ATE546396T1 - Vertikalversatzbeschichter und verwendungsverfahren - Google Patents

Vertikalversatzbeschichter und verwendungsverfahren

Info

Publication number
ATE546396T1
ATE546396T1 AT05784314T AT05784314T ATE546396T1 AT E546396 T1 ATE546396 T1 AT E546396T1 AT 05784314 T AT05784314 T AT 05784314T AT 05784314 T AT05784314 T AT 05784314T AT E546396 T1 ATE546396 T1 AT E546396T1
Authority
AT
Austria
Prior art keywords
substrate
coater
path
transport system
travel
Prior art date
Application number
AT05784314T
Other languages
English (en)
Inventor
Klaus Hartig
Original Assignee
Cardinal Cg Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal Cg Co filed Critical Cardinal Cg Co
Application granted granted Critical
Publication of ATE546396T1 publication Critical patent/ATE546396T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02—Controlled or contamination-free environments or clean space conditions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/365—Coating different sides of a glass substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
AT05784314T 2004-08-12 2005-08-05 Vertikalversatzbeschichter und verwendungsverfahren ATE546396T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60092304P 2004-08-12 2004-08-12
PCT/US2005/028003 WO2006020533A2 (en) 2004-08-12 2005-08-05 Vertical-offset coater and methods of use

Publications (1)

Publication Number Publication Date
ATE546396T1 true ATE546396T1 (de) 2012-03-15

Family

ID=35908056

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05784314T ATE546396T1 (de) 2004-08-12 2005-08-05 Vertikalversatzbeschichter und verwendungsverfahren

Country Status (6)

Country Link
US (2) US7678198B2 (de)
EP (1) EP1781560B1 (de)
JP (1) JP2008509805A (de)
AT (1) ATE546396T1 (de)
CA (1) CA2554011A1 (de)
WO (1) WO2006020533A2 (de)

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KR20060134363A (ko) * 2005-06-22 2006-12-28 엘지.필립스 엘시디 주식회사 경사형 캐리어 이송 장치
CN101626969A (zh) * 2007-03-07 2010-01-13 株式会社爱发科 真空装置、基板搬送方法
US7954627B2 (en) * 2007-03-23 2011-06-07 Btsystems, Llc Bin transporter system
DE102007022431A1 (de) * 2007-05-09 2008-11-13 Leybold Optics Gmbh Behandlungssystem für flache Substrate
DE102007052524B4 (de) * 2007-11-01 2012-05-31 Von Ardenne Anlagentechnik Gmbh Transportmittel und Vakuumbeschichtungsanlage für Substrate unterschiedlicher Größe
US9782949B2 (en) 2008-05-30 2017-10-10 Corning Incorporated Glass laminated articles and layered articles
TWI502751B (zh) * 2008-09-05 2015-10-01 First Solar Inc 經塗覆基材及包含該基材的半導體元件
US20100059115A1 (en) 2008-09-05 2010-03-11 First Solar, Inc. Coated Substrates and Semiconductor Devices Including the Substrates
US8842357B2 (en) 2008-12-31 2014-09-23 View, Inc. Electrochromic device and method for making electrochromic device
US8432603B2 (en) * 2009-03-31 2013-04-30 View, Inc. Electrochromic devices
JP6049051B2 (ja) * 2011-07-29 2016-12-21 日東電工株式会社 両面真空成膜方法
DE102011083139B4 (de) * 2011-09-21 2013-12-24 Von Ardenne Anlagentechnik Gmbh Substratbehandlungsverfahren und Substratbehandlungsanlage
CN104011588B (zh) 2011-12-12 2021-06-22 唯景公司 薄膜装置和制造
EP2650135A1 (de) * 2012-04-12 2013-10-16 KBA-NotaSys SA Intaglio-Druckplattenbeschichtungsvorrichtung
WO2014031119A1 (en) 2012-08-23 2014-02-27 National University Corporation Tokyo University Of Agriculture And Technology Highly transparent aluminum nitride single crystalline layers and devices made therefrom
WO2014120637A1 (en) 2013-01-29 2014-08-07 Hexatech, Inc. Optoelectronic devices incorporating single crystalline aluminum nitride substrate
WO2014159954A1 (en) 2013-03-14 2014-10-02 Hexatech, Inc. Power semiconductor devices incorporating single crystalline aluminum nitride substrate
FR3005654B1 (fr) * 2013-05-17 2017-03-24 Saint Gobain Procede de depot de revetements sur un substrat
US11688589B2 (en) * 2013-06-10 2023-06-27 View, Inc. Carrier with vertical grid for supporting substrates in coater
US9321259B2 (en) * 2013-11-11 2016-04-26 Lee Milazzo Anti-friction roller
CN204058252U (zh) * 2014-07-15 2014-12-31 河南康平光电高科有限公司 一种玻璃镀膜机用装片架
EP3387163B1 (de) * 2015-12-11 2020-04-29 Cardinal CG Company Verfahren zur beidseitigen beschichtung eines substrats
WO2019223952A1 (en) * 2018-05-23 2019-11-28 Agc Glass Europe Double sided coated glass substrate and method for making the same
EP3999459A1 (de) * 2019-07-19 2022-05-25 Saint-Gobain Glass France Vorrichtung zum fördern einer substratbahn
CN113145415B (zh) * 2021-04-26 2023-03-24 芜湖东信光电科技有限公司 超薄柔性玻璃的表面涂布方法

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GB1442314A (en) 1973-07-20 1976-07-14 Triplex Safety Glass Co Heat treatment of glass sheets
US4194962A (en) 1978-12-20 1980-03-25 Advanced Coating Technology, Inc. Cathode for sputtering
US4890714A (en) 1986-02-14 1990-01-02 Brown H Gary Conveying system
FR2596920A1 (fr) 1986-04-03 1987-10-09 Saint Roch Sa Glaceries Cathode de pulverisation
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DE3702775A1 (de) * 1987-01-30 1988-08-11 Leybold Ag Vorrichtung zum quasi-kontinuierlichen behandeln von substraten
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Also Published As

Publication number Publication date
US7678198B2 (en) 2010-03-16
CA2554011A1 (en) 2006-02-23
US8906206B2 (en) 2014-12-09
JP2008509805A (ja) 2008-04-03
EP1781560A2 (de) 2007-05-09
US20060035021A1 (en) 2006-02-16
WO2006020533A2 (en) 2006-02-23
WO2006020533A3 (en) 2006-08-24
US20100221422A1 (en) 2010-09-02
EP1781560B1 (de) 2012-02-22

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