ATE509506T1 - Gasentladungsquelle, im besonderen für euv- strahlung - Google Patents

Gasentladungsquelle, im besonderen für euv- strahlung

Info

Publication number
ATE509506T1
ATE509506T1 AT08860964T AT08860964T ATE509506T1 AT E509506 T1 ATE509506 T1 AT E509506T1 AT 08860964 T AT08860964 T AT 08860964T AT 08860964 T AT08860964 T AT 08860964T AT E509506 T1 ATE509506 T1 AT E509506T1
Authority
AT
Austria
Prior art keywords
electrode
source
intermediate space
discharge area
gas discharge
Prior art date
Application number
AT08860964T
Other languages
English (en)
Inventor
Jakob Neff
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE509506T1 publication Critical patent/ATE509506T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
AT08860964T 2007-12-18 2008-12-16 Gasentladungsquelle, im besonderen für euv- strahlung ATE509506T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007060807A DE102007060807B4 (de) 2007-12-18 2007-12-18 Gasentladungsquelle, insbesondere für EUV-Strahlung
PCT/IB2008/055344 WO2009077980A1 (en) 2007-12-18 2008-12-16 Gas discharge source, in particular for euv-radiation

Publications (1)

Publication Number Publication Date
ATE509506T1 true ATE509506T1 (de) 2011-05-15

Family

ID=40409912

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08860964T ATE509506T1 (de) 2007-12-18 2008-12-16 Gasentladungsquelle, im besonderen für euv- strahlung

Country Status (9)

Country Link
US (1) US8227779B2 (de)
EP (1) EP2223574B1 (de)
JP (1) JP5566302B2 (de)
KR (1) KR101505827B1 (de)
CN (1) CN101971709B (de)
AT (1) ATE509506T1 (de)
DE (1) DE102007060807B4 (de)
TW (1) TWI445458B (de)
WO (1) WO2009077980A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8686381B2 (en) 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
CA2846201C (en) 2013-03-15 2021-04-13 Chevron U.S.A. Inc. Ring electrode device and method for generating high-pressure pulses
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
DE102013017655B4 (de) * 2013-10-18 2017-01-05 Ushio Denki Kabushiki Kaisha Anordnung und Verfahren zum Kühlen einer plasmabasierten Strahlungsquelle
JP6477179B2 (ja) * 2015-04-07 2019-03-06 ウシオ電機株式会社 放電電極及び極端紫外光光源装置
JP7156331B2 (ja) * 2020-05-15 2022-10-19 ウシオ電機株式会社 極端紫外光光源装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10139677A1 (de) * 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
TW589924B (en) * 2001-04-06 2004-06-01 Fraunhofer Ges Forschung Process and device for producing extreme ultraviolet ray/weak x-ray
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
DE10342239B4 (de) * 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
DE102005023060B4 (de) * 2005-05-19 2011-01-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung
CN101199240A (zh) * 2005-06-14 2008-06-11 皇家飞利浦电子股份有限公司 保护用于产生euv辐射和/或软x射线的辐射源对抗短路的方法
JP4904809B2 (ja) * 2005-12-28 2012-03-28 ウシオ電機株式会社 極端紫外光光源装置
JP2007200919A (ja) 2006-01-23 2007-08-09 Ushio Inc 極端紫外光光源装置
DE102006015640B3 (de) * 2006-03-31 2007-10-04 Xtreme Technologies Gmbh Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung auf Basis einer elektrisch betriebenen Gasentladung
DE102006015641B4 (de) * 2006-03-31 2017-02-23 Ushio Denki Kabushiki Kaisha Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung
DE102006015541A1 (de) * 2006-03-31 2007-10-04 List Holding Ag Verfahren und Vorrichtung zur Behandlung von zähviskosen Produkten
JP2007305908A (ja) 2006-05-15 2007-11-22 Ushio Inc 極端紫外光光源装置
CN101444148B (zh) * 2006-05-16 2013-03-27 皇家飞利浦电子股份有限公司 提高euv和/或软x射线灯的转换效率的方法及相应装置
TW200808134A (en) * 2006-07-28 2008-02-01 Ushio Electric Inc Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation

Also Published As

Publication number Publication date
EP2223574B1 (de) 2011-05-11
WO2009077980A8 (en) 2010-12-09
JP2011507206A (ja) 2011-03-03
US8227779B2 (en) 2012-07-24
KR20100093609A (ko) 2010-08-25
US20100264336A1 (en) 2010-10-21
TW200944060A (en) 2009-10-16
JP5566302B2 (ja) 2014-08-06
DE102007060807B4 (de) 2009-11-26
KR101505827B1 (ko) 2015-03-25
TWI445458B (zh) 2014-07-11
CN101971709A (zh) 2011-02-09
EP2223574A1 (de) 2010-09-01
DE102007060807A1 (de) 2009-07-02
WO2009077980A1 (en) 2009-06-25
CN101971709B (zh) 2013-09-18

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