TW200629462A - Supporting plate attaching method - Google Patents
Supporting plate attaching methodInfo
- Publication number
- TW200629462A TW200629462A TW094141922A TW94141922A TW200629462A TW 200629462 A TW200629462 A TW 200629462A TW 094141922 A TW094141922 A TW 094141922A TW 94141922 A TW94141922 A TW 94141922A TW 200629462 A TW200629462 A TW 200629462A
- Authority
- TW
- Taiwan
- Prior art keywords
- support plate
- pressure
- adhesive layer
- supporting plate
- attaching method
- Prior art date
Links
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
To provide an adhering method for pressure-bonding the support plate by easily removing the gas between a substrate such as semiconductor wafer or the like and the support plate. A bonding agent layer 1 is formed over a circuit forming surface by coating an adhesive to the circuit forming surface of a substrate W such as semiconductor wafer or the like. Next, adhesive layer 1 is heated and finished as a dried and fixed layer. Thereafter, a support plate 2 provided with through-holes 3 in the thickness direction for the entire part of the plate is stacked on the adhesive layer 1. Under this condition, the support plate 2 is pushed and pressure-bonded to the adhesive layer 1 under the pressure-reduced and heated state.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004344737A JP4652030B2 (en) | 2004-11-29 | 2004-11-29 | Attaching the support plate |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200629462A true TW200629462A (en) | 2006-08-16 |
TWI430387B TWI430387B (en) | 2014-03-11 |
Family
ID=36634584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094141922A TWI430387B (en) | 2004-11-29 | 2005-11-29 | Supporting plate attaching method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4652030B2 (en) |
KR (1) | KR101099248B1 (en) |
CN (1) | CN100530527C (en) |
TW (1) | TWI430387B (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5027460B2 (en) * | 2006-07-28 | 2012-09-19 | 東京応化工業株式会社 | Wafer bonding method, thinning method, and peeling method |
CA2609169C (en) * | 2006-11-15 | 2011-01-18 | Rohm And Haas Company | Adhesives for elastomers |
JP4825695B2 (en) | 2007-01-19 | 2011-11-30 | 東京応化工業株式会社 | Liquid solvent contact unit |
JP5090789B2 (en) * | 2007-05-30 | 2012-12-05 | 東京応化工業株式会社 | Bonding apparatus, method for preventing dissolution of adhesive, and bonding method |
JP2009130218A (en) * | 2007-11-26 | 2009-06-11 | Tokyo Ohka Kogyo Co Ltd | Bonding device and bonding method |
JP4742252B2 (en) * | 2008-12-10 | 2011-08-10 | カシオ計算機株式会社 | Manufacturing method of semiconductor device |
KR101027858B1 (en) * | 2009-01-13 | 2011-04-07 | 도레이첨단소재 주식회사 | Wafer support adhesive film for processing in semiconductor thin film wafer fabrication |
JP5520491B2 (en) * | 2009-01-27 | 2014-06-11 | 株式会社日立ハイテクノロジーズ | Sample stage device |
JP6869101B2 (en) * | 2017-05-12 | 2021-05-12 | 株式会社ダイセル | Adhesive layer forming device, semiconductor chip manufacturing line, and manufacturing method of laminate |
JP7220135B2 (en) * | 2018-11-01 | 2023-02-09 | 信越化学工業株式会社 | LAMINATED PRODUCTION METHOD AND SUBSTRATE MANUFACTURING METHOD |
JP7335136B2 (en) * | 2019-11-06 | 2023-08-29 | 株式会社ディスコ | Resin protective member forming device |
JP7396863B2 (en) * | 2019-11-06 | 2023-12-12 | 株式会社ディスコ | Method of forming protective member |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61208842A (en) * | 1985-03-14 | 1986-09-17 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor wafer supporting substrate |
JP2001077304A (en) * | 1999-06-28 | 2001-03-23 | Mitsubishi Gas Chem Co Inc | Method for manufacturing electronic parts |
JP2002059363A (en) * | 2000-08-23 | 2002-02-26 | Chemitoronics Co Ltd | Wafer base material |
KR100575867B1 (en) * | 2002-12-26 | 2006-05-03 | 주식회사 하이닉스반도체 | Method for adhering semiconductor die |
JP4364535B2 (en) * | 2003-03-27 | 2009-11-18 | シャープ株式会社 | Manufacturing method of semiconductor device |
-
2004
- 2004-11-29 JP JP2004344737A patent/JP4652030B2/en active Active
-
2005
- 2005-11-28 KR KR1020050114164A patent/KR101099248B1/en active IP Right Grant
- 2005-11-29 TW TW094141922A patent/TWI430387B/en active
- 2005-11-29 CN CNB2005101363874A patent/CN100530527C/en active Active
Also Published As
Publication number | Publication date |
---|---|
TWI430387B (en) | 2014-03-11 |
JP2006156683A (en) | 2006-06-15 |
KR20060059826A (en) | 2006-06-02 |
KR101099248B1 (en) | 2011-12-27 |
CN1815688A (en) | 2006-08-09 |
CN100530527C (en) | 2009-08-19 |
JP4652030B2 (en) | 2011-03-16 |
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