-dimensional programmable exposure pattern for photolithography |
| US6016185A (en) | 1997-10-23 | 2000-01-18 | Hugle Lithography | Lens array photolithography |
| EP1202776A1 (en) * | 1999-06-16 | 2002-05-08 | Norsam Technologies | Method apparatus and article of manufacture for a branding diamond branding with a focused ion beam |
| CN1264541A (zh) * | 2000-01-27 | 2000-08-30 | 李军 | 7%狼毒乌头碱白僵菌素悬浮剂及其生产方法 |
-
2001
- 2001-02-16 GB GBGB0103881.9A patent/GB0103881D0/en not_active Ceased
-
2002
- 2002-02-15 TW TW091102622A patent/TW590863B/zh not_active IP Right Cessation
- 2002-02-18 RU RU2003127842/12A patent/RU2279840C2/ru not_active IP Right Cessation
- 2002-02-18 RU RU2003127843/12A patent/RU2285619C2/ru not_active IP Right Cessation
- 2002-02-18 GB GB0321739A patent/GB2389340B/en not_active Expired - Fee Related
- 2002-02-18 AU AU2002230007A patent/AU2002230007C1/en not_active Ceased
- 2002-02-18 WO PCT/GB2002/000709 patent/WO2002066262A2/en not_active Ceased
- 2002-02-18 EP EP02711117A patent/EP1361961B1/en not_active Expired - Lifetime
- 2002-02-18 WO PCT/GB2002/000712 patent/WO2002066263A2/en not_active Ceased
- 2002-02-18 CA CA2442584A patent/CA2442584C/en not_active Expired - Fee Related
- 2002-02-18 EP EP02712089A patent/EP1365930B1/en not_active Expired - Lifetime
- 2002-02-18 JP JP2002565802A patent/JP4331941B2/ja not_active Expired - Fee Related
- 2002-02-18 AT AT02712089T patent/ATE552123T1/de active
- 2002-02-18 AU AU2002231996A patent/AU2002231996B2/en not_active Ceased
- 2002-02-18 CN CNB028083172A patent/CN1247387C/zh not_active Expired - Fee Related
- 2002-02-18 AT AT02711117T patent/ATE514564T1/de not_active IP Right Cessation
- 2002-02-18 JP JP2002565801A patent/JP4386640B2/ja not_active Expired - Fee Related
- 2002-02-18 IL IL15740702A patent/IL157407A0/xx active IP Right Grant
- 2002-02-18 CA CA002438728A patent/CA2438728C/en not_active Expired - Fee Related
- 2002-02-18 IL IL157429A patent/IL157429A/en not_active IP Right Cessation
- 2002-02-18 KR KR1020037010808A patent/KR100896783B1/ko not_active Expired - Fee Related
- 2002-02-18 TW TW091102670A patent/TW552187B/zh not_active IP Right Cessation
- 2002-02-18 KR KR1020037010809A patent/KR100978547B1/ko not_active Expired - Fee Related
- 2002-02-18 CN CNB028083148A patent/CN100340419C/zh not_active Expired - Fee Related
- 2002-02-18 GB GB0321740A patent/GB2389070B/en not_active Expired - Fee Related
-
2003
- 2003-08-14 IL IL157407A patent/IL157407A/en not_active IP Right Cessation
- 2003-08-15 ZA ZA200306378A patent/ZA200306378B/en unknown
- 2003-08-15 ZA ZA2003/06381A patent/ZA200306381B/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997003846A1 (en) * | 1995-07-17 | 1997-02-06 | Gersan Establishment | Marking diamond |
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