ATE439456T1 - Verfahren zum herstellen einer amorphen kohlenstoffschicht - Google Patents

Verfahren zum herstellen einer amorphen kohlenstoffschicht

Info

Publication number
ATE439456T1
ATE439456T1 AT06011694T AT06011694T ATE439456T1 AT E439456 T1 ATE439456 T1 AT E439456T1 AT 06011694 T AT06011694 T AT 06011694T AT 06011694 T AT06011694 T AT 06011694T AT E439456 T1 ATE439456 T1 AT E439456T1
Authority
AT
Austria
Prior art keywords
evaporation
evaporation sources
sputtering
evaporation source
unbalanced magnetron
Prior art date
Application number
AT06011694T
Other languages
English (en)
Inventor
Kenji Yamamoto
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Application granted granted Critical
Publication of ATE439456T1 publication Critical patent/ATE439456T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Glass Compositions (AREA)
AT06011694T 2005-07-04 2006-06-06 Verfahren zum herstellen einer amorphen kohlenstoffschicht ATE439456T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005195303A JP4607687B2 (ja) 2005-07-04 2005-07-04 非晶質炭素膜の成膜方法

Publications (1)

Publication Number Publication Date
ATE439456T1 true ATE439456T1 (de) 2009-08-15

Family

ID=36716897

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06011694T ATE439456T1 (de) 2005-07-04 2006-06-06 Verfahren zum herstellen einer amorphen kohlenstoffschicht

Country Status (6)

Country Link
US (1) US20070000770A1 (de)
EP (1) EP1741801B1 (de)
JP (1) JP4607687B2 (de)
KR (1) KR100776888B1 (de)
AT (1) ATE439456T1 (de)
DE (1) DE602006008389D1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0608582D0 (en) * 2006-05-02 2006-06-07 Univ Sheffield Hallam High power impulse magnetron sputtering vapour deposition
KR100796766B1 (ko) * 2006-05-29 2008-01-22 (주)레드로버 프로젝션용 스테레오 광학엔진 구조
KR100893675B1 (ko) * 2007-05-11 2009-04-17 주식회사 테스 비정질 탄소막 형성 방법 및 이를 이용한 반도체 소자의제조 방법
WO2009052874A1 (en) * 2007-10-26 2009-04-30 Hauzer Techno Coating Bv Dual magnetron sputtering power supply and magnetron sputtering apparatus
WO2009079358A1 (en) * 2007-12-14 2009-06-25 The Regents Of The University Of California Very low pressure high power impulse triggered magnetron sputtering
BR112013014046A2 (pt) * 2010-12-08 2020-04-28 Galleon Int Corporation método para formar um revestimento em um substrato a ser exposto a hidrocarbonetos, revestimento volumoso resistente ao desgaste e duro depositado em um substrato e artigo
WO2012115040A1 (ja) * 2011-02-22 2012-08-30 グローリー株式会社 貨幣処理装置、貨幣処理システム、貨幣搬送カセット、紙幣処理装置および紙幣処理方法
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
US9761424B1 (en) 2011-09-07 2017-09-12 Nano-Product Engineering, LLC Filtered cathodic arc method, apparatus and applications thereof
JP5713872B2 (ja) * 2011-10-28 2015-05-07 株式会社神戸製鋼所 成膜装置及び成膜方法
CN102719799A (zh) * 2012-06-08 2012-10-10 深圳市华星光电技术有限公司 旋转磁控溅射靶及相应的磁控溅射装置
CN104328380A (zh) * 2014-07-31 2015-02-04 宁夏天马滚动体制造有限公司 轴承滚柱非平衡磁控溅射离子镀装置及方法
US11834204B1 (en) 2018-04-05 2023-12-05 Nano-Product Engineering, LLC Sources for plasma assisted electric propulsion
EP3938556A1 (de) * 2019-03-15 2022-01-19 Nanofilm Technologies International Limited Verbesserte beschichtungsverfahren
CN114717512B (zh) * 2022-04-21 2023-02-28 中国科学院兰州化学物理研究所 一种自适应长效润滑性能金/碳复合薄膜的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9006073D0 (en) * 1990-03-17 1990-05-16 D G Teer Coating Services Limi Magnetron sputter ion plating
JPH06145975A (ja) * 1992-03-20 1994-05-27 Komag Inc 炭素フィルムをスパタリングする方法及びその製造物
DE19651615C1 (de) * 1996-12-12 1997-07-10 Fraunhofer Ges Forschung Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern
DE19740793C2 (de) * 1997-09-17 2003-03-20 Bosch Gmbh Robert Verfahren zur Beschichtung von Oberflächen mittels einer Anlage mit Sputterelektroden und Verwendung des Verfahrens
US6726993B2 (en) * 1997-12-02 2004-04-27 Teer Coatings Limited Carbon coatings, method and apparatus for applying them, and articles bearing such coatings
JP3172139B2 (ja) * 1998-08-04 2001-06-04 富士写真フイルム株式会社 サーマルヘッド
US6338777B1 (en) * 1998-10-23 2002-01-15 International Business Machines Corporation Method and apparatus for sputtering thin films
JP2001150351A (ja) * 1999-11-19 2001-06-05 Noritake Diamond Ind Co Ltd ドレッシング用電着砥石
JP4615697B2 (ja) * 2000-11-07 2011-01-19 ティーア、コーティングズ、リミテッド 炭素含有被覆を施した物品
JP2002367138A (ja) * 2001-06-07 2002-12-20 Fujitsu Ltd 磁気情報記録媒体
JP4360082B2 (ja) * 2001-12-17 2009-11-11 住友電気工業株式会社 非晶質炭素被膜の製造方法及び非晶質炭素被覆摺動部品
JP2004285440A (ja) * 2003-03-24 2004-10-14 Daiwa Kogyo Kk Ｈｃｄ・ｕｂｍｓハイブリッドｐｖｄ法およびその装置
JP2005138208A (ja) * 2003-11-05 2005-06-02 Sumitomo Electric Hardmetal Corp 表面被覆切削工具とその作製方法

Also Published As

Publication number Publication date
US20070000770A1 (en) 2007-01-04
EP1741801A3 (de) 2007-09-05
EP1741801A2 (de) 2007-01-10
KR20070004449A (ko) 2007-01-09
DE602006008389D1 (de) 2009-09-24
JP4607687B2 (ja) 2011-01-05
EP1741801B1 (de) 2009-08-12
KR100776888B1 (ko) 2007-11-19
JP2007009310A (ja) 2007-01-18

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