ATE326495T1 - Copolyester mit verbessertem dauerhaftem haftvermögen - Google Patents

Copolyester mit verbessertem dauerhaftem haftvermögen

Info

Publication number
ATE326495T1
ATE326495T1 AT01971448T AT01971448T ATE326495T1 AT E326495 T1 ATE326495 T1 AT E326495T1 AT 01971448 T AT01971448 T AT 01971448T AT 01971448 T AT01971448 T AT 01971448T AT E326495 T1 ATE326495 T1 AT E326495T1
Authority
AT
Austria
Prior art keywords
copolyester
compositions
permanent adhesion
improved permanent
adhesion
Prior art date
Application number
AT01971448T
Other languages
English (en)
Inventor
Jeffrey Palumbo
Francis Rossitto
Eugene Sommerfeld
Original Assignee
Bostik Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bostik Sa filed Critical Bostik Sa
Application granted granted Critical
Publication of ATE326495T1 publication Critical patent/ATE326495T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J167/00—Adhesives based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Adhesives based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/64—Polyesters containing both carboxylic ester groups and carbonate groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/695—Polyesters containing atoms other than carbon, hydrogen and oxygen containing silicon
    • C08G63/6954—Polyesters containing atoms other than carbon, hydrogen and oxygen containing silicon derived from polxycarboxylic acids and polyhydroxy compounds
    • C08G63/6956—Dicarboxylic acids and dihydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/78—Preparation processes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Paints Or Removers (AREA)
AT01971448T 2000-04-27 2001-04-26 Copolyester mit verbessertem dauerhaftem haftvermögen ATE326495T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/559,794 US6774183B1 (en) 2000-04-27 2000-04-27 Copolyesters having improved retained adhesion

Publications (1)

Publication Number Publication Date
ATE326495T1 true ATE326495T1 (de) 2006-06-15

Family

ID=24235051

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01971448T ATE326495T1 (de) 2000-04-27 2001-04-26 Copolyester mit verbessertem dauerhaftem haftvermögen

Country Status (7)

Country Link
US (1) US6774183B1 (de)
EP (1) EP1220875B1 (de)
AT (1) ATE326495T1 (de)
AU (1) AU9517601A (de)
CA (1) CA2377950A1 (de)
DE (1) DE60119682T2 (de)
WO (1) WO2001081448A2 (de)

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US7226984B2 (en) * 2002-04-26 2007-06-05 Sanyo Chemical Industries, Ltd Binder for electrostatic image developing toner
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20060108710A1 (en) * 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US7122482B2 (en) * 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7906180B2 (en) 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7282550B2 (en) * 2004-08-16 2007-10-16 Molecular Imprints, Inc. Composition to provide a layer with uniform etch characteristics
US7939131B2 (en) 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US20060081557A1 (en) * 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US8557351B2 (en) * 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8142703B2 (en) * 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
US20070141373A1 (en) * 2005-12-20 2007-06-21 Sommerfeld Eugene G Segmented copolyesterether adhesive compositions
EP2574397B1 (de) * 2008-01-24 2016-04-13 PolyOne Corporation Epoxy-1,3-Propandioldisoyat
CN101497775B (zh) * 2008-02-02 2013-06-05 上海轻工业研究所有限公司 耐水解聚酯热熔胶的制备方法
DE102008045802A1 (de) * 2008-09-05 2010-03-11 Henkel Ag & Co. Kgaa Schmelzklebstoff auf Basis von Metallocene-katalysierten Olefin-α-Olefin Copolymeren
US20100109195A1 (en) 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
US10183249B2 (en) * 2015-03-09 2019-01-22 No Toil Industries, Inc. Coated, reticulated foam air filter suitable for respiration
KR102122502B1 (ko) 2015-06-09 2020-06-12 피피지 인더스트리즈 오하이오 인코포레이티드 부드러운 촉감의 방오성 코팅 조성물 및 이로부터 형성된 코팅
CN108137954B (zh) * 2015-07-13 2021-03-19 佐敦公司 防污组合物
EP3938413A4 (de) * 2019-03-15 2022-09-28 Dow Global Technologies LLC Wässrige polyurethandispersion und verfahren zu ihrer herstellung
CN115785419B (zh) * 2023-01-31 2023-05-02 富海(东营)新材料科技有限公司 改性petg共聚酯、制备方法及其发泡颗粒的制备方法
CN117843938B (zh) * 2024-03-08 2024-05-24 华东理工大学 一种类聚烯烃的长碳链聚酯弹性体、制备方法及其应用

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Also Published As

Publication number Publication date
EP1220875A2 (de) 2002-07-10
WO2001081448A3 (en) 2002-05-02
US6774183B1 (en) 2004-08-10
WO2001081448A9 (en) 2003-05-30
EP1220875B1 (de) 2006-05-17
DE60119682T2 (de) 2007-05-03
WO2001081448A2 (en) 2001-11-01
CA2377950A1 (en) 2001-11-01
DE60119682D1 (de) 2006-06-22
AU9517601A (en) 2001-11-07

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Legal Events

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