ATE85655T1 - Vorrichtung zur verdampfungsregelung. - Google Patents

Vorrichtung zur verdampfungsregelung.

Info

Publication number
ATE85655T1
ATE85655T1 AT88306432T AT88306432T ATE85655T1 AT E85655 T1 ATE85655 T1 AT E85655T1 AT 88306432 T AT88306432 T AT 88306432T AT 88306432 T AT88306432 T AT 88306432T AT E85655 T1 ATE85655 T1 AT E85655T1
Authority
AT
Austria
Prior art keywords
vaporizing
passageway
vaporizing apparatus
vapor
pumping means
Prior art date
Application number
AT88306432T
Other languages
English (en)
Inventor
John T Felts
Robert R Hoffman
James J Hofman
Original Assignee
Boc Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boc Group Inc filed Critical Boc Group Inc
Application granted granted Critical
Publication of ATE85655T1 publication Critical patent/ATE85655T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Paints Or Removers (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
AT88306432T 1987-07-15 1988-07-13 Vorrichtung zur verdampfungsregelung. ATE85655T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/073,676 US4847469A (en) 1987-07-15 1987-07-15 Controlled flow vaporizer
EP88306432A EP0299753B1 (de) 1987-07-15 1988-07-13 Vorrichtung zur Verdampfungsregelung

Publications (1)

Publication Number Publication Date
ATE85655T1 true ATE85655T1 (de) 1993-02-15

Family

ID=22115108

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88306432T ATE85655T1 (de) 1987-07-15 1988-07-13 Vorrichtung zur verdampfungsregelung.

Country Status (7)

Country Link
US (1) US4847469A (de)
EP (1) EP0299753B1 (de)
JP (1) JPH0722642B2 (de)
AT (1) ATE85655T1 (de)
CA (1) CA1295896C (de)
DE (1) DE3878328T2 (de)
ES (1) ES2037834T3 (de)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
US5098741A (en) * 1990-06-08 1992-03-24 Lam Research Corporation Method and system for delivering liquid reagents to processing vessels
US7323581B1 (en) 1990-07-06 2008-01-29 Advanced Technology Materials, Inc. Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
US5362328A (en) * 1990-07-06 1994-11-08 Advanced Technology Materials, Inc. Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem
US5711816A (en) * 1990-07-06 1998-01-27 Advanced Technolgy Materials, Inc. Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
US5224441A (en) * 1991-09-27 1993-07-06 The Boc Group, Inc. Apparatus for rapid plasma treatments and method
JP3353924B2 (ja) * 1992-04-30 2002-12-09 株式会社小松製作所 温湿度調整装置及びその制御方法
JP3115134B2 (ja) * 1992-11-27 2000-12-04 松下電器産業株式会社 薄膜処理装置および薄膜処理方法
US5464667A (en) * 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
US5614247A (en) * 1994-09-30 1997-03-25 International Business Machines Corporation Apparatus for chemical vapor deposition of aluminum oxide
US6699530B2 (en) * 1995-07-06 2004-03-02 Applied Materials, Inc. Method for constructing a film on a semiconductor wafer
TW322602B (de) * 1996-04-05 1997-12-11 Ehara Seisakusho Kk
EP0814177A3 (de) * 1996-05-23 2000-08-30 Ebara Corporation Verdampfer und Vorrichtung mit diesem Verdampfer zum Aufdampfen von Schichten
US5719417A (en) * 1996-11-27 1998-02-17 Advanced Technology Materials, Inc. Ferroelectric integrated circuit structure
US5876503A (en) * 1996-11-27 1999-03-02 Advanced Technology Materials, Inc. Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions
US5778681A (en) * 1997-04-15 1998-07-14 Varian Associates, Inc. Cooling device for cooling heatable gas chromatography analyte sample injector
US5882416A (en) * 1997-06-19 1999-03-16 Advanced Technology Materials, Inc. Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer
US6080446A (en) 1997-08-21 2000-06-27 Anelva Corporation Method of depositing titanium nitride thin film and CVD deposition apparatus
US6203898B1 (en) 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
US6224948B1 (en) 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
US5923970A (en) * 1997-11-20 1999-07-13 Advanced Technology Materials, Inc. Method of fabricating a ferrolelectric capacitor with a graded barrier layer structure
US5937141A (en) * 1998-02-13 1999-08-10 Swiatosz; Edmund Smoke generator method and apparatus
KR20010034781A (ko) * 1998-04-14 2001-04-25 잭 피. 샐러노 박막 증착 시스템
US6136725A (en) * 1998-04-14 2000-10-24 Cvd Systems, Inc. Method for chemical vapor deposition of a material on a substrate
US6296711B1 (en) 1998-04-14 2001-10-02 Cvd Systems, Inc. Film processing system
US6210485B1 (en) 1998-07-21 2001-04-03 Applied Materials, Inc. Chemical vapor deposition vaporizer
EP1127381B1 (de) 1998-11-02 2015-09-23 3M Innovative Properties Company Transparente leitfähige oxide für kunststoff-flachbildschirme
US6228436B1 (en) 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making light emitting polymer composite material
US6274204B1 (en) 1998-12-16 2001-08-14 Battelle Memorial Institute Method of making non-linear optical polymer
US6217947B1 (en) 1998-12-16 2001-04-17 Battelle Memorial Institute Plasma enhanced polymer deposition onto fixtures
US6207238B1 (en) 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition for high and/or low index of refraction polymers
US6228434B1 (en) 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making a conformal coating of a microtextured surface
EP1145338B1 (de) 1998-12-16 2012-12-05 Samsung Display Co., Ltd. Umwelt-sperrmaterial für organische elektrolumineszente vorrichtung und herstellungsverfahren
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6207239B1 (en) 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer
JP3470055B2 (ja) * 1999-01-22 2003-11-25 株式会社渡邊商行 Ｍｏｃｖｄ用気化器及び原料溶液の気化方法
US6506461B2 (en) 1999-03-31 2003-01-14 Battelle Memorial Institute Methods for making polyurethanes as thin films
US6358570B1 (en) 1999-03-31 2002-03-19 Battelle Memorial Institute Vacuum deposition and curing of oligomers and resins
KR100649852B1 (ko) * 1999-09-09 2006-11-24 동경 엘렉트론 주식회사 기화기 및 이것을 이용한 반도체 제조 시스템
US6413645B1 (en) 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
US7198832B2 (en) 1999-10-25 2007-04-03 Vitex Systems, Inc. Method for edge sealing barrier films
US6548912B1 (en) 1999-10-25 2003-04-15 Battelle Memorial Institute Semicoductor passivation using barrier coatings
US6623861B2 (en) 2001-04-16 2003-09-23 Battelle Memorial Institute Multilayer plastic substrates
US6866901B2 (en) 1999-10-25 2005-03-15 Vitex Systems, Inc. Method for edge sealing barrier films
US6573652B1 (en) 1999-10-25 2003-06-03 Battelle Memorial Institute Encapsulated display devices
GB0008286D0 (en) * 2000-04-04 2000-05-24 Applied Materials Inc A vaporiser for generating feed gas for an arc chamber
US6492026B1 (en) 2000-04-20 2002-12-10 Battelle Memorial Institute Smoothing and barrier layers on high Tg substrates
ATE535940T1 (de) * 2001-01-18 2011-12-15 Watanabe M & Co Ltd Verdampfer und die beschictungsvorrichtung mit dem verdampfer
US6637212B2 (en) 2001-04-27 2003-10-28 Matheson Tri-Gas Method and apparatus for the delivery of liquefied gases having constant impurity levels
US8900366B2 (en) 2002-04-15 2014-12-02 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US8808457B2 (en) 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7648925B2 (en) 2003-04-11 2010-01-19 Vitex Systems, Inc. Multilayer barrier stacks and methods of making multilayer barrier stacks
US7510913B2 (en) 2003-04-11 2009-03-31 Vitex Systems, Inc. Method of making an encapsulated plasma sensitive device
JP4152982B2 (ja) * 2003-05-26 2008-09-17 新明和工業株式会社 成膜装置及び成膜方法
US7727588B2 (en) * 2003-09-05 2010-06-01 Yield Engineering Systems, Inc. Apparatus for the efficient coating of substrates
JP2005101454A (ja) * 2003-09-26 2005-04-14 Watanabe Shoko:Kk 気化器
US7767498B2 (en) 2005-08-25 2010-08-03 Vitex Systems, Inc. Encapsulated devices and method of making
KR101511799B1 (ko) 2006-12-28 2015-04-13 쓰리엠 이노베이티브 프로퍼티즈 컴파니 박막 금속 층 형성을 위한 핵형성 층
US8350451B2 (en) 2008-06-05 2013-01-08 3M Innovative Properties Company Ultrathin transparent EMI shielding film comprising a polymer basecoat and crosslinked polymer transparent dielectric layer
US9184410B2 (en) 2008-12-22 2015-11-10 Samsung Display Co., Ltd. Encapsulated white OLEDs having enhanced optical output
US9337446B2 (en) 2008-12-22 2016-05-10 Samsung Display Co., Ltd. Encapsulated RGB OLEDs having enhanced optical output
WO2011005684A1 (en) * 2009-07-08 2011-01-13 American Hometec Non-metal electric heating system and method, and tankless water heater using the same
WO2011060444A2 (en) * 2009-11-16 2011-05-19 Fei Company Gas delivery for beam processing systems
US8590338B2 (en) 2009-12-31 2013-11-26 Samsung Mobile Display Co., Ltd. Evaporator with internal restriction
JP5368393B2 (ja) * 2010-08-05 2013-12-18 東京エレクトロン株式会社 気化装置、基板処理装置及び塗布現像装置
JP5236755B2 (ja) * 2011-01-14 2013-07-17 東京エレクトロン株式会社 成膜装置及び成膜方法
US9435477B2 (en) * 2011-03-22 2016-09-06 Sami Mustafa Creating thermal uniformity in heated piping and weldment systems
DE102012213385A1 (de) * 2012-07-30 2014-05-22 E.G.O. Elektro-Gerätebau GmbH Heizeinrichtung und Elektrogerät mit Heizeinrichtung
US20150219361A1 (en) * 2012-08-16 2015-08-06 Top Electric Appliances Industrial Ltd Device for heating and/or vaporizing a fluid such as water
US9186860B2 (en) 2013-01-28 2015-11-17 Carl D. Luenser Vaporizer kit for tobacco, medications, and the like
DE202016100917U1 (de) * 2016-02-22 2016-03-09 Türk & Hillinger GmbH Luft- und/oder Aerosolerhitzer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458948A (en) * 1967-07-07 1969-08-05 Curtis Dyna Prod Corp Apparatus for producing an aerosol
US3718805A (en) * 1971-01-13 1973-02-27 E Posey Heated fluid gun
DE3047602A1 (de) * 1976-06-26 1982-07-22 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum aufdampfen insbesondere sublimierbarer stoffe im vakuum mittels einer elektronenstrahlquelle
JPS563648Y2 (de) * 1977-10-12 1981-01-27
US4255646A (en) * 1978-03-03 1981-03-10 Sam Dick Industries, Inc. Electric liquefied petroleum gas vaporizer
US4447374A (en) * 1979-12-05 1984-05-08 The Tokyo Metropolitan Institute Of Medical Science Preparing replica film of specimen for electron microscopy
US4464932A (en) * 1982-07-12 1984-08-14 Mks Instruments, Inc. Thermal mass flowmetering
US4700660A (en) * 1984-06-12 1987-10-20 Kievsky Politekhnichesky Institut Evaporator for depositing films in a vacuum
JPH0685391B2 (ja) * 1984-10-09 1994-10-26 キヤノン株式会社 堆積膜形成方法

Also Published As

Publication number Publication date
EP0299753A2 (de) 1989-01-18
DE3878328D1 (de) 1993-03-25
US4847469A (en) 1989-07-11
JPH0722642B2 (ja) 1995-03-15
DE3878328T2 (de) 1993-05-27
CA1295896C (en) 1992-02-18
ES2037834T3 (es) 1993-07-01
JPS6485102A (en) 1989-03-30
EP0299753A3 (en) 1990-03-21
EP0299753B1 (de) 1993-02-10

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee