DE602004032334D1 - Antenne zur erzeugung gleichförmiger prozessraten - Google Patents
Antenne zur erzeugung gleichförmiger prozessratenInfo
- Publication number
- DE602004032334D1 DE602004032334D1 DE602004032334T DE602004032334T DE602004032334D1 DE 602004032334 D1 DE602004032334 D1 DE 602004032334D1 DE 602004032334 T DE602004032334 T DE 602004032334T DE 602004032334 T DE602004032334 T DE 602004032334T DE 602004032334 D1 DE602004032334 D1 DE 602004032334D1
- Authority
- DE
- Germany
- Prior art keywords
- chamber
- antenna
- substrate
- generation
- equivalent process
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 abstract 4
- 230000005684 electric field Effects 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32467—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q7/00—Loop antennas with a substantially uniform current distribution around the loop and having a directional radiation pattern in a plane perpendicular to the plane of the loop
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/374,868 US6744213B2 (en) | 1999-11-15 | 2003-02-24 | Antenna for producing uniform process rates |
PCT/US2004/004399 WO2004077608A2 (en) | 2003-02-24 | 2004-02-12 | Antenna for producing uniform process rates |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004032334D1 true DE602004032334D1 (de) | 2011-06-01 |
Family
ID=32926260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004032334T Expired - Lifetime DE602004032334D1 (de) | 2003-02-24 | 2004-02-12 | Antenne zur erzeugung gleichförmiger prozessraten |
Country Status (10)
Country | Link |
---|---|
US (2) | US6744213B2 (de) |
EP (1) | EP1632006B1 (de) |
JP (1) | JP4869059B2 (de) |
KR (1) | KR101094124B1 (de) |
CN (1) | CN1833296B (de) |
AT (1) | ATE506687T1 (de) |
DE (1) | DE602004032334D1 (de) |
IL (1) | IL170926A (de) |
TW (1) | TWI326940B (de) |
WO (1) | WO2004077608A2 (de) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR200253559Y1 (ko) * | 2001-07-30 | 2001-11-22 | 주식회사 플라즈마트 | 회전방향으로 균일한 플라즈마 밀도를 발생시키는유도결합형 플라즈마 발생장치의 안테나구조 |
US6855225B1 (en) * | 2002-06-25 | 2005-02-15 | Novellus Systems, Inc. | Single-tube interlaced inductively coupling plasma source |
GB0326500D0 (en) * | 2003-11-13 | 2003-12-17 | Oxford Instr Plasma Technology | Gas port assembly |
US20050205211A1 (en) * | 2004-03-22 | 2005-09-22 | Vikram Singh | Plasma immersion ion implantion apparatus and method |
US7527713B2 (en) * | 2004-05-26 | 2009-05-05 | Applied Materials, Inc. | Variable quadruple electromagnet array in plasma processing |
US7686926B2 (en) * | 2004-05-26 | 2010-03-30 | Applied Materials, Inc. | Multi-step process for forming a metal barrier in a sputter reactor |
US8187416B2 (en) * | 2005-05-20 | 2012-05-29 | Applied Materials, Inc. | Interior antenna for substrate processing chamber |
JP5561812B2 (ja) * | 2006-11-28 | 2014-07-30 | サムコ株式会社 | プラズマ処理装置 |
JP5098882B2 (ja) * | 2007-08-31 | 2012-12-12 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP5301812B2 (ja) * | 2007-11-14 | 2013-09-25 | 東京エレクトロン株式会社 | プラズマ処理装置 |
WO2011022612A2 (en) * | 2009-08-21 | 2011-02-24 | Mattson Technology, Inc. | Inductive plasma source |
US20110094683A1 (en) | 2009-10-26 | 2011-04-28 | Applied Materials, Inc. | Rf feed structure for plasma processing |
US20110094994A1 (en) * | 2009-10-26 | 2011-04-28 | Applied Materials, Inc. | Inductively coupled plasma apparatus |
US9313872B2 (en) * | 2009-10-27 | 2016-04-12 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
CN102054649B (zh) * | 2009-10-27 | 2014-03-19 | 东京毅力科创株式会社 | 等离子体处理装置以及等离子体处理方法 |
JP5554047B2 (ja) * | 2009-10-27 | 2014-07-23 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US8741097B2 (en) | 2009-10-27 | 2014-06-03 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
JP5592098B2 (ja) * | 2009-10-27 | 2014-09-17 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP5554099B2 (ja) * | 2010-03-18 | 2014-07-23 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP5905447B2 (ja) * | 2010-04-20 | 2016-04-20 | ラム リサーチ コーポレーションLam Research Corporation | プラズマ処理システムにおける誘導コイルアセンブリ |
JP5916044B2 (ja) * | 2010-09-28 | 2016-05-11 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP5851682B2 (ja) | 2010-09-28 | 2016-02-03 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US8884178B2 (en) * | 2010-10-20 | 2014-11-11 | Lam Research Corporation | Methods and apparatus for igniting and sustaining plasma |
JP5018994B1 (ja) * | 2011-11-09 | 2012-09-05 | 日新電機株式会社 | プラズマ処理装置 |
FR2998722B1 (fr) * | 2012-11-23 | 2016-04-15 | Thales Sa | Systeme antennaire a boucles imbriquees et vehicule comprenant un tel systeme antennaire |
CN105340059B (zh) * | 2013-06-17 | 2019-03-22 | 应用材料公司 | 用于等离子体反应器的增强等离子体源 |
KR20150088453A (ko) * | 2014-01-24 | 2015-08-03 | 한국전자통신연구원 | 다중 대역 플라즈마 루프 안테나 |
US10062670B2 (en) | 2016-04-18 | 2018-08-28 | Skyworks Solutions, Inc. | Radio frequency system-in-package with stacked clocking crystal |
US10320071B2 (en) | 2016-04-19 | 2019-06-11 | Skyworks Solutions, Inc. | Methods for selectively shielding radio frequency modules |
TWI800014B (zh) | 2016-12-29 | 2023-04-21 | 美商天工方案公司 | 前端系統及相關裝置、積體電路、模組及方法 |
US10515924B2 (en) | 2017-03-10 | 2019-12-24 | Skyworks Solutions, Inc. | Radio frequency modules |
US10460914B2 (en) | 2017-11-30 | 2019-10-29 | Lam Research Corporation | Ferrite cage RF isolator for power circuitry |
US20200209928A1 (en) * | 2018-12-27 | 2020-07-02 | Innolux Corporation | Electronic device |
CN111785605A (zh) | 2020-06-23 | 2020-10-16 | 北京北方华创微电子装备有限公司 | 一种线圈结构及半导体加工设备 |
US20220130704A1 (en) * | 2020-10-23 | 2022-04-28 | Applied Materials, Inc. | Bipolar electrostatic chuck to limit dc discharge |
CN116390320A (zh) * | 2023-05-30 | 2023-07-04 | 安徽农业大学 | 一种电子回旋共振放电装置及应用 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6514376B1 (en) * | 1991-06-27 | 2003-02-04 | Applied Materials Inc. | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
US5698036A (en) * | 1995-05-26 | 1997-12-16 | Tokyo Electron Limited | Plasma processing apparatus |
US6089182A (en) * | 1995-08-17 | 2000-07-18 | Tokyo Electron Limited | Plasma processing apparatus |
JP3153743B2 (ja) | 1995-08-31 | 2001-04-09 | 東京エレクトロン株式会社 | プラズマ処理装置 |
CA2207154A1 (en) | 1996-06-10 | 1997-12-10 | Lam Research Corporation | Inductively coupled source for deriving substantially uniform plasma flux |
US6028395A (en) * | 1997-09-16 | 2000-02-22 | Lam Research Corporation | Vacuum plasma processor having coil with added conducting segments to its peripheral part |
US6028285A (en) * | 1997-11-19 | 2000-02-22 | Board Of Regents, The University Of Texas System | High density plasma source for semiconductor processing |
US6229264B1 (en) * | 1999-03-31 | 2001-05-08 | Lam Research Corporation | Plasma processor with coil having variable rf coupling |
KR100338057B1 (ko) * | 1999-08-26 | 2002-05-24 | 황 철 주 | 유도 결합형 플라즈마 발생용 안테나 장치 |
US6320320B1 (en) * | 1999-11-15 | 2001-11-20 | Lam Research Corporation | Method and apparatus for producing uniform process rates |
US6341574B1 (en) | 1999-11-15 | 2002-01-29 | Lam Research Corporation | Plasma processing systems |
US6518705B2 (en) * | 1999-11-15 | 2003-02-11 | Lam Research Corporation | Method and apparatus for producing uniform process rates |
US6302966B1 (en) | 1999-11-15 | 2001-10-16 | Lam Research Corporation | Temperature control system for plasma processing apparatus |
US6322661B1 (en) | 1999-11-15 | 2001-11-27 | Lam Research Corporation | Method and apparatus for controlling the volume of a plasma |
KR100396214B1 (ko) * | 2001-06-19 | 2003-09-02 | 주성엔지니어링(주) | 초단파 병렬 공명 안테나를 구비하는 플라즈마 공정장치 |
KR100476902B1 (ko) * | 2001-07-20 | 2005-03-17 | 주식회사 셈테크놀러지 | 균일 분포 플라즈마를 형성하는 대면적 플라즈마안테나(lapa)및 이를 포함하는 플라즈마 발생장치 |
-
2003
- 2003-02-24 US US10/374,868 patent/US6744213B2/en not_active Expired - Lifetime
-
2004
- 2004-02-12 CN CN2004800106180A patent/CN1833296B/zh not_active Expired - Fee Related
- 2004-02-12 DE DE602004032334T patent/DE602004032334D1/de not_active Expired - Lifetime
- 2004-02-12 KR KR1020057015733A patent/KR101094124B1/ko active IP Right Grant
- 2004-02-12 AT AT04710690T patent/ATE506687T1/de not_active IP Right Cessation
- 2004-02-12 JP JP2006503590A patent/JP4869059B2/ja not_active Expired - Fee Related
- 2004-02-12 EP EP04710690A patent/EP1632006B1/de not_active Expired - Lifetime
- 2004-02-12 WO PCT/US2004/004399 patent/WO2004077608A2/en active Application Filing
- 2004-02-13 US US10/779,187 patent/US6873112B2/en not_active Expired - Fee Related
- 2004-02-19 TW TW093104100A patent/TWI326940B/zh not_active IP Right Cessation
-
2005
- 2005-09-18 IL IL170926A patent/IL170926A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2004077608A2 (en) | 2004-09-10 |
TW200507338A (en) | 2005-02-16 |
IL170926A (en) | 2012-01-31 |
WO2004077608A3 (en) | 2006-01-12 |
KR101094124B1 (ko) | 2011-12-15 |
JP4869059B2 (ja) | 2012-02-01 |
JP2006518915A (ja) | 2006-08-17 |
KR20050103504A (ko) | 2005-10-31 |
CN1833296B (zh) | 2010-10-20 |
EP1632006B1 (de) | 2011-04-20 |
US6873112B2 (en) | 2005-03-29 |
EP1632006A2 (de) | 2006-03-08 |
IL170926A0 (en) | 2011-08-01 |
ATE506687T1 (de) | 2011-05-15 |
US20040216676A1 (en) | 2004-11-04 |
CN1833296A (zh) | 2006-09-13 |
US6744213B2 (en) | 2004-06-01 |
TWI326940B (en) | 2010-07-01 |
EP1632006A4 (de) | 2008-11-26 |
US20030189524A1 (en) | 2003-10-09 |
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