ATE545137T1 - Verfahren zur herstellung von leitfähigen partikeln - Google Patents

Verfahren zur herstellung von leitfähigen partikeln

Info

Publication number
ATE545137T1
ATE545137T1 AT06123112T AT06123112T ATE545137T1 AT E545137 T1 ATE545137 T1 AT E545137T1 AT 06123112 T AT06123112 T AT 06123112T AT 06123112 T AT06123112 T AT 06123112T AT E545137 T1 ATE545137 T1 AT E545137T1
Authority
AT
Austria
Prior art keywords
particle
nano powder
layer
conductive particles
forming
Prior art date
Application number
AT06123112T
Other languages
English (en)
Inventor
Mi-Jung Lee
Sung-Jei Hong
Won-Keun Kim
Jeong-In Han
Original Assignee
Korea Electronics Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Electronics Technology filed Critical Korea Electronics Technology
Application granted granted Critical
Publication of ATE545137T1 publication Critical patent/ATE545137T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1639Substrates other than metallic, e.g. inorganic or organic or non-conductive
    • C23C18/1641Organic substrates, e.g. resin, plastic
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2053Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
    • C23C18/206Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemically Coating (AREA)
  • Non-Insulated Conductors (AREA)
AT06123112T 2005-10-31 2006-10-27 Verfahren zur herstellung von leitfähigen partikeln ATE545137T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050102912A KR100765363B1 (ko) 2005-10-31 2005-10-31 도전성 입자의 제조 방법

Publications (1)

Publication Number Publication Date
ATE545137T1 true ATE545137T1 (de) 2012-02-15

Family

ID=37692449

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06123112T ATE545137T1 (de) 2005-10-31 2006-10-27 Verfahren zur herstellung von leitfähigen partikeln

Country Status (6)

Country Link
US (1) US20070098976A1 (de)
EP (1) EP1780731B1 (de)
JP (1) JP4485508B2 (de)
KR (1) KR100765363B1 (de)
CN (1) CN1959867B (de)
AT (1) ATE545137T1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101173199B1 (ko) * 2007-09-10 2012-08-10 주식회사 엘지화학 환경친화적 도전성 입자 및 그 제조방법과 상기 도전성입자를 포함하는 이방 도전성 접착재료
KR101114425B1 (ko) * 2009-12-22 2012-03-05 엘에스전선 주식회사 표면입자 뭉침이 제거된 나노복합 입자체 및 그 제조방법
JP5792963B2 (ja) * 2011-02-01 2015-10-14 早川ゴム株式会社 グラフェン構造を持つナノ構造体の吸着方法及びその吸着方法を用いた無電解メッキ方法
US9765251B2 (en) * 2012-12-18 2017-09-19 University Of South Florida Encapsulation of thermal energy storage media
WO2016100477A1 (en) * 2014-12-16 2016-06-23 The Procter & Gamble Company Compositions providing delayed release of actives
EP3233266B1 (de) 2014-12-16 2020-05-06 Noxell Corporation Überzogene mikrokapseln
US9944887B2 (en) 2014-12-16 2018-04-17 Noxell Corporation Coated microcapsules
EP3888782B1 (de) 2014-12-16 2025-06-11 Noxell Corporation Überzogene mikrokapseln
EP3233264B1 (de) 2014-12-16 2019-05-08 Noxell Corporation Beschichtete mikrokapseln
KR102124997B1 (ko) * 2018-10-05 2020-06-22 주식회사 아이에스시 도전성 입자의 제조방법 및 그 제조방법으로 제조된 도전성 입자
JP6962307B2 (ja) * 2018-12-10 2021-11-05 昭和電工マテリアルズ株式会社 異方導電性接着剤用の導電性粒子
CN115667579B (zh) * 2020-05-20 2025-03-25 日本化学工业株式会社 导电性颗粒的制造方法和导电性颗粒
KR102581070B1 (ko) * 2021-09-13 2023-09-21 주식회사 엠엠에스코퍼레이션 막 치밀도를 향상시킨 전도성 분말의 제조방법 및 이에 의하여 제조된 막 치밀도를 향상시킨 전도성 분말

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740657A (en) * 1986-02-14 1988-04-26 Hitachi, Chemical Company, Ltd Anisotropic-electroconductive adhesive composition, method for connecting circuits using the same, and connected circuit structure thus obtained
JPH0850808A (ja) * 1994-08-05 1996-02-20 Sekisui Finechem Co Ltd 導電性微粒子の製造方法
JP3417699B2 (ja) * 1994-12-26 2003-06-16 日本化学工業株式会社 導電性無電解めっき粉体
JPH09171714A (ja) * 1995-12-21 1997-06-30 Nippon Chem Ind Co Ltd 導電性粉体
JP3137578B2 (ja) * 1996-02-27 2001-02-26 ソニーケミカル株式会社 異方性導電接着フィルム用導電粒子及びその製造方法並びに異方性導電接着フィルム
JP3696429B2 (ja) 1999-02-22 2005-09-21 日本化学工業株式会社 導電性無電解めっき粉体とその製造方法並びに該めっき粉体からなる導電性材料
US6485831B1 (en) * 1999-05-13 2002-11-26 Shin-Etsu Chemical Co., Ltd. Conductive powder and making process
ATE243374T1 (de) * 1999-10-22 2003-07-15 Shinetsu Polymer Co Verbindungselement aus gummi
JP4347974B2 (ja) * 2000-01-05 2009-10-21 積水化学工業株式会社 導電性微粒子の製造方法、異方性導電接着剤及び導電接続構造体
JP4085228B2 (ja) * 2000-10-20 2008-05-14 信越化学工業株式会社 金属被覆粉体及びその製造方法
KR100484383B1 (ko) * 2000-12-28 2005-04-20 히다치 가세고교 가부시끼가이샤 이방도전성 회로 접속용 접착제 및 이들을 이용한회로판의 접속방법 및 회로접속 구조체
US20020197404A1 (en) * 2001-04-12 2002-12-26 Chang Chun Plastics Co., Ltd., Taiwan R.O.C. Method of activating non-conductive substrate for use in electroless deposition
KR20040019089A (ko) * 2001-07-31 2004-03-04 세키스이가가쿠 고교가부시키가이샤 도전성 미립자의 제조 방법
TW557237B (en) * 2001-09-14 2003-10-11 Sekisui Chemical Co Ltd Coated conductive particle, coated conductive particle manufacturing method, anisotropic conductive material, and conductive connection structure
KR100624155B1 (ko) * 2003-09-09 2006-09-19 조인셋 주식회사 도전성 실리콘 파우더와 그 제조방법 및 이를 적용한 이방도전성 필름 및 도전성 페이스트
KR100656518B1 (ko) * 2003-10-30 2006-12-11 제일모직주식회사 다층 표면개질된 도전성 미립자, 그의 제조방법 및 이를 이용한 이방 도전성 필름
KR100621463B1 (ko) * 2003-11-06 2006-09-13 제일모직주식회사 절연 전도성 미립자 및 이를 함유하는 이방 전도성 필름
KR100651177B1 (ko) * 2004-12-10 2006-11-29 제일모직주식회사 돌기형 도전성 미립자 및 이를 포함하는 이방 도전성 필름

Also Published As

Publication number Publication date
KR100765363B1 (ko) 2007-10-09
EP1780731A1 (de) 2007-05-02
EP1780731B1 (de) 2012-02-08
JP4485508B2 (ja) 2010-06-23
JP2007128878A (ja) 2007-05-24
CN1959867B (zh) 2010-07-07
CN1959867A (zh) 2007-05-09
US20070098976A1 (en) 2007-05-03

Similar Documents

Publication Publication Date Title
ATE545137T1 (de) Verfahren zur herstellung von leitfähigen partikeln
WO2008142070A3 (de) Verfahren zur herstellung von polymerbeschichteten metallfolien sowie verwendung davon
EP1986200A4 (de) Zusammengesetztes magnetisches blatt und herstellungsprozess dafür
WO2008081784A1 (ja) 三次元形状造形物の製造方法
ATE482608T1 (de) Elektronische baugruppe und verfahren zur herstellung einer elektronischen baugruppe
PL2029317T3 (pl) Sposób wytwarzania korbowodu
ATE533621T1 (de) Verbundbauteil aus wärmehärtenden harzen und elastomeren, verfahren zur herstellung und verwendung eines solchen verbundteils
WO2013095908A3 (en) Process for preparing cured epoxy composites
TW200709230A (en) Process for producing articles having an electrically conductive coating
Bernasconi et al. Electroless plating of NiP and Cu on polylactic acid and polyethylene terephthalate glycol-modified for 3D printed flexible substrates
IN2012DN03175A (de)
ATE502087T1 (de) Verfahren zur herstellung von schuppenförmigen partikeln
US20060042954A1 (en) Method for plating resin material
EP1724299A4 (de) Modifizierungsmittel für harz und harzzusammensetzung damit und formkörper
EP1802184A4 (de) Verfahren zur herstellung eines leitfähigen strukturmaterials
CN104394664A (zh) 一种加强塑胶基底立体电路可靠性的方法及其制备的装置
ATE447479T1 (de) Verfahren zur herstellung von flugzeugsperren aus verbundmaterial aus kohlenstoff
WO2008015169A3 (de) Thermoplastische formmasse zur herstellung galvanisch metallisierbarer formteile
CN104005027B (zh) 一种含硅环氧树脂表面金属化的方法
TW200704507A (en) Method for making high anti-flexion flexible copper clad laminate board
KR101738494B1 (ko) 전자파 차폐용 구리 분말의 은 코팅 방법
WO2014111010A1 (zh) 导电通孔的封孔方法及封孔产品
DE502004007794D1 (de) Herstellung elektrisch leitfähiger, flexibler flächengebilde
JP5083005B2 (ja) 表層に貴金属を固定させた樹脂基板、その製造方法、回路基板、及びその製造方法
ATE523276T1 (de) Verfahren zur herstellung von kettenmetallpulvern,dadurch hergestellte kettenmetallpulver und durch verwendung der pulver hergestellte anisotrope leitende filme