AU2002222663A1 - Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure - Google Patents

Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure

Info

Publication number
AU2002222663A1
AU2002222663A1 AU2002222663A AU2266302A AU2002222663A1 AU 2002222663 A1 AU2002222663 A1 AU 2002222663A1 AU 2002222663 A AU2002222663 A AU 2002222663A AU 2266302 A AU2266302 A AU 2266302A AU 2002222663 A1 AU2002222663 A1 AU 2002222663A1
Authority
AU
Australia
Prior art keywords
focusing characteristics
apparatusfor
managing
usage
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002222663A
Other languages
English (en)
Inventor
Tetsuo Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002222663A1 publication Critical patent/AU2002222663A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
AU2002222663A 2000-12-18 2001-12-17 Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure Abandoned AU2002222663A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000383086 2000-12-18
JP2000-383086 2000-12-18
JP2000383081 2000-12-18
JP2000-383081 2000-12-18
PCT/JP2001/011044 WO2002050506A1 (fr) 2000-12-18 2001-12-17 Appareil de mesure de surface d'onde et son utilisation, procede et appareil pour determiner des caracteristiques de mise au point, procede et appareil pour corriger des caracteristiques de mise au point, procede pour gerer des caracteristiques de mise au point, et procede et appareil d'exposition

Publications (1)

Publication Number Publication Date
AU2002222663A1 true AU2002222663A1 (en) 2002-07-01

Family

ID=26605990

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002222663A Abandoned AU2002222663A1 (en) 2000-12-18 2001-12-17 Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure

Country Status (3)

Country Link
JP (1) JPWO2002050506A1 (fr)
AU (1) AU2002222663A1 (fr)
WO (1) WO2002050506A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100893516B1 (ko) 2000-12-28 2009-04-16 가부시키가이샤 니콘 결상특성 계측방법, 결상특성 조정방법, 노광방법 및노광장치, 프로그램 및 기록매체, 그리고 디바이스 제조방법
TWI220999B (en) 2001-02-13 2004-09-11 Nikon Corp Measuring method of image formation characteristic, exposure method, exposure apparatus and its adjustment method, manufacture method of device, and recording medium
TWI223132B (en) 2002-01-29 2004-11-01 Nikon Corp Image formation state adjustment system, exposing method and exposing device and data recording medium
WO2003075328A1 (fr) 2002-03-01 2003-09-12 Nikon Corporation Procede de reglage d'un systeme optique de projection, procede de prediction, procede d'evaluation, procede de reglage, procede d'exposition, dispositif d'exposition, programme et procede de fabrication dudit dispositif
KR101117429B1 (ko) * 2003-10-31 2012-04-16 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
DE102004035595B4 (de) 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
US7333175B2 (en) * 2004-09-13 2008-02-19 Asml Netherlands, B.V. Method and system for aligning a first and second marker
JP4977068B2 (ja) * 2008-03-18 2012-07-18 株式会社東芝 画像採取装置及び試料検査装置
JP5859263B2 (ja) 2011-09-29 2016-02-10 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置および荷電粒子ビーム描画方法
JP6661371B2 (ja) * 2015-12-25 2020-03-11 キヤノン株式会社 評価方法、露光方法、および物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0599673A (ja) * 1991-10-09 1993-04-23 Topcon Corp 光学式測定装置
JPH0623654A (ja) * 1992-04-03 1994-02-01 Murata Mach Ltd 板材加工機の熱変位補正制御方法
JPH0764164A (ja) * 1993-08-30 1995-03-10 Sony Corp コンバージョンレンズ
JP3203972B2 (ja) * 1994-09-16 2001-09-04 三菱電機株式会社 波面センサ
JP3551570B2 (ja) * 1995-08-09 2004-08-11 株式会社ニコン 走査型露光装置及び露光方法
JPH10177206A (ja) * 1996-12-18 1998-06-30 Kyocera Corp カメラ
JPH10289865A (ja) * 1997-04-11 1998-10-27 Nikon Corp 投影露光装置及び投影露光方法
JP2000091209A (ja) * 1998-09-14 2000-03-31 Nikon Corp 露光装置の製造方法、露光装置、及びデバイス製造方法
JPH11251225A (ja) * 1998-03-05 1999-09-17 Nikon Corp 結像系、該結像系を備えた露光装置、前記結像系の使用方法、及び前記露光装置を用いたデバイスの製造方法
JP2000047103A (ja) * 1998-07-27 2000-02-18 Nikon Corp 投影光学系の調整方法
JP3774588B2 (ja) * 1999-04-06 2006-05-17 キヤノン株式会社 投影露光装置の波面測定方法、及び投影露光装置

Also Published As

Publication number Publication date
WO2002050506A1 (fr) 2002-06-27
JPWO2002050506A1 (ja) 2004-04-22

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