ATE516595T1 - Verdampfer und halbleiter- verarbeitungsvorrichtung - Google Patents

Verdampfer und halbleiter- verarbeitungsvorrichtung

Info

Publication number
ATE516595T1
ATE516595T1 AT04732201T AT04732201T ATE516595T1 AT E516595 T1 ATE516595 T1 AT E516595T1 AT 04732201 T AT04732201 T AT 04732201T AT 04732201 T AT04732201 T AT 04732201T AT E516595 T1 ATE516595 T1 AT E516595T1
Authority
AT
Austria
Prior art keywords
gas
evaporator
processing apparatus
vaporizing chamber
semiconductor processing
Prior art date
Application number
AT04732201T
Other languages
English (en)
Inventor
Hachishiro Iizuka
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of ATE516595T1 publication Critical patent/ATE516595T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
AT04732201T 2003-05-12 2004-05-11 Verdampfer und halbleiter- verarbeitungsvorrichtung ATE516595T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003132607 2003-05-12
JP2004121290A JP4185015B2 (ja) 2003-05-12 2004-04-16 気化原料の供給構造、原料気化器及び反応処理装置
PCT/JP2004/006609 WO2004100249A1 (ja) 2003-05-12 2004-05-11 気化器及び半導体処理装置

Publications (1)

Publication Number Publication Date
ATE516595T1 true ATE516595T1 (de) 2011-07-15

Family

ID=33436437

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04732201T ATE516595T1 (de) 2003-05-12 2004-05-11 Verdampfer und halbleiter- verarbeitungsvorrichtung

Country Status (6)

Country Link
US (1) US7666260B2 (de)
EP (1) EP1630859B1 (de)
JP (1) JP4185015B2 (de)
KR (1) KR100691038B1 (de)
AT (1) ATE516595T1 (de)
WO (1) WO2004100249A1 (de)

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CN100367471C (zh) * 2003-05-12 2008-02-06 东京毅力科创株式会社 气化器和半导体处理装置
JP4845385B2 (ja) * 2004-08-13 2011-12-28 東京エレクトロン株式会社 成膜装置
US7927423B1 (en) 2005-05-25 2011-04-19 Abbott Kenneth A Vapor deposition of anti-stiction layer for micromechanical devices
EP1752555A1 (de) * 2005-07-28 2007-02-14 Applied Materials GmbH & Co. KG Verdampfervorrichtung
JP4601535B2 (ja) * 2005-09-09 2010-12-22 株式会社リンテック 低温度で液体原料を気化させることのできる気化器
KR100792396B1 (ko) * 2005-10-11 2008-01-08 주식회사 유진테크 파티션 구조형 가열유닛과 이를 이용한 히팅장치
JP4263206B2 (ja) * 2005-11-15 2009-05-13 東京エレクトロン株式会社 熱処理方法、熱処理装置及び気化装置
JP4973071B2 (ja) * 2006-08-31 2012-07-11 東京エレクトロン株式会社 成膜装置
JP5179739B2 (ja) * 2006-09-27 2013-04-10 東京エレクトロン株式会社 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法
KR101480971B1 (ko) * 2006-10-10 2015-01-09 에이에스엠 아메리카, 인코포레이티드 전구체 전달 시스템
KR101155991B1 (ko) * 2007-06-27 2012-06-18 삼성전자주식회사 잉크젯 화상형성기기의 헤드칩 및 그 제조방법
US8297223B2 (en) * 2007-10-02 2012-10-30 Msp Corporation Method and apparatus for particle filtration and enhancing tool performance in film deposition
US20090214777A1 (en) * 2008-02-22 2009-08-27 Demetrius Sarigiannis Multiple ampoule delivery systems
US8590338B2 (en) * 2009-12-31 2013-11-26 Samsung Mobile Display Co., Ltd. Evaporator with internal restriction
KR101845580B1 (ko) 2011-01-19 2018-04-04 시케이디 가부시키가이샤 액체 기화기
TWI505400B (zh) * 2011-08-26 2015-10-21 Lg Siltron Inc 基座
JP5989944B2 (ja) 2011-09-30 2016-09-07 Ckd株式会社 液体制御装置
KR101892758B1 (ko) 2011-09-30 2018-10-04 시케이디 가부시키가이샤 액체 제어 장치
WO2013057228A1 (en) * 2011-10-21 2013-04-25 Oc Oerlikon Balzers Ag Direct liquid deposition
JP2013115208A (ja) * 2011-11-28 2013-06-10 Tokyo Electron Ltd 気化原料供給装置、これを備える基板処理装置、及び気化原料供給方法
JP5973178B2 (ja) * 2012-02-01 2016-08-23 Ckd株式会社 液体制御装置
JP6156972B2 (ja) * 2012-04-06 2017-07-05 株式会社日立国際電気 半導体装置の製造方法、基板処理装置、気化システムおよびミストフィルタ
JP5919089B2 (ja) * 2012-05-15 2016-05-18 Ckd株式会社 液体制御装置
US9598766B2 (en) * 2012-05-27 2017-03-21 Air Products And Chemicals, Inc. Vessel with filter
JP5919115B2 (ja) 2012-07-12 2016-05-18 Ckd株式会社 液体制御装置、及び液体制御装置に適用される網状体組立体
US9523151B2 (en) * 2014-02-21 2016-12-20 Tokyo Electron Limited Vaporizer unit with open cell core and method of operating
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
KR20200020608A (ko) 2018-08-16 2020-02-26 에이에스엠 아이피 홀딩 비.브이. 고체 소스 승화기
JP2021031769A (ja) * 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー．ブイ． 成膜原料混合ガス生成装置及び成膜装置
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
KR102660572B1 (ko) * 2021-11-23 2024-04-26 주식회사 레이크머티리얼즈 필터 모듈 및 그를 포함하는 유기금속 화합물 공급 장치
CN114318300B (zh) * 2021-12-30 2024-05-10 拓荆科技股份有限公司 一种半导体加工设备及其反应腔室、工艺管路穿腔模块

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US4550706A (en) * 1983-09-21 1985-11-05 Hoffman-Lewis, Ltd. Fuel vaporizer
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
JP3118493B2 (ja) * 1993-04-27 2000-12-18 菱電セミコンダクタシステムエンジニアリング株式会社 液体原料用ｃｖｄ装置
JPH0794426A (ja) 1993-09-24 1995-04-07 Ryoden Semiconductor Syst Eng Kk Ｃｖｄ装置
JP2642858B2 (ja) * 1993-12-20 1997-08-20 日本碍子株式会社 セラミックスヒーター及び加熱装置
JPH07310185A (ja) * 1994-05-12 1995-11-28 Hitachi Ltd Ｃｖｄガス供給装置
JP3676403B2 (ja) 1994-11-01 2005-07-27 アドバンスド エナジー ジャパン株式会社 液体の気化供給装置
US6074487A (en) * 1997-02-13 2000-06-13 Shimadzu Corporation Unit for vaporizing liquid materials
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
US6210485B1 (en) * 1998-07-21 2001-04-03 Applied Materials, Inc. Chemical vapor deposition vaporizer
JP2000119858A (ja) 1998-10-09 2000-04-25 Mitsubishi Materials Corp Ｃｖｄ装置用気化器
US6454860B2 (en) * 1998-10-27 2002-09-24 Applied Materials, Inc. Deposition reactor having vaporizing, mixing and cleaning capabilities
US6207239B1 (en) * 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer
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JP2001274145A (ja) 2000-03-24 2001-10-05 Mitsubishi Electric Corp 液体原料気化装置、半導体装置および半導体装置の製造方法
US20040000379A1 (en) * 2002-06-27 2004-01-01 Ulvac, Inc. Evaporation container and evaporation source
JP4056888B2 (ja) 2003-01-07 2008-03-05 株式会社島津製作所 気化器

Also Published As

Publication number Publication date
EP1630859B1 (de) 2011-07-13
EP1630859A1 (de) 2006-03-01
JP4185015B2 (ja) 2008-11-19
US7666260B2 (en) 2010-02-23
EP1630859A4 (de) 2009-08-26
US20070101940A1 (en) 2007-05-10
JP2004363562A (ja) 2004-12-24
KR100691038B1 (ko) 2007-03-12
WO2004100249A1 (ja) 2004-11-18
KR20050075420A (ko) 2005-07-20

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