ATE521980T1 - Gerät zur behandlung mittels einen mikrowellenangeregtem plasma - Google Patents

Gerät zur behandlung mittels einen mikrowellenangeregtem plasma

Info

Publication number
ATE521980T1
ATE521980T1 AT04027241T AT04027241T ATE521980T1 AT E521980 T1 ATE521980 T1 AT E521980T1 AT 04027241 T AT04027241 T AT 04027241T AT 04027241 T AT04027241 T AT 04027241T AT E521980 T1 ATE521980 T1 AT E521980T1
Authority
AT
Austria
Prior art keywords
microwave
excited plasma
slits
processing apparatus
plasma processing
Prior art date
Application number
AT04027241T
Other languages
English (en)
Inventor
Yoji Taguchi
Maiko Yoshida
Kohta Kusaba
Kibatsu Shinohara
Munekazu Matsuo
Kazuhiro Watanabe
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Application granted granted Critical
Publication of ATE521980T1 publication Critical patent/ATE521980T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
AT04027241T 2003-11-17 2004-11-17 Gerät zur behandlung mittels einen mikrowellenangeregtem plasma ATE521980T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003387057A JP4304053B2 (ja) 2003-11-17 2003-11-17 マイクロ波励起プラズマ処理装置

Publications (1)

Publication Number Publication Date
ATE521980T1 true ATE521980T1 (de) 2011-09-15

Family

ID=34431529

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04027241T ATE521980T1 (de) 2003-11-17 2004-11-17 Gerät zur behandlung mittels einen mikrowellenangeregtem plasma

Country Status (8)

Country Link
US (1) US7392760B2 (de)
EP (1) EP1531487B1 (de)
JP (1) JP4304053B2 (de)
KR (1) KR101187100B1 (de)
CN (1) CN100405533C (de)
AT (1) ATE521980T1 (de)
SG (1) SG112094A1 (de)
TW (1) TWI361449B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216433B2 (en) 2006-03-07 2012-07-10 University Of The Ryukyus Plasma generator and method of generating plasma using the same
JP2007268252A (ja) * 2006-03-07 2007-10-18 Univ Of Ryukyus 滅菌装置及びそれを用いた滅菌方法
JP4793662B2 (ja) * 2008-03-28 2011-10-12 独立行政法人産業技術総合研究所 マイクロ波プラズマ処理装置
US8941039B2 (en) * 2010-08-02 2015-01-27 General Electric Company Device and implementation thereof for repairing damage in a cooking appliance
JP5762708B2 (ja) * 2010-09-16 2015-08-12 国立大学法人名古屋大学 プラズマ生成装置、プラズマ処理装置及びプラズマ処理方法
JP5490192B2 (ja) * 2011-12-28 2014-05-14 東京エレクトロン株式会社 マイクロ波加熱処理装置および処理方法
WO2014057836A1 (ja) * 2012-10-11 2014-04-17 東京エレクトロン株式会社 成膜装置
JP6596285B2 (ja) * 2015-09-24 2019-10-23 東芝メモリ株式会社 マイクロ波照射装置および基板処理方法
NL2017575B1 (en) * 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
CN108872716B (zh) * 2017-05-12 2021-03-02 长春理工大学 外加磁场增强激光诱导空气等离子体微波辐射装置和方法
JP7202599B2 (ja) * 2018-08-27 2023-01-12 国立大学法人岩手大学 血圧測定装置、車両装置、及び血圧測定プログラム
CN111785606A (zh) * 2020-07-23 2020-10-16 核工业西南物理研究院 一种可调节微波入射角度的准光学传输装置及其调角方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3680142A (en) * 1969-10-06 1972-07-25 Nasa Circularly polarized antenna
US4160145A (en) * 1978-02-16 1979-07-03 Armstrong Cork Company Microwave applicator device
US4463239A (en) * 1982-12-06 1984-07-31 General Electric Company Rotating slot antenna arrangement for microwave oven
JP2570090B2 (ja) 1992-10-08 1997-01-08 日本電気株式会社 ドライエッチング装置
KR0153842B1 (ko) 1994-06-14 1998-12-01 나카무라 다메아키 마이크로파 플라즈마 처리장치
EP0771017A1 (de) 1995-10-27 1997-05-02 Sumitomo Metal Industries, Ltd. Plasmabearbeitungsvorrichtung
EP0777257B1 (de) * 1995-10-30 1999-08-25 Kabushiki Kaisha Toshiba Bearbeitungsgerät mittels Mikrowellen-angeregtes Plasma
JP2857090B2 (ja) 1995-10-30 1999-02-10 株式会社東芝 マイクロ波励起プラズマ処理装置
KR100218444B1 (ko) * 1996-07-31 1999-09-01 구자홍 전자레인지의 균일가열장치
JP3566046B2 (ja) 1997-10-02 2004-09-15 アルプス電気株式会社 プラズマ処理装置およびスパッタ装置
TW385623B (en) * 1997-10-20 2000-03-21 Sumitomo Metal Ind Apparatus and method for microwave plasma process
JP3430959B2 (ja) * 1999-03-04 2003-07-28 東京エレクトロン株式会社 平面アンテナ部材、これを用いたプラズマ処理装置及びプラズマ処理方法
JP2001203099A (ja) * 2000-01-20 2001-07-27 Yac Co Ltd プラズマ生成装置およびプラズマ処理装置

Also Published As

Publication number Publication date
EP1531487A3 (de) 2006-02-01
US20050145178A1 (en) 2005-07-07
CN1630026A (zh) 2005-06-22
US7392760B2 (en) 2008-07-01
TW200522143A (en) 2005-07-01
CN100405533C (zh) 2008-07-23
KR20050047484A (ko) 2005-05-20
TWI361449B (en) 2012-04-01
EP1531487A2 (de) 2005-05-18
JP4304053B2 (ja) 2009-07-29
EP1531487B1 (de) 2011-08-24
KR101187100B1 (ko) 2012-09-28
SG112094A1 (en) 2005-06-29
JP2005150473A (ja) 2005-06-09

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