ATE514517T1 - Verfahren zum diffusionsverbinden einer mikrokanalplatte mit einem mehrschichtkeramikkörper; diffusionsverbundene mikrokanalplattenkörperanordnung - Google Patents

Verfahren zum diffusionsverbinden einer mikrokanalplatte mit einem mehrschichtkeramikkörper; diffusionsverbundene mikrokanalplattenkörperanordnung

Info

Publication number
ATE514517T1
ATE514517T1 AT04749506T AT04749506T ATE514517T1 AT E514517 T1 ATE514517 T1 AT E514517T1 AT 04749506 T AT04749506 T AT 04749506T AT 04749506 T AT04749506 T AT 04749506T AT E514517 T1 ATE514517 T1 AT E514517T1
Authority
AT
Austria
Prior art keywords
microchannel plate
diffusion
layer ceramic
bonding
mcp
Prior art date
Application number
AT04749506T
Other languages
English (en)
Inventor
Miguel Saldana
Jay Tucker
Michael Iosue
Original Assignee
L 3 Comm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by L 3 Comm Corp filed Critical L 3 Comm Corp
Application granted granted Critical
Publication of ATE514517T1 publication Critical patent/ATE514517T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/02—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating by means of a press ; Diffusion bonding
    • B23K20/023—Thermo-compression bonding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/16—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating with interposition of special material to facilitate connection of the parts, e.g. material for absorbing or producing gas
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/003—Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts
    • C04B37/006—Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts consisting of metals or metal salts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00—Cathode ray tubes; Electron beam tubes
    • H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
    • H01J31/50—Image-conversion or image-amplification tubes, i.e. having optical, X-ray, or analogous input, and optical output
    • H01J31/506—Image-conversion or image-amplification tubes, i.e. having optical, X-ray, or analogous input, and optical output tubes using secondary emission effect
    • H01J31/507—Image-conversion or image-amplification tubes, i.e. having optical, X-ray, or analogous input, and optical output tubes using secondary emission effect using a large number of channels, e.g. microchannel plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
    • H01J43/04—Electron multipliers
    • H01J43/06—Electrode arrangements
    • H01J43/18—Electrode arrangements using essentially more than one dynode
    • H01J43/24—Dynodes having potential gradient along their surfaces
    • H01J43/246—Microchannel plates [MCP]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/124—Metallic interlayers based on copper
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/125—Metallic interlayers based on noble metals, e.g. silver
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/34—Oxidic
    • C04B2237/343—Alumina or aluminates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/36—Non-oxidic
    • C04B2237/368—Silicon nitride
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2231/00—Cathode ray tubes or electron beam tubes
    • H01J2231/50—Imaging and conversion tubes
    • H01J2231/501—Imaging and conversion tubes including multiplication stage
    • H01J2231/5013—Imaging and conversion tubes including multiplication stage with secondary emission electrodes
    • H01J2231/5016—Michrochannel plates [MCP]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
AT04749506T 2003-03-30 2004-03-30 Verfahren zum diffusionsverbinden einer mikrokanalplatte mit einem mehrschichtkeramikkörper; diffusionsverbundene mikrokanalplattenkörperanordnung ATE514517T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32006703P 2003-03-30 2003-03-30
PCT/US2004/009635 WO2004093157A2 (en) 2003-03-30 2004-03-30 Diffusion bonding method for microchannel plates

Publications (1)

Publication Number Publication Date
ATE514517T1 true ATE514517T1 (de) 2011-07-15

Family

ID=33298187

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04749506T ATE514517T1 (de) 2003-03-30 2004-03-30 Verfahren zum diffusionsverbinden einer mikrokanalplatte mit einem mehrschichtkeramikkörper; diffusionsverbundene mikrokanalplattenkörperanordnung

Country Status (6)

Country Link
US (1) US6938817B2 (de)
EP (1) EP1617966B1 (de)
JP (1) JP2006522454A (de)
AT (1) ATE514517T1 (de)
RU (1) RU2343058C2 (de)
WO (1) WO2004093157A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1613448B1 (de) * 2003-03-31 2011-06-29 L-3 Communications Corporation Verfahren zum Diffusionverbinden einer Mikrokanalplatte mit einem Mehrschichtkeramikkörper ; Diffusionsverbundene Mikrokanalplattenkörper-Anordnung
US8225481B2 (en) * 2003-05-19 2012-07-24 Pratt & Whitney Rocketdyne, Inc. Diffusion bonded composite material and method therefor
JP5771447B2 (ja) 2011-06-02 2015-08-26 浜松ホトニクス株式会社 電子増倍器
CN103794429A (zh) * 2014-01-22 2014-05-14 中国科学院长春光学精密机械与物理研究所 方形柱面实芯微通道板的制备装置及制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61209965A (ja) * 1985-03-14 1986-09-18 株式会社東芝 窒化珪素セラミツクスとアルミニウムの接合方法
JPS62124083A (ja) * 1985-11-20 1987-06-05 Hitachi Ltd 拡散接合法
GB2202367A (en) * 1987-03-18 1988-09-21 Philips Electronic Associated Channel plate electron multipliers
JPS649878A (en) * 1987-07-02 1989-01-13 Agency Ind Science Techn Bonding between silicon nitride ceramics and metal
SU1737554A1 (ru) * 1989-09-07 1992-05-30 Научно-исследовательский институт электронных приборов Вакуумна оболочка рентгеновского электронно-оптического преобразовател
US5452177A (en) * 1990-06-08 1995-09-19 Varian Associates, Inc. Electrostatic wafer clamp
RU2018187C1 (ru) * 1990-11-15 1994-08-15 Научно-исследовательский институт "Платан" с заводом Способ сборки многопучковой электронно-оптической системы
DE69313399T2 (de) * 1992-11-02 1998-02-26 Philips Electronics Nv Vacuumröhre mit keramischem Teil
DE69316872T2 (de) * 1992-11-06 1998-05-28 Varian Associates Elektrostatische klemmvorrichtung zur halterung einer wafer
US5514928A (en) * 1994-05-27 1996-05-07 Litton Systems, Inc. Apparatus having cascaded and interbonded microchannel plates and method of making
RU2174728C2 (ru) * 1994-10-12 2001-10-10 Х Пауэр Корпорейшн Топливный элемент, использующий интегральную технологию пластин для распределения жидкости
US5863671A (en) * 1994-10-12 1999-01-26 H Power Corporation Plastic platelet fuel cells employing integrated fluid management
US5994824A (en) 1997-07-24 1999-11-30 Itt Manufacturing Enterprises Light weight/small image intensifier tube
US6040657A (en) * 1997-08-15 2000-03-21 Itt Manufacturing Enterprises Thin faceplate image intensifier tube having an improved vacuum housing
EP1071121A1 (de) * 1999-07-19 2001-01-24 International Business Machines Corporation Verfahren zur Herstellung einer Oxid-Ummantelung in einem Graben in einem Halbleitersubstrat
IL138398A0 (en) * 2000-09-11 2001-10-31 Merhav Aap Ltd System for protection from falls
EP1362876B1 (de) * 2000-12-18 2006-03-08 Konishi Co., Ltd. Einkomponentige feuchtigkeitshärtbare epoxidharzzusammensetzung

Also Published As

Publication number Publication date
WO2004093157A3 (en) 2005-05-06
US6938817B2 (en) 2005-09-06
RU2343058C2 (ru) 2009-01-10
EP1617966A2 (de) 2006-01-25
EP1617966A4 (de) 2008-09-10
WO2004093157A2 (en) 2004-10-28
EP1617966B1 (de) 2011-06-29
JP2006522454A (ja) 2006-09-28
US20040191940A1 (en) 2004-09-30
RU2005129597A (ru) 2006-05-10

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