ATE513311T1 - Suszeptor und verfahren zur herstellung einer led-vorrichtung mit diesem suszeptor - Google Patents

Suszeptor und verfahren zur herstellung einer led-vorrichtung mit diesem suszeptor

Info

Publication number
ATE513311T1
ATE513311T1 AT07868710T AT07868710T ATE513311T1 AT E513311 T1 ATE513311 T1 AT E513311T1 AT 07868710 T AT07868710 T AT 07868710T AT 07868710 T AT07868710 T AT 07868710T AT E513311 T1 ATE513311 T1 AT E513311T1
Authority
AT
Austria
Prior art keywords
sussceptor
producing
led device
susceptor
recess
Prior art date
Application number
AT07868710T
Other languages
English (en)
Inventor
Matthew A Simpson
Original Assignee
Saint Gobain Ceramics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Ceramics filed Critical Saint Gobain Ceramics
Application granted granted Critical
Publication of ATE513311T1 publication Critical patent/ATE513311T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7616—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material

Landscapes

  • Led Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT07868710T 2006-11-10 2007-11-09 Suszeptor und verfahren zur herstellung einer led-vorrichtung mit diesem suszeptor ATE513311T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US86522106P 2006-11-10 2006-11-10
PCT/US2007/084261 WO2008058270A2 (en) 2006-11-10 2007-11-09 A susceptor and method of forming a led device using such susceptor

Publications (1)

Publication Number Publication Date
ATE513311T1 true ATE513311T1 (de) 2011-07-15

Family

ID=39324157

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07868710T ATE513311T1 (de) 2006-11-10 2007-11-09 Suszeptor und verfahren zur herstellung einer led-vorrichtung mit diesem suszeptor

Country Status (6)

Country Link
US (1) US20080110402A1 (de)
EP (1) EP2080221B1 (de)
JP (1) JP2010509778A (de)
CN (1) CN101563771A (de)
AT (1) ATE513311T1 (de)
WO (1) WO2008058270A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120101633A (ko) * 2009-10-14 2012-09-14 아사히 가라스 가부시키가이샤 반도체 제조용 지그 및 그의 제조 방법
US20140256082A1 (en) * 2013-03-07 2014-09-11 Jehad A. Abushama Method and apparatus for the formation of copper-indiumgallium selenide thin films using three dimensional selective rf and microwave rapid thermal processing
US10490437B2 (en) * 2015-04-07 2019-11-26 Sumco Corporation Susceptor, vapor deposition apparatus, vapor deposition method and epitaxial silicon wafer

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3951587A (en) * 1974-12-06 1976-04-20 Norton Company Silicon carbide diffusion furnace components
JPS5366164A (en) * 1976-11-26 1978-06-13 Hitachi Ltd Susceptor for semiconductor wafer processing
US4795673A (en) * 1978-01-09 1989-01-03 Stemcor Corporation Composite material of discontinuous silicon carbide particles and continuous silicon matrix and method of producing same
US4633051A (en) * 1983-11-23 1986-12-30 Advanced Semiconductor Materials America, Inc. Stable conductive elements for direct exposure to reactive environments
JPS6169116A (ja) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd シリコンウエハ−の連続ｃｖｄコ−テイング用サセプター
JPS6447019A (en) * 1987-08-18 1989-02-21 Denki Kagaku Kogyo Kk Glassy carbon coated susceptor
JPH06287091A (ja) * 1993-02-02 1994-10-11 Ngk Insulators Ltd ＳｉＣ含有遠赤外線放射体、乾燥装置及び焼成装置
JPH0758041A (ja) * 1993-08-20 1995-03-03 Toshiba Ceramics Co Ltd サセプタ
US5837058A (en) * 1996-07-12 1998-11-17 Applied Materials, Inc. High temperature susceptor
JPH10233529A (ja) * 1997-02-14 1998-09-02 Hewlett Packard Co <Hp> 窒化物半導体素子およびその製造方法
US6026589A (en) * 1998-02-02 2000-02-22 Silicon Valley Group, Thermal Systems Llc Wafer carrier and semiconductor apparatus for processing a semiconductor substrate
US6162543A (en) * 1998-12-11 2000-12-19 Saint-Gobain Industrial Ceramics, Inc. High purity siliconized silicon carbide having high thermal shock resistance
US6673198B1 (en) * 1999-12-22 2004-01-06 Lam Research Corporation Semiconductor processing equipment having improved process drift control
WO2002047129A1 (en) * 2000-12-05 2002-06-13 Ibiden Co., Ltd. Ceramic substrate for semiconductor manufacturing and inspecting devices, and method of manufacturing the ceramic substrate
JP3922018B2 (ja) * 2001-12-21 2007-05-30 株式会社Ｓｕｍｃｏ 気相成長装置および気相成長装置の温度検出方法
US7394043B2 (en) * 2002-04-24 2008-07-01 Sumitomo Electric Industries, Ltd. Ceramic susceptor
US7255775B2 (en) * 2002-06-28 2007-08-14 Toshiba Ceramics Co., Ltd. Semiconductor wafer treatment member
JP4278441B2 (ja) * 2002-06-28 2009-06-17 コバレントマテリアル株式会社 半導体ウエハ処理用部材
US7256375B2 (en) * 2002-08-30 2007-08-14 Asm International N.V. Susceptor plate for high temperature heat treatment
EP1654752B1 (de) * 2003-08-01 2011-06-29 SGL Carbon SE Halter zum tragen von wafern während der halbleiterherstellung
JP4556034B2 (ja) * 2004-03-10 2010-10-06 学校法人 名城大学 Ｉｉｉ族窒化物半導体の作製方法
US20060060145A1 (en) * 2004-09-17 2006-03-23 Van Den Berg Jannes R Susceptor with surface roughness for high temperature substrate processing
US7632609B2 (en) * 2005-10-24 2009-12-15 Shin-Etsu Chemical Co., Ltd. Fabrication method of photomask-blank

Also Published As

Publication number Publication date
WO2008058270A2 (en) 2008-05-15
CN101563771A (zh) 2009-10-21
JP2010509778A (ja) 2010-03-25
EP2080221B1 (de) 2011-06-15
EP2080221A2 (de) 2009-07-22
US20080110402A1 (en) 2008-05-15
WO2008058270A3 (en) 2008-07-10

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