ATE525638T1 - Verfahren und vorrichtung zur gleichzeitigen 2d- und topographischen untersuchung - Google Patents
Verfahren und vorrichtung zur gleichzeitigen 2d- und topographischen untersuchungInfo
- Publication number
- ATE525638T1 ATE525638T1 AT04701074T AT04701074T ATE525638T1 AT E525638 T1 ATE525638 T1 AT E525638T1 AT 04701074 T AT04701074 T AT 04701074T AT 04701074 T AT04701074 T AT 04701074T AT E525638 T1 ATE525638 T1 AT E525638T1
- Authority
- AT
- Austria
- Prior art keywords
- simultaneous
- optical elements
- information
- acquire
- topographic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N2021/1765—Method using an image detector and processing of image signal
- G01N2021/177—Detector of the video camera type
- G01N2021/1772—Array detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N2021/178—Methods for obtaining spatial resolution of the property being measured
- G01N2021/1785—Three dimensional
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43878303P | 2003-01-09 | 2003-01-09 | |
PCT/IL2004/000019 WO2004063668A2 (en) | 2003-01-09 | 2004-01-09 | Method and apparatus for simultaneous 2-d and topographical inspection |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE525638T1 true ATE525638T1 (de) | 2011-10-15 |
Family
ID=32713379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04701074T ATE525638T1 (de) | 2003-01-09 | 2004-01-09 | Verfahren und vorrichtung zur gleichzeitigen 2d- und topographischen untersuchung |
Country Status (8)
Country | Link |
---|---|
US (1) | US7253891B2 (de) |
EP (1) | EP1581781B1 (de) |
JP (1) | JP2006515676A (de) |
KR (1) | KR20050096125A (de) |
CN (1) | CN1788194A (de) |
AT (1) | ATE525638T1 (de) |
TW (1) | TWI298097B (de) |
WO (1) | WO2004063668A2 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7315383B1 (en) * | 2004-07-09 | 2008-01-01 | Mohsen Abdollahi | Scanning 3D measurement technique using structured lighting and high-speed CMOS imager |
CN102007513A (zh) * | 2005-08-26 | 2011-04-06 | 卡姆特有限公司 | 用于检查物体的设备和方法 |
KR100585270B1 (ko) * | 2005-12-14 | 2006-05-30 | 에이티아이 주식회사 | 2개 영상을 이용한 물체 표면 형상 및 컬러 정보 획득시스템 및 방법 |
JP5276833B2 (ja) * | 2007-02-28 | 2013-08-28 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及び欠陥検査装置 |
US7847927B2 (en) | 2007-02-28 | 2010-12-07 | Hitachi High-Technologies Corporation | Defect inspection method and defect inspection apparatus |
JP2009222689A (ja) * | 2008-03-19 | 2009-10-01 | Nuflare Technology Inc | 検査装置 |
US9482755B2 (en) | 2008-11-17 | 2016-11-01 | Faro Technologies, Inc. | Measurement system having air temperature compensation between a target and a laser tracker |
JP5542367B2 (ja) * | 2009-05-08 | 2014-07-09 | 池上通信機株式会社 | 外観検査装置及び外観検査用の光学装置 |
WO2011049190A1 (ja) * | 2009-10-24 | 2011-04-28 | 株式会社Djtech | 外観検査装置及び印刷半田検査装置 |
JP5621178B2 (ja) * | 2009-10-24 | 2014-11-05 | 株式会社第一メカテック | 外観検査装置及び印刷半田検査装置 |
US9035673B2 (en) | 2010-01-25 | 2015-05-19 | Palo Alto Research Center Incorporated | Method of in-process intralayer yield detection, interlayer shunt detection and correction |
US9772394B2 (en) | 2010-04-21 | 2017-09-26 | Faro Technologies, Inc. | Method and apparatus for following an operator and locking onto a retroreflector with a laser tracker |
US9377885B2 (en) | 2010-04-21 | 2016-06-28 | Faro Technologies, Inc. | Method and apparatus for locking onto a retroreflector with a laser tracker |
US9400170B2 (en) | 2010-04-21 | 2016-07-26 | Faro Technologies, Inc. | Automatic measurement of dimensional data within an acceptance region by a laser tracker |
US8619265B2 (en) | 2011-03-14 | 2013-12-31 | Faro Technologies, Inc. | Automatic measurement of dimensional data with a laser tracker |
TW201215845A (en) * | 2010-10-05 | 2012-04-16 | Machvision Inc | Illumination system for automatic optical inspection and assembly of it and camera system |
US8902408B2 (en) | 2011-02-14 | 2014-12-02 | Faro Technologies Inc. | Laser tracker used with six degree-of-freedom probe having separable spherical retroreflector |
GB2518769A (en) | 2011-03-03 | 2015-04-01 | Faro Tech Inc | Target apparatus and method |
JP2014516409A (ja) | 2011-04-15 | 2014-07-10 | ファロ テクノロジーズ インコーポレーテッド | レーザトラッカの改良位置検出器 |
US9686532B2 (en) | 2011-04-15 | 2017-06-20 | Faro Technologies, Inc. | System and method of acquiring three-dimensional coordinates using multiple coordinate measurement devices |
US9482529B2 (en) | 2011-04-15 | 2016-11-01 | Faro Technologies, Inc. | Three-dimensional coordinate scanner and method of operation |
US9164173B2 (en) | 2011-04-15 | 2015-10-20 | Faro Technologies, Inc. | Laser tracker that uses a fiber-optic coupler and an achromatic launch to align and collimate two wavelengths of light |
JP6099675B2 (ja) | 2012-01-27 | 2017-03-22 | ファロ テクノロジーズ インコーポレーテッド | バーコード識別による検査方法 |
JP5773939B2 (ja) | 2012-04-27 | 2015-09-02 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置および欠陥検査方法 |
US9279722B2 (en) * | 2012-04-30 | 2016-03-08 | Agilent Technologies, Inc. | Optical emission system including dichroic beam combiner |
US9041914B2 (en) | 2013-03-15 | 2015-05-26 | Faro Technologies, Inc. | Three-dimensional coordinate scanner and method of operation |
US9116038B2 (en) * | 2013-08-19 | 2015-08-25 | International Business Machines Corporation | Integrated optical illumination reference source |
TWI489101B (zh) * | 2013-12-02 | 2015-06-21 | Ind Tech Res Inst | 結合三維及二維形貌之量測方法及裝置 |
US9395174B2 (en) | 2014-06-27 | 2016-07-19 | Faro Technologies, Inc. | Determining retroreflector orientation by optimizing spatial fit |
US10724947B2 (en) * | 2015-04-14 | 2020-07-28 | Cognex Corporation | System and method for acquiring images of surface texture |
WO2020049551A1 (en) | 2018-09-06 | 2020-03-12 | Orbotech Ltd. | Multimodality multiplexed illumination for optical inspection systems |
DE102022132162A1 (de) * | 2022-12-05 | 2024-06-06 | Witrins S.R.O. | Verfahren zur Fehleranalyse und Inspektionssystem |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4845373A (en) * | 1984-02-22 | 1989-07-04 | Kla Instruments Corporation | Automatic alignment apparatus having low and high resolution optics for coarse and fine adjusting |
US5774572A (en) * | 1984-12-20 | 1998-06-30 | Orbotech Ltd. | Automatic visual inspection system |
US4741621A (en) * | 1986-08-18 | 1988-05-03 | Westinghouse Electric Corp. | Geometric surface inspection system with dual overlap light stripe generator |
US5058178A (en) * | 1989-12-21 | 1991-10-15 | At&T Bell Laboratories | Method and apparatus for inspection of specular, three-dimensional features |
JP2953736B2 (ja) * | 1990-03-20 | 1999-09-27 | 松下電器産業株式会社 | 半田の形状検査方法 |
JP3072998B2 (ja) * | 1990-04-18 | 2000-08-07 | 株式会社日立製作所 | はんだ付け状態検査方法及びその装置 |
US5127061A (en) * | 1990-12-03 | 1992-06-30 | At&T Bell Laboratories | Real-time three-dimensional imaging technique |
JPH0833293B2 (ja) * | 1991-04-15 | 1996-03-29 | 松下電器産業株式会社 | 半田の形状検査方法 |
US5189481A (en) * | 1991-07-26 | 1993-02-23 | Tencor Instruments | Particle detector for rough surfaces |
JP3051279B2 (ja) * | 1993-05-13 | 2000-06-12 | シャープ株式会社 | バンプ外観検査方法およびバンプ外観検査装置 |
US5638175A (en) * | 1994-01-24 | 1997-06-10 | Display Inspection Systems, Inc. | Differential phase contrast inspection system with multiple detectors |
US5798829A (en) * | 1996-03-05 | 1998-08-25 | Kla-Tencor Corporation | Single laser bright field and dark field system for detecting anomalies of a sample |
JPH09311020A (ja) * | 1996-05-23 | 1997-12-02 | Nec Corp | 突起部検査装置 |
WO1999020048A1 (en) * | 1997-10-10 | 1999-04-22 | Northeast Robotics Llc | Imaging method and system with elongate inspection zone |
EP1129338A1 (de) * | 1998-10-16 | 2001-09-05 | ADE Optical Systems Corporation | Verfahren und vorrichtung zur kartographischen darstellung der oberflächentopographie eines substrats |
JP3945951B2 (ja) * | 1999-01-14 | 2007-07-18 | 日立ビアメカニクス株式会社 | レーザ加工方法およびレーザ加工機 |
SE514859C2 (sv) * | 1999-01-18 | 2001-05-07 | Mydata Automation Ab | Förfarande och anordning för undersökning av objekt på ett substrat genom att ta bilder av substratet och analysera dessa |
IL131284A (en) * | 1999-08-05 | 2003-05-29 | Orbotech Ltd | Illumination for inspecting surfaces of articles |
US6563575B1 (en) * | 1999-08-10 | 2003-05-13 | Automated Technology Services, Inc. | Optical sensing system for detecting welds and defects in metal |
US6750899B1 (en) | 2000-01-07 | 2004-06-15 | Cyberoptics Corporation | Solder paste inspection system |
JP2001255281A (ja) * | 2000-01-17 | 2001-09-21 | Agilent Technol Inc | 検査装置 |
US6552783B1 (en) * | 2000-06-28 | 2003-04-22 | Teradyne, Inc. | Optical system |
US6587600B1 (en) * | 2000-08-15 | 2003-07-01 | Floor Corporation | Methods and apparatus for producing topocompositional images |
US6654115B2 (en) * | 2001-01-18 | 2003-11-25 | Orbotech Ltd. | System and method for multi-dimensional optical inspection |
JP4803568B2 (ja) * | 2001-03-30 | 2011-10-26 | ルネサスエレクトロニクス株式会社 | 半導体集積回路の検査装置および検査方法 |
US7009163B2 (en) * | 2001-06-22 | 2006-03-07 | Orbotech Ltd. | High-sensitivity optical scanning using memory integration |
IL144806A (en) * | 2001-08-08 | 2005-11-20 | Nova Measuring Instr Ltd | Method and apparatus for process control in semiconductor manufacturing |
US6577429B1 (en) * | 2002-01-15 | 2003-06-10 | Eastman Kodak Company | Laser projection display system |
US6819844B2 (en) * | 2002-06-20 | 2004-11-16 | The Boeing Company | Fiber-optic based surface spectroscopy |
US7521651B2 (en) * | 2003-09-12 | 2009-04-21 | Orbotech Ltd | Multiple beam micro-machining system and method |
-
2004
- 2004-01-09 WO PCT/IL2004/000019 patent/WO2004063668A2/en active Application Filing
- 2004-01-09 TW TW093100562A patent/TWI298097B/zh not_active IP Right Cessation
- 2004-01-09 CN CNA2004800054538A patent/CN1788194A/zh active Pending
- 2004-01-09 EP EP04701074A patent/EP1581781B1/de not_active Expired - Lifetime
- 2004-01-09 KR KR1020057012693A patent/KR20050096125A/ko not_active Application Discontinuation
- 2004-01-09 JP JP2006500370A patent/JP2006515676A/ja active Pending
- 2004-01-09 US US10/753,391 patent/US7253891B2/en not_active Expired - Fee Related
- 2004-01-09 AT AT04701074T patent/ATE525638T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW200506317A (en) | 2005-02-16 |
WO2004063668A2 (en) | 2004-07-29 |
KR20050096125A (ko) | 2005-10-05 |
US20040156043A1 (en) | 2004-08-12 |
JP2006515676A (ja) | 2006-06-01 |
EP1581781B1 (de) | 2011-09-21 |
TWI298097B (en) | 2008-06-21 |
US7253891B2 (en) | 2007-08-07 |
WO2004063668A3 (en) | 2005-09-09 |
EP1581781A2 (de) | 2005-10-05 |
EP1581781A4 (de) | 2008-03-12 |
CN1788194A (zh) | 2006-06-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |