ATE84636T1 - Bei einer mehrere halbleiterbausteine beinhaltenden verpackung fuer hohe ansprueche verwendbares mehrschichtenverbindungssystem. - Google Patents

Bei einer mehrere halbleiterbausteine beinhaltenden verpackung fuer hohe ansprueche verwendbares mehrschichtenverbindungssystem.

Info

Publication number
ATE84636T1
ATE84636T1 AT88303988T AT88303988T ATE84636T1 AT E84636 T1 ATE84636 T1 AT E84636T1 AT 88303988 T AT88303988 T AT 88303988T AT 88303988 T AT88303988 T AT 88303988T AT E84636 T1 ATE84636 T1 AT E84636T1
Authority
AT
Austria
Prior art keywords
system used
connection system
layer connection
high demands
multiple semiconductor
Prior art date
Application number
AT88303988T
Other languages
German (de)
English (en)
Inventor
Andrew L Wu
Original Assignee
Digital Equipment Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Digital Equipment Corp filed Critical Digital Equipment Corp
Application granted granted Critical
Publication of ATE84636T1 publication Critical patent/ATE84636T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H10W72/00—
    • H10W70/05—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143—Masks therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Pipeline Systems (AREA)
  • Branch Pipes, Bends, And The Like (AREA)
  • Communication Control (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
  • Luminescent Compositions (AREA)
  • Excavating Of Shafts Or Tunnels (AREA)
AT88303988T 1987-05-05 1988-05-03 Bei einer mehrere halbleiterbausteine beinhaltenden verpackung fuer hohe ansprueche verwendbares mehrschichtenverbindungssystem. ATE84636T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/046,160 US4770897A (en) 1987-05-05 1987-05-05 Multilayer interconnection system for multichip high performance semiconductor packaging
EP88303988A EP0290222B1 (en) 1987-05-05 1988-05-03 A multilayer interconnection system for multichip high performance semiconductor packaging

Publications (1)

Publication Number Publication Date
ATE84636T1 true ATE84636T1 (de) 1993-01-15

Family

ID=21941937

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88303988T ATE84636T1 (de) 1987-05-05 1988-05-03 Bei einer mehrere halbleiterbausteine beinhaltenden verpackung fuer hohe ansprueche verwendbares mehrschichtenverbindungssystem.

Country Status (11)

Country Link
US (1) US4770897A (enExample)
EP (1) EP0290222B1 (enExample)
JP (1) JPS6432663A (enExample)
KR (1) KR920007210B1 (enExample)
AT (1) ATE84636T1 (enExample)
AU (1) AU606411B2 (enExample)
CA (1) CA1284692C (enExample)
DE (1) DE3877412T2 (enExample)
DK (1) DK240888A (enExample)
FI (1) FI882058A7 (enExample)
IL (1) IL85982A (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124238A (en) * 1988-09-06 1992-06-23 The Boeing Company Fabrication of microelectronics using photosensitive polyimides
US5122440A (en) * 1988-09-06 1992-06-16 Chien Chung Ping Ultraviolet curing of photosensitive polyimides
US5276351A (en) * 1988-10-17 1994-01-04 Semiconductor Energy Laboratory Co., Ltd. Electronic device and a manufacturing method for the same
US5205036A (en) * 1988-10-17 1993-04-27 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device with selective coating on lead frame
US5127986A (en) * 1989-12-01 1992-07-07 Cray Research, Inc. High power, high density interconnect method and apparatus for integrated circuits
US5185502A (en) * 1989-12-01 1993-02-09 Cray Research, Inc. High power, high density interconnect apparatus for integrated circuits
US5067004A (en) * 1989-12-13 1991-11-19 Digital Equipment Corporation Module for interconnecting integrated circuits
US5102718A (en) * 1990-07-27 1992-04-07 Minnesota Mining And Manufacturing Company Multi-chip substrate
US5514449A (en) * 1990-07-27 1996-05-07 Minnesota Mining And Manufacturing Company Multi-chip substrate
US5196377A (en) * 1990-12-20 1993-03-23 Cray Research, Inc. Method of fabricating silicon-based carriers
US5518674A (en) * 1991-06-28 1996-05-21 Texas Instruments Incorporated Method of forming thin film flexible interconnect for infrared detectors
JPH05129760A (ja) * 1991-11-06 1993-05-25 Fujitsu Ltd 導体パターンの形成方法
DE69300616T2 (de) * 1992-04-30 1996-05-30 Ibm Silikon enthaltendes positives Photoresistmaterial und dessen Verwendung in Dünnfilm-Verpackung-Technologie.
US5609797A (en) * 1993-05-03 1997-03-11 The Boeing Company Method for recording refractive index patterns in polyimide films
EP0690494B1 (de) 1994-06-27 2004-03-17 Infineon Technologies AG Verbindungs- und Aufbautechnik für Multichip-Module
US5594297A (en) * 1995-04-19 1997-01-14 Texas Instruments Incorporated Field emission device metallization including titanium tungsten and aluminum
US5651857A (en) * 1995-09-08 1997-07-29 International Business Machines Corporation Sidewall spacer using an overhang
US5722162A (en) * 1995-10-12 1998-03-03 Fujitsu Limited Fabrication procedure for a stable post
US6077781A (en) * 1995-11-21 2000-06-20 Applied Materials, Inc. Single step process for blanket-selective CVD aluminum deposition
US5861341A (en) * 1996-07-15 1999-01-19 Raytheon Company Plated nickel-gold/dielectric interface for passivated MMICs
EP0924755A3 (en) * 1997-12-19 1999-12-29 CTS Corporation Method of fabricating a multilayer circuit board
US7335965B2 (en) * 1999-08-25 2008-02-26 Micron Technology, Inc. Packaging of electronic chips with air-bridge structures
US6537866B1 (en) * 2000-10-18 2003-03-25 Advanced Micro Devices, Inc. Method of forming narrow insulating spacers for use in reducing minimum component size
JP4733308B2 (ja) * 2001-07-27 2011-07-27 フランスベッド株式会社 クッション装置
US7300821B2 (en) * 2004-08-31 2007-11-27 Micron Technology, Inc. Integrated circuit cooling and insulating device and method
US7202562B2 (en) * 2004-12-02 2007-04-10 Micron Technology, Inc. Integrated circuit cooling system and method
US8635761B2 (en) 2011-09-19 2014-01-28 Xerox Corporation System and method for formation of electrical conductors on a substrate
WO2021222582A1 (en) * 2020-04-30 2021-11-04 Dujud Llc Methods and processes for forming electrical circuitries on three-dimensional geometries
US12520425B2 (en) 2020-04-30 2026-01-06 Dujud Llc Three-dimensional circuits with flexible interconnects
US12463137B2 (en) 2022-12-02 2025-11-04 International Business Machines Corporation Integrated circuit device with interconnects made of layered topological materials

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3427197A (en) * 1965-01-27 1969-02-11 Lockheed Aircraft Corp Method for plating thin titanium films
US3928670A (en) * 1974-09-23 1975-12-23 Amp Inc Selective plating on non-metallic surfaces
US3969751A (en) * 1974-12-18 1976-07-13 Rca Corporation Light shield for a semiconductor device comprising blackened photoresist
US4310568A (en) * 1976-12-29 1982-01-12 International Business Machines Corporation Method of fabricating improved Schottky barrier contacts
US4367119A (en) * 1980-08-18 1983-01-04 International Business Machines Corporation Planar multi-level metal process with built-in etch stop
US4568632A (en) * 1982-10-07 1986-02-04 International Business Machines Corporation Patterning of polyimide films with far ultraviolet light
US4624749A (en) * 1985-09-03 1986-11-25 Harris Corporation Electrodeposition of submicrometer metallic interconnect for integrated circuits
US4687552A (en) * 1985-12-02 1987-08-18 Tektronix, Inc. Rhodium capped gold IC metallization

Also Published As

Publication number Publication date
IL85982A0 (en) 1988-09-30
JPS6432663A (en) 1989-02-02
DK240888A (da) 1988-11-06
DE3877412D1 (de) 1993-02-25
DE3877412T2 (de) 1993-08-12
KR880014666A (ko) 1988-12-24
KR920007210B1 (ko) 1992-08-27
FI882058A0 (fi) 1988-05-03
JPH0563102B2 (enExample) 1993-09-09
EP0290222A3 (en) 1988-12-14
IL85982A (en) 1991-08-16
EP0290222B1 (en) 1993-01-13
US4770897A (en) 1988-09-13
CA1284692C (en) 1991-06-04
AU606411B2 (en) 1991-02-07
AU1500088A (en) 1988-11-10
FI882058A7 (fi) 1988-11-06
DK240888D0 (da) 1988-05-04
EP0290222A2 (en) 1988-11-09

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Legal Events

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