ATE61488T1 - Photomaskenreparaturverfahren durch laser induzierte polymerdegradation. - Google Patents

Photomaskenreparaturverfahren durch laser induzierte polymerdegradation.

Info

Publication number
ATE61488T1
ATE61488T1 AT85303093T AT85303093T ATE61488T1 AT E61488 T1 ATE61488 T1 AT E61488T1 AT 85303093 T AT85303093 T AT 85303093T AT 85303093 T AT85303093 T AT 85303093T AT E61488 T1 ATE61488 T1 AT E61488T1
Authority
AT
Austria
Prior art keywords
polymer
photomask
repair process
laser induced
polymer degradation
Prior art date
Application number
AT85303093T
Other languages
English (en)
Inventor
Peter L Young
Modest M Oprysko
Mark W Beranek
Original Assignee
Gould Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gould Inc filed Critical Gould Inc
Application granted granted Critical
Publication of ATE61488T1 publication Critical patent/ATE61488T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
AT85303093T 1984-06-20 1985-05-01 Photomaskenreparaturverfahren durch laser induzierte polymerdegradation. ATE61488T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/622,367 US4592975A (en) 1984-06-20 1984-06-20 Method for repairing a photomask by laser-induced polymer degradation
EP85303093A EP0165686B1 (de) 1984-06-20 1985-05-01 Photomaskenreparaturverfahren durch Laser induzierte Polymerdegradation

Publications (1)

Publication Number Publication Date
ATE61488T1 true ATE61488T1 (de) 1991-03-15

Family

ID=24493924

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85303093T ATE61488T1 (de) 1984-06-20 1985-05-01 Photomaskenreparaturverfahren durch laser induzierte polymerdegradation.

Country Status (5)

Country Link
US (1) US4592975A (de)
EP (1) EP0165686B1 (de)
JP (1) JPS6113247A (de)
AT (1) ATE61488T1 (de)
DE (1) DE3581961D1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2523633B2 (ja) * 1987-05-13 1996-08-14 株式会社日立製作所 レ−ザレ−ダの走査方法
US4960613A (en) * 1988-10-04 1990-10-02 General Electric Company Laser interconnect process
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
KR100190423B1 (ko) * 1989-06-06 1999-06-01 기타지마 요시도시 에멀젼마스크 등의결함 수정방법 및 장치
US5268245A (en) * 1992-07-09 1993-12-07 Polaroid Corporation Process for forming a filter on a solid state imager
US5405659A (en) * 1993-03-05 1995-04-11 University Of Puerto Rico Method and apparatus for removing material from a target by use of a ring-shaped elliptical laser beam and depositing the material onto a substrate
US6074571A (en) 1997-09-30 2000-06-13 International Business Machines Corporation Cut and blast defect to avoid chrome roll over annealing
US5981110A (en) * 1998-02-17 1999-11-09 International Business Machines Corporation Method for repairing photomasks
KR100732740B1 (ko) * 2001-06-13 2007-06-27 주식회사 하이닉스반도체 포토마스크 리페어 장치 및 리페어 방법
RU2471263C1 (ru) * 2011-07-12 2012-12-27 Мойше Самуилович Китай Способ создания маски на поверхности подложки

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1222071A (en) * 1967-03-13 1971-02-10 Agfa Gevaert Nv Light-sensitive photographic material
US3574657A (en) * 1967-12-14 1971-04-13 Fmc Corp Polymeric images formed by heat
US3549733A (en) * 1968-12-04 1970-12-22 Du Pont Method of producing polymeric printing plates
CA967365A (en) * 1970-10-12 1975-05-13 Fuji Photo Film Co. Laser recording method and material therefor
US3723121A (en) * 1970-11-03 1973-03-27 Du Pont Process for recording images with laser beams
BE793605A (fr) * 1972-01-03 1973-05-02 Rca Corp Appareil et procede pour corriger un masque photographique defectueux
US3847644A (en) * 1972-11-24 1974-11-12 Xerox Corp Imaging by phase aggregation from block copolymers
US4059461A (en) * 1975-12-10 1977-11-22 Massachusetts Institute Of Technology Method for improving the crystallinity of semiconductor films by laser beam scanning and the products thereof
US4200668A (en) * 1978-09-05 1980-04-29 Western Electric Company, Inc. Method of repairing a defective photomask
JPS5635130A (en) * 1979-08-31 1981-04-07 Fujitsu Ltd Resist material and method for forming resist pattern
US4340617A (en) * 1980-05-19 1982-07-20 Massachusetts Institute Of Technology Method and apparatus for depositing a material on a surface
US4340654A (en) * 1980-06-19 1982-07-20 Campi James G Defect-free photomask
US4444801A (en) * 1981-01-14 1984-04-24 Hitachi, Ltd. Method and apparatus for correcting transparent defects on a photomask
JPS586127A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd フオトマスク欠陥修正方法とその装置
JPS58203443A (ja) * 1982-05-24 1983-11-26 Hitachi Ltd ホトマスクの白点欠陥修正用組成物

Also Published As

Publication number Publication date
JPS6113247A (ja) 1986-01-21
EP0165686A2 (de) 1985-12-27
US4592975A (en) 1986-06-03
DE3581961D1 (de) 1991-04-11
EP0165686B1 (de) 1991-03-06
EP0165686A3 (en) 1988-01-27

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