ATE346326T1 - Lichtempfindliche harzzusammensetzung, inkjet- aufzeichnungskopf mit der zusammensetzung und wiedergabeverfahren dafür - Google Patents
Lichtempfindliche harzzusammensetzung, inkjet- aufzeichnungskopf mit der zusammensetzung und wiedergabeverfahren dafürInfo
- Publication number
- ATE346326T1 ATE346326T1 AT04746028T AT04746028T ATE346326T1 AT E346326 T1 ATE346326 T1 AT E346326T1 AT 04746028 T AT04746028 T AT 04746028T AT 04746028 T AT04746028 T AT 04746028T AT E346326 T1 ATE346326 T1 AT E346326T1
- Authority
- AT
- Austria
- Prior art keywords
- composition
- recording head
- inkjet recording
- light sensitive
- sensitive resin
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 239000011342 resin composition Substances 0.000 title abstract 2
- 229920002614 Polyether block amide Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000003431 cross linking reagent Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003170674A JP3963456B2 (ja) | 2003-06-16 | 2003-06-16 | 感光性樹脂組成物およびこれを用いたインクジェット記録ヘッドおよびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE346326T1 true ATE346326T1 (de) | 2006-12-15 |
Family
ID=33549433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04746028T ATE346326T1 (de) | 2003-06-16 | 2004-06-10 | Lichtempfindliche harzzusammensetzung, inkjet- aufzeichnungskopf mit der zusammensetzung und wiedergabeverfahren dafür |
Country Status (8)
Country | Link |
---|---|
US (1) | US7063933B2 (de) |
EP (1) | EP1634123B1 (de) |
JP (1) | JP3963456B2 (de) |
KR (1) | KR100733939B1 (de) |
CN (1) | CN100580556C (de) |
AT (1) | ATE346326T1 (de) |
DE (1) | DE602004003379T2 (de) |
WO (1) | WO2004111732A1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5027991B2 (ja) * | 2004-12-03 | 2012-09-19 | キヤノン株式会社 | インクジェットヘッドおよびその製造方法 |
JP4656641B2 (ja) * | 2005-06-02 | 2011-03-23 | キヤノン株式会社 | 記録ヘッドおよび記録装置 |
EP1752480A1 (de) * | 2005-08-12 | 2007-02-14 | Merck Patent GmbH | Polymerisierbares dielektrisches Material |
JP4854464B2 (ja) * | 2005-10-20 | 2012-01-18 | キヤノン株式会社 | 液体吐出ヘッドおよびその製造方法 |
JP4979641B2 (ja) * | 2007-06-20 | 2012-07-18 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
KR20090062012A (ko) * | 2007-12-12 | 2009-06-17 | 삼성전자주식회사 | 잉크젯 헤드 및 그 제조방법 |
JP5388817B2 (ja) * | 2008-12-12 | 2014-01-15 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
KR101791446B1 (ko) * | 2009-07-21 | 2017-10-30 | 닛산 가가쿠 고교 가부시키 가이샤 | 광배향성을 갖는 열경화막 형성 조성물 |
EP2557119B1 (de) | 2010-04-08 | 2015-12-09 | Nissan Chemical Industries, Ltd. | Zusammensetzung zur bildung eines wärmehärtenden films mit lichtausrichtungseigenschaften |
JP6071565B2 (ja) | 2013-01-11 | 2017-02-01 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
WO2016068947A1 (en) | 2014-10-30 | 2016-05-06 | Hewlett-Packard Development Company, L.P. | Ink jet printhead |
JP6632225B2 (ja) * | 2015-06-05 | 2020-01-22 | キヤノン株式会社 | 吐出口面の撥水処理方法 |
US11666918B2 (en) * | 2020-03-06 | 2023-06-06 | Funai Electric Co., Ltd. | Microfluidic chip, head, and dispensing device for dispensing fluids containing an acidic component |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4450455A (en) | 1981-06-18 | 1984-05-22 | Canon Kabushiki Kaisha | Ink jet head |
JPS57208255A (en) | 1981-06-18 | 1982-12-21 | Canon Inc | Ink jet head |
JPS57208256A (en) | 1981-06-18 | 1982-12-21 | Canon Inc | Ink jet head |
US4595745A (en) * | 1983-06-27 | 1986-06-17 | Ube Industries, Ltd. | Organic solvent-soluble photosensitive polyamide resin |
US4565859A (en) | 1984-01-30 | 1986-01-21 | Daicel Chemical Industries, Ltd. | Polyether compounds, epoxy resins, epoxy resin compositions, and processes for production thereof |
JPH0625194B2 (ja) | 1984-01-30 | 1994-04-06 | ダイセル化学工業株式会社 | 新規なエポキシ樹脂の製造方法 |
JPS60180197A (ja) * | 1984-02-27 | 1985-09-13 | 宇部興産株式会社 | 多層プリント配線板の製造方法 |
JPH0645242B2 (ja) | 1984-12-28 | 1994-06-15 | キヤノン株式会社 | 液体噴射記録ヘツドの製造方法 |
JPH07119269B2 (ja) | 1986-08-26 | 1995-12-20 | ダイセル化学工業株式会社 | エポキシ樹脂 |
JPH0725864B2 (ja) | 1987-03-09 | 1995-03-22 | ダイセル化学工業株式会社 | エポキシ樹脂 |
EP0303759B1 (de) | 1987-08-17 | 1994-06-08 | Daicel Chemical Industries, Ltd. | Polyetherverbindungen, Epoxydharze und Verfahren zu deren Herstellung |
JPH0822902B2 (ja) | 1988-11-21 | 1996-03-06 | ダイセル化学工業株式会社 | エポキシ樹脂の製造方法 |
CA2019693A1 (en) * | 1989-07-07 | 1991-01-07 | Karen Ann Graziano | Acid-hardening photoresists of improved sensitivity |
JP2697937B2 (ja) | 1989-12-15 | 1998-01-19 | キヤノン株式会社 | 活性エネルギー線硬化性樹脂組成物 |
DE4217688A1 (de) * | 1992-05-29 | 1993-12-02 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen |
JP3143307B2 (ja) | 1993-02-03 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
ES2232047T3 (es) * | 1998-06-03 | 2005-05-16 | Canon Kabushiki Kaisha | Cabezal para chorros de tinta, sustrato para cabezal para chorros de tinta y metodo para la fabricacion del cabezal. |
JP3957920B2 (ja) | 1998-06-11 | 2007-08-15 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
US6379571B1 (en) | 1998-06-11 | 2002-04-30 | Canon Kabushiki Kaisha | Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus |
WO2002044275A1 (fr) * | 2000-12-01 | 2002-06-06 | Toray Industries, Inc. | Composition polyester, films fabriques a partir de cette composition et procede de fabrication de la composition |
FR2824329B1 (fr) * | 2001-05-03 | 2003-06-13 | Atofina | Compositions de polymeres antistatique |
US20040094761A1 (en) * | 2002-11-02 | 2004-05-20 | David Sparrowe | Polymerizable amine mixtures, amine polymer materials and their use |
EP1609024B1 (de) * | 2003-03-11 | 2015-09-30 | Fujifilm Electronic Materials USA, Inc. | Lichtempfindliche harzzusammensetzungen |
-
2003
- 2003-06-16 JP JP2003170674A patent/JP3963456B2/ja not_active Expired - Fee Related
-
2004
- 2004-06-10 KR KR1020057024097A patent/KR100733939B1/ko not_active IP Right Cessation
- 2004-06-10 EP EP04746028A patent/EP1634123B1/de not_active Not-in-force
- 2004-06-10 CN CN200480011699A patent/CN100580556C/zh not_active Expired - Fee Related
- 2004-06-10 AT AT04746028T patent/ATE346326T1/de not_active IP Right Cessation
- 2004-06-10 DE DE602004003379T patent/DE602004003379T2/de active Active
- 2004-06-10 WO PCT/JP2004/008500 patent/WO2004111732A1/en active IP Right Grant
- 2004-12-10 US US11/008,221 patent/US7063933B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7063933B2 (en) | 2006-06-20 |
CN1781058A (zh) | 2006-05-31 |
DE602004003379D1 (de) | 2007-01-04 |
WO2004111732A1 (en) | 2004-12-23 |
US20050093924A1 (en) | 2005-05-05 |
KR20060020680A (ko) | 2006-03-06 |
JP3963456B2 (ja) | 2007-08-22 |
JP2005008652A (ja) | 2005-01-13 |
DE602004003379T2 (de) | 2007-09-13 |
KR100733939B1 (ko) | 2007-06-29 |
EP1634123A1 (de) | 2006-03-15 |
CN100580556C (zh) | 2010-01-13 |
EP1634123B1 (de) | 2006-11-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |