ATE263447T1 - Laser mit hoher spitzenleistung und dessen anwendung zur erzeugung von licht im extrem-uv- bereich - Google Patents

Laser mit hoher spitzenleistung und dessen anwendung zur erzeugung von licht im extrem-uv- bereich

Info

Publication number
ATE263447T1
ATE263447T1 AT01965537T AT01965537T ATE263447T1 AT E263447 T1 ATE263447 T1 AT E263447T1 AT 01965537 T AT01965537 T AT 01965537T AT 01965537 T AT01965537 T AT 01965537T AT E263447 T1 ATE263447 T1 AT E263447T1
Authority
AT
Austria
Prior art keywords
extreme
range
application
peak power
power laser
Prior art date
Application number
AT01965537T
Other languages
English (en)
Inventor
Jean-Marc Weulersse
Flanchec Vincent Le
Michel Gilbert
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE263447T1 publication Critical patent/ATE263447T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
  • X-Ray Techniques (AREA)
  • Laser Surgery Devices (AREA)
AT01965537T 2000-09-27 2001-09-19 Laser mit hoher spitzenleistung und dessen anwendung zur erzeugung von licht im extrem-uv- bereich ATE263447T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0012286A FR2814599B1 (fr) 2000-09-27 2000-09-27 Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet
PCT/IB2001/001714 WO2002027872A1 (en) 2000-09-27 2001-09-19 High-peak-power laser device and application to the generation of light in the extreme ultraviolet

Publications (1)

Publication Number Publication Date
ATE263447T1 true ATE263447T1 (de) 2004-04-15

Family

ID=8854730

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01965537T ATE263447T1 (de) 2000-09-27 2001-09-19 Laser mit hoher spitzenleistung und dessen anwendung zur erzeugung von licht im extrem-uv- bereich

Country Status (12)

Country Link
US (1) US20040022295A1 (de)
EP (1) EP1320913B1 (de)
JP (1) JP5036118B2 (de)
KR (2) KR100900164B1 (de)
CN (1) CN1279666C (de)
AT (1) ATE263447T1 (de)
AU (1) AU2001286170A1 (de)
DE (1) DE60102597T2 (de)
FR (1) FR2814599B1 (de)
RU (1) RU2301485C2 (de)
TW (1) TW515134B (de)
WO (1) WO2002027872A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2006503432A (ja) 2002-10-17 2006-01-26 ルメニス・インコーポレーテッド ２つ以上の波長のレーザ・ビームを供給するシステム、方法および装置
FR2859545B1 (fr) 2003-09-05 2005-11-11 Commissariat Energie Atomique Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet
FR2884652B1 (fr) * 2005-04-19 2009-07-10 Femlight Sa Dispositif de generation d'impulsions laser amplifiees par fibres optiques a couches photoniques
JP4959956B2 (ja) * 2005-06-07 2012-06-27 株式会社日立製作所 アンテナ
JP5608173B2 (ja) 2008-12-16 2014-10-15 コーニンクレッカ フィリップス エヌ ヴェ 向上された効率によってｅｕｖ放射又は軟ｘ線を生成する方法及び装置
JP5314433B2 (ja) * 2009-01-06 2013-10-16 ギガフォトン株式会社 極端紫外光源装置
JP5312959B2 (ja) * 2009-01-09 2013-10-09 ギガフォトン株式会社 極端紫外光源装置
WO2011013779A1 (ja) 2009-07-29 2011-02-03 株式会社小松製作所 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
JP5578483B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
US9335637B2 (en) * 2011-09-08 2016-05-10 Kla-Tencor Corporation Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation
JP6021454B2 (ja) 2011-10-05 2016-11-09 ギガフォトン株式会社 極端紫外光生成装置および極端紫外光生成方法
CN115119373B (zh) * 2022-05-31 2025-12-05 广东省智能机器人研究院 极紫外光产生方法及装置

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US4264869A (en) * 1978-11-13 1981-04-28 Hunter Robert O Compressed pulse laser
JPS62160781A (ja) * 1986-01-09 1987-07-16 Agency Of Ind Science & Technol レ−ザ光照射装置
JPS63272092A (ja) * 1987-04-30 1988-11-09 Yoshiaki Arata 超強力複合レ−ザ・ビ−ム造出法
EP0377710A4 (en) * 1988-06-16 1991-04-10 Australasian Lasers Pty. Ltd. Hybrid laser
US5009658A (en) * 1989-04-14 1991-04-23 Karl Storz Endoscopy-America, Inc. Dual frequency laser lithotripter
JPH0442979A (ja) * 1990-06-07 1992-02-13 Asahi Glass Co Ltd レーザダイオード励起固体レーザ
RU2014690C1 (ru) * 1990-11-28 1994-06-15 Научно-исследовательский институт комплексных испытаний оптико-электронных приборов и систем Всесоюзного научного центра "Государственный оптический институт им.С.И.Вавилова" Способ получения импульса мощного лазерного излучения
US5235607A (en) * 1990-12-27 1993-08-10 Mitsui Petrochemical Industries, Ltd. Solid-state laser device and machining apparatus
JPH06174660A (ja) * 1992-10-08 1994-06-24 Rikagaku Kenkyusho Ｘ線像形成装置
US5375132A (en) * 1993-05-05 1994-12-20 Coherent, Inc. Solid state laser with interleaved output
US5488619A (en) * 1994-10-06 1996-01-30 Trw Inc. Ultracompact Q-switched microlasers and related method
JPH10509280A (ja) * 1994-11-15 1998-09-08 ジェイ・エム・エー・アール・テクノロジー・カンパニー 低コスト、高平均出力、高輝度ソリツドステートレーザ
JPH08327794A (ja) * 1995-06-01 1996-12-13 Olympus Optical Co Ltd レーザプラズマ光源
US5838709A (en) * 1995-06-07 1998-11-17 Nikon Corporation Ultraviolet laser source
JPH11233867A (ja) * 1998-02-10 1999-08-27 Nikon Corp パルスレーザ光発生装置
AU1514399A (en) * 1998-11-04 2000-05-22 Laserlab Research Ltd Radiating adder
JP2000208799A (ja) * 1999-01-13 2000-07-28 Kanegafuchi Chem Ind Co Ltd 薄膜構成体の加工方法
US6097742A (en) * 1999-03-05 2000-08-01 Coherent, Inc. High-power external-cavity optically-pumped semiconductor lasers
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Also Published As

Publication number Publication date
FR2814599A1 (fr) 2002-03-29
WO2002027872A1 (en) 2002-04-04
RU2301485C2 (ru) 2007-06-20
AU2001286170A1 (en) 2002-04-08
EP1320913B1 (de) 2004-03-31
TW515134B (en) 2002-12-21
KR100900164B1 (ko) 2009-06-02
DE60102597T2 (de) 2005-03-03
CN1279666C (zh) 2006-10-11
US20040022295A1 (en) 2004-02-05
FR2814599B1 (fr) 2005-05-20
KR20030036839A (ko) 2003-05-09
CN1505857A (zh) 2004-06-16
JP2004510356A (ja) 2004-04-02
JP5036118B2 (ja) 2012-09-26
EP1320913A1 (de) 2003-06-25
DE60102597D1 (de) 2004-05-06
KR20080059476A (ko) 2008-06-27

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