ATE359540T1 - Beleuchtungsvorrichtung - Google Patents

Beleuchtungsvorrichtung

Info

Publication number
ATE359540T1
ATE359540T1 AT02256342T AT02256342T ATE359540T1 AT E359540 T1 ATE359540 T1 AT E359540T1 AT 02256342 T AT02256342 T AT 02256342T AT 02256342 T AT02256342 T AT 02256342T AT E359540 T1 ATE359540 T1 AT E359540T1
Authority
AT
Austria
Prior art keywords
light
light integrator
sides
integrator
lighting device
Prior art date
Application number
AT02256342T
Other languages
English (en)
Inventor
Ken-Ichiro Mori
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE359540T1 publication Critical patent/ATE359540T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vehicle Body Suspensions (AREA)
  • Polarising Elements (AREA)
  • Seal Device For Vehicle (AREA)
  • Microscoopes, Condenser (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Supplying Of Containers To The Packaging Station (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
AT02256342T 2001-09-14 2002-09-12 Beleuchtungsvorrichtung ATE359540T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001280458A JP3634782B2 (ja) 2001-09-14 2001-09-14 照明装置、それを用いた露光装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
ATE359540T1 true ATE359540T1 (de) 2007-05-15

Family

ID=19104453

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02256342T ATE359540T1 (de) 2001-09-14 2002-09-12 Beleuchtungsvorrichtung

Country Status (8)

Country Link
US (1) US7126757B2 (de)
EP (1) EP1293834B1 (de)
JP (1) JP3634782B2 (de)
KR (2) KR100521938B1 (de)
CN (1) CN1251028C (de)
AT (1) ATE359540T1 (de)
DE (1) DE60219404T2 (de)
TW (1) TW559891B (de)

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JP4366163B2 (ja) * 2003-09-25 2009-11-18 キヤノン株式会社 照明装置及び露光装置
WO2005078522A2 (en) * 2004-02-17 2005-08-25 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP4551666B2 (ja) * 2004-02-19 2010-09-29 キヤノン株式会社 照明装置及び露光装置
JP2005310942A (ja) * 2004-04-20 2005-11-04 Canon Inc 露光装置、露光方法、及びそれを用いたデバイス製造方法
US7337552B2 (en) * 2004-08-24 2008-03-04 Litel Instruments Method and apparatus for registration with integral alignment optics
JP2007198896A (ja) 2006-01-26 2007-08-09 Canon Inc 計測方法
KR20090013746A (ko) * 2006-05-25 2009-02-05 가부시키가이샤 니콘 조명 광학 장치, 노광 장치 및 디바이스 제조방법
US8237609B2 (en) * 2009-02-22 2012-08-07 Trimble Navigation Limited GNSS position coasting
DE112007003538T5 (de) * 2007-06-22 2010-05-20 Trimble Terrasat Gmbh Positionsverfolgungsgerät und Verfahren
JP4572989B2 (ja) * 2008-07-08 2010-11-04 セイコーエプソン株式会社 照明装置、投写型表示装置、および光学インテグレータ
US8396055B2 (en) * 2009-10-20 2013-03-12 Time Warner Cable Inc. Methods and apparatus for enabling media functionality in a content-based network
JP5806479B2 (ja) * 2011-02-22 2015-11-10 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP2013015762A (ja) * 2011-07-06 2013-01-24 Sony Corp 照明光学系および画像表示装置
JP5924037B2 (ja) * 2012-03-09 2016-05-25 ソニー株式会社 照明装置および表示装置
DE102012207866A1 (de) 2012-05-11 2013-11-14 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie
DE102012210961A1 (de) * 2012-06-27 2013-06-06 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie
CN102866593B (zh) * 2012-09-17 2015-02-11 上海华力微电子有限公司 一种监控光刻设备光路稳定性的装置
JP2014153636A (ja) * 2013-02-13 2014-08-25 Canon Inc 照明光学系および画像投射装置
CN103399463B (zh) * 2013-07-19 2015-07-29 中国科学院上海光学精密机械研究所 投影光刻机照明装置和使用方法
CN106707691B (zh) * 2015-07-15 2018-10-16 上海微电子装备（集团）股份有限公司 曝光装置及方法
WO2017194393A1 (en) * 2016-05-11 2017-11-16 Asml Netherlands B.V. Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method
CN106907583A (zh) * 2017-03-22 2017-06-30 深圳市奇普仕科技有限公司 一种新型基于紫外led的3d丝印光源
CN107656415A (zh) * 2017-11-24 2018-02-02 北京速镭视激光科技有限公司 一种高效、高均匀性被动光束匀光整形照明系统
CN112576944B (zh) * 2020-11-26 2023-03-14 广州光联电子科技有限公司 一种照明系统
CN113419407B (zh) * 2021-07-15 2022-09-20 中国科学院长春光学精密机械与物理研究所 一种复眼照明系统的匹配方法

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US5253110A (en) * 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
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JPH1092729A (ja) 1996-09-12 1998-04-10 Canon Inc 照明装置及びそれを用いた走査型投影露光装置
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JP3005203B2 (ja) * 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
KR19990002911U (ko) * 1997-06-30 1999-01-25 김영환 사진 식각 공정의 조명 장치
KR100564436B1 (ko) * 1997-07-22 2006-03-29 가부시키가이샤 니콘 노광 방법, 노광 장치 및 광 세정 방법
JPH11150051A (ja) * 1997-11-17 1999-06-02 Nikon Corp 露光方法及び装置
JPH11176742A (ja) * 1997-12-12 1999-07-02 Nikon Corp 照明光学系と露光装置及び半導体デバイスの製造方法
EP1069600A4 (de) * 1998-03-24 2002-11-20 Nikon Corp Belichtungsvorrichtung und -verfahren, und herstellungsverfahren einer solchen vorrichtung
JP2001176766A (ja) 1998-10-29 2001-06-29 Nikon Corp 照明装置及び投影露光装置
EP1014196A3 (de) * 1998-12-17 2002-05-29 Nikon Corporation Beleuchtungsverfahren und -System für einen optischen Projektionsapparat
EP1114802A4 (de) * 1999-04-21 2008-12-31 Nikon Corp Quartzglas-element, verfahren zur herstellung und projektionsausrichteinrichtung, das dieses verwendet
KR100347517B1 (ko) * 1999-12-01 2002-08-07 한국전자통신연구원 리소그래피 장비에서 복굴절 광학 유니트를 사용하는 변형 조명 장치
KR20010085493A (ko) * 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법

Also Published As

Publication number Publication date
JP2003086500A (ja) 2003-03-20
US20030053217A1 (en) 2003-03-20
US7126757B2 (en) 2006-10-24
DE60219404D1 (de) 2007-05-24
KR100521938B1 (ko) 2005-10-13
KR100506497B1 (ko) 2005-08-08
EP1293834A2 (de) 2003-03-19
CN1405633A (zh) 2003-03-26
TW559891B (en) 2003-11-01
CN1251028C (zh) 2006-04-12
EP1293834A3 (de) 2004-09-22
EP1293834B1 (de) 2007-04-11
JP3634782B2 (ja) 2005-03-30
DE60219404T2 (de) 2007-12-27
KR20030023586A (ko) 2003-03-19
KR20050046685A (ko) 2005-05-18

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